CN101093786B - 紫外固化系统 - Google Patents

紫外固化系统 Download PDF

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Publication number
CN101093786B
CN101093786B CN2007100874797A CN200710087479A CN101093786B CN 101093786 B CN101093786 B CN 101093786B CN 2007100874797 A CN2007100874797 A CN 2007100874797A CN 200710087479 A CN200710087479 A CN 200710087479A CN 101093786 B CN101093786 B CN 101093786B
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Prior art keywords
substrate
reflector
ultraviolet radiation
radiation
lamp
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CN2007100874797A
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Chinese (zh)
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CN101093786A (zh
Inventor
胡安·卡洛斯·罗奇-阿尔维斯
托马斯·诺瓦克
戴尔·R·杜·博伊斯
萨尼夫·巴鲁贾
斯科特·A·亨德里克森
达斯廷·W·胡
安德兹·卡祖巴
汤姆·K·乔
希姆·M·萨德
恩德卡·O·米科蒂
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Applied Materials Inc
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Applied Materials Inc
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Publication of CN101093786A publication Critical patent/CN101093786A/zh
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B05D3/065After-treatment
    • B05D3/067Curing or cross-linking the coating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C71/00After-treatment of articles without altering their shape; Apparatus therefor
    • B29C71/04After-treatment of articles without altering their shape; Apparatus therefor by wave energy or particle radiation, e.g. for curing or vulcanising preformed articles
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B3/00Drying solid materials or objects by processes involving the application of heat
    • F26B3/28Drying solid materials or objects by processes involving the application of heat by radiation, e.g. from the sun
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02107Forming insulating materials on a substrate
    • H01L21/02296Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
    • H01L21/02318Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment
    • H01L21/02345Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to radiation, e.g. visible light
    • H01L21/02348Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to radiation, e.g. visible light treatment by exposure to UV light
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • H01L21/67115Apparatus for thermal treatment mainly by radiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0827Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Microbiology (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Formation Of Insulating Films (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
CN2007100874797A 2006-03-17 2007-03-19 紫外固化系统 Active CN101093786B (zh)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
US78342106P 2006-03-17 2006-03-17
US60/783,421 2006-03-17
US81672306P 2006-06-26 2006-06-26
US81666006P 2006-06-26 2006-06-26
US60/816,723 2006-06-26
US60/816,660 2006-06-26
US88690607P 2007-01-26 2007-01-26
US60/886,906 2007-01-26

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN2010105348732A Division CN102136411B (zh) 2006-03-17 2007-03-19 紫外固化系统

Publications (2)

Publication Number Publication Date
CN101093786A CN101093786A (zh) 2007-12-26
CN101093786B true CN101093786B (zh) 2010-12-22

Family

ID=38591674

Family Applications (2)

Application Number Title Priority Date Filing Date
CN2007100874797A Active CN101093786B (zh) 2006-03-17 2007-03-19 紫外固化系统
CN2010105348732A Expired - Fee Related CN102136411B (zh) 2006-03-17 2007-03-19 紫外固化系统

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN2010105348732A Expired - Fee Related CN102136411B (zh) 2006-03-17 2007-03-19 紫外固化系统

Country Status (6)

Country Link
US (3) US7909595B2 (enExample)
JP (1) JP5285864B2 (enExample)
KR (1) KR101341540B1 (enExample)
CN (2) CN101093786B (enExample)
SG (1) SG136078A1 (enExample)
TW (1) TWI388692B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20220377871A1 (en) * 2021-05-19 2022-11-24 Draka Comteq B.V. Plasma Chemical Vapor Deposition Apparatus

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US7589336B2 (en) 2009-09-15
US20120003398A1 (en) 2012-01-05
US7909595B2 (en) 2011-03-22
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US20070228289A1 (en) 2007-10-04
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