JP2007201073A - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP2007201073A JP2007201073A JP2006016433A JP2006016433A JP2007201073A JP 2007201073 A JP2007201073 A JP 2007201073A JP 2006016433 A JP2006016433 A JP 2006016433A JP 2006016433 A JP2006016433 A JP 2006016433A JP 2007201073 A JP2007201073 A JP 2007201073A
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 73
- 239000010410 layer Substances 0.000 claims abstract description 99
- 229910052751 metal Inorganic materials 0.000 claims abstract description 24
- 239000002184 metal Substances 0.000 claims abstract description 24
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 239000011229 interlayer Substances 0.000 claims abstract description 19
- 239000004973 liquid crystal related substance Substances 0.000 claims description 13
- 239000012535 impurity Substances 0.000 claims description 6
- 239000010408 film Substances 0.000 abstract description 64
- 239000010409 thin film Substances 0.000 abstract description 39
- 230000006866 deterioration Effects 0.000 abstract description 3
- 230000003287 optical effect Effects 0.000 abstract 1
- 230000007423 decrease Effects 0.000 description 9
- 229910052581 Si3N4 Inorganic materials 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 6
- 229910052814 silicon oxide Inorganic materials 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 229920005591 polysilicon Polymers 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000005224 laser annealing Methods 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
- H01L29/78609—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device for preventing leakage current
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/417—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
- H01L29/41725—Source or drain electrodes for field effect devices
- H01L29/41733—Source or drain electrodes for field effect devices for thin film transistors with insulated gate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
- H01L29/78633—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device with a light shield
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Thin Film Transistor (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
【解決手段】基板10上に下部金属層11が形成され、さらに、バッファ膜12、半導体層13、ゲート絶縁膜14、及びゲート配線15が、この順で形成されている。ゲート配線15上には、コンタクトホールCHを備えた層間絶縁膜16が形成されている。層間絶縁膜16上には、コンタクトホールCHを通して半導体層13のソース13S及びドレイン13Dとそれぞれ接続されたソース配線17S及びドレイン配線17Dが延在している。ここで、ソース配線17S、ドレイン配線17D、及び下部金属層11は、各コンタクトホールCHの側から延びて、半導体層13及びゲート配線15の上方もしくは下方において、ゲート配線15の幅方向の端P3を越えない領域を覆う。
【選択図】 図2
Description
13 半導体層 13S ソース 13D ドレイン
14 ゲート絶縁膜 15,GL ゲート配線 16 層間絶縁膜
17S,37S ソース配線 17D,37D,47D,DL ドレイン配線
18 平坦化膜 19 画素電極
A,B 低濃度層 DEP 空乏化領域
Claims (5)
- 絶縁基板と、
前記絶縁基板上に形成されたバッファ膜と、
前記バッファ膜上に形成された半導体層と、
前記半導体層に不純物が添加されてなるソース及びドレインと、
前記半導体層を覆って前記バッファ膜上に形成されたゲート絶縁膜と、
前記半導体層と一部重畳して前記ゲート絶縁膜上に形成されたゲート配線と、
前記ゲート配線を覆って前記ゲート絶縁膜上に形成された層間絶縁膜と、
前記ソース及び前記ドレイン上の前記層間絶縁膜に形成されたコンタクトホールと、
前記コンタクトホールを通して前記ソースと接続され前記層間絶縁膜上に延在するソース配線と、
前記コンタクトホールを通して前記ドレインと接続され前記層間絶縁膜上に延在するドレイン配線と、を備え、
前記ソース配線又は前記ドレイン配線は、前記ゲート配線上で終端することを特徴とする半導体装置。 - 前記ソース配線又は前記ドレイン配線は、前記ゲート配線上であって前記半導体層と重畳する領域で終端することを特徴とする請求項1記載の半導体装置。
- 前記ドレイン配線は、前記半導体層と重畳して直線状に延びていることを特徴とする請求項1又は請求項2に記載の半導体装置。
- 前記絶縁基板上には金属層が形成されており、
前記金属層は、前記コンタクトホール側から延びて、前記ゲート配線の下方であって前記半導体層と重畳する領域で終端することを特徴とする請求項1、2、3のいずれかに記載の半導体装置。 - 液晶表示装置の表示画素に配置され、その表示画素を選択する画素選択トランジスタに用いられることを特徴とする請求項1、2、3、4のいずれかに記載の半導体装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006016433A JP4844133B2 (ja) | 2006-01-25 | 2006-01-25 | 半導体装置 |
TW096102441A TWI334226B (en) | 2006-01-25 | 2007-01-23 | Semiconductor device |
KR1020070007410A KR100861628B1 (ko) | 2006-01-25 | 2007-01-24 | 반도체 장치 |
US11/657,008 US7629650B2 (en) | 2006-01-25 | 2007-01-24 | Semiconductor device |
CN2007100082209A CN101009333B (zh) | 2006-01-25 | 2007-01-25 | 半导体装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006016433A JP4844133B2 (ja) | 2006-01-25 | 2006-01-25 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007201073A true JP2007201073A (ja) | 2007-08-09 |
JP4844133B2 JP4844133B2 (ja) | 2011-12-28 |
Family
ID=38284695
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006016433A Active JP4844133B2 (ja) | 2006-01-25 | 2006-01-25 | 半導体装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7629650B2 (ja) |
JP (1) | JP4844133B2 (ja) |
KR (1) | KR100861628B1 (ja) |
CN (1) | CN101009333B (ja) |
TW (1) | TWI334226B (ja) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010107786A (ja) * | 2008-10-30 | 2010-05-13 | Hitachi Displays Ltd | 表示装置 |
JP2011187931A (ja) * | 2010-02-15 | 2011-09-22 | Nec Lcd Technologies Ltd | 薄膜トランジスタ、その製造方法、及び表示装置並びに電子機器 |
JP2015173296A (ja) * | 2015-06-24 | 2015-10-01 | 株式会社ジャパンディスプレイ | 表示装置 |
JP2015211089A (ja) * | 2014-04-24 | 2015-11-24 | Nltテクノロジー株式会社 | 薄膜トランジスタ及び表示装置 |
US9853063B2 (en) | 2015-08-11 | 2017-12-26 | Japan Display Inc. | Display device |
KR20190122923A (ko) * | 2018-04-20 | 2019-10-31 | 삼성디스플레이 주식회사 | 디스플레이 장치 및 그 제조방법 |
WO2020161775A1 (ja) * | 2019-02-04 | 2020-08-13 | シャープ株式会社 | 表示装置 |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI423448B (zh) * | 2010-05-21 | 2014-01-11 | Innolux Corp | 影像顯示系統 |
KR101724556B1 (ko) * | 2010-07-29 | 2017-04-10 | 삼성디스플레이 주식회사 | 센서 어레이 기판 및 이의 제조 방법 |
KR102164308B1 (ko) * | 2013-12-30 | 2020-10-12 | 엘지디스플레이 주식회사 | 박막 트랜지스터 기판 및 그를 이용한 액정표시장치 |
CN104793415A (zh) * | 2014-01-17 | 2015-07-22 | 群创光电股份有限公司 | 薄膜晶体管基板、显示面板及显示装置 |
CN104022157A (zh) * | 2014-05-26 | 2014-09-03 | 京东方科技集团股份有限公司 | 一种薄膜晶体管、阵列基板及显示装置 |
KR102182482B1 (ko) * | 2014-07-15 | 2020-11-25 | 엘지디스플레이 주식회사 | 산화물 반도체 박막 트랜지스터 및 이를 구비한 표시장치용 어레이 기판 |
TWI553839B (zh) * | 2015-04-15 | 2016-10-11 | 群創光電股份有限公司 | 顯示面板 |
KR101713030B1 (ko) * | 2015-10-19 | 2017-03-07 | 주식회사 비.엘.아이 | 냉온음료 공급기용 니들 구조체 |
CN105470267A (zh) * | 2016-01-11 | 2016-04-06 | 武汉华星光电技术有限公司 | 一种阵列基板及其制备方法 |
CN105742364A (zh) * | 2016-04-12 | 2016-07-06 | 中山大学 | 一种抑制有源沟道区光致漏电流产生的mos管及应用 |
CN106896610A (zh) * | 2017-02-24 | 2017-06-27 | 厦门天马微电子有限公司 | 阵列基板、显示面板及显示装置 |
KR102579829B1 (ko) * | 2018-03-22 | 2023-09-18 | 삼성디스플레이 주식회사 | 박막 트랜지스터 표시판 |
CN115735156A (zh) * | 2021-06-29 | 2023-03-03 | 京东方科技集团股份有限公司 | 显示基板及其制备方法、显示装置 |
CN116230654B (zh) * | 2023-05-10 | 2023-07-21 | 之江实验室 | 晶上系统组装结构及其组装方法 |
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JP2010107786A (ja) * | 2008-10-30 | 2010-05-13 | Hitachi Displays Ltd | 表示装置 |
JP2011187931A (ja) * | 2010-02-15 | 2011-09-22 | Nec Lcd Technologies Ltd | 薄膜トランジスタ、その製造方法、及び表示装置並びに電子機器 |
JP2015211089A (ja) * | 2014-04-24 | 2015-11-24 | Nltテクノロジー株式会社 | 薄膜トランジスタ及び表示装置 |
US10263116B2 (en) | 2014-04-24 | 2019-04-16 | Nlt Technologies, Ltd. | Thin film transistor and display device |
JP2015173296A (ja) * | 2015-06-24 | 2015-10-01 | 株式会社ジャパンディスプレイ | 表示装置 |
US9853063B2 (en) | 2015-08-11 | 2017-12-26 | Japan Display Inc. | Display device |
US10192895B2 (en) | 2015-08-11 | 2019-01-29 | Japan Display Inc. | Display device |
KR20190122923A (ko) * | 2018-04-20 | 2019-10-31 | 삼성디스플레이 주식회사 | 디스플레이 장치 및 그 제조방법 |
KR102603872B1 (ko) | 2018-04-20 | 2023-11-21 | 삼성디스플레이 주식회사 | 디스플레이 장치 및 그 제조방법 |
WO2020161775A1 (ja) * | 2019-02-04 | 2020-08-13 | シャープ株式会社 | 表示装置 |
Also Published As
Publication number | Publication date |
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CN101009333A (zh) | 2007-08-01 |
JP4844133B2 (ja) | 2011-12-28 |
TW200729511A (en) | 2007-08-01 |
CN101009333B (zh) | 2010-06-16 |
KR20070078075A (ko) | 2007-07-30 |
US20070170506A1 (en) | 2007-07-26 |
US7629650B2 (en) | 2009-12-08 |
TWI334226B (en) | 2010-12-01 |
KR100861628B1 (ko) | 2008-10-07 |
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