JP2007247068A5 - - Google Patents

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Publication number
JP2007247068A5
JP2007247068A5 JP2007070851A JP2007070851A JP2007247068A5 JP 2007247068 A5 JP2007247068 A5 JP 2007247068A5 JP 2007070851 A JP2007070851 A JP 2007070851A JP 2007070851 A JP2007070851 A JP 2007070851A JP 2007247068 A5 JP2007247068 A5 JP 2007247068A5
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Japan
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substrate
radiation
support
reflector
substrate support
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JP2007070851A
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JP5285864B2 (ja
JP2007247068A (ja
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JP2007070851A 2006-03-17 2007-03-19 Ｕｖ硬化システム Active JP5285864B2 (ja)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
US78342106P 2006-03-17 2006-03-17
US60/783421 2006-03-17
US81672306P 2006-06-26 2006-06-26
US81666006P 2006-06-26 2006-06-26
US60/816723 2006-06-26
US60/816660 2006-06-26
US88690607P 2007-01-26 2007-01-26
US60/886906 2007-01-26

Publications (3)

Publication Number Publication Date
JP2007247068A JP2007247068A (ja) 2007-09-27
JP2007247068A5 true JP2007247068A5 (enExample) 2010-04-15
JP5285864B2 JP5285864B2 (ja) 2013-09-11

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US (3) US7909595B2 (enExample)
JP (1) JP5285864B2 (enExample)
KR (1) KR101341540B1 (enExample)
CN (2) CN101093786B (enExample)
SG (1) SG136078A1 (enExample)
TW (1) TWI388692B (enExample)

Families Citing this family (81)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050250346A1 (en) * 2004-05-06 2005-11-10 Applied Materials, Inc. Process and apparatus for post deposition treatment of low k dielectric materials
US7777198B2 (en) * 2005-05-09 2010-08-17 Applied Materials, Inc. Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation
US7622378B2 (en) 2005-11-09 2009-11-24 Tokyo Electron Limited Multi-step system and method for curing a dielectric film
US7692171B2 (en) * 2006-03-17 2010-04-06 Andrzei Kaszuba Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors
US7566891B2 (en) * 2006-03-17 2009-07-28 Applied Materials, Inc. Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectors
US7909595B2 (en) * 2006-03-17 2011-03-22 Applied Materials, Inc. Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections
US7547633B2 (en) * 2006-05-01 2009-06-16 Applied Materials, Inc. UV assisted thermal processing
US20070287091A1 (en) * 2006-06-12 2007-12-13 Jacobo Victor M System and method for exposing electronic substrates to UV light
US8956457B2 (en) * 2006-09-08 2015-02-17 Tokyo Electron Limited Thermal processing system for curing dielectric films
US7763869B2 (en) * 2007-03-23 2010-07-27 Asm Japan K.K. UV light irradiating apparatus with liquid filter
US20090075491A1 (en) * 2007-09-13 2009-03-19 Tokyo Electron Limited Method for curing a dielectric film
US8186855B2 (en) * 2007-10-01 2012-05-29 Wassel James J LED lamp apparatus and method of making an LED lamp apparatus
US8322881B1 (en) 2007-12-21 2012-12-04 Appalachian Lighting Systems, Inc. Lighting fixture
JP5234319B2 (ja) * 2008-01-21 2013-07-10 ソニー株式会社 光造形装置および光造形方法
US7858533B2 (en) * 2008-03-06 2010-12-28 Tokyo Electron Limited Method for curing a porous low dielectric constant dielectric film
US20090226695A1 (en) * 2008-03-06 2009-09-10 Tokyo Electron Limited Method for treating a dielectric film with infrared radiation
US7977256B2 (en) 2008-03-06 2011-07-12 Tokyo Electron Limited Method for removing a pore-generating material from an uncured low-k dielectric film
US20090226694A1 (en) * 2008-03-06 2009-09-10 Tokyo Electron Limited POROUS SiCOH-CONTAINING DIELECTRIC FILM AND A METHOD OF PREPARING
US8022377B2 (en) 2008-04-22 2011-09-20 Applied Materials, Inc. Method and apparatus for excimer curing
US20090305515A1 (en) * 2008-06-06 2009-12-10 Dustin Ho Method and apparatus for uv curing with water vapor
KR101631586B1 (ko) * 2008-06-27 2016-06-17 어플라이드 머티어리얼스, 인코포레이티드 기판 성능에 대한 높은 처리량 및 안정한 기판을 위한 급속 주기적 및 포괄적 후 다중 기판 ｕｖ-오존 세정 시퀀스들의 중첩
JP5423205B2 (ja) * 2008-08-29 2014-02-19 東京エレクトロン株式会社 成膜装置
US8895942B2 (en) * 2008-09-16 2014-11-25 Tokyo Electron Limited Dielectric treatment module using scanning IR radiation source
KR101690804B1 (ko) * 2008-09-16 2016-12-28 도쿄엘렉트론가부시키가이샤 유전체 재료 처리 시스템 및 작동 방법
US20100065758A1 (en) * 2008-09-16 2010-03-18 Tokyo Electron Limited Dielectric material treatment system and method of operating
WO2010045534A1 (en) * 2008-10-17 2010-04-22 Atonometrics, Inc. Ultraviolet light exposure chamber for photovoltaic modules
US7964858B2 (en) * 2008-10-21 2011-06-21 Applied Materials, Inc. Ultraviolet reflector with coolant gas holes and method
US20100096569A1 (en) * 2008-10-21 2010-04-22 Applied Materials, Inc. Ultraviolet-transmitting microwave reflector comprising a micromesh screen
JP5445044B2 (ja) * 2008-11-14 2014-03-19 東京エレクトロン株式会社 成膜装置
US8399869B2 (en) * 2008-12-11 2013-03-19 Osram Gesellschaft Mit Beschraenkter Haftung UV luminaire having a plurality of UV lamps, particularly for technical product processing
US20100193674A1 (en) * 2009-02-03 2010-08-05 Wkk Distribution, Ltd. Lamp system producing uniform high intensity ultraviolet light for exposure of photolithographic and other light polymerizable materials
US8617347B2 (en) * 2009-08-06 2013-12-31 Applied Materials, Inc. Vacuum processing chambers incorporating a moveable flow equalizer
US8603292B2 (en) * 2009-10-28 2013-12-10 Lam Research Corporation Quartz window for a degas chamber
JP5257328B2 (ja) * 2009-11-04 2013-08-07 東京エレクトロン株式会社 基板処理装置、基板処理方法及び記憶媒体
JP5310512B2 (ja) * 2009-12-02 2013-10-09 東京エレクトロン株式会社 基板処理装置
JP5553588B2 (ja) * 2009-12-10 2014-07-16 東京エレクトロン株式会社 成膜装置
US8584612B2 (en) * 2009-12-17 2013-11-19 Lam Research Corporation UV lamp assembly of degas chamber having rotary shutters
US20110151677A1 (en) * 2009-12-21 2011-06-23 Applied Materials, Inc. Wet oxidation process performed on a dielectric material formed from a flowable cvd process
WO2011100577A2 (en) * 2010-02-12 2011-08-18 Procure Treatment Centers, Inc. Robotic mobile anesthesia system
US9017933B2 (en) * 2010-03-29 2015-04-28 Tokyo Electron Limited Method for integrating low-k dielectrics
JP5909039B2 (ja) * 2010-04-06 2016-04-26 株式会社小森コーポレーション 巻紙印刷機
WO2011152650A2 (ko) * 2010-05-31 2011-12-08 주식회사 메가젠임플란트 치과용 임플란트의 표면 처리 장치
US8492736B2 (en) 2010-06-09 2013-07-23 Lam Research Corporation Ozone plenum as UV shutter or tunable UV filter for cleaning semiconductor substrates
US9378857B2 (en) * 2010-07-16 2016-06-28 Nordson Corporation Lamp systems and methods for generating ultraviolet light
CN103109357B (zh) 2010-10-19 2016-08-24 应用材料公司 用于紫外线纳米固化腔室的石英喷洒器
WO2012053132A1 (ja) * 2010-10-22 2012-04-26 パナソニック株式会社 半導体製造装置、膜の製造方法及び半導体装置の製造方法
US8309421B2 (en) * 2010-11-24 2012-11-13 Applied Materials, Inc. Dual-bulb lamphead control methodology
CN102121607B (zh) * 2011-01-11 2012-10-24 安徽师范大学 一种紫外led平面固化装置的设计方案
US20120258259A1 (en) 2011-04-08 2012-10-11 Amit Bansal Apparatus and method for uv treatment, chemical treatment, and deposition
US20130026381A1 (en) * 2011-07-25 2013-01-31 Taiwan Semiconductor Manufacturing Company, Ltd. Dynamic, real time ultraviolet radiation intensity monitor
KR101310657B1 (ko) * 2011-12-27 2013-09-24 주은유브이텍 주식회사 자외선 경화장치
KR101310656B1 (ko) * 2011-12-27 2013-09-24 주은유브이텍 주식회사 자외선 경화장치
US9287154B2 (en) 2012-06-01 2016-03-15 Taiwan Semiconductor Manufacturing Co., Ltd. UV curing system for semiconductors
US20150123015A1 (en) * 2013-11-04 2015-05-07 Nordson Corporation Apparatus and methods for irradiating substrates with ultraviolet light
JP6349208B2 (ja) * 2014-09-09 2018-06-27 東京応化工業株式会社 紫外線照射装置、紫外線照射方法、基板処理装置、及び基板処理装置の製造方法
US10520251B2 (en) * 2015-01-15 2019-12-31 Heraeus Noblelight America Llc UV light curing systems, and methods of designing and operating the same
TWI535971B (zh) * 2015-04-16 2016-06-01 隆達電子股份有限公司 車用燈具
US9433973B1 (en) * 2015-06-15 2016-09-06 Taiwan Semiconductor Manufacturing Co., Ltd. UV curing apparatus
DE102015011229B4 (de) * 2015-08-27 2020-07-23 Süss Microtec Photomask Equipment Gmbh & Co. Kg Vorrichtung zum Aufbringen eines mit UV-Strahlung beaufschlagten flüssigen Mediums auf ein Substrat
US10773509B2 (en) * 2016-03-09 2020-09-15 Applied Materials, Inc. Pad structure and fabrication methods
US10541159B2 (en) * 2016-05-26 2020-01-21 Applied Materials, Inc. Processing chamber with irradiance curing lens
JP6721420B2 (ja) * 2016-06-02 2020-07-15 株式会社ディスコ 漏れ光検出方法
US20170358446A1 (en) * 2016-06-13 2017-12-14 Taiwan Semiconductor Manufacturing Co., Ltd. Wafer processing apparatus and wafer processing method using the same
KR102145276B1 (ko) * 2016-07-22 2020-08-18 어플라이드 머티어리얼스, 인코포레이티드 에피 균일성 조정을 개선하기 위한 가열 변조기
US10483010B2 (en) * 2016-09-07 2019-11-19 Lam Research Ag Reduction of surface and embedded substrate charge by controlled exposure to vacuum ultraviolet (VUV) light in low-oxygen environment
JP6862549B2 (ja) * 2017-02-10 2021-04-21 ヒューレット−パッカード デベロップメント カンパニー エル．ピー．Ｈｅｗｌｅｔｔ‐Ｐａｃｋａｒｄ Ｄｅｖｅｌｏｐｍｅｎｔ Ｃｏｍｐａｎｙ， Ｌ．Ｐ． 融着モジュール
US20210197466A1 (en) * 2017-04-13 2021-07-01 Hewlett-Packard Development Company, L.P. Reflective barriers
WO2019213651A1 (en) 2018-05-04 2019-11-07 Xenon Corporation Reflector for providing uniform light energy
CN109340634A (zh) * 2018-11-27 2019-02-15 广州黑格智造信息科技有限公司 光固化组件及光固化箱
US12239751B2 (en) * 2018-11-28 2025-03-04 Gold Mine Ideas, Llc UV pathogen control device and system
US11348784B2 (en) 2019-08-12 2022-05-31 Beijing E-Town Semiconductor Technology Co., Ltd Enhanced ignition in inductively coupled plasmas for workpiece processing
US11215934B2 (en) * 2020-01-21 2022-01-04 Applied Materials, Inc. In-situ light detection methods and apparatus for ultraviolet semiconductor substrate processing
KR102799656B1 (ko) * 2020-03-31 2025-04-23 에이지씨 가부시키가이샤 무선 전달 시스템
CN111508872B (zh) * 2020-04-22 2024-03-26 北京北方华创微电子装备有限公司 光照射装置及半导体加工设备
US11430671B2 (en) * 2020-07-30 2022-08-30 Taiwan Semiconductor Manufacturing Co., Ltd. Ozone wafer cleaning module having an ultraviolet lamp module with rotatable reflectors
KR102455371B1 (ko) * 2020-09-14 2022-10-17 주식회사 유비테크 Uv램프의 수명이 연장된 uv경화장치
CN115036199A (zh) * 2021-03-05 2022-09-09 台湾积体电路制造股份有限公司 微波产生器、紫外光源、与基板处理方法
TWI785519B (zh) * 2021-03-05 2022-12-01 台灣積體電路製造股份有限公司 微波產生器、紫外光源、與基板處理方法
NL2028245B1 (en) * 2021-05-19 2022-12-05 Draka Comteq Bv A plasma chemical vapor deposition apparatus
KR102322101B1 (ko) * 2021-06-24 2021-11-04 주식회사 자이시스 반도체 제조 장치
TWI808488B (zh) * 2021-09-14 2023-07-11 林獻昇 集光束uvled紫外線掃描方法及其裝置

Family Cites Families (65)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA988453A (en) * 1972-03-22 1976-05-04 Robert Hildebrand Maschinenbau G.M.B.H. Method and apparatus for curing a coating of a substrate
US3983039A (en) * 1975-03-03 1976-09-28 Fusion Systems Corporation Non-symmetrical reflector for ultraviolet curing
US4135098A (en) 1976-11-05 1979-01-16 Union Carbide Corporation Method and apparatus for curing coating materials
JPS5845738A (ja) * 1981-09-16 1983-03-17 Toshiba Electric Equip Corp 紫外線照射器具
US4411931A (en) 1982-09-29 1983-10-25 Armstrong World Industries, Inc. Multiple step UV curing process for providing accurately controlled surface texture
NL8402124A (nl) 1984-07-04 1986-02-03 Philips Nv Inrichting voor het belichten van een uv hardende laag op een draadvormig lichaam.
GB2203757B (en) * 1987-04-16 1991-05-22 Philips Electronic Associated Electronic device manufacture
JPH01112230A (ja) * 1987-10-24 1989-04-28 Mitsubishi Rayon Co Ltd 照射装置
JPH02109338A (ja) * 1988-10-18 1990-04-23 Fujitsu Ltd 絶縁膜の安定化処理方法
DE3919334A1 (de) * 1989-06-13 1990-12-20 Tetsuhiro Kano Reflektor fuer eine leuchte
JPH0360733A (ja) * 1989-07-27 1991-03-15 Toshiba Lighting & Technol Corp 紫外線照射装置
JPH03169338A (ja) * 1989-11-30 1991-07-23 Toshiba Lighting & Technol Corp 紫外線照射装置
JPH0435842A (ja) 1990-05-31 1992-02-06 Brother Ind Ltd 加工ユニット制御装置
JPH04131460U (ja) * 1991-05-23 1992-12-03 大平洋機工株式会社 長尺の被塗物の紫外線乾燥装置
US5228206A (en) 1992-01-15 1993-07-20 Submicron Systems, Inc. Cluster tool dry cleaning system
US5215588A (en) * 1992-01-17 1993-06-01 Amtech Systems, Inc. Photo-CVD system
DE4318735A1 (de) * 1993-06-05 1994-12-08 Kammann Maschf Werner UV-Strahler zum Bestrahlen von Druckfarben auf Objekten und Verfahren zum Trocknen von mit Druckfarbe versehenen Objekten
US5440137A (en) 1994-09-06 1995-08-08 Fusion Systems Corporation Screw mechanism for radiation-curing lamp having an adjustable irradiation area
US5705232A (en) 1994-09-20 1998-01-06 Texas Instruments Incorporated In-situ coat, bake and cure of dielectric material processing system for semiconductor manufacturing
GB2349684B (en) * 1996-08-02 2001-01-17 Nordson Corp Lamp assembly
EP0968962A4 (en) 1997-06-23 2002-04-03 Soloviev Evgeny Vladimirovich METHOD AND DEVICE FOR TREATING LIQUIDS, AIR AND SURFACES WITH UV RAYS
US6098637A (en) 1998-03-03 2000-08-08 Applied Materials, Inc. In situ cleaning of the surface inside a vacuum processing chamber
DE19810455C2 (de) 1998-03-11 2000-02-24 Michael Bisges Kaltlicht-UV-Bestrahlungsvorrichtung
GB2336240A (en) * 1998-04-09 1999-10-13 Jenton International Limited Apparatus for emitting light
US6284050B1 (en) 1998-05-18 2001-09-04 Novellus Systems, Inc. UV exposure for improving properties and adhesion of dielectric polymer films formed by chemical vapor deposition
JP2000005295A (ja) * 1998-06-22 2000-01-11 Daikin Ind Ltd 脱臭装置
JP3078528B2 (ja) * 1998-09-10 2000-08-21 東京エレクトロン株式会社 被処理膜の改質装置
JP2000218156A (ja) 1998-11-25 2000-08-08 Hooya Shot Kk 紫外光照射装置
US6331480B1 (en) 1999-02-18 2001-12-18 Taiwan Semiconductor Manufacturing Company Method to improve adhesion between an overlying oxide hard mask and an underlying low dielectric constant material
US7126687B2 (en) 1999-08-09 2006-10-24 The United States Of America As Represented By The Secretary Of The Army Method and instrumentation for determining absorption and morphology of individual airborne particles
US6475930B1 (en) * 2000-01-31 2002-11-05 Motorola, Inc. UV cure process and tool for low k film formation
GB2360084B (en) 2000-03-08 2004-04-21 Nordson Corp Lamp assembly
CN1224074C (zh) 2000-04-07 2005-10-19 诺德森公司 带有灯体冷却系统的微波激励的紫外线灯系统
US6614181B1 (en) 2000-08-23 2003-09-02 Applied Materials, Inc. UV radiation source for densification of CVD carbon-doped silicon oxide films
US6566278B1 (en) 2000-08-24 2003-05-20 Applied Materials Inc. Method for densification of CVD carbon-doped silicon oxide films through UV irradiation
US6323601B1 (en) 2000-09-11 2001-11-27 Nordson Corporation Reflector for an ultraviolet lamp system
US6380270B1 (en) 2000-09-26 2002-04-30 Honeywell International Inc. Photogenerated nanoporous materials
US6559460B1 (en) * 2000-10-31 2003-05-06 Nordson Corporation Ultraviolet lamp system and methods
GB2407370B (en) * 2001-02-27 2005-07-06 Nordson Corp Lamp assembly
US6732451B2 (en) 2001-04-11 2004-05-11 Intermec Ip Corp. UV curing module for label printer
US6756085B2 (en) 2001-09-14 2004-06-29 Axcelis Technologies, Inc. Ultraviolet curing processes for advanced low-k materials
DE10204994B4 (de) 2002-02-05 2006-11-09 Xtreme Technologies Gmbh Anordnung zur Überwachung der Energieabstrahlung einer EUV-Strahlungsquelle
DE10241330A1 (de) 2002-02-20 2003-09-04 Geesthacht Gkss Forschung Spiegelelement für die Reflektion von Röntgenstrahlen
US6619181B1 (en) * 2002-05-16 2003-09-16 The United States Of America As Represented By The Secretary Of The Army Apparatus for reversing the detonability of an explosive in energetic armor
US6717161B1 (en) 2003-04-30 2004-04-06 Fusion Uv Systems, Inc. Apparatus and method providing substantially uniform irradiation of surfaces of elongated objects with a high level of irradiance
WO2005001453A1 (en) * 2003-06-03 2005-01-06 Bayer Healthcare, Llc Automatic identification of reagent test strips using reflectance values
US7326502B2 (en) 2003-09-18 2008-02-05 Intel Corporation Multilayer coatings for EUV mask substrates
US7119904B2 (en) * 2004-01-13 2006-10-10 Thermo Electron Scientific Instruments Corporation Stabilized infrared source for infrared spectrometers
JP2005223007A (ja) * 2004-02-03 2005-08-18 Nikon Corp 照明光学装置
US7164144B2 (en) 2004-03-10 2007-01-16 Cymer Inc. EUV light source
US7227613B2 (en) * 2004-07-26 2007-06-05 Asml Holding N.V. Lithographic apparatus having double telecentric illumination
US7077547B2 (en) 2004-07-29 2006-07-18 Nordson Corporation Shuttered lamp assembly and method of cooling the lamp assembly
DE102004038592A1 (de) * 2004-08-06 2006-03-16 Ist Metz Gmbh Bestrahlungsaggregat
JP2006114848A (ja) * 2004-10-18 2006-04-27 Apex Corp 紫外線照射処理装置、紫外線照射処理方法及び半導体製造装置
JP2006134974A (ja) * 2004-11-04 2006-05-25 Canon Inc 露光装置、判定方法及びデバイス製造方法
US20060251827A1 (en) 2005-05-09 2006-11-09 Applied Materials, Inc. Tandem uv chamber for curing dielectric materials
US7777198B2 (en) 2005-05-09 2010-08-17 Applied Materials, Inc. Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation
US20060249175A1 (en) 2005-05-09 2006-11-09 Applied Materials, Inc. High efficiency UV curing system
JP2007234527A (ja) * 2006-03-03 2007-09-13 Harison Toshiba Lighting Corp 照明装置
US7692171B2 (en) 2006-03-17 2010-04-06 Andrzei Kaszuba Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors
US7909595B2 (en) 2006-03-17 2011-03-22 Applied Materials, Inc. Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections
US7566891B2 (en) 2006-03-17 2009-07-28 Applied Materials, Inc. Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectors
US20070287091A1 (en) 2006-06-12 2007-12-13 Jacobo Victor M System and method for exposing electronic substrates to UV light
US20070295012A1 (en) 2006-06-26 2007-12-27 Applied Materials, Inc. Nitrogen enriched cooling air module for uv curing system
KR20080027009A (ko) 2006-09-22 2008-03-26 에이에스엠지니텍코리아 주식회사 원자층 증착 장치 및 그를 이용한 다층막 증착 방법

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