JP2006114618A5 - - Google Patents
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- Publication number
- JP2006114618A5 JP2006114618A5 JP2004298955A JP2004298955A JP2006114618A5 JP 2006114618 A5 JP2006114618 A5 JP 2006114618A5 JP 2004298955 A JP2004298955 A JP 2004298955A JP 2004298955 A JP2004298955 A JP 2004298955A JP 2006114618 A5 JP2006114618 A5 JP 2006114618A5
- Authority
- JP
- Japan
- Prior art keywords
- field effect
- type field
- effect transistor
- integrated circuit
- frequency
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005669 field effect Effects 0.000 claims 29
- 239000000758 substrate Substances 0.000 claims 13
- 150000001875 compounds Chemical class 0.000 claims 12
- 239000004065 semiconductor Substances 0.000 claims 12
- 239000003990 capacitor Substances 0.000 claims 7
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims 3
- 230000005685 electric field effect Effects 0.000 claims 1
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004298955A JP4843927B2 (ja) | 2004-10-13 | 2004-10-13 | 高周波集積回路 |
| TW094133560A TW200623631A (en) | 2004-10-13 | 2005-09-27 | High frequency integrated circuit |
| KR1020077007563A KR20070083626A (ko) | 2004-10-13 | 2005-10-12 | 고주파 집적회로 |
| EP05793641A EP1806784B1 (en) | 2004-10-13 | 2005-10-12 | High-frequency integrated circuit |
| CNB2005800349191A CN100557802C (zh) | 2004-10-13 | 2005-10-12 | 高频集成电路 |
| US11/663,966 US8797697B2 (en) | 2004-10-13 | 2005-10-12 | High frequency integrated circuit |
| CN200910138831A CN101546765A (zh) | 2004-10-13 | 2005-10-12 | 高频集成电路 |
| PCT/JP2005/018784 WO2006041087A1 (ja) | 2004-10-13 | 2005-10-12 | 高周波集積回路 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004298955A JP4843927B2 (ja) | 2004-10-13 | 2004-10-13 | 高周波集積回路 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006114618A JP2006114618A (ja) | 2006-04-27 |
| JP2006114618A5 true JP2006114618A5 (enExample) | 2007-11-08 |
| JP4843927B2 JP4843927B2 (ja) | 2011-12-21 |
Family
ID=36148375
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004298955A Expired - Fee Related JP4843927B2 (ja) | 2004-10-13 | 2004-10-13 | 高周波集積回路 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8797697B2 (enExample) |
| EP (1) | EP1806784B1 (enExample) |
| JP (1) | JP4843927B2 (enExample) |
| KR (1) | KR20070083626A (enExample) |
| CN (2) | CN101546765A (enExample) |
| TW (1) | TW200623631A (enExample) |
| WO (1) | WO2006041087A1 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8144441B2 (en) | 2006-08-30 | 2012-03-27 | Triquint Semiconductor, Inc. | Electrostatic discharge protection circuit for compound semiconductor devices and circuits |
| JP2008108840A (ja) * | 2006-10-24 | 2008-05-08 | Mitsubishi Electric Corp | 半導体装置 |
| JP2009054851A (ja) * | 2007-08-28 | 2009-03-12 | Panasonic Corp | 半導体集積回路 |
| JP2009087962A (ja) * | 2007-09-27 | 2009-04-23 | Panasonic Corp | 保護回路及び半導体集積回路 |
| WO2010112971A2 (en) * | 2009-03-31 | 2010-10-07 | Freescale Semiconductor, Inc. | Integrated protection circuit |
| US8427796B2 (en) * | 2010-01-19 | 2013-04-23 | Qualcomm, Incorporated | High voltage, high frequency ESD protection circuit for RF ICs |
| JP5424128B2 (ja) * | 2010-11-09 | 2014-02-26 | 次世代パワーデバイス技術研究組合 | 保護素子およびそれを備えた半導体装置 |
| JP2012190872A (ja) * | 2011-03-09 | 2012-10-04 | Ricoh Co Ltd | 面発光レーザ素子の製造方法、光走査装置及び画像形成装置 |
| US9064704B2 (en) * | 2013-02-15 | 2015-06-23 | Win Semiconductors Corp. | Integrated circuits with ESD protection devices |
| US9812440B2 (en) * | 2014-08-29 | 2017-11-07 | Fairchild Semiconductor Corporation | Biased ESD circuit |
| US20170092637A1 (en) * | 2015-09-30 | 2017-03-30 | Infineon Technologies Ag | Semiconductor ESD Protection Device and Method |
| JP6597357B2 (ja) * | 2016-02-09 | 2019-10-30 | 三菱電機株式会社 | 保護ダイオード付き電界効果トランジスタ |
| CN108206515A (zh) * | 2016-12-16 | 2018-06-26 | 江苏安其威微电子科技有限公司 | Mim电容的esd保护电路 |
| CN113131875B (zh) * | 2021-03-31 | 2022-07-12 | 复旦大学 | 一种高可靠性低噪声放大器 |
| JP2023136954A (ja) | 2022-03-17 | 2023-09-29 | キオクシア株式会社 | メモリデバイス及びメモリデバイスの製造方法 |
| CN116545425A (zh) * | 2023-07-06 | 2023-08-04 | 合肥芯谷微电子股份有限公司 | 一种毫米波单刀单掷开关 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57162466A (en) | 1981-03-31 | 1982-10-06 | Toshiba Corp | Input-output protective circuit for integrated circuit |
| JPH0449652A (ja) * | 1990-06-19 | 1992-02-19 | Nec Corp | 半導体装置の入出力保護回路 |
| JPH05136360A (ja) * | 1991-11-14 | 1993-06-01 | Hitachi Ltd | 静電破壊保護回路、及び半導体集積回路 |
| JP3113951B2 (ja) | 1992-06-26 | 2000-12-04 | 日本電気エンジニアリング株式会社 | GaAsFET保護電源回路 |
| US5615073A (en) * | 1995-06-22 | 1997-03-25 | National Semiconductor Corporation | Electrostatic discharge protection apparatus |
| US5751525A (en) * | 1996-01-05 | 1998-05-12 | Analog Devices, Inc. | EOS/ESD Protection circuit for an integrated circuit with operating/test voltages exceeding power supply rail voltages |
| FR2744578B1 (fr) | 1996-02-06 | 1998-04-30 | Motorola Semiconducteurs | Amlificateur hautes frequences |
| US5774318A (en) * | 1996-11-27 | 1998-06-30 | Raytheon Company | I.C. power supply terminal protection clamp |
| JP2000510653A (ja) | 1997-04-16 | 2000-08-15 | ザ ボード オブ トラスティーズ オブ ザ リーランド スタンフォード ジュニア ユニバーシティ | 高速集積回路のための分散型esd保護デバイス |
| JP3570180B2 (ja) * | 1997-11-20 | 2004-09-29 | セイコーエプソン株式会社 | 半導体集積装置 |
| JP2000067323A (ja) | 1998-08-20 | 2000-03-03 | Toshiba Tec Corp | ドロワ |
| US6459553B1 (en) * | 1999-03-19 | 2002-10-01 | Ati International Srl | Single gate oxide electrostatic discharge protection circuit |
| US6999290B1 (en) * | 1999-04-28 | 2006-02-14 | Hitachi, Ltd. | Integrated circuit with protection against electrostatic damage |
| KR100379619B1 (ko) * | 2000-10-13 | 2003-04-10 | 광주과학기술원 | 단일집적 e/d 모드 hemt 및 그 제조방법 |
| TW511179B (en) * | 2000-11-28 | 2002-11-21 | Nat Science Council | Method of using plasma treatment to improve electric characteristic of oxide layer |
| US6661276B1 (en) * | 2002-07-29 | 2003-12-09 | Lovoltech Inc. | MOSFET driver matching circuit for an enhancement mode JFET |
| US7183592B2 (en) * | 2004-05-26 | 2007-02-27 | Raytheon Company | Field effect transistor |
-
2004
- 2004-10-13 JP JP2004298955A patent/JP4843927B2/ja not_active Expired - Fee Related
-
2005
- 2005-09-27 TW TW094133560A patent/TW200623631A/zh not_active IP Right Cessation
- 2005-10-12 CN CN200910138831A patent/CN101546765A/zh active Pending
- 2005-10-12 US US11/663,966 patent/US8797697B2/en not_active Expired - Fee Related
- 2005-10-12 EP EP05793641A patent/EP1806784B1/en not_active Expired - Lifetime
- 2005-10-12 WO PCT/JP2005/018784 patent/WO2006041087A1/ja not_active Ceased
- 2005-10-12 KR KR1020077007563A patent/KR20070083626A/ko not_active Ceased
- 2005-10-12 CN CNB2005800349191A patent/CN100557802C/zh not_active Expired - Fee Related
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