JP2006302891A5 - - Google Patents

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Publication number
JP2006302891A5
JP2006302891A5 JP2006112246A JP2006112246A JP2006302891A5 JP 2006302891 A5 JP2006302891 A5 JP 2006302891A5 JP 2006112246 A JP2006112246 A JP 2006112246A JP 2006112246 A JP2006112246 A JP 2006112246A JP 2006302891 A5 JP2006302891 A5 JP 2006302891A5
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JP
Japan
Prior art keywords
composition
glass frit
silver powder
organic medium
semiconductor
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Application number
JP2006112246A
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English (en)
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JP5362946B2 (ja
JP2006302891A (ja
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Publication date
Priority claimed from US11/106,245 external-priority patent/US7462304B2/en
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Publication of JP2006302891A publication Critical patent/JP2006302891A/ja
Publication of JP2006302891A5 publication Critical patent/JP2006302891A5/ja
Application granted granted Critical
Publication of JP5362946B2 publication Critical patent/JP5362946B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Claims (6)

  1. a)導電性銀粉末と、
    b)マンガン含有添加剤と、
    c)軟化点が300℃から600℃の範囲内にあるガラスフリットとが、
    d)有機媒体中に分散されている
    ことを特徴とする厚膜導電性組成物。
  2. 請求項1に記載の組成物は、前記有機媒体が除去されるように、かつ前記ガラスフリットおよび銀粉末が焼結されるように、処理されていることを特徴とする請求項1に記載の組成物を含む基板。
  3. 請求項1に記載の組成物は、前記有機媒体が除去されるように、かつ前記ガラスフリットおよび銀粉末が焼結されるように処理されていることを特徴とする請求項1に記載の組成物から形成された電極。
  4. p−n接合を有する半導体と、半導体の主要面上に形成された絶縁膜とからなる構造要素から、半導体デバイスを製造する方法であって、(a)前記絶縁膜上に、請求項1に記載の厚膜組成物を付着させるステップと、(b)前記半導体、絶縁膜、および厚膜組成物を焼成して、電極を形成するステップとを含むことを特徴とする方法。
  5. 請求項4に記載の方法によって形成されたことを特徴とする半導体デバイス。
  6. 前記組成物は、前記有機媒体が除去され、かつ前記ガラスフリットおよび銀粉末が焼結されるように処理されていることを特徴とする請求項1に記載の組成物から形成された半導体デバイス。
JP2006112246A 2005-04-14 2006-04-14 半導体デバイスの製造方法、およびそこで使用される導電性組成物 Expired - Fee Related JP5362946B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/106,245 US7462304B2 (en) 2005-04-14 2005-04-14 Conductive compositions used in the manufacture of semiconductor device
US11/106,245 2005-04-14

Publications (3)

Publication Number Publication Date
JP2006302891A JP2006302891A (ja) 2006-11-02
JP2006302891A5 true JP2006302891A5 (ja) 2009-04-30
JP5362946B2 JP5362946B2 (ja) 2013-12-11

Family

ID=36688129

Family Applications (1)

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JP2006112246A Expired - Fee Related JP5362946B2 (ja) 2005-04-14 2006-04-14 半導体デバイスの製造方法、およびそこで使用される導電性組成物

Country Status (7)

Country Link
US (2) US7462304B2 (ja)
EP (1) EP1713095B1 (ja)
JP (1) JP5362946B2 (ja)
KR (1) KR100887128B1 (ja)
CN (1) CN1862839B (ja)
AU (1) AU2006201555A1 (ja)
TW (1) TWI338308B (ja)

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WO2010107996A1 (en) 2009-03-19 2010-09-23 E. I. Du Pont De Nemours And Company Conductive paste for a solar cell electrode
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