TW402758B - Spin dryer and method of drying substrates - Google Patents

Spin dryer and method of drying substrates Download PDF

Info

Publication number
TW402758B
TW402758B TW086106685A TW86106685A TW402758B TW 402758 B TW402758 B TW 402758B TW 086106685 A TW086106685 A TW 086106685A TW 86106685 A TW86106685 A TW 86106685A TW 402758 B TW402758 B TW 402758B
Authority
TW
Taiwan
Prior art keywords
substrate
rotating body
holding
scope
patent application
Prior art date
Application number
TW086106685A
Other languages
Chinese (zh)
Inventor
Yosiyuki Honda
Yosio Kumagaya
Original Assignee
Tokyo Electorn Limtied
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electorn Limtied filed Critical Tokyo Electorn Limtied
Application granted granted Critical
Publication of TW402758B publication Critical patent/TW402758B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Drying Of Solid Materials (AREA)

Abstract

A spin dryer which removes the liquid adhering to a plurality of substrates via centrifugal separation, comprises; a rotary body having a lower part provided with a main shaft; a substrate holding means which holds a plurality of substrates with the substrate faces perpendicular to the main shaft of the rotary body and which is provided symmetrically with respect to the main shaft of the rotary body and rotatable with the rotary body; a treating container enclosing the rotary body and the substrate holding means; an air inlet port provided on top of the treating container for directing air into the treating container; and an air discharge port provided at one side of the treating container and extending from the bottom of the treating container to a level as high as the rotary body.

Description

經濟部中央標準局員工消費合作社印裝 402758 A7 _________B7 __五、發明説明（l ) 〔發明之技術背景〕 /¾ y 本發明是關於從半導體晶圓或L C D用等的 基板利用離心分離除去附著液，並使基板表之旋轉 乾燥器及基板乾燥方法。 ^ 製造半導體裝置之晶圓製程中，為淨化半導體晶圓表 面而以化學洗淨晶圓，水洗後乾燥之。在晶圓乾燥工程中 例如使用如美國專利5,4 35，075號公報、日本實 開昭63-180925號、日本特開平7-17651 2號公報、日本國特開平6 - 9 7 1 4 8號公報等所記載。 但是，美國專利5，4 3 5，0 7 5號公報所記載是 為了使乾燥用空氣充份且均匀地接觸各晶圓，而將乾燥用 空氣有效地導入，且必須將有效導入的空氣分配在晶圓相 互間的各俩空間內。又，因為來自旋轉驅動源或周邊機械 的發塵或帶電等所產生的微粒會混入乾燥用空氣中，於乾 燥處理時微粒等會附著在晶圓上而造成污染等問題。此外 ，又由於對排氣之空氣處理室側的逆流而有造成使撤粒附 著在晶片之處。 實開昭63-180925號所記載之装置為在豎立 設置於旋轉髏上的一對框體壁上支持可自由擺動的一對箱 形匣髏架，同時使兩匣體架可分開或接近者。根據此一裝 置在將收容多數晶圓的匣體揷入匣體架內之後，使兩匣體 架分開。隨後轉動旋轉體時，匣髏架形成水平狀態而使得 附著液從晶圓上離心分離。但是，該習知技術是將清洗處 理後的晶圓與匣體同時揷入匣體架的構造，因此其佔有容 (請先閱讀背面之注意事項3、寫本頁) al'ii .裝.Printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs 402758 A7 _________B7 __V. Description of the Invention (l) [Technical Background of the Invention] / ¾ y The present invention relates to the removal of adhesion from substrates such as semiconductor wafers or LCDs by centrifugation Liquid, and spin dryer and substrate drying method for substrate surface. ^ In the wafer manufacturing process for manufacturing semiconductor devices, the wafers are chemically cleaned to purify the surface of the semiconductor wafers, and then dried after being washed with water. In the wafer drying process, for example, U.S. Patent No. 5,4 35,075, Japanese Utility Model Publication No. 63-180925, Japanese Patent Application Laid-Open No. 7-17651, and Japanese Patent Application Laid-Open No. 6-9 7 1 4 8 are used. It is described in the bulletin and the like. However, in U.S. Patent No. 5,4 3,5,07,5, in order to allow the drying air to fully and uniformly contact each wafer, the drying air is effectively introduced, and the effectively introduced air must be distributed. In each of the two spaces between the wafers. In addition, particles generated by dust generation or charging from a rotary drive source or peripheral machinery may be mixed into the drying air, and particles and the like may adhere to the wafer during the drying process, causing problems such as contamination. In addition, due to the back-flow to the air processing chamber side of the exhaust gas, particle removal is attached to the wafer. The device described in Shikai Sho No. 63-180925 is a pair of box-shaped box skeletons that can swing freely on a pair of frame walls that are erected on the rotating skull, and at the same time, the two box frames can be separated or approached. . According to this device, after the magazine housing most wafers is put into the magazine holder, the two magazine holders are separated. When the rotating body is subsequently rotated, the cassette frame forms a horizontal state so that the adhesion liquid is centrifuged from the wafer. However, this conventional technique is a structure in which wafers and boxes that are cleaned and processed are put into a box rack at the same time, so its possession capacity (please read the note on the back 3, write this page) al'ii.

、1T 本紙張尺度逋用中國國家標準(CNS ) A4規格（210 X 297公釐） A7 B7 五、發明説明（2 ) 積大而導致裝置的大型化。並且，不僅是晶圓，匣體也同 時構成乾燥的對象，因此會有乾燥所須時間增長等問題。 又，由於是將匣體插入匣體架內，因此會使供給乾燥用空 氣產生亂流Μ致降低乾燥的效率。此外，由於乾燥用空氣 的亂流使微粒容易附著在晶圓上而會有導致污染之虞。 特開平7 - 1765 1 2號公報中所記載之裝置，具 備利用蓮送臂將蓮送之晶圓保持載置於載置台（匣體）， 及放入該載置台（匣體）的箱形搖籃。搖藍具備將載置台 保持於晶圓下位置的構件及周緣保持在晶圓中央位置的保 持構件。該裝置具有將上述載置台收容於箱形搖籃内Μ代 替匣體的構造，因此形成小的佔有容積而形成小型的裝置 。但是，該習知裝置是形成箱型搖籃，因此所供應之乾燥 用空氣在通過搖籃内時會產生亂流而會降低乾燥效率。此 外，會因為乾燥用空氣的亂流會使微粒容易附著在晶圓上 ,而產生污染的可能。 特開平6 - 9 7 1 4 8號公報所記載之裝置具備可互 相自由傾斜移動而相對的一對搖藍，及水平保持該等搖籃 的水平保持機構。此外，在搖籃的兩側壁上安裝可推壓保 持晶圓周緣的機構，可防止旋轉時晶圓的脫落。但是，該 習知裝置之晶圓推壓機構在構造上相當複雜。且由於是利 用彈簧的彈力推壓保持著晶画，因此會增大保持構件與晶 圓間相互的接觸面積，使異物容易附著在晶圓上而會有造 成污染之虞。另外，推壓力一旦過大時會有使晶圓變形的 問題。 本紙張尺度適用中國國家標準（CNS ) Α4規格（210 X 297公釐） _ 5 - ：4〇g758 A7 B7 五、發明説明（3 ) 再者，習知之旋轉乾燥器中必須緩和因高速旋轉對於 晶圓衝擊時所造成的破壞。 〔發明概要〕 本Γ發明之目的爲提供可有效利用乾燥用空氣*並儘可 能減少基板與保持部的接觸面積，並可防止撒粒的附著及 污染的發生而可提高精度及生產率，及可獲得裝置小型化、 1T This paper size adopts Chinese National Standard (CNS) A4 specification (210 X 297 mm) A7 B7 5. Description of the invention (2) The large size leads to the enlargement of the device. In addition, not only the wafers, but also the magazines are also the subject of drying, so there is a problem that the time required for drying increases. In addition, since the cassette is inserted into the cassette frame, a turbulent flow M is caused to supply the air for drying, thereby reducing the drying efficiency. In addition, the turbulent flow of drying air may cause particles to adhere to the wafer, which may cause contamination. The device described in Japanese Patent Application Laid-Open No. 7-1765 1 2 has a lotus-shaped arm for holding a wafer sent by a lotus on a mounting table (box), and a box shape placed in the mounting table (box). cradle. The shaker includes a member that holds the mounting table below the wafer and a holding member that holds the periphery at the center of the wafer. This device has a structure in which the above-mentioned mounting table is housed in a box-shaped cradle in place of an M-replacement box, and therefore, it has a small occupation volume and a small-sized device. However, this conventional device is formed into a box-type cradle. Therefore, the supplied drying air may cause turbulence when passing through the cradle, thereby reducing drying efficiency. In addition, the turbulent flow of drying air may cause particles to easily adhere to the wafer, which may cause contamination. The device described in Japanese Patent Application Laid-Open No. 6-9 7 1 4 8 includes a pair of rocking blues which can be tilted and moved freely relative to each other, and a horizontal holding mechanism for horizontally holding such cradles. In addition, the two sides of the cradle are equipped with a mechanism that can push and hold the periphery of the wafer to prevent the wafer from falling off during rotation. However, the wafer pushing mechanism of the conventional device is quite complicated in structure. And because the crystal picture is held by the elastic force of the spring, the contact area between the holding member and the crystal circle is increased, and foreign matter is likely to adhere to the wafer, which may cause contamination. In addition, if the pushing force is too large, the wafer may be deformed. This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) _ 5-: 4〇758758 A7 B7 V. Description of the invention (3) Furthermore, the conventional rotary dryer must be relieved due to high-speed rotation. Damage caused by wafer impact. [Summary of the Invention] The object of the present invention is to provide an efficient use of drying air * and to minimize the contact area between the substrate and the holding portion, and to prevent the adhesion of dust particles and the occurrence of contamination, and to improve accuracy and productivity. Gain device miniaturization

I 之旋轉乾燥器及基板乾燥方法。 為達成上述之目的，本發明之旋轉乾燥器，其特徽為 具備：下部具主軸之旋轉髏；相對於該旋轉體的主軸而保 持著與基板面正交之複數個基板，且對稱設置在上述旋轉 體主軸而與旋轉體同時旋囀的基板保持裝置；包圍上述旋 轉體及上述基板保持裝置之處理容器；將空氣導入該處理 容器内而形成在處理容器上部的空氣導入口；及，至少從 上述處理容器底部開口至上逑旋轉體高度位置的排氣口。 此外，將排氣導管連接在上逑排氣口的同時，可在該 排氣導管内配設使拂氣中氣液分離之氣液分離裝置。 又，於上述處理容器之空氣導入口部配設中央具通氣 孔之天板，同時在該天板上方配設環形過濾器，且亦可配 設具有從上述過濾器上部朝著過濾器中央部内突入之傾斜 部所成的遮蔽導板。 並且也可Μ在上述空氣導入口安裝防止靜電裝置（1〇-n i zer) ° 另外，將上述處理容器的底部沿著旋轉體的旋轉方向 形成逐漸朝下之坡度，同時可Μ朝著排氣口向下傾斜者亦 本紙張尺度適用中國國家標準（CNS ) Α4規格（210X 297公釐） 經濟部中央標準局員工消費合作社印製 402758 A7 B7五、發明説明（4 ) 可0 又，本發明之旋轉乾燥器，其特徴為：具備下部具主 軸之旋轉體；使該旋轉體旋轉之旋轉裝置；收容該旋轉裝 置之室；相對於上述旋轉體的主軸保持使基板的面正交之 複數値基板，且與上述旋轉體主軸對稱設置而與旋轉體同 時轉動之至少一對基板保持裝置；包圍上逑旋轉體及上述 基板保持裝置之處理容器；將空氣導入該處理容器内而形 成在該處理容器上部之空氣導入口；形成於上述處理容器 側部，至少從上述處理容器底部至上述旋轉髏高度位置形 成開口之排氣口；連通該排氣口之排氣管；連通上述旋轉 體與自由轉動支撐該主軸之封蓋間隙間所成的軸排氣管； 至少連通收容上述旋轉裝置室之室排氣管；及，將上述軸 排氣管的開口端部設置在上述室排氣管內，而使來自軸排 氣管的排氣流與室排氣管内的排氣流合流者。 另外，本發明之旋轉乾燥器，其特徵為：具備藉旋轉 裝置旋轉之旋轉體；相對於該旋轉體對稱配設，而保持基 板之至少一對基板保持裝置；及，安裝於上述旋轉體，具 有Μ直線覆蓋上述基板保持裝置側方的一對钿壁之腳，上 述基板保持裝置具有與上逑俩壁平行之壁部，及在上述旋 旋轉體半徑方向開口之通氣口。 並且，本發明之旋轉乾燥器，其特徽為：具備藉旋轉 裝置旋轉之旋轉體；相對於該旋轉體的軸對稱位置配設* 而保持基板之至少一對基板保持裝置；包圍上述旋轉髏及 支持裝置之處理容器；及，設置於上述旋轉體，具有Μ直 (請先閲讀背面之注意事項再填寫本頁) ru." 裝· 訂 本紙張尺度適用中國國家標準（CNS ) Α4規格（210X297公釐) 402758 A7 B7 ______ 五、發明説明（5 ) 線覆蓋上述基板保持裝置側方之一對壁部的脑，上述基板 保持裝置具有與上述側壁平行之壁部，及在上述旋轉髏半 徑方向開口之通氣口；上述處理容器具有形成相對於上述 旋轉體旋轉中心位置之空氣導入口，及設於侧壁一部份而 具有至少從底部延伸至上述旋轉體高度位置之排氣口。 又，本發明之旋轉乾燥器，其特擻為：具備藉旋轉裝 置旋轉之旋轉體；相對於該旋轉體的軸對稱位置配設，而 可保持基板之至少一對基板保持裝置；可使該等支持裝置 互相相對移動之相對移動裝置;使各基板保持裝置分別傾 動之傾動裝置；設於上述基板保持裝置*具有可保持基板 下侧部之複數個槽的下部支持體；具有保持基板兩側周圍 緣部的複數個稽之支持框體；及，使上述下部支持體可相 對於上述支持框體升降之升降裝置者。 此外，本發明之旋轉乾燥器，其特撤為：具備藉旋轉 裝置旋轉之旋轉體；設置可自由傾動於該旋轉體之軸對稱 位置，可支持複數個基板之至少一對支持裝置；具上部開 口，可收容上述旋轉體及支持裝置之處理室；覆蓋上述處 理室上部開口之蓋；移動上述支持裝置之移動裝置；開關 上述蓋之開關裝置，可藉上述移動裝置移動支持裝置時， 利用上述開關裝置使上述蓋開關動作者。 本發明之基板乾燥方法為， (a) —次接受複數値量之匣體的基板使基板可Μ等節 距間隔垂直配列， (b) 將所接受的基板至少分成兩群組， 本紙張又度適用中國國家標準（CNS ) A4規格（210X297公釐） _ 8 _ 經濟部中央標準局員工消費合作社印製 A7 B7 五、發明説明（6 ) (c)M各群組將基板從垂直位置改變至水平位置， (d )藉第1旋轉加速開姶轉動全群組的基板， (e)使基板轉數達到預定之最大轉數為止，Μ大於上 述第1旋轉加速度之第2旋轉加速度使全群組的基板隨著 旋轉而_加速。 根據本發明，可使來自處理容器上部空氣導入口導入 至處理容器内的乾燥空氣接觸基板的附著液飛散使之乾燥 ，隨後從支持裝置钿方開口之排氣口排出。 又，在連接排氣口的排氣導管內，設置分離排氣中的 氣液之氣液分離裝置，分離供應乾燥處理之空氣中的氣體 (空氣）與液體（噴霧）.，同時可抑制排氣侧逆流所造成 對基板的破壞。 此外，可從外圍將空氣導入中心下方，使導入的空氣 從旋轉體的中心朝箸外周圍流出，而可均勻接觸基板。 並且，在空氣導入口配設靜電除去裝置，藉此可除去 供應乾燥用空氣中所存在之撒粒等的帶電，而可防止因靜 電對於基板之微粒的附著。 又，將處理容器底面沿著旋轉體的旋轉方向逐漸形成 向下之坡度，同時形成朝排氣口向下傾斜面，藉此可使離 心分離的水滴積極地集中在處理容器底面的外周圍侧，而 可從排氣口排出。 另外，可阻止從旋轉體的轉軸侵入旋轉髏內的撤粒等 ，同時可減小排氣条統的容積使裝置小型化。又，可確實 進行室内的排氣而可防止對室内的逆流。此時，使突入軸 本紙張尺度適用中國國家標準（CNS ) Α4規格（210X297公釐） - 9 _ (請先閲讀背面之注意事項界樣寫本頁) .裝· 訂 A7 B7 402758 h •V*， 五、發明説明（ 排氣管的室排氣管内的端部朝著下游側，藉此可利用軸排 氣管內的排氣流使室排氣管内排氣，因.此可更確實防止其 逆流者。 / 〔圖示之簡單說明〕 第1圖是表示基板清洗乾燥處理糸統之整體概要透視 圖。 第2圖是表示本發明旋轉乾燥器從正面所視之透視概 要前視圔。 第3圖是表示本發明旋轉乾燥器從正面所視之透視概 要前視圖。 第4圖是表示本發明旋轉乾燥器從側面所視之外觀側 視圖。 第5圖是表示旋轉乾燥器要部之部份剖視圖。 第6圖是表示旋轉體、支持裝置、搖藍之透視圖。 第7圖是表示其他旋轉髏、支持裝置、搖籃之透視圖。 第8圖是表示乾燥處理容器底部之剖面透視圖。 第9圖是表示軸排氣管與室排氣管合流部份之縱剖視 圖。 第10_是表示從上方所視搖籃及其週邊構件之俯視圖。 第11圖是表示支持基板用支持裝置之概要前視圖。 第12圖是表示支持裝置之概要側視圔。 第13圖是表示說明支持裝置之晶圓的移載與保持狀態 用支持裝置之部份剖視圔。 第14圖是表示藉支持裝置（晶圓保持部）所支持晶圓 本紙張尺度適用中國國家標隼（CNS ) A4規格（210 X 297公釐） 請 先 閲 讀 背 面 意 事 項 填 寫 本 頁 經濟部中央標準局員工消費合作杜印製 10 A7 B7 五、發明説明（8 ) 之概要圖。 第15A圖是表示沿第14圔中X V A - X V A線切斷之 晶圓保持部的剖視圖、第15B圖是表示沿第14圔中X V B - XVB線切斷之晶圓保持部的剖視圖、第15C围是表示 沿第14圖中XV C - XVC線切斷之晶圓保持部的剖視圖 〇 第16圖是表示傳遞晶圓之支持裝置的俯視圖。 第17圖是表示水平位置之支持裝置的透視概要画。 第18圖是表示旋轉乾燥器要部之部份剖視画。 第19A圖〜第19J圖是分別表示利用旋轉乾燥器乾燥處 理基板時，各動作時之旋轉乾燥器的透視概要圖。 第20圖為旋轉乾燥器旋轉時之轉數的經時變化，分別 比較本發明方法與習知而表示之特性線圖。 第21A画〜第21C圖是分別表示利用其他旋轉乾燥器乾 燥處理基板時，各動作時之旋轉乾燥器的透視概要圖。 〔發明之實施形態〕 參閲添附圖示詳細說明本發明種種具體實施形態如下 。以下之實施形態是針對乾燥處理半導體晶圓時說_明。 如第1圖所示，晶圓清洗乾燥處理集統具備：操作部 60、輸入緩衝部50、輪出缓衝部5 1的3値部份。輸 入緩衝部50是被設置在操作部60的轉動部5 4側，而 形成可送入收容未處理晶圓W之匣體C。輪出緩衝部5 1 係被設置於搡作部6 0的未轉動部5 6側，而形成可送出 收容處理後晶圓W的匣體C。輸入緩衝部5 0及輸出缓衝 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 402758 A7 ________ B7 五、發明説明（9 ) 部5 1皆具有待機部5 3。藉未圖示之匣體移送裝置從待 機部53分別將兩個匣體C移送至轉動部54。 操作部60具備3台晶圓蓮送裝置40;9個處理單 元6 1〜69 ;匣體蓮送部70 ;及筒/配管收容室。操 作部60的第1處理單元61是使晶圓蓮送裝置40的夾 具40b清洗乾燥，第2處理單元62是Μ第1藥液化學 清冼晶圓W，第3及第4處理單元63、 64是分別清洗 晶圓W，第5處理單元6 5是Μ第2藥液化學清洗晶圓W ，第6及第7處理6 6、6 7是分別將晶圓W予Μ清洗， 第8處理單元6 8是清洗乾燥晶_蓮送装置4 0的夾具4 Ob，第9處理單元69則是形成最終的乾燥處理。本發 明之旋轉乾燥器80係設置於笫9處理單元69内。 如第2圖表示，旋轉乾燥器80具備何服電動機1; 旋轉髏2 ; —對搖藍10a、10b ;處理容器30 ;及 ，上蓋32。一對搖籃係被搭載於旋轉體2上，與旋轉體 2同時被收容在處理容器30内。有底圓筒形處理容器 3 0上部開設空氣導入口 3 0 a。經由該空氣導入口30a 利用蓮送裝置40形成可將晶圓W運入蓮出於處理容器 30內者。上蓋32是利用絞鍵機構37、 37a、 38 可自由移動支持於處理容器30的上部，形成可藉上蓋 32開關空氣導入口 30 a者。 於旋轉乾燥器80外側設置可朝箸X軸、Y軸、Z軸 各方向移動之晶圓蓮送裝置4 0。該晶圓蓮送裝置4 0具 備可一次夾持5 0片晶圓之晶圓夾4 0 b，形成可將該等 本紙張尺度適用中國國家標準（CNS ) A4規格（210 X 297公釐） - 12 _ 402758 A7 B7 五、發明説明（ίο ) 晶圓W移送至旋轉乾燥器80者。 如第2圖及第4圖表示，於旋轉乾燥器80上部側方 配置控制盒4 1。控制盒4 1係連接於電源（未圖示）， 形成可分別供電至伺服電動機1、升降裝置2 3及開關汽 缸39等。又，控制盒41在操作電腦中內設有控制器（ 未圖示），形成可分別控制伺服電動機1、升降裝置2 3 及開關汽缸39等的動作。此外，在開口部30a中央及 內周圍側配設複數値噴嘴43,形成可從各噴嘴43朝箸 處理容器30內噴射如純水等的清洗液。 又，在旋轉乾燥器8 0上方配置具有過濾器及風扇（ 未圖示）之風扇濾器組（FFU) 44 ,形成可使供應旋 轉乾燥器8 0内空氣的淨化。FFU44之風扇動作是利 用盒4 1內的控制器加Μ控制，而形成可變調節風量者。 為了安定乾燥處理，利用控制器分別控制使第9處理 單元69內形成一定之淨化空氣的風速與風查。具體而言 ，分別测定Μ種種轉速轉動旋轉體2時之處理容器30内 外周圍的風速與風量，將該等測定之测定數據預先儲存在 操作電腦的記憶體，另一方面藉编碼器（未圖示）檢測實 際處理中旋轉體2的轉速，控制器是根據檢测轉速及上述 测定數據控制單元44的風扇動作。藉此使旋轉乾燥器8 0内之清淨空氣的風速與風量分別維持在一定範菌內。此 外，於上部過濾器3 5外部附近設置風速•風量測感器（ 未圖示），而根據該風速·風量的檢測數據控制經時性之 風速與風量者。 本紙張尺度適用中國國家標準（CNS ) Α4規格（210 X297公釐） -13 _ 經濟部中央標準局員工消費合作杜印製 402758 Λ7 ____ B7 __ 五、發明説明（11 ) 如第3圖及第5圖所示，在旋轉體2下部周圍緣部安 裝振動防止用自動均衡器2 a。又，在旋轉髏2的下部中 央安裝有主軸3。主軸3的一端安裝驅動滑車4，電動機 1的驅動軸與滑車4之間鉤掛確動皮帶6，形成可將旋轉 驅動力傳逹於主軸3者。藉驅動控制伺服電動機1形成可 連縳進行旋轉體2及搖籃1 0 a、1 0 b氷平旋轉的啟動 、停止、制動及徹速轉動。 如第5画所示，處理容器30的底部與旋轉體2的主 軸3之間藉密封軸承機構維持著氣水密性。該密封軸承機 構具備密封蓋7，及滾珠軸承7 a，及密封筒體7b。密 封筒體7 b是安裝在處理容器3 0的底部，主軸3則是經 由滾珠軸承7 a自由旋轉支持在密封筒體7 b上。 搖籃10a、 10b係相對於旋轉髏2的軸而配置在 左右對稱的位置上，形成可分別保持各2 5片晶圓W的2 5條槽。此外，本實施形態雖是表示一對搖籃10a、1 〇b的場合，但是也可Μ採用2對或3對Μ上的搖籃。或 者可只設置1個25片晶圓W的保持用搖籃。 如第6圖所示，將脚12搭載在旋轉體2上面。腳 12具備一對平行垂直側壁11，在上部及2値側部上形 成開口。使搖藍10a、10b定位在該等一對垂直側壁 1 1之間。垂直侧壁1 1的高度遠較搖籃1 0 a、1 0 b 的高度為高，因此搖藍10a、 l〇b的兩側係可藉著垂 直側壁11予Μ遮蔽。 第5圖及第6圖表示，搖藍10 a、10b具備角筒 本紙張尺度適用中國國家操準（CNS ) A4規格（210X 297公釐） ~ 14 _ --------J----裝.I I , , 、J (請先閱讀背面之注意事項-T-填寫本頁)I. Rotary dryer and substrate drying method. In order to achieve the above-mentioned object, the rotary dryer of the present invention has a special emblem including: a rotating cross with a main shaft at the lower part; and a plurality of substrates orthogonal to the substrate surface are held with respect to the main shaft of the rotating body, and are symmetrically arranged at A substrate holding device that rotates the main shaft of the rotating body and rotates simultaneously with the rotating body; a processing container that surrounds the rotating body and the substrate holding device; an air introduction port that introduces air into the processing container and is formed on the upper portion of the processing container; and, at least The air outlet opening from the bottom of the processing container to the height position of the upper rotator. In addition, when the exhaust duct is connected to the upper exhaust port, a gas-liquid separation device for separating the gas from the liquid in the air can be provided in the exhaust duct. In addition, a top plate with a vent hole in the center is provided at the air introduction port of the processing container, and a ring filter is provided above the top plate, and the top portion of the processing container may be provided with a filter facing the center of the filter. A shielding guide formed by the protruding inclined portion. It is also possible to install an anti-static device (10-ni zer) at the air inlet port. In addition, the bottom of the processing container may be formed to gradually slope down along the rotation direction of the rotating body, and at the same time, the exhaust gas may be directed toward the exhaust port. Those whose mouths are tilted downwards also apply the Chinese National Standard (CNS) A4 size (210X 297 mm) to the paper size. Printed by the Staff Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs 402758 A7 B7 V. Description of the invention (4) Yes 0 Also, the present invention A rotary dryer is characterized by comprising: a rotating body with a main shaft at the lower part; a rotating device for rotating the rotating body; a room for accommodating the rotating device; and a plurality of substrates orthogonal to the main shaft of the rotating body. A substrate, and at least one pair of substrate holding devices which are symmetrically arranged with the main shaft of the rotating body and rotate simultaneously with the rotating body; a processing container surrounding the upper rotating body and the substrate holding device; and introducing air into the processing container to form the processing The air inlet of the upper part of the container; formed on the side of the processing container, at least from the bottom of the processing container to the height position of the rotary cross An exhaust pipe forming an opening; an exhaust pipe communicating with the exhaust port; a shaft exhaust pipe communicating between the rotating body and a cover gap for freely supporting the main shaft; and at least communicating with a chamber row housing the rotating device room An air pipe; and an open end portion of the shaft exhaust pipe is provided in the chamber exhaust pipe so that an exhaust flow from the shaft exhaust pipe and an exhaust flow in the chamber exhaust pipe merge. In addition, the rotary dryer of the present invention is characterized by comprising: a rotating body rotated by a rotating device; at least one pair of substrate holding devices arranged symmetrically with respect to the rotating body and holding a substrate; and mounted on the rotating body, It has a pair of cymbal walls that cover the sides of the substrate holding device in a straight line. The substrate holding device has a wall portion parallel to the upper walls and an air vent opening in the radial direction of the rotating body. In addition, the rotary dryer of the present invention is characterized in that it includes a rotating body rotated by a rotating device; at least one pair of substrate holding devices configured to hold a substrate with respect to an axisymmetric position of the rotating body; and surrounds the rotating skeleton And supporting container; and, it is installed on the above-mentioned rotating body and has M straight (please read the precautions on the back before filling in this page) ru. &Quot; Binding and binding paper size applies Chinese National Standard (CNS) Α4 specification (210X297 mm) 402758 A7 B7 ______ V. Description of the invention (5) The line covers the brain of one of the side walls of the substrate holding device, the substrate holding device has a wall portion parallel to the side wall, and the rotating skull An air vent opening in the radial direction; the processing container has an air introduction port formed at a position relative to the rotation center of the rotating body, and an exhaust port provided at a part of the side wall and extending at least from the bottom to the height position of the rotating body. In addition, the rotary dryer of the present invention includes: a rotating body rotated by a rotating device; at least one pair of substrate holding devices arranged with respect to the axis-symmetrical position of the rotating body and capable of holding a substrate; A relative moving device that waits for relative supporting devices to move relative to each other; a tilting device that tilts each substrate holding device separately; a lower support provided on the above substrate holding device * having a plurality of grooves capable of holding the lower side of the substrate; having both sides of the holding substrate A plurality of supporting frames at the peripheral edge; and a lifting device that enables the lower support to be raised and lowered relative to the support frame. In addition, the rotary dryer of the present invention has the following features: a rotary body that is rotated by a rotary device; at least one pair of supporting devices that can be tilted freely at the axis-symmetric position of the rotary body and can support a plurality of substrates; The opening can accommodate the processing chamber of the rotating body and the supporting device; a cover covering the upper opening of the processing chamber; a moving device for moving the supporting device; a switching device for opening and closing the cover, and the supporting device can be moved by the moving device by using the above The switching device causes the lid to open and close. The method for drying the substrate of the present invention is: (a) the substrates of the plurality of boxes that are received multiple times so that the substrates can be aligned vertically at equal pitch intervals; (b) the received substrates are divided into at least two groups. Applicable to China National Standard (CNS) A4 specification (210X297mm) _ 8 _ Printed by the Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (6) (c) Each group changes the substrate from the vertical position To the horizontal position, (d) rotate the substrates of the entire group by the first rotation acceleration opening, (e) until the substrate rotation number reaches a predetermined maximum number of rotations, and M is greater than the second rotation acceleration of the first rotation acceleration to make the entire group The substrates of the group accelerate as they rotate. According to the present invention, the dry air introduced from the air inlet of the upper part of the processing container into the processing container can be scattered by contact with the adhesion liquid of the substrate to be dried, and then discharged from the exhaust port of the side opening of the supporting device. In addition, a gas-liquid separation device for separating gas and liquid in the exhaust gas is provided in an exhaust duct connected to the exhaust port to separate and supply gas (air) and liquid (spray) in the dry air, while suppressing exhaust Damage to the substrate caused by gas-side countercurrent. In addition, air can be introduced below the center from the periphery, so that the introduced air flows out from the center of the rotating body toward the outer periphery of the cymbal, and can evenly contact the substrate. Furthermore, a static electricity removing device is provided at the air introduction port, thereby removing the electrification of particles and the like existing in the supply air for drying, and preventing the particles from adhering to the substrate due to static electricity. In addition, the bottom surface of the processing container is gradually formed into a downward slope along the rotation direction of the rotating body, and at the same time, a downwardly inclined surface is formed toward the exhaust port, so that the centrifugally separated water drops can be actively concentrated on the outer peripheral side of the bottom surface of the processing container , And can be discharged from the exhaust port. In addition, it can prevent the ingress of particles from the rotating body from the rotating shaft of the rotating body, and reduce the volume of the exhaust system to reduce the size of the device. In addition, the indoor exhaust can be surely performed, and the indoor backflow can be prevented. At this time, make the paper size of the protruding shaft applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm)-9 _ (Please read the precautions on the back to write this page first). Binding · Order A7 B7 402758 h • V *, V. Description of the invention (The end of the exhaust pipe in the chamber exhaust pipe is facing the downstream side, so that the exhaust flow in the shaft exhaust pipe can be used to exhaust the interior of the chamber exhaust pipe. Preventing backflow. / [Simplified description of the figure] Fig. 1 is a perspective view showing the overall outline of a substrate cleaning and drying processing system. Fig. 2 is a perspective view showing the outline of the rotary dryer of the present invention viewed from the front. Fig. 3 is a schematic front view of the rotary dryer of the present invention as viewed from the front. Fig. 4 is a side view of the appearance of the rotary dryer of the present invention as viewed from the side. Partial cross-sectional view. Figure 6 is a perspective view showing a rotating body, a supporting device, and a rocking blue. Figure 7 is a perspective view showing another rotating cross, a supporting device, and a cradle. Figure 8 is a sectional view showing a bottom of a drying treatment container Perspective view. Figure 9 is A longitudinal cross-sectional view of the confluence part of the shaft exhaust pipe and the chamber exhaust pipe. Figure 10_ is a plan view showing the cradle and its surrounding components viewed from above. Figure 11 is a schematic front view showing a supporting device for supporting a substrate. Fig. 12 is a schematic side view showing the supporting device. Fig. 13 is a partial sectional view showing the supporting device for explaining the transfer and holding state of the wafer of the supporting device. Fig. 14 is a view showing the borrowing device (wafer). The paper size of the wafers supported by the maintenance department) applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm). Please read the notice on the back and fill in this page. The Department of Economics, Central Standards Bureau, Consumer Consumption Du printed 10 A7 B7 V. Outline view of the description of the invention (8) Figure 15A is a cross-sectional view showing a wafer holding portion cut along the XVA-XVA line in the 14th line, and Figure 15B is a cut along the XVB-XVB line in the 14th line A cross-sectional view of the broken wafer holding portion, and a 15C line is a cross-sectional view showing the wafer holding portion cut along the XV C-XVC line in FIG. 14. FIG. 16 is a plan view showing a supporting device for transferring a wafer. The figure shows the level A perspective overview drawing of the supporting device at the position. Fig. 18 is a partial cross-sectional view showing the main part of the spin dryer. Figs. 19A to 19J show the rotation during each operation when the substrate is dried by the spin dryer. The perspective overview of the dryer. Figure 20 shows the change over time in the number of revolutions of the rotary dryer, which is a characteristic line chart comparing the method of the present invention and the conventional method. Figures 21A to 21C show the use of each. When a rotary dryer is used to dry a substrate, a perspective overview view of the rotary dryer during each operation is made. [Embodiments of the Invention] The specific embodiments of the present invention will be described in detail with reference to the attached drawings. The following embodiments are explained when drying semiconductor wafers. As shown in FIG. 1, the wafer cleaning and drying processing system includes an operation unit 60, an input buffer unit 50, and a 3 値 portion of the wheel-out buffer unit 51. The input buffer portion 50 is provided on the rotating portion 54 side of the operation portion 60, and forms a cassette C capable of receiving unprocessed wafers W. The wheel-out buffer portion 5 1 is provided on the non-rotating portion 56 side of the operation portion 60 to form a box C that can send out the processed wafer W. Input buffer section 50 and output buffer This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 402758 A7 ________ B7 V. Description of the invention (9) Section 51 has a standby section 53. The two cassettes C are transferred from the standby section 53 to the rotating section 54 by a cassette transfer device (not shown). The operation section 60 includes three wafer feeders 40; nine processing units 6 1 to 69; a cassette feeder 70; and a cartridge / piping storage chamber. The first processing unit 61 of the operation unit 60 cleans and dries the jig 40b of the wafer feeding device 40, the second processing unit 62 is the first chemical liquid chemical cleaning wafer W, and the third and fourth processing units 63 and 64 are The wafer W is cleaned separately. The fifth processing unit 65 is the second chemical liquid chemically cleaned wafer W. The sixth and seventh processes 6 6 and 67 are respectively cleaned the wafer W and the eighth processing unit 6. 8 is a fixture 4 Ob for cleaning and drying the crystal_4, and the ninth processing unit 69 forms a final drying process. The rotary drier 80 of the present invention is installed in the 笫 9 processing unit 69. As shown in FIG. 2, the rotary dryer 80 is provided with a motor 1, a rotary cross 2, a pair of shaking blues 10 a and 10 b, a processing container 30, and an upper cover 32. A pair of cradles are mounted on the rotating body 2 and housed in the processing container 30 at the same time as the rotating body 2. An air inlet 30 a is opened at the upper part of the bottomed cylindrical processing vessel 30. The lotus feeding device 40 is formed through the air introduction port 30a so that the wafer W can be transported into the lotus processing chamber 30. The upper cover 32 is supported on the upper part of the processing container 30 by the hinge mechanism 37, 37a, 38 and can be freely moved to form an air inlet 30a that can be opened and closed by the upper cover 32. A wafer feeding device 40 is provided on the outside of the rotary dryer 80 and can move in each direction of the X axis, Y axis, and Z axis. The wafer feeding device 40 is provided with a wafer holder 40 b which can hold 50 wafers at a time, so that the paper size can be adapted to the Chinese National Standard (CNS) A4 specification (210 X 297 mm). -12 _ 402758 A7 B7 V. Description of the Invention (ίο) Wafer W is transferred to the spin dryer 80. As shown in Figs. 2 and 4, a control box 41 is disposed on the upper side of the spin dryer 80. The control box 41 is connected to a power source (not shown), and can be configured to supply power to the servo motor 1, the lifting device 23, and the switch cylinder 39, respectively. In addition, the control box 41 is provided with a controller (not shown) in the operation computer so as to control the operations of the servo motor 1, the lifting device 2 3, the switch cylinder 39, and the like, respectively. In addition, a plurality of concrete nozzles 43 are arranged in the center and the inner peripheral side of the opening portion 30a, so that a cleaning liquid such as pure water can be sprayed into the concrete processing container 30 from each nozzle 43. In addition, a fan filter unit (FFU) 44 having a filter and a fan (not shown) is arranged above the rotary drier 80, so as to purify the air in the rotary drier 80. The fan action of the FFU44 is to use the controller in the box 41 to control the M to form a variable air volume. In order to stabilize the drying process, a controller is used to separately control the wind speed and check that a certain amount of purified air is formed in the ninth processing unit 69. Specifically, the wind speed and volume around the processing container 30 when the rotating body 2 is rotated at various M speeds are measured, and the measured data is stored in the memory of the operating computer in advance. On the other hand, an encoder (not (Illustrated) The rotation speed of the rotating body 2 is detected during actual processing. The controller operates the fan of the control unit 44 based on the detected rotation speed and the measurement data. As a result, the wind speed and volume of the clean air in the rotary dryer 80 are maintained within a certain range of bacteria, respectively. In addition, a wind speed and air volume sensor (not shown) is installed near the outside of the upper filter 35, and the wind speed and air volume over time are controlled based on the wind speed and air volume detection data. The size of this paper is applicable to China National Standard (CNS) A4 (210 X297 mm) -13 _ Printed by the Department of Economics, Central Standards Bureau, Consumer Cooperation Du 402758 Λ7 ____ B7 __ V. Description of Invention (11) As shown in FIG. 5, an automatic equalizer 2 a for preventing vibration is attached to the peripheral edge of the lower portion of the rotating body 2. A main shaft 3 is attached to the lower center of the rotating skull 2. A drive pulley 4 is installed at one end of the main shaft 3, and a driving belt 6 is hooked between the drive shaft of the motor 1 and the pulley 4, so as to transmit the rotational driving force to the main shaft 3. By driving and controlling the servo motor 1, the rotating body 2 and the cradles 10a and 10b can be linked to start, stop, brake, and spin at full speed. As shown in the fifth picture, airtightness is maintained between the bottom of the processing container 30 and the main shaft 3 of the rotating body 2 by a sealed bearing mechanism. This sealed bearing mechanism is provided with a seal cap 7, a ball bearing 7a, and a sealed cylinder 7b. The sealed cylinder 7b is installed at the bottom of the processing container 30, and the main shaft 3 is supported on the sealed cylinder 7b by a ball bearing 7a freely rotating. The cradles 10a and 10b are arranged at positions symmetrical to each other with respect to the axis of the rotary cradle 2 and form 25 grooves capable of holding 25 wafers W each. In addition, although the present embodiment shows a case where a pair of cradles 10a and 10b are shown, two or three pairs of cradles may be used. Alternatively, only one cradle for holding 25 wafers W may be provided. As shown in FIG. 6, the foot 12 is mounted on the rotating body 2. The leg 12 is provided with a pair of parallel vertical side walls 11 and an opening is formed in the upper part and the side part of the hip. The rock blues 10a and 10b are positioned between the pair of vertical side walls 1 1. The height of the vertical side wall 11 is much higher than the height of the cradles 10 a and 10 b. Therefore, both sides of the rocking blue 10 a and 10 b can be shielded by the vertical side wall 11. Figures 5 and 6 show that the blue paper 10 a and 10 b have a corner tube. The paper size is applicable to China National Standards (CNS) A4 (210X 297 mm) ~ 14 _ -------- J- --- Install. II,,, J (Please read the precautions on the back first-T-Fill in this page)

.tT I--.----- :.:E— 402758 A 7 B7 五、發明説明（12 ) 形支持框髏14,及格子狀下部支持體15。支持框體 14具有與垂直側壁1 1平行的壁部14 a。下部支持髏 1 5係設置可相對於支持框體1 4自由升降者。搖籃10a 、10b的通氣孔是藉著角筒形支持框體14的緣部與下 部支持髏1 5的格子孔1 5 a所形成。該等通氣口是分別 朝箸旋轉體2的半徑方向開口。因此，從晶圓W離心分離 的液滴僅通過格子孔1 5 a側的通氣孔而排出於外侧者。 此外，如第7國所示，在相當於旋轉髏2的旋轉下游 侧部位中，於侧壁1 1設置滴水孔1 1 a亦可。此時之滴 水孔1 1 a最好是位在侧壁1 1的下部。設置如上逑之滴 水孔1 la，可藉此使液滴不僅從格子孔15a侧的通氣 口，同時也可從滴水孔1 1 a排出，可更為提高乾燥的效 果。 如第10圖表示，支持框體14係可於水平支軸13周 圍自由擺動地安裝在腳12上，而形成可改變其姿勢者。 經濟部中央標準局員工消費合作社印製 第19圖A至第19调D表示，在豎立支持框體1 4的狀態下 將晶圓W從夾具40b傳遞至支持框體1 4，此時晶圓W 是呈垂直狀態。如第19圖F所示，在橫向倒置支持框髏1 4的狀態下高速轉動晶圓W，此時的晶圓W是呈水平狀態。 如第6圖及第7麗所示，在腳12的侧壁11與搖籃 3LOa、1 0 b之間配設與侧壁11大致平行的整流板 16。利用該整流板16沿著側壁11與搖藍l〇a、 10b之間使空氣流動，藉此形成整流的空氣。 搖籃1 Oa、1 Ob的最外周圍部，即水平狀態之支 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -15 - 402758 Λ, Β7 五、發明説明（13 ) 持框體1 4的外側端部上設有傾斜部1 4b。又，側壁1 1的側端部上同樣沿箸轉動方向設置傾斜部1 1 b。如上 逑設置傾斜部14b、 lib，可藉此将附著在搖籃10 a、 10b及侧壁11的水滴予Μ順利排除。又，在側壁 1 1的兩端部上設置傾斜部1 lb可藉此使腳12具有剛 性。並且，可設置圓弧形部K代替傾斜部1 4 b、1 1 b。.tT I --.-----:.: E— 402758 A 7 B7 V. Description of the invention (12) Shaped supporting frame 14 and grid-like lower supporting body 15. The support frame 14 has a wall portion 14 a parallel to the vertical side wall 11. The lower support frame 1 5 series can be set up and down freely relative to the support frame 1 4. The vent holes of the cradles 10a and 10b are formed by the edge portions of the angular cylindrical support frame 14 and the lattice holes 15a of the lower support ribs 15. These vents are respectively opened in the radial direction of the rotator 2. Therefore, the droplets centrifuged from the wafer W are discharged to the outside only through the vent holes on the grid hole 15a side. In addition, as shown in the seventh country, a drip hole 1 1 a may be provided in the side wall 11 in a portion corresponding to the rotation downstream side of the revolving skull 2. The drip hole 1 1 a at this time is preferably located at the lower part of the side wall 11. By setting the drip holes 1 la as above, the droplets can be discharged not only from the vents on the side of the grid holes 15a, but also from the drip holes 1 1 a, which can further improve the drying effect. As shown in Fig. 10, the support frame 14 is mounted on the foot 12 so as to be able to swing around the horizontal support shaft 13 to form a person whose position can be changed. Figures 19 to 19 of D printed by the Consumer Cooperatives of the Central Bureau of Standards of the Ministry of Economic Affairs indicate that the wafer W is transferred from the fixture 40b to the supporting frame 14 while the supporting frame 14 is erected. At this time, the wafer W is vertical. As shown in FIG. 19F, the wafer W is rotated at a high speed in a state where the support frame 14 is horizontally inverted, and the wafer W at this time is horizontal. As shown in FIG. 6 and FIG. 7, a rectifying plate 16 is disposed between the side wall 11 of the foot 12 and the cradles 3LOa and 10 b, which is substantially parallel to the side wall 11. This rectifying plate 16 causes air to flow along between the side wall 11 and the rock blues 10a and 10b, thereby forming rectified air. The outermost surroundings of the cradle 1 Oa and 1 Ob, that is, the paper size in the horizontal state, is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) -15-402758 Λ, Β7 V. Description of the invention (13) A slanted portion 14b is provided on an outer end portion of the body 14. In addition, the side end portion of the side wall 11 is also provided with an inclined portion 1 1 b in the direction of 箸 rotation. As described above, the inclined portions 14b and lib are provided, so that the water droplets attached to the cradles 10a and 10b and the side wall 11 can be smoothly eliminated. Moreover, the inclined portions 1 lb are provided at both end portions of the side wall 11 to thereby make the feet 12 rigid. Further, an arc-shaped portion K may be provided instead of the inclined portions 1 4 b and 1 1 b.

此外，在晶圓W呈水平狀態時，位在搖藍10a、 1 .Ob上端側的位置上安裝有暫置板17。暫置板17係形 成與晶圓W大致同形之半圓弧形，從支持框體14朝著旋 轉中心突出。保持於搖籃1 0 a、1 Ob之晶圓W的大致 一半的面積是被該暫置板17所覆蓋。可利用暫置板17 使流動在保持於搖籃10a、 10b的上端部侧之晶圓W 的空氣整流，藉著亂流可防止上端部側晶圓W受損。 經濟部中央標準局員工消費合作社印製 如上述使旋轉體2的上部機構形成分別於旋轉半徑方 向兩側部及上部開口的構造，藉此利用轉動周圍空氣的侧 壁1 1予Μ導入（刮取），從上方的導入空氣從旋轉體2 的中央部分別分散至側壁1 1、整流板1 6、搖籃1 0 a 、：LOb的壁部14a的間隙及晶圓W間的間隙。因此， 可高效率地Μ離心分離將附著在晶圓W上的水滴排出。 如第5圖及第8圖所示，處理容器3 0的底面部30b 具有朝外周圍倒排氣口 30c半徑方向向下的坡度，且在 轉動方向同樣形成向下坡度。形成如上述的底面部30b 可迅速從處理容器3 0内利用離心分離晶圓W上的液滴。 其次，參閲第10_〜第18圖說明支持框體14及搖藍 本紙張尺度適用中國國家標準（CNS)A4規格（ 210X297公釐） -16 - A7 B7 五、發明説明（14 ) 經濟部中央標準局員工消費合作社印製 10a、 10b如下。實質上是配置相同2舾之左右對稱 的支持框髏1 4，因此Μ下說明是Μ—側之支持框體1 4 代表說明之。 支持框體1 4具備：具支持基部2 1之下部支持體1 5 ; —對保持部18 ; 2根第1保持棒19 ; 2根第2保 持棒20;及，一對導軸22。一對保持部18是互相相 對於支持框髏1 4的上部側壁而設置，在相對的面上形成 2 5條等間距的槽1 8 a。於該等槽1 8 a內插入晶圓W 最大徑部的周圍緣部，藉此使晶圓W可安定而毫無振動地 保持在支持框體1 4內。 下部支持體15¾第1保持棒19、第2保持棒20 及支持基部21所構成。第1保持棒19是從晶圓W最下 端偏離而保持的2位置。第2保持棒2 0係形成於較第1 保持棒19外側的位置上保持著晶圓W。第1保持棒19 及第2保持棒20上分別形成25條的槽19a、 20a 。此外，保持部18、第1保持棒19及第2保持棒20 為具有抗藥性及抗強度的材質，例如ρ τ F E (聚四氟乙 嫌）或PF A (四氟乙烯氟代烷基乙烯醚共聚物）、石英 或者PEEK (聚酮醚）等製成。又，支持框體14與支 持基部2 1是Μ表面經硬化處理的鋁合金製構件形成，同 時在其表面含浸處理有氟樹脂。如上述，藉鋁合金製構件 形成支持框體14及支持基部21，使表面含浸處理氟樹 脂，藉此可使下部支持體輕量化，同時可獲得壽命的增大 。此外，或可至少Κ鋁合金製構件形成支持基部2 1的同 請 先 閱 讀 背 © 之 注 意 事 項 # 裝 訂 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ 297公釐） -17 - 402758 A7 _____ B7_______ 五、發明説明（15) 時，使其表面含浸處理氟樹脂。再者，僅藉電解硏磨處理 後的鋁合金製構件形成支持基部2 1時，可在支持框體1 4上使用電解硏磨後的不銹鋼製構件。 藉上述第1及第2保持棒19、 20可Μ4點支持晶 圓W，因此可安定保持晶圓W的下部側。又，不會對保持 棒19、 20造成阻礙，而可使液滴從晶圓W的最下端部 自然落下，丙而形成良好之液滴的去除。 此時，設置於第1保持棒19的保持槽19a是如画 1 5/1表示形成剖面V字型槽。又，設置在第2保持棒2 0的保持槽2 0 a為如第20圖b所示係Μ剖面V字型槽部 2 0 b，及從該V字型槽部2 0 b的開口端朝著擴開方向 緩緩傾斜的擴開槽部2 0 c所構成。又，設在保持部1 8 的保持槽1 8 a是如第15圖C表示形成具有若千大於晶圓 W厚度的槽基部1 8 b »及從該槽基部1 8 b的開口端朝 擴開方向傾斜之擴開槽部1 8 c所成剖面大致V字形者。 如上述，將第1保持棒1 9的保持槽1 9 a形成剖面 V字形，可藉此支持晶圓W的下端部，而WV宇犁槽部2 0 b及擴開槽部2 0 c構成第2保持棒20的保持槽2 0 a，藉此利用V字型槽支持Μ第1保持棒1 9所支持的部 位上方位置，同時可利用擴開槽部2 0 c限制晶圓W的横 向移動。又，將設置在保持部1 8的保持槽1 8 a形成剖 面V字型，其可使晶圓W中心部的兩側位置保持在限制橫 向移動的狀態。因此，可儘可能減少與晶圓W的接觸，同 時可將晶圓W保持在安定的狀態。 本紙張尺度適用中國國家標準（CNS ) A4規格（210X 297公釐） 一-18 - 經濟部中央標準局員工消費合作社印製 402758 A7 _______ B7 __ 五、發明説明（16 ) 如第10圖所示，下部支持體1 5為可潸動裝著於垂設 在支持框體14兩侧的導軸22上。另外，下部支持體1 5是利用配設在第2函表示之處理容器3 0下方的升降裝 置可移動設置在Z軸方向。如上逑使下部支持體1 5可相 對於支持框體1 4而升降，藉此在晶圓蓮送裝置40與下 部支持部1 5之間傳遞晶圖W。並且，即使在保持晶圓W 的狀態下使之升降時，如第13画及第14圖所示，不致使晶 圓W及夾具4 0 a與保持部1 8互相干涉。 下部支持體15係形成藉配置在第2圖表示之處理容 器3 0下方的升降裝置2 3予Μ升降。升降裝置2 3具備 藉步進馬達2 3 a旋轉之垂直方向延伸的滾珠螺絲2 3 b ，及連結在拴合於該滾珠螺絲2 3 b之可動件2 3 c的操 作桿23 d。操作桿23 d—旦上升時使下部支持體1 5 上升，而使操作捍2 3 d下降時形成可使下部支持體1 5 下降者。邸，在垂直狀態下使兩搖籃10 a、10b放置 於接近位置的狀態，利用升降裝置23的操作桿2 3 d上 升而將下部支持體1 5上推，形成可從晶圓夾40a接受 5 0片的晶圓W (參閲第13圖）。 此外，將操作桿2 3 d可相對於可動件2 3 c連結形 成可自由轉動。在該操作捍2 3d下端部連結有旋轉引動 器2 3 e，利用該旋轉引動器2 3 e轉動操作捍2 3 d時 ，如第13圖所示形成卡合設置在操作桿23d下面的卡合 部15a上。一旦形成可自由卡合脫離之升降裝置23及 下部支持體1 5時，將鉤2 3 f與卡合部1 5 a卡合而可 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -19_ - (請先閲讀背面之注意事項-S7-氣寫本頁) 訂 402758 A7 B7 ___ 五、發明説明（17 ) 使操作桿23d升降，並且，在下部支持髏1 5下降後， 可解除鉤2 3 f與卡合部1 5 a的卡合，使操作桿2 3 d 更為下降，藉以使乾燥處理時的旋轉體2及搖籃1 〇 a、 10b的水平轉動不致受到阻礙。 如第10匾、第12圔、第16圖及第17画表示，在一侧搖 籃10 a的兩侧設置移動辊2 4，形成可沿著導軌2 5使 搖籃可與移動辊2 4同時移動。導軌2 5是朝箸Y軸方向 延伸而出而設置在腳12的側壁11上。藉未圖示之移動 裝置形成使一侧搖藍1 0 a相對於另一侧的搖藍1 〇 b接 近或離開者。 第16圖表示，活塞桿2 6 a的前端設有卡合在設置於 搖籃1Oa的支持框體14側部之卡合部14a的鉤26 b，形成可藉連結在活塞桿2 6a上的旋轉引動器26c 使鉤2 6 b與卡合部14 a可自由卡合脫離者。如上述利 用移動汽缸26與搖藍10 a的卡合脫離使鉤26b與卡 合部1 4 a卡合，可伸長移動汽缸26的活塞捍26 a使 搖籃10a移動接近另一側的搖籃10b側。又，將晶圓 W傳遞於搖藍10a、 10b之後，使活塞捍26a收縮 經濟部中央標準局員工消費合作社印製 而相對於另一侧的搖籃10 b設定於離開一側搖籃1 0 a 的相對位置上。將一側的搖籃l〇a移動至預定的相對位 置之後，解除鉤26b與卡合部1 4 a的卡合使活塞桿2 6 a更為退避時，使活塞捍26 a形成不與旋轉體2及搖 籃10a、 10b的旋轉動作互相干涉者。 如第17圖及第10圖所示，從兩搖籃l〇a、l〇b的 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -20 -- 經濟部中央標準局員工消費合作社印製 402758 A7 五、發明説明（18 ) 一侧旋轉中心偏心的位置上突設有突軸2 7。該突軸2 7 是利用連結在上推汽缸28的上推構件28a而上推，可 藉此使搖籃10 a、10b形成垂直狀態。另一方面，使 上推構件2 8 &下降而解除突軸2 7與搖藍10 a、10 b的卡合時，支持晶圓W的搖籃10 a、10b藉箸本身 重量相對於水平面例如傾斜約1 5 ° 。此時相對於搖籃1 0a、 10b水平面的傾斜角度最好是在10°〜40° 的範圍內。其理由為傾斜角度如未滿10°時，在停止時 會有使晶圓W向前飛出之虞，另一方面，傾斜角度一旦大 於40°時，在旋轉時會造成不能保持搖籃1 0 a、10 b在水平狀態之虞。 又，在第9處理單元69的上部設置控制箱41。該 控制箱4 1收納有可控制伺服電動機1、步進馬達2 3 a 、移動汽缸26、旋轉引動器23e，26c、上推汽缸 28及開關汽缸39的動作用控制器（未圖示）。利用該 控制器可連績控制例如伺服電動機1的啟動時、停止時及 制動的微速轉動。又，連動驅動移動汽缸26與開關汽缸 39,形成可同時進行搖籃10a、10b的接離移動（ 相對移動）與蓋32的開關動作。丙此，可縮短乾燥處理 前後的準備時間。又，縮短從清洗處理Μ至旋轉乾燥的時 間而可防止在晶圓W表面產生水漬。 其次，說明處理容器30如下。 如第5画及第6圖所示，在處理容器30上部設有空 氣導入口 30a。該空氣導入口 30a配置中央具有通氣 本紙張尺度適用中國國家標準（CNS ) A4規格（2〗0><297公釐） ---1—j---UT— .1' - - (請先閲讀背面之注意事項寫本頁) rwUUJ__Lhl 打 402758 A7 B7 經濟部中央標準局員工消費合作社印製 五、發明説明（19 ) 孔34 a之甜圈圈狀天板34。天板34上方設置甜圈圈 狀濾器3 5，並在濾器3 5中央部上方設置中心側朝下方 縮徑形成之遮蔽導板3 6 °如上述，在空氣導入口 3 0 a 處配置天板34、濾器35及遮蔽導板36，藉此可使外 周圍側經由濾器3 5流入的空氣通過天板34的通氣孔 3 4 a流入處理室3 1的中心部上方。 又，在處理容器3 0的開口部3 0 a設置電離器4 2 (靜電去除裝置）。該電離器42例如間隔設置發射極桿 與複數値電極，利用具有未圖示電源之控制部生成預定的 極性（正或炱）與量的離子。將上述之電離器42配設在 空氣導入口 30 a的中央部，藉此從外侧經由濾器35照 射流入處理容器30内的空氣之正或貪離子而除去存在於 空氣中撤粒等所附帶之靜電。 又，在處理容器30的空氣導入口30a上經由鉸鏈 3 7安裝有可自由開關之上蓋3 2 ,藉由連結在鉸鏈3 7 的樞支軸37 a的連捍38而利用連接開關汽缸39 (開 關裝置）之活塞桿3 9 a的伸縮動作形成可開關上蓋3 2 者。於該上蓋32安裝甜甜圈狀天板34、濾器35、遮 蔽板導板36、電離器42及容器清洗用噴嘴43。 如第2圖〜第4圖所示，在處理容器3 0的側部從底 部設置至少延伸至旋轉體2定位高度的位置之排氣口 30c 。但是，排氣口30c在低於搖籃l〇a、 10b的位置 處具有開口。該排氣口 3 0 c上連接剖面呈矩形之排氣導 管3 3。此外，排氣導管3 3不僅限於矩形之剖面形狀也 (請先閲讀背面之注意事項尤 •裝一^— 'r本頁) 訂 0 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 402758 A7 B7 五、發明説明（20 ) 可Μ是橢圓形狀者。 如第3圔表示，排氣導管33是藉由彎管部33a安 裝於排氣口 3 0 c上。從該彆管部3 3 a處朝箸下侧將氣 液分離用隔板3 3 b設置於排氣導管3 3内，藉此形成可 分離氣體與亂流者。又，可利用隔板33b抑制排氣的亂 流（渦流），因此可抑制對處理容器30內的逆流阻止或 晶圓W的破壊。如上述分離之液量係流入下側的排液管 33c而排出至外部，氣體量則經由連通排氣導管33a 侧方的處理室排氣管33 d而排氣至外部。 與處理室排氣管3 3 d不同，而在收容何服電動機1 、升降裝置23、開關汽缸3 9等的箱體8內產生的發塵 係經由室排氣管9而予Μ排氣（參閲第2画及第4圖）。 又，如第5圖所示，於旋轉體2的主軸3與封閉蓋7之間 連通有軸排氣管9 a，利用連通該軸排氣管9 a的噴射器 9 b可將發生於旋轉軸3與封閉蓋7之間的撤粒排出至外 部所成 (參閲第2画及第5圖）。 如第9圖所示，將軸排氣管9 a的排氣钿端部揷入室 排氣管9內，使室排氣管9與軸排氣管9a合流。如上述 ，藉箸室排氣管9與軸排氣管9 a的合流，利用流動於較 室排氣管9小直徑之軸排氣管9 a内的排氣流速較室排氣 管9内流動之排氣流速快速而可吸引排出室排氣管9内的 排氣。此外，此時使插入室排氣管9內的軸排氣管9 a前 端部朝著下游側彎曲，藉此可確實利用軸排氣吸引排氣， 本紙張·尺度適用中國國家標準( CNS ) A4規格（210X 297公釐） -23 - 402758 A7 B7 五、發明説明（21 ) 同時可防止室排氣朝著箱髏8內的逆流。 其次，參閲第19A圖〜第19J圖及第20圖說.明上述旋轉 乾燥器80的動作態樣如下。 首先，將Y軸移動汽缸26的桿26a伸長使一侧搖 籃1 0 a接近另一側的搖籃1 0 b，並使井降裝置2 3的 操作桿2 3 d伸長而上升下部支持體1 5，形成可M2個 下部支持體15可接受50片晶圔W的態勢（參閲第19圔 )。在此狀態下，俾晶圓夾40b下降而將晶圓W從晶麵 夾40b移載於下部支持部1 5上，使晶國夾40b退避 至上方（參閲第19B圖、第19C圖）。此時，使升降裝置 2 3的操作桿2 3 d下降而在處理容器30的下方位置待 機。 其次，退入Y軸移動汽缸2 6的捍26 a使一侧搖籃 1 0 a離開另一側的搖籃1 〇b。藉此使兩搖籃1 Oa、 1 0 b定位在旋轉髏2中心軸的左右對稱位置上。於此的 同時驅動開關汽缸3 9關閉上蓋3 2 (參閲第19D画、第 19E圖）。在此狀態下，Y軸移動汽缸2 6的捍26 a係 解除與搖藍1 0 a的卡合而收縮在待機狀態。又，藉箸上 推汽缸28之上推構件28a的上推，使搖籃10a、 1 Ob柑對於水平面呈10〜40°傾斜的狀態。 其次，驅動伺服電動機丨水平轉動旋轉體2及搖藍1 0 a、10b時，可藉著離心力使搖籃10a、10 b形 成水平狀態，使空氣流從中心部通過各晶圓W間的間隙而 朝著外周圍侧流動，藉此從晶圓W除去附箸水滴，使晶圓 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -24 ~ 經濟部中央標準局員工消費合作社印製 402758 A7 _____B7 __五、發明説明（22) W的表面乾燥（參閲第19圖）。 如第20圖所示，旋轉體2是抑制從起動至時間tl ( s e c)為止之第1加速期E 1的加速而低加速旋轉至轉 數R 1為止，其次在第2加速期E 2 (時間t 1〜t 3 ) 增加其加速而使之高加速旋轉至轉數R3為止。定常速度 期E3 (時間t3〜t4)係維持著一定的轉數R3,第 1減速期E4 (時間t4〜t5) —旦減速至轉數R2, 經過定常速度期E5 (時間t5〜t6)，第2減速斯E 6 (時間t 6〜t 7)是從轉數R2減速後停止旋轉體2 。並且，維持著最高轉數800 r pm持續約280秒之 間。 另外，如第20圖之假設線Cl、C2表示，於短時間 t 2内使旋轉體2在瞬間從起動高加速轉動至高轉數R 3 時，會造成晶圓W的振動，而導致晶圓W的損壊。因此， 在初期K低加速轉動旋轉體2，使晶圓W不致遭受損壊。 並可於後期E4〜E6中從最高轉數R3瞬間減速後停止 旋轉體2 〇 停止（參閲第19阃G)旋轉體2及搖籃10a、10 b，使上推捍28a上升形成搖藍10a、 10b之垂直 狀態（參閲第19圖Η)。在此狀態下將Y軸移動汽缸26 的活塞桿26 a卡合在搖籃10a，同時使之伸長而使一 側搖籃1 0 a接近另一側的搖籃1 Ob。 其次，將升降裝置23的操作桿2 3d卡合在下部支 持體15，同時使其上升並使得兩搖藍1 〇a、l 〇b的 ---Ί'------—裝-- (請先閲讀背面之注意事項tk本頁)In addition, when the wafer W is in a horizontal state, a temporary plate 17 is mounted at a position on the upper end side of the blue 10a, 1.0b. The temporary plate 17 is formed in a semicircular arc shape substantially the same as the wafer W, and protrudes from the supporting frame 14 toward the center of rotation. Approximately half of the area of the wafer W held in the cradles 10 a and 1 Ob is covered by the temporary plate 17. The temporary plate 17 can rectify the air flowing on the wafer W held on the upper end portion side of the cradles 10a and 10b, and the upper end portion wafer W can be prevented from being damaged by the turbulent flow. The Consumer Cooperatives of the Central Bureau of Standards of the Ministry of Economic Affairs printed the structure in which the upper mechanism of the rotating body 2 is opened on both sides and in the upper part of the radius of rotation as described above. Taken), the air introduced from above is dispersed from the central portion of the rotating body 2 to the side wall 11, the rectifying plate 16, the cradle 10 a, and the gap between the wall portion 14 a of the LOb and the gap between the wafers W. Therefore, it is possible to efficiently discharge the water droplets adhering to the wafer W by the centrifugal separation. As shown in Fig. 5 and Fig. 8, the bottom surface portion 30b of the processing container 30 has a downward gradient in the radial direction toward the outer exhaust vent 30c, and also has a downward gradient in the rotation direction. By forming the bottom surface portion 30b as described above, the liquid droplets on the wafer W can be quickly separated from the processing container 30 by centrifugation. Secondly, referring to Figures 10_ ~ 18, the supporting frame 14 and the blueprint paper size are applicable to Chinese National Standard (CNS) A4 (210X297 mm) -16-A7 B7 V. Description of Invention (14) Central Standard of the Ministry of Economic Affairs Bureau employees' consumer cooperatives printed 10a and 10b as follows. Essentially, the left and right symmetrical support frames 14 are arranged with the same 2 ，, so the following description of M is the support frame 1 4 on the M side. The supporting frame 14 includes a supporting base 15 with a supporting base 21, a pair of holding portions 18, two first holding rods 19, two second holding rods 20, and a pair of guide shafts 22. The pair of holding portions 18 are provided opposite each other to support the upper side wall of the frame 14 and form two or five equally spaced grooves 18a on opposite sides. A peripheral edge portion of the largest diameter portion of the wafer W is inserted into the grooves 18a, so that the wafer W can be stably held in the support frame 14 without vibration. The lower support body 15¾ is composed of a first holding rod 19, a second holding rod 20, and a supporting base 21. The first holding rod 19 is held at two positions that are offset from the lowermost end of the wafer W and held. The second holding rod 20 is formed to hold the wafer W at a position outside the first holding rod 19. The first holding rod 19 and the second holding rod 20 are formed with 25 grooves 19a and 20a, respectively. In addition, the holding portion 18, the first holding rod 19, and the second holding rod 20 are made of a material having drug resistance and resistance, such as ρ τ FE (polytetrafluoroethylene) or PFA (tetrafluoroethylene fluoroalkyl ethylene). Ether copolymer), quartz or PEEK (polyketide ether). The support frame 14 and the support base 21 are formed of an aluminum alloy member whose surface is hardened, and the surface is impregnated with a fluororesin. As described above, the support frame 14 and the support base 21 are formed by the aluminum alloy member, and the surface is impregnated with the fluororesin, thereby reducing the weight of the lower support and increasing the life span. In addition, it may be possible to form at least Κ aluminum alloy members to support the base 2 1 Please read the back © Note # Binding This paper size applies to Chinese National Standard (CNS) A4 (210 × 297 mm) -17-402758 A7 _____ B7_______ 5. In the description of the invention (15), the surface is impregnated with fluororesin. When the support base 21 is formed only by an aluminum alloy member after electrolytic honing, the stainless steel member after electrolytic honing can be used for the support frame 14. Since the first and second holding rods 19 and 20 can support the wafer W at the M4 point, the lower side of the wafer W can be held stably. In addition, without holding the holding rods 19, 20, the droplets can naturally fall from the lowermost end portion of the wafer W to form a good droplet removal. At this time, the holding groove 19a provided in the first holding rod 19 is formed as shown in FIG. The holding groove 20a provided in the second holding rod 20 is a V-shaped groove portion 2b of the M-shaped cross section as shown in FIG. 20b, and an open end from the V-shaped groove portion 20b. The expansion groove portion 2 0 c is gradually inclined toward the expansion direction. Further, the holding groove 18a provided in the holding portion 18 is formed as shown in FIG. 15C with a groove base portion 1 8b having a thickness larger than the thickness of the wafer W, and is expanded from the open end of the groove base portion 18b. The open groove portion 18 c inclined in the opening direction has a substantially V-shaped cross section. As described above, the holding groove 19 a of the first holding rod 19 is formed into a V-shaped cross-section, which can support the lower end portion of the wafer W, and the WV Yu plough groove portion 20 b and the expanded groove portion 20 c constitute The holding groove 2 0 a of the second holding rod 20 is used to support the upper position of the portion supported by the first holding rod 19 by the V-shaped groove, and the lateral direction of the wafer W can be restricted by expanding the groove portion 20 c. mobile. Further, the holding grooves 18a provided in the holding portion 18 are formed in a V-shaped cross section, which can maintain the positions of both sides of the center portion of the wafer W in a state where the lateral movement is restricted. Therefore, the contact with the wafer W can be minimized, and the wafer W can be kept in a stable state. This paper size applies Chinese National Standard (CNS) A4 specification (210X 297 mm). 1-18-Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs 402758 A7 _______ B7 __ 5. Description of the invention (16) as shown in Figure 10 The lower support body 15 is movably mounted on the guide shafts 22 suspended on both sides of the support frame 14. In addition, the lower support 15 is movably provided in the Z-axis direction by a lifting device arranged below the processing container 30 shown in the second letter. As described above, the lower support body 15 can be raised and lowered relative to the support frame 14 to thereby transfer the crystal map W between the wafer lotus device 40 and the lower support portion 15. In addition, even when the wafer W is raised and lowered while holding it, as shown in FIGS. 13 and 14, the wafer W and the holder 40a do not interfere with the holder 18. The lower support 15 is formed by a lifting device 23 arranged below the processing container 30 shown in FIG. The lifting device 2 3 includes a ball screw 2 3 b extending in a vertical direction rotated by the stepping motor 2 3 a, and an operating lever 23 d connected to a movable member 2 3 c fastened to the ball screw 2 3 b. The operation lever 23 d-once the lower support 1 5 is raised when it is raised, and when the operation guard 2 3 d is lowered, a person who can lower the lower support 15 is formed. In a state where the two cradles 10 a and 10 b are placed in a close position in a vertical state, the lower support 15 is pushed up by using the operating lever 2 3 d of the lifting device 23 to form a receiving position 5 from the wafer holder 40a. 0 wafers W (see Figure 13). In addition, the operation lever 2 3 d is connected to the movable member 2 3 c so as to be freely rotatable. A rotary actuator 2 3e is connected to the lower end of the operation lever 2 3d, and when the operation lever 2 3 d is rotated by using the rotation actuator 2 3 e, a card that is engaged with the operation lever 23d is formed as shown in FIG. 13. On the joint 15a. Once the lifting device 23 and the lower support body 15 which can be freely engaged and engaged are formed, the hook 2 3 f is engaged with the engaging portion 15 a so that the Chinese paper standard (CNS) A4 (210X297) (Centi) -19_-(Please read the precautions on the back-S7-qi to write this page first) Order 402758 A7 B7 ___ V. Description of the invention (17) The operating lever 23d is raised and lowered, and after the lower supporting skull 15 is lowered, The engagement of the hook 2 3 f with the engaging portion 15 a can be released, and the operation lever 2 3 d can be lowered further, so that the horizontal rotation of the rotating body 2 and the cradles 10a and 10b during the drying process is not hindered. As shown in the 10th plaque, 12th, 16th, and 17th drawings, moving rollers 2 4 are provided on both sides of one side of the cradle 10 a, so that the cradle can be moved at the same time as the moving rollers 24 along the guide rails 2 5. . The guide rail 25 is provided on the side wall 11 of the leg 12 so as to extend in the Y-axis direction. A moving device (not shown) is formed so that one side of the blue pan 10 a approaches or moves away from the other side of the blue pan 10 b. Fig. 16 shows that the front end of the piston rod 26a is provided with a hook 26b that is engaged with the engaging portion 14a provided on the side of the support frame 14 provided on the cradle 10a, so that the piston rod 26a can be rotated by being connected thereto. The actuator 26c allows the hook 2 6 b and the engaging portion 14 a to be freely engaged with the detached person. As described above, using the disengagement of the mobile cylinder 26 and the rock blue 10 a causes the hook 26 b to engage with the engaging portion 1 4 a, and the piston 26 of the mobile cylinder 26 can be extended to move the cradle 10 a closer to the other side of the cradle 10 b. . In addition, after transferring the wafer W to the blue 10a and 10b, the piston guard 26a was contracted and printed by the staff consumer cooperative of the Central Standards Bureau of the Ministry of Economic Affairs. Relative position. After the cradle 10a on one side is moved to a predetermined relative position, the engagement of the release hook 26b with the engaging portion 1 4 a makes the piston rod 2 6 a more retracted, so that the piston guard 26 a does not form a rotating body. 2 and the cradles 10a and 10b are interfering with each other. As shown in Figure 17 and Figure 10, the paper size from the two cradles 10a and 10b applies the Chinese National Standard (CNS) A4 specification (210X297 mm) -20-Staff Consumption of the Central Standards Bureau of the Ministry of Economic Affairs Printed by the cooperative 402758 A7 V. Description of the invention (18) A protruding shaft 2 7 is protruded at a position where the center of rotation on one side is eccentric. The protruding shaft 27 is pushed up by a push-up member 28a connected to the push-up cylinder 28, whereby the cradles 10a and 10b can be made vertical. On the other hand, when the push-up member 2 8 & is lowered to release the engagement of the projecting shaft 2 7 with the rocker 10 a, 10 b, the cradles 10 a and 10 b supporting the wafer W are weighted relative to the horizontal plane, for example. Tilt about 15 °. At this time, the tilt angle with respect to the horizontal planes of 10a and 10b of the cradle is preferably within a range of 10 ° to 40 °. The reason is that if the tilt angle is less than 10 °, the wafer W may fly forward when stopped. On the other hand, if the tilt angle is greater than 40 °, the cradle cannot be maintained during rotation. a, 10 b may be in a horizontal state. A control box 41 is provided above the ninth processing unit 69. The control box 41 contains a controller (not shown) for controlling the operation of the servo motor 1, the stepping motor 2 3a, the moving cylinder 26, the rotary actuators 23e, 26c, the push-up cylinder 28, and the switch cylinder 39. This controller can continuously control, for example, the servo motor 1 during start-up, stop, and fine-speed rotation during braking. In addition, the moving cylinder 26 and the opening and closing cylinder 39 are driven in conjunction to form a detachable movement (relative movement) of the cradles 10a and 10b and a lid opening and closing operation simultaneously. As a result, the preparation time before and after the drying process can be shortened. In addition, by shortening the time from the cleaning process M to the spin drying, it is possible to prevent the occurrence of water stains on the surface of the wafer W. Next, the processing container 30 will be described as follows. As shown in Figs. 5 and 6, an air introduction port 30a is provided in the upper portion of the processing container 30. The air inlet 30a is provided with ventilation in the center. The paper size is applicable to Chinese National Standard (CNS) A4 specifications (2〗 0 > < 297 mm) --- 1—j --- UT— .1 '--(Please First read the notes on the back to write this page) rwUUJ__Lhl Type 402758 A7 B7 Printed by the Consumer Cooperatives of the Central Bureau of Standards of the Ministry of Economic Affairs 5. Description of the invention (19) Donut-shaped top plate 34 with hole 34a. A donut-shaped filter 3 5 is arranged above the top plate 34, and a shielding guide plate 3 6 is formed above the central portion of the filter 3 5 and the center side is reduced in diameter downward. As described above, the top plate is arranged at the air inlet 30 a 34. The filter 35 and the shield guide plate 36 allow the air flowing into the outer peripheral side through the filter 35 to flow into the upper portion of the processing chamber 31 through the vent hole 34a of the top plate 34. An ionizer 4 2 (a static electricity removing device) is provided in the opening portion 30 a of the processing container 30. The ionizer 42 is provided with, for example, an emitter pole and a plurality of ytterbium electrodes, and generates a predetermined polarity (positive or ytterbium) and a quantity of ions by a control unit having a power source not shown. The above-mentioned ionizer 42 is disposed in the central portion of the air introduction port 30a, thereby irradiating the positive or greedy ions of the air flowing into the processing container 30 through the filter 35 from the outside to remove incidental particles and the like that are present in the air. Static electricity. Further, a freely openable cover 3 2 is attached to the air introduction port 30a of the processing container 30 via a hinge 37, and a connection switch cylinder 39 is connected by a coupling 38 connected to a pivot shaft 37a of the hinge 37. The telescopic action of the piston rod 3 9 a of the switching device) can form the upper cover 3 2 which can be opened and closed. A donut-shaped top plate 34, a filter 35, a shield plate guide 36, an ionizer 42, and a container cleaning nozzle 43 are attached to the upper cover 32. As shown in Figs. 2 to 4, an exhaust port 30c is provided on the side of the processing container 30 from the bottom portion to at least the position where the rotating body 2 is positioned. However, the exhaust port 30c has an opening at a position lower than the cradles 10a, 10b. The exhaust port 3 0 c is connected to an exhaust duct 33 having a rectangular cross section. In addition, the exhaust duct 3 3 is not limited to the rectangular cross-sectional shape (please read the precautions on the back, especially install it ^ — 'r page). Order 0 This paper size is applicable to China National Standard (CNS) A4 specification (210X297) (Centi) 402758 A7 B7 5. Description of the invention (20) May be an oval shape. As shown in Fig. 3 (a), the exhaust duct 33 is attached to the exhaust port 3 0 c through a bent pipe portion 33a. A gas-liquid separator baffle 3 3 b is installed in the exhaust duct 33 from the other pipe part 3 3 a toward the lower side of the diaphragm, thereby forming a person capable of separating gas and turbulent flow. Further, since the turbulent flow (eddy current) of the exhaust gas can be suppressed by the partition plate 33b, the backflow prevention in the processing container 30 and the breakage of the wafer W can be suppressed. The liquid amount separated as described above flows into the lower drain pipe 33c and is discharged to the outside, and the gas amount is exhausted to the outside through the process chamber exhaust pipe 33d communicating with the exhaust pipe 33a. Unlike the processing chamber exhaust pipe 3 3 d, the dust generated in the box 8 containing the Hofu motor 1, the lifting device 23, the switching cylinder 39, etc. is exhausted to the M through the chamber exhaust pipe 9 ( (See pictures 2 and 4). As shown in FIG. 5, a shaft exhaust pipe 9 a is communicated between the main shaft 3 of the rotating body 2 and the closing cover 7. The ejector 9 b that communicates with the shaft exhaust pipe 9 a can cause the shaft exhaust pipe 9 a to rotate. The ejection of particles between the shaft 3 and the closure cover 7 is discharged to the outside (see pictures 2 and 5). As shown in FIG. 9, the exhaust pipe end portion of the shaft exhaust pipe 9 a is inserted into the chamber exhaust pipe 9, and the chamber exhaust pipe 9 and the shaft exhaust pipe 9 a are merged. As described above, by combining the chamber exhaust pipe 9 and the shaft exhaust pipe 9 a, the exhaust gas flowing in the shaft exhaust pipe 9 a having a smaller diameter than the chamber exhaust pipe 9 is used to flow faster than the inside of the chamber exhaust pipe 9. The flowing exhaust gas has a fast flow rate and can attract exhaust gas from the exhaust pipe 9 of the exhaust chamber. In addition, at this time, the front end portion of the shaft exhaust pipe 9a inserted into the exhaust pipe 9 of the chamber is bent toward the downstream side, so that the shaft exhaust can be surely used to attract the exhaust gas. This paper · size applies the Chinese National Standard (CNS) A4 size (210X 297mm) -23-402758 A7 B7 V. Description of the invention (21) At the same time, it can prevent the exhaust of the room from flowing backwards towards the inside of the skull 8. Next, referring to FIGS. 19A to 19J and 20, the operation of the rotary dryer 80 will be described below. First, the rod 26a of the Y-axis moving cylinder 26 is extended so that the cradle 10a on one side approaches the cradle 10b on the other side, and the operation lever 23d of the well descending device 2 3 is extended to raise the lower support 1 5 , Forming a situation where M 2 lower supports 15 can accept 50 pieces of crystal 圔 W (see section 19 圔). In this state, the wafer holder 40b is lowered, and the wafer W is transferred from the crystal face holder 40b to the lower support portion 15 to retreat the wafer holder 40b to the upper side (see FIGS. 19B and 19C). . At this time, the operation lever 2 3 d of the elevating device 23 is lowered and stands by at a position below the processing container 30. Next, retreat into the Y-axis to move the cylinder 26 to defend 26a so that one side of the cradle 10a leaves the other side of the cradle 10b. As a result, the two cradles 10a and 10b are positioned on the left and right symmetrical positions of the central axis of the rotary skull 2. At the same time, the switch cylinder 3 9 is driven to close the upper cover 3 2 (see picture 19D and 19E). In this state, the Y 26-axis moving cylinder 26 6 is released from the engagement with the rocking blue 10 a and contracted in the standby state. In addition, by pushing up the pushing member 28a of the pushing cylinder 28, the cradle 10a, 1 Ob is inclined at a state of 10 to 40 ° with respect to the horizontal plane. Next, when the servomotor is driven to rotate the rotating body 2 horizontally and the blue 10a, 10b, the cradle 10a, 10b can be brought into a horizontal state by centrifugal force, and the air flow can be passed from the center through the gap between the wafers W Flowing toward the outer periphery side, thereby removing the attached water droplets from the wafer W, and making the paper size of the wafer conform to the Chinese National Standard (CNS) A4 specification (210X297 mm) System 402758 A7 _____B7 __ V. Description of the invention (22) The surface of W is dry (see Figure 19). As shown in FIG. 20, the rotating body 2 suppresses the acceleration in the first acceleration period E1 from the start to time t1 (sec) and rotates at a low acceleration to the number of revolutions R1, followed by the second acceleration period E2 ( Time t 1 to t 3) increase its acceleration to make it rotate at high acceleration until the number of revolutions R3. The constant speed period E3 (time t3 ~ t4) is maintained at a certain number of revolutions R3, the first deceleration period E4 (time t4 ~ t5)-once the deceleration to the number of revolutions R2, after the constant speed period E5 (time t5 ~ t6), The second deceleration E 6 (time t 6 to t 7) is to stop the rotating body 2 after decelerating from the number of revolutions R 2. And, it maintains a maximum speed of 800 r pm for about 280 seconds. In addition, as shown by the hypothetical lines Cl and C2 in FIG. 20, when the rotating body 2 is turned from the starting high acceleration to the high rotation number R 3 in an instant within a short time t 2, the wafer W will be vibrated and the wafer will be caused. The loss of W. Therefore, the rotating body 2 is rotated at a low speed in the initial stage K, so that the wafer W is not damaged. In the later stages of E4 ~ E6, you can stop the rotating body 2 after decelerating from the highest speed R3 instantly. Stop (see 19 停止 G) the rotating body 2 and the cradles 10a and 10b, so that the push-up defense 28a rises to form the shake blue 10a. The vertical state of 10b (see Figure 19). In this state, the piston rod 26a of the Y-axis moving cylinder 26 is engaged with the cradle 10a, and at the same time, it is extended so that the cradle 10a on one side approaches the cradle 1 Ob on the other side. Next, the operation lever 2 3d of the elevating device 23 is engaged with the lower support body 15 and raised at the same time, so that the two rocking blues 10a and 10b are installed. -(Please read the note on the back tk page first)

、1T -線· 〇 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -25 - 經濟部中央標準局員工消費合作社印製 402758 A7 _ B7五、發明説明（23 ) 下部支持體15及保持其上之晶圓W上升（參閲第19J圖 ) 6此外，將晶圓蓮送裝置4 0定位在第9處理組9 ,利用 晶片夾4 Ob —次夾取乾燥處理後的晶圓W，從旋轉乾燥 器8 0將晶圓W蓮出。 其次，參閲第21A圖〜第21C圖說明其他實施形態之 旋轉乾燥器8 0 A如下。 該實施形態之旋轉乾燥器80A具備2値升降機構2 3、 90。第1升降機構23實質上與上逑旋轉乾燥器8 0所有者相同。第2升降機構90具備垂直汽缸90b及 水平汽缸9 0 d。使捍9 0 a突出垂直汽缸9 0 b時，藉 箸桿90 a形成使一側之下部支持體1 5從支持體1 4突 出者。 水平汽缸90 d之桿90 c的前端部連結於垂直汽缸 90b的下部。一旦使桿90c從水平汽缸90d突出或 退入時，支持於垂直桿9 0 a之一側下部支持體1 5係形 成可接近或離開他側之下部支持髏1 5。此外，為了進行 一次傳遞50^{晶圓W，使一側之下部支持體15朝著他 侧之下部支持體1 5的方向接近。或者，將兩搖籃1 0 a 、：L Ob定位於旋轉體3 0之軸的左右對稱位置上。 其次，說明旋轉乾燥器80A的動作如下。 首先，利用第1升降機構23將他侧之下部支持體1 5從搖籃1 Ob上推。又，利用第2升降機構9 0使一側 之下部支持體1 5從搖籃1 0a往上推，並使之Y軸移動 本紙張尺度適用中國國家標準（CNS_) A4規格（210X 297公釐.） -26 - 402758 A7 A7 ___.__B7 _ - 五、發明説明（24 ) 而使一側之下部支持體15接近另一側之下部支持體15 ，而形成可接受晶圓W的狀態（參閲第21A圖）。在此狀 態下，使晶圓夾40b下降而從晶圓夾4〇b將晶圓W — 次移載於2俩下部支持體1 5上，使晶圓夾40 b朝箸上 方退避。 其次，藉第2升降機構90使一側之下部支持體15 Y軸移動（參閲第21C圖）。並且，分別使第1及第2升 降機構23、90下降，與下部支持體1 5的同時，使晶 圓W分別於搖籃l〇a、 l〇b內下降。藉此使各晶豳群 與下部支持髏1 5分別被收容在搖籃1 0 a、1 0 b之中 (參閲第21C圖）。與此的同時，驅動開關汽缸3 9而關 閉上蓋3 2。隨後，與上述實施形態相同旋轉乾燥處理晶 圓W 〇 上述之實施形態雖使用將本發明旋轉乾燥器安裝於晶 圓清洗乾燥處理条統中而加以說明，但是本發明旋轉乾燥 器當然也可Μ單獨的裝置加Μ利用者。 經濟部中央標準局員工消費合作社印製 又，上逑實施形態雖己針對使用本發明之旋轉乾燥器 進行半導體晶圓乾燥處理時的說明，但是同樣可蓮用於乾 燥處理半導體晶圓Μ外的玻璃基板或LCD用基板等之其 他基板。 根據本發明可獲得Μ下的效果。 根據本發明，可將乾燥用空氣有效地導入旋轉體上部 機構的中央領域内，將此分配至各個搖籃内的基板上，因 此可有效利用乾燥用空氣。如上述，可實現高效率之基板 本紙張尺度適用中國國家標準（CNS ) Α4規格（210X 297公釐） _ 27 - 402758 A7 B7 五、發明説明（25 ) 經濟部中央標準局員工消費合作社印製 的旋轉乾燥處理。 又，排氣通路内具有氣液分離裝置，因此可分離排氣 與排液而予Μ處理的同時，其可抑制來自排氣侧的逆流所 造成對基板的破壊。 又，可從外周圍將乾燥空氣引導至中心下方，使導入 之空氣從旋轉髏中心流向外周圍，藉下方旋轉之支持裝置 所支持的基板上形成均一地接觸，因此可更有效利用乾燥 空氣。 此外，可除去存在於供應乾燥甩之空氣中的撒粒等的 帶電，藉靜電防止撤粒附著在基板上而可更提高其精密度 並且，使處理容器的底面朝著排氣口向下傾斜，可藉 此將從基板離心分離的液滴迅速從處理容器排出，更可藉 Μ獲得處理能力的提昇。 又，使軸排氣管合流於室排氣管内，同時利用連接軸 排氣管之來自排氣源的排氣流而吸引室排氣管内的排氣， 藉此阻止來自旋轉體轉軸的微粒等侵入至旋轉髏内，同時 可減少排氣条統的容積使裝置小型化。又，可確實進行室 內的排氣而可防止朝著室内的逆流。 再者，使突入軸排氣管之室排氣管內的端部朝著下游 側，藉此可利用軸排氣管内的排氣流使室排氣管內排氣， 丙此更可確實防止朝著室内的逆流。 根據本發明，由於在旋轉體上設有具垂直倒壁的脚， 且Μ具有通氣口之筒狀構造的支持裝置，可藉此僅Μ簡便 的構造邸可有效利用乾燥用空氣。又，從基板離心分離的 請 先 閲 讀 背 之 注 裝 訂 本紙乐尺度適用中國國家標準（CNS ) Α4規格（210 X 297公釐） 28 經濟部中央標準局員工消費合作社印製 402758 A7 B7 五、發明説明（26 ) 水滴從钿壁刮除藉此排出至外侧，而可獲得乾燥效率的提 昇。 又*腳的側壁與支持裝置的壁部之間配設與兩者大致 平行之整流板，藉此可整流空氣的流動，同時藉整流板阻 止微粒對於基板侧的侵入，因此更可獲得乾燥效果的提昇。 此外，處理容器上在相對於旋轉體旋轉中心的位置安 裝空氣導入口，同時在該處理容器侧壁的一部份從底部設 置至少延伸至旋轉體高度位置的排氣口，藉此可從旋轉體 中心部侧將乾燥用空氣導入，而均勻地流入基板枏互間的 間隙內，可將基板離心分離的液滴排出至排氣口侧。 使保持基板下部侧之下部支持體形成可相對於支持框 體自由升降，藉此使下部支持體上升而進行基板的傳遞， 在下部支持體下降的狀態下，可利用該下部支持髏與支持 框體的保持部保持基板。因此可形成簡單的構造。又，可 減少與基板的接觸面積，同時可確實進行基板的傳遞及保 持，因此可防止撒粒及汚染的發生，同時獲得精度的提昇 。並且可固定保持基板上部侧的上部支持體，藉此一上部 支持體的固定而可使旋轉中基板的保持更為安定。 另外，藉著保持從基板最下端部偏移的下部2處之第 1保持棒，及保持該等第1保持棒外側的2處之第2保持 棒構成下部支持體的保持部，因此可有效地將附著在基板 上的水滴排除的同時，可使基板保持在更安定的狀態。 又，藉下端侧之第1保持棒的剖面呈V字型槽部支持 著較基板下端部的上方位置，同時可利用擴開槽部限制基 (請先閲讀背面之注意事項再填寫本頁) -裝- 訂 .線. 本紙張尺度適用中國國家橾準（CNS ) A4規格（210X 297公釐） -29 - 402758 A7 B7 五、發明説明（27 ) 板播向得移動，因此可儘可能減少與基板的接觸，而更可 確實地防止微粒或污染的發生。 另外，至少支持基部是由鋁合金製構件所形成，间時 使氟樹脂含浸處理於該鋁合金製構件的表面，可使下部支 持髏輕量化，同時使之具有抗蝕性。因此可延長裝置的壽 命。 並藉移動裝置形成可相對移動之支持裝置，利用開關 裝置形成可自由開關收容旋轉體及支持裝置之處理室的蓋 ，且Μ移動裝置相對移動支持裝置時，藉開關裝置形成可 自由開關蓋者，藉此可同時進行支持裝置的相對移動與蓋 的開關動作，因此可縮短乾燥處理前後的準備時間，同時 可提高產量。又，可縮短清洗處理至旋轉乾燥的時間而可 防止在基板表面產生水漬。 再者，將旋轉體的轉動，在起動時Η低速旋轉，隨之 高速轉動，藉此可緩和起動時對於基板的衝擊而可減少基 板的損壞，藉此提高其精度者。 本紙張尺度適用中國國家標準（CNS ) Α4規格（210X 297公釐） 30、 1T -line · 〇 This paper size is applicable to China National Standard (CNS) A4 specification (210X297 mm) -25-Printed by the Staff Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs 402758 A7 _ B7 V. Description of the invention (23) Lower support 15 and keep the wafer W rising there (refer to FIG. 19J) 6 In addition, the wafer lotus feeding device 40 is positioned in the 9th processing group 9 and the wafer clip 4 Ob is used to clamp the dried crystals once Circle W, the wafer W is ejected from the spin dryer 80. Next, referring to Figs. 21A to 21C, a rotary dryer 80A of another embodiment will be described as follows. The rotary dryer 80A of this embodiment is provided with a 2 値 lift mechanism 2 3, 90. The first lifting mechanism 23 is substantially the same as the owner of the upper spin dryer 80. The second lifting mechanism 90 includes a vertical cylinder 90b and a horizontal cylinder 90d. When the guard 90 a is caused to protrude from the vertical cylinder 90 b, the lever 90 a is formed to make the lower support 15 on one side protrude from the support 14. A front end portion of the rod 90 c of the horizontal cylinder 90 d is connected to a lower portion of the vertical cylinder 90 b. Once the rod 90c protrudes or retracts from the horizontal cylinder 90d, the lower support body 15 supporting one side of the vertical rod 90a forms a lower support bone 15 which can approach or leave the lower side. In addition, in order to perform a single transfer of the wafer W, the lower support 15 on one side is brought closer to the lower support 15 on the other side. Alternatively, the two cradles 10 a,: L Ob are positioned at left and right symmetrical positions on the axis of the rotating body 30. Next, the operation of the rotary dryer 80A will be described as follows. First, the lower support body 15 on his side is pushed up from the cradle 1 Ob by the first lifting mechanism 23. In addition, the second lifting mechanism 9 0 is used to push the lower support 15 on one side up from the cradle 10a and move the Y axis of the paper. The paper size applies the Chinese National Standard (CNS_) A4 specification (210X 297 mm. ) -26-402758 A7 A7 ___.__ B7 _-V. Description of the invention (24) The lower support 15 on one side is brought closer to the lower support 15 on the other side to form a state that can accept the wafer W (see Figure 21A). In this state, the wafer holder 40b is lowered, and the wafer W is transferred from the wafer holder 40b to the two lower supports 15 at a time, and the wafer holder 40b is retracted upward. Next, the Y-axis of the lower support 15 on one side is moved by the second lifting mechanism 90 (see FIG. 21C). Then, the first and second lifting mechanisms 23 and 90 are lowered, and the wafer W is lowered in the cradles 10a and 10b, respectively, at the same time as the lower support 15. As a result, each of the crystal puppet groups and the lower supporting skeleton 15 are contained in the cradles 10 a and 10 b, respectively (see FIG. 21C). At the same time, the cylinder 39 is opened and closed and the upper cover 32 is closed. Subsequently, the wafer is spin-dried in the same manner as the above-mentioned embodiment. Although the above-mentioned embodiment is described using the spin-dryer of the present invention installed in a wafer cleaning and drying process system, the spin-dryer of the present invention may of course be used. Separate device plus M user. Printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs. Although the above embodiment has been described for the semiconductor wafer drying process using the spin dryer of the present invention, it can also be used to dry semiconductor wafers. Other substrates such as glass substrates and LCD substrates. According to the present invention, the effect under M can be obtained. According to the present invention, the air for drying can be efficiently introduced into the center region of the upper body of the rotating body, and this can be distributed to the substrates in the respective cradles, so that the air for drying can be effectively used. As mentioned above, high-efficiency substrates can be achieved. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X 297 mm) _ 27-402758 A7 B7 V. Description of the invention (25) Printed by the Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs Spin drying process. In addition, since the exhaust passage has a gas-liquid separation device, it can separate the exhaust gas from the discharged liquid and perform the M treatment, and it can prevent the substrate from being damaged by the backflow from the exhaust side. In addition, the dry air can be guided from the outer periphery to the center below, so that the introduced air flows outward from the center of the rotating cross, and the substrates supported by the supporting device that rotates downward make uniform contact, so the dry air can be used more effectively. In addition, it is possible to remove the electrification of particles and the like existing in the air that is supplied dry, and to improve the precision by preventing the particles from adhering to the substrate by static electricity. The bottom surface of the processing container can be inclined downward toward the exhaust port. Therefore, the droplets centrifuged from the substrate can be quickly discharged from the processing container, and the processing capacity can be improved by using M. In addition, the shaft exhaust pipe is merged into the chamber exhaust pipe, and the exhaust gas from the exhaust source connected to the shaft exhaust pipe is used to attract the exhaust gas in the chamber exhaust pipe, thereby preventing particles and the like from the rotating shaft of the rotating body. Intrusion into the rotating skull, while reducing the volume of the exhaust system, the device is miniaturized. In addition, it is possible to surely exhaust the room and prevent backflow into the room. Furthermore, the end portion of the chamber exhaust pipe protruding into the shaft exhaust pipe is directed toward the downstream side, so that the exhaust gas flow in the shaft exhaust pipe can be used to exhaust the interior of the chamber exhaust pipe, which can be prevented more reliably. Backflow towards the room. According to the present invention, since the rotating body is provided with a leg having a vertically inverted wall, and the support device having a cylindrical structure having an air vent is provided, it is possible to effectively use the drying air by using only a simple structure. Also, please read the back of the paper for centrifugal separation from the substrate. The paper scale is applicable to the Chinese National Standard (CNS) A4 (210 X 297 mm). 28 Printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economy 402758 A7 B7 V. Invention Explanation (26) The water droplets are scraped off from the wall and discharged to the outside, so that the drying efficiency can be improved. Also, a rectifying plate is arranged between the side wall of the foot and the wall portion of the supporting device so as to be parallel to the two, so that the flow of air can be rectified, and the intrusion of particles into the substrate side is prevented by the rectifying plate, so that a drying effect can be obtained. Promotion. In addition, the processing container is provided with an air inlet at a position relative to the center of rotation of the rotating body, and at the same time, an exhaust port extending from the bottom to at least the height of the rotating body is provided on a part of the side wall of the processing container, thereby enabling the Drying air is introduced into the center of the body and uniformly flows into the gap between the substrates and the substrates, and the droplets centrifuged on the substrate can be discharged to the exhaust port side. The lower supporting body on the lower side of the holding substrate is formed to be able to freely rise and fall relative to the supporting frame, thereby raising the lower supporting body to transfer the substrate. When the lower supporting body is lowered, the lower supporting frame and the supporting frame can be used. The holding portion of the body holds the substrate. Therefore, a simple structure can be formed. In addition, the contact area with the substrate can be reduced, and at the same time, the substrate can be reliably transferred and maintained. Therefore, it is possible to prevent particle spatter and contamination and improve accuracy. In addition, the upper support body on the upper side of the substrate can be fixedly held, whereby the upper support body can be fixed to make the holding of the substrate more stable during rotation. In addition, since the first holding rods at the two lower portions offset from the lowermost end portion of the substrate and the second holding rods at the two positions outside the first holding rods are configured as holding portions of the lower support, it is effective. While the water droplets adhering to the substrate are eliminated, the substrate can be kept in a more stable state. In addition, the first holding rod on the lower end side has a V-shaped groove to support the upper position of the lower end of the substrate. At the same time, the groove can be expanded (please read the precautions on the back before filling this page) -Binding-Stitching. The paper size is applicable to China National Standard (CNS) A4 specification (210X 297 mm) -29-402758 A7 B7 V. Description of the invention (27) The direction of the board is shifted as much as possible The contact with the substrate can more reliably prevent the occurrence of particles or contamination. In addition, at least the supporting base is formed of an aluminum alloy member, and the surface of the aluminum alloy member is impregnated with fluororesin for a while, so that the lower support frame can be made lighter and more resistant to corrosion. As a result, the life of the device can be extended. The mobile device is used to form a relatively movable support device, and the switch device is used to form a cover that can freely open and close the processing chamber containing the rotating body and the support device. When the M mobile device is relatively moved to support the device, the switch device is used to form a freely opened and closed cover. Therefore, the relative movement of the supporting device and the opening and closing operation of the cover can be performed at the same time, so the preparation time before and after the drying process can be shortened, and the yield can be improved. In addition, the time from the cleaning process to the spin-drying can be shortened to prevent the occurrence of water stains on the substrate surface. Furthermore, by rotating the rotating body at a low speed during start-up, and then rotating at a high speed, the impact on the substrate during start-up can be mitigated and damage to the substrate can be reduced, thereby improving its accuracy. This paper size applies to China National Standard (CNS) Α4 size (210X 297 mm) 30

Claims (1)

402758 A8 B8 C8 D8 經濟部中央標準局員工消費合作社印製 六、申請專利範圍 1. 一種從複數個基板利用離心分離除去附著液的旋轉乾 燥器中，其特徽為；具備： 下部具主軸之旋轉體； 相對於該旋轉體的主軸而保持與基板面正交之複 數値基板，且對稱設置於上述旋轉體主軸而與旋轉體 同時旋轉的基板保持裝置； 包圍上述旋轉體及上述基板保持裝置之處理容器 > 將空氣導入該處理容器内而形成在處理容器上部 之空氣導入口；及， 至少從上述處理容器底部開口至上逑旋轉體高度 位置的排氣口。 2. 如申請專利範圍第1項所記載之旋轉乾燥器，其中更 具備連通上述排氣口之排氣導管；及， 設置於將上述處理容器所排出的排氣中之液髏成 份從氣體成份中分離用上述排氣管内的氣液分離構件 0 3. 如申請專利範圍第1項所記載之旋轉乾燥器，其中更 具備設置於上述空氣導入口而具有在其中央流通空氣 的空氣孔之天板； 設於該天板上方的環狀濾器；及， 於該環狀濾器上方從外周圍朝中央向下傾斜之遮 蔽導板。 4. 如申請專利範圍第1項所記載之旋轉乾燥器，其中於 本紙張尺度適用中國國家標準（CNS) A4規格（210x297公釐）. -31 - (請先閎讀背面之注意事項#/if;®r本頁) -裝. 訂 A8 B8 C8 D8 402V58 六、申請專利範圍 上上述空氣導入口上更具備除去靜電用靜電除去裝置 〇 5. 如申請專利範圍第1項所記載之旋轉乾燥器，其中將 上述處理容器的底面形成朝上述旋轉體的轉動方向逐 漸下降之坡度，且朝箸上述排氣口形成向下之坡度者 0 6. 如申請專利範圍第1項所記載之旋轉乾燥器，其中上 述基板保持裝置具備·· 至少形成有保持各基板用複數個槽之一對接觸支 持構件； 分别與上述接觸支持構件卡合而與上述旋轉體同 時一體轉動，且可擺動支持而改變基板姿勢之至少一 對搖籃；及， 使上述搖籃相互間水平方向相對移動之第1相對 移動裝置。 7. 如申請專利範圍第1項所記載之旋轉乾燥器，其中上 述基板保持裝置具備： 形成有保持各基板用複數個槽之一對接觸支持構 件； 分別與上述接觸支持構件卡合而與上述旋轉體同 時一體轉動，且可擺動支持而改變基板姿勢之至少一 對搖籃， 另外，使上述接觸支持構件具有從上逑搖藍突出 之升降装置。 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -32 - --Ί--d----Ί 澤-- r C:.' (請先閎讀背面之注意事項f填寫本頁) 、言 經濟部中央標準局員工消費合作社印製 402758 ABCD 經濟部中央標準局員工消費合作社印製 六、申請專利範圍 8. 如申請專利範圍第1項所記載之旋轉乾燥器，其中上 述基板保持裝置具備： 至少形成有保持各基板用複數値槽之一對接觸支 持構件； 分別與上述接觸支持構件卡合而與上逑旋轉體同 時一體轉動，且可擺動支持而改變基板姿勢之至少一 對搖籃， 另外，旋轉乾燥器具備使一側接觸支持構件一側 從上述搖籃突出之第1升降裝置； 可分別獨立驅動該第1升降構件而使另一側之接 觸支持構件從另一側搖籃突出之第2升降裝置；及， 使上述第1升降裝置與上述第2升降裝置水平方 向相對移動之第2相對移動裝置。 9. 如申請專利範圍第1項所記載之旋轉乾燥器，其中上 述基板保持裝置具備： 至少形成有保持各基板用複數掴槽之一對接觸支 持構件； 分別與上述接觸支持構件卡合而與上述旋轉體同 時一髏轉動，且可擺動支持而改變基板姿勢之至少一 對搖籃， 另外，旋轉乾燥器具備使上述搖藍相互之間水平 方向相對移動之第1相對移動裝置；及，· 使上述接觸支持構件從上述搖藍突出之升降裝置。 10.—種從複數偏基板利用離心分離除去附著液的旋轉乾 請 先 聞' 讀 背 面▲之· 注 意 項 裝 π 訂 本紙張尺度適用中國國家標準（CNS ) A4規格（ 210X297公釐） -33 _ 402758 C8 _ D8 六、申請專利範圍 燥器中，其特擻為；具備： 下部具主軸之旋轉體； 轉動該旋轉體之旋轉裝置； 收容該旋轉裝置之室； 相對於該旋轉體的主軸而保持與基板面正交之複 數個基板，且對稱設置於上述旋轉體主軸而與旋轉體 同時旋轉之至少一對基板保持裝置； 包圍上述旋轉體及上述基板保持裝置之處理容器； 將空氣導入該處理容器內而形成在處理容器上部 的空氣導入口； 形成於上述處理容器之侧部，至少從上述處理容 器底部開口至上述旋轉髏高度位置的排氣口； 連通該排氣口的排氣管； 連通上述旋轉體的主軸與可自由轉動支撐該主軸 的封閉蓋的間隙間之軸排氣管； 連通於至少可收容上述旋轉裝置之室的室排氣管 ;及， 將上述軸排氣管的開口端部設置於上述室排氣管 內，使來自軸排氣管的排氣合流於室排氣管内的排氣 流。 11. 如申請專利範圍第10項所記載之旋轉乾燥器，其中上 述軸排氣管的開口端部係於室排氣管內形成向下游側 彎曲而成者。 12. —種利用離心分離將附箸液從複數値基板除去之旋轉 本紙張尺度適用中國國家標準（CNS ) A4規格（210 X 297公釐） _ q 4 一 A8 B8 C8 ____ D8 六、+請專利範園 乾燥器中，其特擻為具備： 利用旋轉裝置旋轉之旋轉體； 相對於該旋轉體的軸而配設在對稱位置上，可保 持基板之至少一對基板保持裝置； 安裝於上述旋轉體上，具有Μ直線覆蓋上述支持 裝置之一對侧壁的腳， 上述基板保持裝置，具有： 與上述侧壁平行之壁部；及， 在上逑旋轉體半徑方向開口之通氣口。 13·如申請專利範圍第12項所記載之旋轉乾燥器，其中更 具有設於上述腳的側壁與基板保持裝置的壁部之間， 而與兩者平行之整流板。 14. 一種利用離心分離將附箸液從複數個基板除去之旋轉 乾燥器中，其特徴爲具備： 利用旋轉装置旋轉之旋轉體； 相對於該旋轉體的軸而配設在對稱位置上，可保 持基板之至少一對基板保持裝置； 經濟部中央標準局員工消費合作社印製 包圍上述旋轉體及基板保持裝置之處理容器； 安裝於上述旋轉體上，具有以直線覆蓋上述基板 保持裝置侧方之一對側壁的腳， 上述基板保持裝置，具有： 與上述側壁平荇之壁部；及， 在上述旋轉體半徑方向開口之通氣口， 上述處理容器，具有： 本紙張尺度適用中國國家標準（CNS) Α4規格（2丨0X297公釐） -35 - 402758 A8 B8 C8 D8 經濟部中央標準局員工消費合作社印製 六、申請專利範圍 形成相對於上述旋轉體的旋轉中心位置之空氣導 入口；及， 設於側壁的一部份上，至少從底部延伸至上述旋 轉體高度位置的排氣口。 15. 如申請專利範圍第14項所筚載之旋轉乾燥器，其中滴 水孔爲開設在與上述脚的側壁之上述旋轉體旋轉方向 相對的位置上。 16. 如申請專利範圍第14項所記載之旋轉乾燥器，其中於 上述基板保持裝置端部突設有覆蓋以此基板保持裝置 保持之基板露出面的遮蔽導板所成者。 17·—種利用離心分離將附箸液從複數個基板除去之旋轉 乾燥器中，其特歡為具備： 利用旋轉裝置旋轉之旋轉體； 配設在該旋轉體的軸對稱位置上而可保持基板之 至少一對基板保持裝置； 使該等基板保持裝置互相相對移動之相對移動裝 置； 分別使各基板保持裝置傾動之傾動裝置； 具有設於上述基板保持裝置，而可保持基板下部 侧用複數値槽之下部支持體； 具有可保持基板兩側周圍之複數値槽的支持框體 ;及，上逑下部支持髏相對於上述支持框體升降之升 降裝置。 18.如申請專利範圍第17項所記載之旋轉乾燥器，其中上 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） n^— —fru n^— 1^1 HI m* HIan F -.*·o (請先閲讀背面之注意事項再赛窝本頁) 訂 402758 A8 Βδ C8 D8 經濟部中央標隼局員工消費合作社印製 申請專利範圍 述下部支持體在從基板最下端部偏離位置上具有保持 基板的2根第1保持棒，及較第1保持棒的外侧位置 上保持基板的2根第2保持棒。 19. 如申請專利範圍第18項所記載之旋轉乾燥器，其中上 述第1保持棒的槽係形成剖面V字形， 上述第2保持棒的槽具備剖面V字形槽部，及從 該V字形槽部的開口端朝著擴開的方向呈平緩傾斜之 擴開槽部。 20. 如申請專利範圍第17項所記載之旋轉乾燥器，其中上 述下部支持體具備從基板最下端部偏離位置上保持基 板的2根第1保持棒，及較第1保持棒的外側位置上 保持基板的2根第2保持棒，及支持上述第1及第2 保持棒之支持基部， 至少藉鋁合金製構件形成上述支持基部，同時Μ 氟樹脂含浸處理該鋁合金製構件的表面。 21. —種利用離心分離將附著液從複數痼基板除去之旋轉 乾燥器中，其特徴為具備： 利用旋轉裝置水平轉動之旋轉體； 設置可於該旋轉髏的軸對稱位置上傾動而可支持 複數個基板之至少一對支持裝置； 具上部開口而可收容上述旋轉體與支持裝置之處 理室； 覆蓋上述處理室上部開口之蓋； 移動上述支持装置之移動裝置；及， 之鬵 注 意 項 r 寫 本 頁 裝 訂 本紙張尺皮適用中國國家標準（CNS ) A4規格（210X297公釐） -37 - 402756 as B8 C8 D8 六、申請專利範圍 可開關上述蓋之開關裝置， 利用上述移動裝置移動上述支持裝置時，可藉上 述開關裝置使上述蓋開關動作者。 22. —種利用離心分離將附著液從複數個基板除去之基板 乾燥方法中，其特瀹為：. (a) —次接受複數個量之匣體的基板使基板可 Μ等節距閭隔垂直配列， (b )將所接受之基板至少分成兩群組， (c) W各群組將基板從垂直位置改變為水平位 置， (d) 藉第1旋轉加速開始轉動全群組的基板， (e) 使基板轉數達到預定之最大轉數為止，Μ 大於上逑第1旋轉加速度之第2旋轉加速度使全群組 的基板隨著旋轉而加速。 23. 如申請專利範圍第22項所記載之方法，其中更將基板 的轉動保持在一定的最大轉數之後，Μ第1之轉動減 速轉動基板。 經濟部中央標準局員工消費合作社印製 24·如申請專利範圍第23項所記載之方法，其中從上述第 1轉動減速變更至第2轉動減速，以第2轉動減速轉 動基板使基板的轉動停止為止。 25·如申請專利範圍第24項所記載之方法，其中從上述第 1轉動減速移換至第2轉動減速時，可暫時使基板的 轉動減速減至零者。 26.如申請專利範圍第22項所記載之方法，其中上述工程 本紙張尺度適用中國國家標準（CNS ) Α4規格（210 X 297公釐） _ 〇 ς 一 402758 ABCD 申請專利範圍 (d)、 （ e )是從上方一邊供應乾燥用空氣的同時，而在基板較下方的位置上朝著側方排氣者。 經濟部中央標準局員工消費合作社印製 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閲讀背面之注意事項再痕寫本頁)402758 A8 B8 C8 D8 Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs 6. Application for patent scope 1. A rotary dryer for removing adhesion liquid from a plurality of substrates by centrifugal separation. The special emblem is: Rotating body; a substrate holding device that holds a plurality of substrates orthogonal to the substrate surface with respect to the main axis of the rotating body, and is symmetrically disposed on the main shaft of the rotating body and rotates simultaneously with the rotating body; surrounding the rotating body and the substrate holding device A processing container > an air introduction port formed at an upper portion of the processing container by introducing air into the processing container; and an exhaust port which opens at least from the bottom of the processing container to a height position of the upper rotary body. 2. The rotary dryer described in item 1 of the scope of the patent application, which further includes an exhaust duct communicating with the exhaust port; and a liquid cross-section component provided in the exhaust gas discharged from the processing container from a gas component. The gas-liquid separation member in the exhaust pipe for intermediate separation. 3. The rotary dryer as described in the first item of the scope of patent application, which further includes an air hole provided in the air inlet and having an air hole in the center thereof. A plate; a ring filter provided above the roof plate; and a shield guide plate inclined downward from the outer periphery toward the center above the ring filter. 4. The rotary dryer described in item 1 of the scope of the patent application, which applies the Chinese National Standard (CNS) A4 (210x297 mm) to this paper size. -31-(Please read the precautions on the back # / if; ®r this page)-installation. Order A8 B8 C8 D8 402V58 6. The above-mentioned air inlet on the scope of patent application is further equipped with a static electricity removal device for removing static electricity. 5. Rotary dryer as described in item 1 of the scope of patent application In which, the bottom surface of the processing container is formed into a slope that gradually decreases toward the rotation direction of the rotating body, and a downward slope is formed toward the exhaust port. 6. The rotary dryer described in the first item of the scope of patent application Wherein, the substrate holding device is provided with at least one pair of contact support members for holding a plurality of grooves for holding each substrate; and the contact support members are respectively engaged with the contact support member to rotate simultaneously and integrally with the rotating body, and can be swingably supported to change the substrate. At least one pair of cradles in a posture; and a first relative movement device for moving the cradles in a horizontal direction relative to each other. 7. The spin dryer described in item 1 of the scope of patent application, wherein the substrate holding device includes: a pair of contact support members formed with a plurality of grooves for holding each substrate; and the contact support members are respectively engaged with the contact support members to form the contact support members. The rotating body rotates integrally at the same time and can swing to support at least a pair of cradles that change the posture of the substrate. In addition, the contact support member has a lifting device protruding from the upper swing rocker. This paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) -32---Ί--d ---- Ί Ze-r C :. '(Please read the notes on the back f first (This page) Printed by the Consumers 'Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs 402758 ABCD Printed by the Consumers' Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs 6. Scope of patent application 8. The rotary dryer described in item 1 of the scope of patent applications, where the above The substrate holding device includes: at least one pair of contact support members for holding a plurality of grooves for holding each substrate; at least one pair of contact support members for engaging with the contact support members to rotate integrally with the upper rotator at the same time, and swingable support to change at least the posture of the substrate A pair of cradles, and the spin dryer is provided with a first lifting device that protrudes from the cradle on one side of the supporting member on one side; the first lifting member can be independently driven to contact the supporting member on the other side from the other side A second lifting device protruding from the cradle; and a second relative moving device that relatively moves the first lifting device and the second lifting device in a horizontal direction. 9. The spin dryer described in item 1 of the scope of patent application, wherein the substrate holding device includes: at least one pair of contact support members formed with a plurality of grooves for holding each substrate; and the contact support members are respectively engaged with the contact support members and The rotating body rotates at the same time and can swing to support at least a pair of cradles that change the posture of the substrate. In addition, the rotary dryer is provided with a first relative moving device that moves the shaking blue relative to each other in the horizontal direction; and The contact support member is a lifting device protruding from the rocking blue. 10.—A kind of spin dry for removing adhesion liquid from a plurality of partial substrates by centrifugation, please read 'Read the back side ▲ of · Caution Items π The size of the paper is applicable to China National Standard (CNS) A4 (210X297 mm) -33 _ 402758 C8 _ D8 6. In the patent application range dryer, the special features are: equipped with: a rotating body with a main shaft at the lower part; a rotating device for rotating the rotating body; a room for receiving the rotating device; the main shaft opposite to the rotating body At least one pair of substrate holding devices holding a plurality of substrates orthogonal to the substrate surface and symmetrically disposed on the main shaft of the rotating body and rotating simultaneously with the rotating body; a processing container surrounding the rotating body and the substrate holding device; introducing air An air inlet formed in the processing container and formed on the upper portion of the processing container; an exhaust port formed on a side of the processing container and opening at least from the bottom of the processing container to the height position of the swivel; the exhaust gas communicating with the exhaust port Tube; a shaft row between the main shaft of the rotating body and the gap of a closed cover that can freely support the main shaft A room exhaust pipe that communicates with at least a room in which the rotating device can be accommodated; and an open end portion of the shaft exhaust pipe is provided in the room exhaust pipe so that the exhaust from the shaft exhaust pipe joins in Exhaust flow in a room exhaust pipe. 11. The rotary dryer according to item 10 of the scope of the patent application, wherein the open end of the shaft exhaust pipe is formed in the chamber exhaust pipe and is formed by bending to the downstream side. 12. —A type of rotation that uses centrifugal separation to remove the tritium solution from a plurality of tritium substrates. The size of this paper is applicable to China National Standard (CNS) A4 (210 X 297 mm) _ q 4 A8 B8 C8 ____ D8 VI. + Please In the patented Fanyuan dryer, it is particularly provided with: a rotating body rotated by a rotating device; at least one pair of substrate holding devices arranged at symmetrical positions with respect to the axis of the rotating body and capable of holding a substrate; The rotating body has legs that cover a pair of side walls of one of the supporting devices in a straight line, and the substrate holding device includes: a wall portion parallel to the side wall; and an air vent that opens in a radial direction of the upper rotating body. 13. The rotary drier according to item 12 of the scope of patent application, further comprising a rectifying plate provided between the side wall of the leg and the wall portion of the substrate holding device, and parallel to the two. 14. A rotary dryer which removes the tritium solution from a plurality of substrates by centrifugal separation, comprising: a rotary body rotated by a rotary device; and disposed in a symmetrical position with respect to the axis of the rotary body. At least one pair of substrate holding devices that hold the substrate; a processing container printed by the Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs that surrounds the above-mentioned rotating body and the substrate holding device; The pair of legs of the side wall, the substrate holding device has: a wall portion flush with the side wall; and an air vent opening in a radial direction of the rotating body, and the processing container has: This paper size applies to the Chinese National Standard (CNS ) Α4 specifications (2 丨 0X297 mm) -35-402758 A8 B8 C8 D8 Printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs 6. The scope of patent application forms the air inlet relative to the position of the center of rotation of the above-mentioned rotating body; and, It is installed on a part of the side wall, extending from at least the bottom to the height position of the rotating body exhaust vent. 15. The rotary dryer described in item 14 of the scope of patent application, wherein the drip hole is provided at a position opposite to the rotation direction of the rotating body of the side wall of the foot. 16. The rotary dryer according to item 14 of the scope of patent application, wherein a shield guide plate is provided on the end of the substrate holding device to cover the exposed surface of the substrate held by the substrate holding device. 17 · —A rotary drier that removes the entrapped liquid from a plurality of substrates by centrifugal separation is particularly equipped with: a rotating body rotated by a rotating device; and the rotating body is arranged at an axisymmetric position of the rotating body and can be maintained At least one pair of substrate holding devices for the substrate; relative moving devices for moving the substrate holding devices relative to each other; tilting devices for tilting the substrate holding devices respectively; having a plurality of substrate holding devices provided on the substrate holding device for holding the lower side of the substrate; A lower supporting body of the gutter; a supporting frame having a plurality of gutters around the two sides of the substrate; and a lifting device for supporting the lower part of the upper grate to lift and lower relative to the supporting frame. 18. The rotary dryer as described in item 17 of the scope of the patent application, in which the above paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) n ^ — —fru n ^ — 1 ^ 1 HI m * HIan F-. * · O (please read the precautions on the back before playing on this page) Order 402758 A8 Βδ C8 D8 Printed by the Consumers' Cooperative of the Central Bureau of Standards of the Ministry of Economy The offset position includes two first holding rods holding the substrate, and two second holding rods holding the substrate at positions outside the first holding rod. 19. The rotary dryer according to item 18 of the scope of the patent application, wherein the groove of the first holding rod is formed in a V-shaped cross section, the groove of the second holding rod is provided with a V-shaped groove portion in a cross section, and the V-shaped groove is formed from the groove. The open end of the portion is a widened groove portion that is gently inclined toward the direction of expansion. 20. The rotary dryer according to item 17 of the scope of the patent application, wherein the lower support includes two first holding rods holding the substrate at positions deviated from the lowermost end portion of the substrate, and is positioned outside the first holding rods. The two second holding rods holding the substrate and the supporting base supporting the first and second holding rods are formed by at least an aluminum alloy member, and the surface of the aluminum alloy member is impregnated with the M fluororesin. 21. —A rotary drier for removing adhesion liquid from a plurality of substrates by centrifugal separation, which specifically includes: a rotating body that is rotated horizontally by a rotating device; and can be tilted at an axisymmetric position of the rotating skeleton to support At least one pair of supporting devices of the plurality of substrates; a processing chamber having an upper opening to accommodate the above-mentioned rotating body and the supporting device; a cover covering the upper opening of the processing chamber; a moving device for moving the supporting device; and This page is bound in this paper. The paper ruler applies the Chinese National Standard (CNS) A4 (210X297 mm) -37-402756 as B8 C8 D8. 6. The patent application scope can open and close the cover, and use the mobile device to move the support. When the device is installed, the above-mentioned switch device can be used to cause the lid switch to operate. 22. —A substrate drying method for removing the adhesion liquid from a plurality of substrates by centrifugation, which is characterized by: (a) — substrates that receive a plurality of boxes at a time so that the substrates can be separated by equal pitches Align vertically, (b) divide the received substrates into at least two groups, (c) each group changes the substrate from a vertical position to a horizontal position, (d) start rotating the entire group of substrates by the first rotation acceleration, (e) Until the number of rotations of the substrate reaches a predetermined maximum number of rotations, M is greater than the second rotation acceleration of the first rotation acceleration of the upper part, and the substrates of the entire group are accelerated with rotation. 23. The method according to item 22 of the scope of patent application, wherein the rotation of the substrate is kept at a reduced speed after the rotation of the substrate is kept at a certain maximum number of rotations. Printed by the Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs 24. The method described in item 23 of the scope of patent application, wherein the first rotation deceleration is changed to the second rotation deceleration, and the substrate is stopped by the second rotation deceleration to stop the substrate rotation until. 25. The method according to item 24 of the scope of patent application, wherein when the first rotation deceleration is shifted to the second rotation deceleration, the rotation deceleration of the substrate can be temporarily reduced to zero. 26. The method as described in item 22 of the scope of patent application, in which the paper size of the above project is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) _ 〇ς 402758 ABCD patent scope (d), ( e) It is a person who supplies air for drying from the upper side and exhausts the gas from the lower side of the substrate toward the side. Printed by the Consumers' Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs This paper is sized for the Chinese National Standard (CNS) A4 (210X297 mm) (Please read the precautions on the back before writing this page) 3939
TW086106685A 1996-05-20 1997-05-19 Spin dryer and method of drying substrates TW402758B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP14790096 1996-05-20
JP14789896 1996-05-20
JP14789996 1996-05-20

Publications (1)

Publication Number Publication Date
TW402758B true TW402758B (en) 2000-08-21

Family

ID=27319438

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086106685A TW402758B (en) 1996-05-20 1997-05-19 Spin dryer and method of drying substrates

Country Status (3)

Country Link
US (1) US5873177A (en)
KR (1) KR100490508B1 (en)
TW (1) TW402758B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI778786B (en) * 2021-09-11 2022-09-21 辛耘企業股份有限公司 Wafer processing method and carrier
WO2023103695A1 (en) * 2021-12-06 2023-06-15 杭州众硅电子科技有限公司 Position finding apparatus for wafer, position finding method, and wafer speed counting method

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6942738B1 (en) 1996-07-15 2005-09-13 Semitool, Inc. Automated semiconductor processing system
US5974681A (en) * 1997-09-10 1999-11-02 Speedfam-Ipec Corp. Apparatus for spin drying a workpiece
JP3627132B2 (en) * 1997-11-18 2005-03-09 東京エレクトロン株式会社 Substrate drying processing apparatus and substrate drying processing method
KR100797435B1 (en) * 2000-06-30 2008-01-24 동경 엘렉트론 주식회사 Lequid processing apparatus
AU2001268656A1 (en) * 2000-07-07 2002-01-21 Semitool, Inc. Automated processing system
TW538472B (en) * 2001-04-27 2003-06-21 Kobe Steel Ltd Method and system for processing substrate
TW513548B (en) * 2001-05-08 2002-12-11 Mosel Vitelic Inc Cover sensing system of spin dryer
US6824612B2 (en) 2001-12-26 2004-11-30 Applied Materials, Inc. Electroless plating system
US6742279B2 (en) 2002-01-16 2004-06-01 Applied Materials Inc. Apparatus and method for rinsing substrates
US7138014B2 (en) * 2002-01-28 2006-11-21 Applied Materials, Inc. Electroless deposition apparatus
US20030159653A1 (en) * 2002-02-28 2003-08-28 Dando Ross S. Manifold assembly for feeding reactive precursors to substrate processing chambers
US6743736B2 (en) * 2002-04-11 2004-06-01 Micron Technology, Inc. Reactive gaseous deposition precursor feed apparatus
US6896730B2 (en) * 2002-06-05 2005-05-24 Micron Technology, Inc. Atomic layer deposition apparatus and methods
US7279049B2 (en) * 2004-02-05 2007-10-09 Applied Materials, Inc. Apparatus for reducing entrapment of foreign matter along a moveable shaft of a substrate support
KR100674954B1 (en) * 2005-02-07 2007-01-26 삼성전자주식회사 Utility for wet processing of semiconductor substrate
US20060201541A1 (en) * 2005-03-11 2006-09-14 Semiconductor Energy Laboratory Co., Ltd. Cleaning-drying apparatus and cleaning-drying method
JP4237184B2 (en) * 2005-03-31 2009-03-11 エルピーダメモリ株式会社 Manufacturing method of semiconductor device
WO2007084952A2 (en) * 2006-01-18 2007-07-26 Akrion Technologies, Inc. Systems and methods for drying a rotating substrate
US8474468B2 (en) * 2006-09-30 2013-07-02 Tokyo Electron Limited Apparatus and method for thermally processing a substrate with a heated liquid
US7479463B2 (en) * 2007-03-09 2009-01-20 Tokyo Electron Limited Method for heating a chemically amplified resist layer carried on a rotating substrate
US9383138B2 (en) * 2007-03-30 2016-07-05 Tokyo Electron Limited Methods and heat treatment apparatus for uniformly heating a substrate during a bake process
US20080241400A1 (en) * 2007-03-31 2008-10-02 Tokyo Electron Limited Vacuum assist method and system for reducing intermixing of lithography layers
KR101379811B1 (en) * 2007-06-26 2014-05-07 애프코 씨브이 Drying apparatus and method for silicon-based electronic circuits
JP4994211B2 (en) * 2007-12-20 2012-08-08 大日本スクリーン製造株式会社 Substrate processing equipment
US20090205703A1 (en) * 2008-02-14 2009-08-20 Applied Materials, Inc. Apparatus and method of mounting and supporting a solar panel
CN108257888A (en) * 2016-12-29 2018-07-06 江苏鲁汶仪器有限公司 A kind of wafer cutting device and method
KR101847945B1 (en) * 2017-02-09 2018-04-11 씨엠티 주식회사 Spin dryer equipped with multi drying device

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4677758A (en) * 1985-10-08 1987-07-07 Seiichiro Aigo Spin drier for semiconductor material
JPS62166524A (en) * 1986-01-20 1987-07-23 Mitsubishi Electric Corp Centrifugal dehydrator
JP2700003B2 (en) * 1987-01-23 1998-01-19 オリンパス光学工業株式会社 Compact wide-angle lens
US4990374A (en) * 1989-11-28 1991-02-05 Cvd Incorporated Selective area chemical vapor deposition
JPH0543472A (en) * 1991-08-12 1993-02-23 Toyama Pref Gov Antidigestible ulcer agent and its production
KR100248564B1 (en) * 1992-04-07 2000-03-15 다카시마 히로시 Spindrier
JP3101415B2 (en) * 1992-04-30 2000-10-23 保 目崎 Drainer and dryer for semiconductor materials
KR200148607Y1 (en) * 1993-12-10 1999-06-15 구본준 Spin dryer having a preventive means of electrostatic
JPH07176512A (en) * 1993-12-17 1995-07-14 Nec Kyushu Ltd Spin-dryer device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI778786B (en) * 2021-09-11 2022-09-21 辛耘企業股份有限公司 Wafer processing method and carrier
WO2023103695A1 (en) * 2021-12-06 2023-06-15 杭州众硅电子科技有限公司 Position finding apparatus for wafer, position finding method, and wafer speed counting method

Also Published As

Publication number Publication date
US5873177A (en) 1999-02-23
KR970077475A (en) 1997-12-12
KR100490508B1 (en) 2005-08-04

Similar Documents

Publication Publication Date Title
TW402758B (en) Spin dryer and method of drying substrates
TW308713B (en)
JP5996425B2 (en) Cleaning jig and cleaning method for cleaning substrate processing apparatus, and substrate processing system
CN100367453C (en) Substrate treatment method and substrate treatment apparatus
JPWO2006038472A1 (en) Substrate processing apparatus and substrate processing method
KR102410089B1 (en) Liquid processing apparatus and liquid processing method
JP2009054985A (en) Substrate processing apparatus and substrate processing method
US11352285B2 (en) Sludge drying apparatus
WO2015093226A1 (en) Substrate processing apparatus, control method for substrate processing apparatus, and recording medium
CN115621181A (en) Turning device
JP2005239293A (en) Suspension type damper device, suction type powder collector, and air current mixing suction type powder collector
JP4796902B2 (en) Substrate spin processing equipment
CN107275260A (en) Substrate board treatment and substrate processing method using same
JPWO2017163633A1 (en) Substrate cleaning device
JP2006140492A (en) Dry cleaning equipment used in manufacture of semiconductor device
TW201639019A (en) Substrate treatment device and substrate treatment method
JP2002519856A (en) Flat plate media processing unit with offset rotor
CN1792475A (en) Dry cleaning apparatus used to manufacture semiconductor devices
JP5755845B2 (en) Processing equipment
US5150532A (en) Lid member having a filter medium for a spin dryer
KR101719216B1 (en) The recycling cyclone system
JP2909306B2 (en) Rotary processing equipment
JP3245674B2 (en) Drying processing equipment
CN112309912A (en) Substrate drying device with anti-pollution function
JP3258725B2 (en) Rotary processing device

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees