|
US3727620A
(en)
|
1970-03-18 |
1973-04-17 |
Fluoroware Of California Inc |
Rinsing and drying device
|
|
US3772105A
(en)
|
1970-07-24 |
1973-11-13 |
Shipley Co |
Continuous etching process
|
|
US3770598A
(en)
|
1972-01-21 |
1973-11-06 |
Oxy Metal Finishing Corp |
Electrodeposition of copper from acid baths
|
|
US4027686A
(en)
|
1973-01-02 |
1977-06-07 |
Texas Instruments Incorporated |
Method and apparatus for cleaning the surface of a semiconductor slice with a liquid spray of de-ionized water
|
|
AU496780B2
(en)
|
1975-03-11 |
1978-10-26 |
Oxy Metal Industries Corporation |
Additives in baths forthe electrodeposition of copper
|
|
US3953265A
(en)
|
1975-04-28 |
1976-04-27 |
International Business Machines Corporation |
Meniscus-contained method of handling fluids in the manufacture of semiconductor wafers
|
|
US3990462A
(en)
|
1975-05-19 |
1976-11-09 |
Fluoroware Systems Corporation |
Substrate stripping and cleaning apparatus
|
|
JPS5271871A
(en)
|
1975-12-11 |
1977-06-15 |
Nec Corp |
Washing apparatus
|
|
JPS5819350B2
(ja)
|
1976-04-08 |
1983-04-18 |
富士写真フイルム株式会社 |
スピンコ−テイング方法
|
|
US4326940A
(en)
|
1979-05-21 |
1982-04-27 |
Rohco Incorporated |
Automatic analyzer and control system for electroplating baths
|
|
US4315059A
(en)
|
1980-07-18 |
1982-02-09 |
The United States Of America As Represented By The United States Department Of Energy |
Molten salt lithium cells
|
|
US4405416A
(en)
|
1980-07-18 |
1983-09-20 |
Raistrick Ian D |
Molten salt lithium cells
|
|
US4336114A
(en)
|
1981-03-26 |
1982-06-22 |
Hooker Chemicals & Plastics Corp. |
Electrodeposition of bright copper
|
|
US4376685A
(en)
|
1981-06-24 |
1983-03-15 |
M&T Chemicals Inc. |
Acid copper electroplating baths containing brightening and leveling additives
|
|
DE3272891D1
(en)
|
1981-10-01 |
1986-10-02 |
Emi Ltd |
Electroplating arrangements
|
|
US4429983A
(en)
|
1982-03-22 |
1984-02-07 |
International Business Machines Corporation |
Developing apparatus for exposed photoresist coated wafers
|
|
US4439243A
(en)
|
1982-08-03 |
1984-03-27 |
Texas Instruments Incorporated |
Apparatus and method of material removal with fluid flow within a slot
|
|
US4439244A
(en)
|
1982-08-03 |
1984-03-27 |
Texas Instruments Incorporated |
Apparatus and method of material removal having a fluid filled slot
|
|
US4838289A
(en)
|
1982-08-03 |
1989-06-13 |
Texas Instruments Incorporated |
Apparatus and method for edge cleaning
|
|
US4489740A
(en)
|
1982-12-27 |
1984-12-25 |
General Signal Corporation |
Disc cleaning machine
|
|
US4510176A
(en)
|
1983-09-26 |
1985-04-09 |
At&T Bell Laboratories |
Removal of coating from periphery of a semiconductor wafer
|
|
US4518678A
(en)
|
1983-12-16 |
1985-05-21 |
Advanced Micro Devices, Inc. |
Selective removal of coating material on a coated substrate
|
|
JPS60210840A
(ja)
|
1984-03-06 |
1985-10-23 |
Fujitsu Ltd |
スピン処理装置
|
|
US4519846A
(en)
|
1984-03-08 |
1985-05-28 |
Seiichiro Aigo |
Process for washing and drying a semiconductor element
|
|
JPS61279858A
(ja)
|
1985-06-05 |
1986-12-10 |
Mitsubishi Electric Corp |
ネガレジスト現像装置
|
|
US4677758A
(en)
|
1985-10-08 |
1987-07-07 |
Seiichiro Aigo |
Spin drier for semiconductor material
|
|
US4693805A
(en)
|
1986-02-14 |
1987-09-15 |
Boe Limited |
Method and apparatus for sputtering a dielectric target or for reactive sputtering
|
|
US4788994A
(en)
|
1986-08-13 |
1988-12-06 |
Dainippon Screen Mfg. Co. |
Wafer holding mechanism
|
|
US4732785A
(en)
|
1986-09-26 |
1988-03-22 |
Motorola, Inc. |
Edge bead removal process for spin on films
|
|
US4875434A
(en)
|
1987-04-02 |
1989-10-24 |
Mitsubishi Denki Kabushiki Kaisha |
Apparatus for coating a substrate with a coating material
|
|
FR2623134B1
(fr)
|
1987-11-13 |
1991-08-02 |
Salem Ali |
Procede technique de decoupe et d'ajourage de plaques metalliques en vue de leur reproduction et incrustation
|
|
US5224504A
(en)
|
1988-05-25 |
1993-07-06 |
Semitool, Inc. |
Single wafer processor
|
|
US5230743A
(en)
|
1988-05-25 |
1993-07-27 |
Semitool, Inc. |
Method for single wafer processing in which a semiconductor wafer is contacted with a fluid
|
|
JPH01316936A
(ja)
|
1988-06-17 |
1989-12-21 |
Toshiba Corp |
半導体基板エッチング処理装置
|
|
US5316974A
(en)
|
1988-12-19 |
1994-05-31 |
Texas Instruments Incorporated |
Integrated circuit copper metallization process using a lift-off seed layer and a thick-plated conductor layer
|
|
JPH02253620A
(ja)
|
1989-03-28 |
1990-10-12 |
Oki Electric Ind Co Ltd |
半導体基板の洗浄装置
|
|
JP2803143B2
(ja)
|
1989-04-14 |
1998-09-24 |
カシオ計算機株式会社 |
半導体ウエハのメッキ前処理方法
|
|
US5039381A
(en)
|
1989-05-25 |
1991-08-13 |
Mullarkey Edward J |
Method of electroplating a precious metal on a semiconductor device, integrated circuit or the like
|
|
US5055425A
(en)
|
1989-06-01 |
1991-10-08 |
Hewlett-Packard Company |
Stacked solid via formation in integrated circuit systems
|
|
US5162260A
(en)
|
1989-06-01 |
1992-11-10 |
Hewlett-Packard Company |
Stacked solid via formation in integrated circuit systems
|
|
US4989345A
(en)
|
1989-12-18 |
1991-02-05 |
Gill Jr Gerald L |
Centrifugal spin dryer for semiconductor wafer
|
|
US5155336A
(en)
|
1990-01-19 |
1992-10-13 |
Applied Materials, Inc. |
Rapid thermal heating apparatus and method
|
|
JP2841618B2
(ja)
|
1990-01-25 |
1998-12-24 |
日本電気株式会社 |
ウェットエッチング装置
|
|
US5232511A
(en)
|
1990-05-15 |
1993-08-03 |
Semitool, Inc. |
Dynamic semiconductor wafer processing using homogeneous mixed acid vapors
|
|
US5222310A
(en)
|
1990-05-18 |
1993-06-29 |
Semitool, Inc. |
Single wafer processor with a frame
|
|
JP2902728B2
(ja)
*
|
1990-05-29 |
1999-06-07 |
新光電気工業株式会社 |
片面めっき方法
|
|
US5259407A
(en)
|
1990-06-15 |
1993-11-09 |
Matrix Inc. |
Surface treatment method and apparatus for a semiconductor wafer
|
|
US5252807A
(en)
|
1990-07-02 |
1993-10-12 |
George Chizinsky |
Heated plate rapid thermal processor
|
|
US5368711A
(en)
|
1990-08-01 |
1994-11-29 |
Poris; Jaime |
Selective metal electrodeposition process and apparatus
|
|
US5256274A
(en)
|
1990-08-01 |
1993-10-26 |
Jaime Poris |
Selective metal electrodeposition process
|
|
JPH0810686B2
(ja)
|
1990-09-14 |
1996-01-31 |
株式会社東芝 |
半導体基板エッチング処理装置
|
|
CA2059841A1
(en)
|
1991-01-24 |
1992-07-25 |
Ichiro Hayashida |
Surface treating solutions and cleaning method
|
|
DE4109955A1
(de)
|
1991-03-26 |
1992-10-01 |
Siemens Ag |
Verfahren zum nasschemischen aetzen einer wolframrueckseitenbeschichtung auf einer halbleiterscheibe
|
|
JPH04363022A
(ja)
|
1991-06-06 |
1992-12-15 |
Enya Syst:Kk |
貼付板洗浄装置
|
|
JPH0513322A
(ja)
|
1991-07-09 |
1993-01-22 |
Ryoden Semiconductor Syst Eng Kk |
被膜溶剤塗布装置
|
|
JPH0715897B2
(ja)
|
1991-11-20 |
1995-02-22 |
株式会社エンヤシステム |
ウエ−ハ端面エッチング方法及び装置
|
|
JPH05160104A
(ja)
|
1991-12-05 |
1993-06-25 |
Fujitsu Ltd |
半導体ウェーハのウェット処理方法及びウェット処理装置
|
|
DE4202194C2
(de)
|
1992-01-28 |
1996-09-19 |
Fairchild Convac Gmbh Geraete |
Verfahren und Vorrichtung zum partiellen Entfernen von dünnen Schichten von einem Substrat
|
|
JP3200468B2
(ja)
|
1992-05-21 |
2001-08-20 |
日本エレクトロプレイテイング・エンジニヤース株式会社 |
ウエーハ用めっき装置
|
|
JP2654314B2
(ja)
|
1992-06-04 |
1997-09-17 |
東京応化工業株式会社 |
裏面洗浄装置
|
|
JPH0617291A
(ja)
|
1992-07-03 |
1994-01-25 |
Nec Corp |
金属めっき装置
|
|
US5328589A
(en)
|
1992-12-23 |
1994-07-12 |
Enthone-Omi, Inc. |
Functional fluid additives for acid copper electroplating baths
|
|
US5718813A
(en)
|
1992-12-30 |
1998-02-17 |
Advanced Energy Industries, Inc. |
Enhanced reactive DC sputtering system
|
|
JP3277404B2
(ja)
|
1993-03-31 |
2002-04-22 |
ソニー株式会社 |
基板洗浄方法及び基板洗浄装置
|
|
US5337708A
(en)
|
1993-06-15 |
1994-08-16 |
Chen We Yu |
Apparatus and method for automatic transmission system fluid exchange and internal system flushing
|
|
JP3247211B2
(ja)
|
1993-08-02 |
2002-01-15 |
富士通株式会社 |
配線用銅膜表面の酸化銅除去方法
|
|
US5608943A
(en)
|
1993-08-23 |
1997-03-11 |
Tokyo Electron Limited |
Apparatus for removing process liquid
|
|
US5415890A
(en)
|
1994-01-03 |
1995-05-16 |
Eaton Corporation |
Modular apparatus and method for surface treatment of parts with liquid baths
|
|
US5625170A
(en)
|
1994-01-18 |
1997-04-29 |
Nanometrics Incorporated |
Precision weighing to monitor the thickness and uniformity of deposited or etched thin film
|
|
JP3377849B2
(ja)
|
1994-02-02 |
2003-02-17 |
日本エレクトロプレイテイング・エンジニヤース株式会社 |
ウエーハ用メッキ装置
|
|
JPH07235473A
(ja)
*
|
1994-02-24 |
1995-09-05 |
Hitachi Ltd |
液体供給方法及び回転式液体供給装置及び回転式レジスト現像処理装置
|
|
US5651865A
(en)
|
1994-06-17 |
1997-07-29 |
Eni |
Preferential sputtering of insulators from conductive targets
|
|
US5753133A
(en)
|
1994-07-11 |
1998-05-19 |
Applied Komatsu Technology, Inc. |
Method and apparatus for etching film layers on large substrates
|
|
US5705223A
(en)
|
1994-07-26 |
1998-01-06 |
International Business Machine Corp. |
Method and apparatus for coating a semiconductor wafer
|
|
TW402758B
(en)
|
1996-05-20 |
2000-08-21 |
Tokyo Electorn Limtied |
Spin dryer and method of drying substrates
|
|
US5899216A
(en)
|
1996-07-08 |
1999-05-04 |
Speedfam Corporation |
Apparatus for rinsing wafers in the context of a combined cleaning rinsing and drying system
|
|
US6264752B1
(en)
*
|
1998-03-13 |
2001-07-24 |
Gary L. Curtis |
Reactor for processing a microelectronic workpiece
|
|
US5997653A
(en)
|
1996-10-07 |
1999-12-07 |
Tokyo Electron Limited |
Method for washing and drying substrates
|
|
US6114254A
(en)
|
1996-10-15 |
2000-09-05 |
Micron Technology, Inc. |
Method for removing contaminants from a semiconductor wafer
|
|
US5937469A
(en)
|
1996-12-03 |
1999-08-17 |
Intel Corporation |
Apparatus for mechanically cleaning the edges of wafers
|
|
TW345681B
(en)
|
1996-12-13 |
1998-11-21 |
Taiwan Semiconductor Mfg Co Ltd |
Method for removing covering layer on the peripheral edge portion of wafer
|
|
JP3300624B2
(ja)
|
1997-01-24 |
2002-07-08 |
東京エレクトロン株式会社 |
基板端面の洗浄方法
|
|
KR100249309B1
(ko)
|
1997-02-28 |
2000-03-15 |
윤종용 |
반도체 제조용 포토 레지스트 코팅 장치
|
|
TW419716B
(en)
|
1997-04-28 |
2001-01-21 |
Tokyo Electron Ltd |
Processing apparatus
|
|
US5783097A
(en)
|
1997-06-09 |
1998-07-21 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Process to avoid dielectric damage at the flat edge of the water
|
|
US6017437A
(en)
|
1997-08-22 |
2000-01-25 |
Cutek Research, Inc. |
Process chamber and method for depositing and/or removing material on a substrate
|
|
US5974681A
(en)
|
1997-09-10 |
1999-11-02 |
Speedfam-Ipec Corp. |
Apparatus for spin drying a workpiece
|
|
JPH1192949A
(ja)
*
|
1997-09-16 |
1999-04-06 |
Ebara Corp |
半導体ウエハーの配線メッキ装置
|
|
JP3830272B2
(ja)
*
|
1998-03-05 |
2006-10-04 |
株式会社荏原製作所 |
基板のめっき装置
|
|
US6027631A
(en)
|
1997-11-13 |
2000-02-22 |
Novellus Systems, Inc. |
Electroplating system with shields for varying thickness profile of deposited layer
|
|
US5897379A
(en)
|
1997-12-19 |
1999-04-27 |
Sharp Microelectronics Technology, Inc. |
Low temperature system and method for CVD copper removal
|
|
US6117778A
(en)
|
1998-02-11 |
2000-09-12 |
International Business Machines Corporation |
Semiconductor wafer edge bead removal method and tool
|
|
US6632292B1
(en)
*
|
1998-03-13 |
2003-10-14 |
Semitool, Inc. |
Selective treatment of microelectronic workpiece surfaces
|
|
US6565729B2
(en)
*
|
1998-03-20 |
2003-05-20 |
Semitool, Inc. |
Method for electrochemically depositing metal on a semiconductor workpiece
|
|
JP3534605B2
(ja)
*
|
1998-03-27 |
2004-06-07 |
大日本スクリーン製造株式会社 |
基板メッキ装置
|
|
DE69929967T2
(de)
|
1998-04-21 |
2007-05-24 |
Applied Materials, Inc., Santa Clara |
Elektroplattierungssystem und verfahren zur elektroplattierung auf substraten
|
|
US6099702A
(en)
|
1998-06-10 |
2000-08-08 |
Novellus Systems, Inc. |
Electroplating chamber with rotatable wafer holder and pre-wetting and rinsing capability
|
|
JP4162298B2
(ja)
*
|
1998-08-11 |
2008-10-08 |
株式会社荏原製作所 |
基板めっき装置
|
|
JP2000064087A
(ja)
*
|
1998-08-17 |
2000-02-29 |
Dainippon Screen Mfg Co Ltd |
基板メッキ方法及び基板メッキ装置
|
|
JP2000124156A
(ja)
*
|
1998-10-12 |
2000-04-28 |
Sony Corp |
半導体製造装置
|
|
US6267853B1
(en)
|
1999-07-09 |
2001-07-31 |
Applied Materials, Inc. |
Electro-chemical deposition system
|
|
US6258220B1
(en)
|
1998-11-30 |
2001-07-10 |
Applied Materials, Inc. |
Electro-chemical deposition system
|
|
US6254760B1
(en)
|
1999-03-05 |
2001-07-03 |
Applied Materials, Inc. |
Electro-chemical deposition system and method
|
|
US6290865B1
(en)
|
1998-11-30 |
2001-09-18 |
Applied Materials, Inc. |
Spin-rinse-drying process for electroplated semiconductor wafers
|
|
DE19902194A1
(de)
*
|
1999-01-21 |
2000-07-27 |
Stahlecker Fritz |
Flyer-Streckwerk mit nachfolgender Kondensierzone
|
|
US6136163A
(en)
*
|
1999-03-05 |
2000-10-24 |
Applied Materials, Inc. |
Apparatus for electro-chemical deposition with thermal anneal chamber
|
|
US6258223B1
(en)
*
|
1999-07-09 |
2001-07-10 |
Applied Materials, Inc. |
In-situ electroless copper seed layer enhancement in an electroplating system
|
|
US6254742B1
(en)
|
1999-07-12 |
2001-07-03 |
Semitool, Inc. |
Diffuser with spiral opening pattern for an electroplating reactor vessel
|
|
US6309981B1
(en)
|
1999-10-01 |
2001-10-30 |
Novellus Systems, Inc. |
Edge bevel removal of copper from silicon wafers
|
|
KR100773165B1
(ko)
*
|
1999-12-24 |
2007-11-02 |
가부시키가이샤 에바라 세이사꾸쇼 |
반도체기판처리장치 및 처리방법
|
|
JP3866012B2
(ja)
*
|
2000-06-02 |
2007-01-10 |
株式会社荏原製作所 |
無電解めっき方法及び装置
|
|
US20020152955A1
(en)
*
|
1999-12-30 |
2002-10-24 |
Yezdi Dordi |
Apparatus and method for depositing an electroless solution
|
|
JP2001192845A
(ja)
*
|
2000-01-13 |
2001-07-17 |
Tokyo Electron Ltd |
無電解メッキ装置及び無電解メッキ方法
|
|
US6634370B2
(en)
*
|
2000-05-08 |
2003-10-21 |
Tokyo Electron Limited |
Liquid treatment system and liquid treatment method
|
|
JP3668100B2
(ja)
*
|
2000-06-07 |
2005-07-06 |
株式会社荏原製作所 |
基板処理装置
|