JP2005011490A5 - - Google Patents

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Publication number
JP2005011490A5
JP2005011490A5 JP2004129233A JP2004129233A JP2005011490A5 JP 2005011490 A5 JP2005011490 A5 JP 2005011490A5 JP 2004129233 A JP2004129233 A JP 2004129233A JP 2004129233 A JP2004129233 A JP 2004129233A JP 2005011490 A5 JP2005011490 A5 JP 2005011490A5
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JP
Japan
Prior art keywords
memory cell
semiconductor device
diffusion layer
gate electrode
semiconductor substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2004129233A
Other languages
English (en)
Japanese (ja)
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JP2005011490A (ja
JP4593159B2 (ja
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Publication date
Application filed filed Critical
Priority claimed from JP2004129233A external-priority patent/JP4593159B2/ja
Priority to JP2004129233A priority Critical patent/JP4593159B2/ja
Priority to US10/852,150 priority patent/US8054680B2/en
Priority to TW093114807A priority patent/TW200506952A/zh
Priority to KR1020040038120A priority patent/KR20040103781A/ko
Priority to CNA2004100455022A priority patent/CN1574062A/zh
Publication of JP2005011490A publication Critical patent/JP2005011490A/ja
Publication of JP2005011490A5 publication Critical patent/JP2005011490A5/ja
Publication of JP4593159B2 publication Critical patent/JP4593159B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004129233A 2003-05-28 2004-04-26 半導体装置 Expired - Fee Related JP4593159B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2004129233A JP4593159B2 (ja) 2003-05-28 2004-04-26 半導体装置
US10/852,150 US8054680B2 (en) 2003-05-28 2004-05-25 Semiconductor device
TW093114807A TW200506952A (en) 2003-05-28 2004-05-25 Semiconductor device
CNA2004100455022A CN1574062A (zh) 2003-05-28 2004-05-28 半导体器件
KR1020040038120A KR20040103781A (ko) 2003-05-28 2004-05-28 반도체 장치

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003150226 2003-05-28
JP2004129233A JP4593159B2 (ja) 2003-05-28 2004-04-26 半導体装置

Publications (3)

Publication Number Publication Date
JP2005011490A JP2005011490A (ja) 2005-01-13
JP2005011490A5 true JP2005011490A5 (enExample) 2007-05-17
JP4593159B2 JP4593159B2 (ja) 2010-12-08

Family

ID=33566714

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004129233A Expired - Fee Related JP4593159B2 (ja) 2003-05-28 2004-04-26 半導体装置

Country Status (5)

Country Link
US (1) US8054680B2 (enExample)
JP (1) JP4593159B2 (enExample)
KR (1) KR20040103781A (enExample)
CN (1) CN1574062A (enExample)
TW (1) TW200506952A (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007193862A (ja) * 2006-01-17 2007-08-02 Toshiba Corp 不揮発性半導体記憶装置
JP4965948B2 (ja) * 2006-09-21 2012-07-04 ルネサスエレクトロニクス株式会社 半導体装置
JP5068053B2 (ja) * 2006-10-02 2012-11-07 ルネサスエレクトロニクス株式会社 不揮発性半導体記憶装置およびその動作方法
JP2008270343A (ja) * 2007-04-17 2008-11-06 Renesas Technology Corp 不揮発性半導体記憶装置
JP5238208B2 (ja) 2007-09-27 2013-07-17 株式会社東芝 不揮発性半導体記憶装置の駆動方法及び不揮発性半導体記憶装置
US7643349B2 (en) * 2007-10-18 2010-01-05 Macronix International Co., Ltd. Efficient erase algorithm for SONOS-type NAND flash
JP5166095B2 (ja) * 2008-03-31 2013-03-21 株式会社東芝 不揮発性半導体記憶装置の駆動方法及び不揮発性半導体記憶装置
US8432732B2 (en) 2010-07-09 2013-04-30 Sandisk Technologies Inc. Detection of word-line leakage in memory arrays
US8514630B2 (en) 2010-07-09 2013-08-20 Sandisk Technologies Inc. Detection of word-line leakage in memory arrays: current based approach
US8379454B2 (en) * 2011-05-05 2013-02-19 Sandisk Technologies Inc. Detection of broken word-lines in memory arrays
US8775901B2 (en) 2011-07-28 2014-07-08 SanDisk Technologies, Inc. Data recovery for defective word lines during programming of non-volatile memory arrays
US8750042B2 (en) 2011-07-28 2014-06-10 Sandisk Technologies Inc. Combined simultaneous sensing of multiple wordlines in a post-write read (PWR) and detection of NAND failures
US8730722B2 (en) 2012-03-02 2014-05-20 Sandisk Technologies Inc. Saving of data in cases of word-line to word-line short in memory arrays
US9165683B2 (en) 2013-09-23 2015-10-20 Sandisk Technologies Inc. Multi-word line erratic programming detection
KR102170975B1 (ko) * 2013-10-31 2020-10-28 삼성전자주식회사 불휘발성 메모리 장치 및 그것의 불량 워드라인 탐지 방법
US9443612B2 (en) 2014-07-10 2016-09-13 Sandisk Technologies Llc Determination of bit line to low voltage signal shorts
US9484086B2 (en) 2014-07-10 2016-11-01 Sandisk Technologies Llc Determination of word line to local source line shorts
US9514835B2 (en) 2014-07-10 2016-12-06 Sandisk Technologies Llc Determination of word line to word line shorts between adjacent blocks
US9460809B2 (en) 2014-07-10 2016-10-04 Sandisk Technologies Llc AC stress mode to screen out word line to word line shorts
US9202593B1 (en) 2014-09-02 2015-12-01 Sandisk Technologies Inc. Techniques for detecting broken word lines in non-volatile memories
US9240249B1 (en) 2014-09-02 2016-01-19 Sandisk Technologies Inc. AC stress methods to screen out bit line defects
US9449694B2 (en) 2014-09-04 2016-09-20 Sandisk Technologies Llc Non-volatile memory with multi-word line select for defect detection operations
US9659666B2 (en) 2015-08-31 2017-05-23 Sandisk Technologies Llc Dynamic memory recovery at the sub-block level

Family Cites Families (14)

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Publication number Priority date Publication date Assignee Title
US3882469A (en) * 1971-11-30 1975-05-06 Texas Instruments Inc Non-volatile variable threshold memory cell
JPH02137196A (ja) * 1988-11-17 1990-05-25 Mitsubishi Electric Corp 不揮発性半導体記憶装置
US5408115A (en) * 1994-04-04 1995-04-18 Motorola Inc. Self-aligned, split-gate EEPROM device
JP3123921B2 (ja) * 1995-05-18 2001-01-15 三洋電機株式会社 半導体装置および不揮発性半導体メモリ
US6469343B1 (en) * 1998-04-02 2002-10-22 Nippon Steel Corporation Multi-level type nonvolatile semiconductor memory device
JPH11134881A (ja) * 1997-10-31 1999-05-21 Sanyo Electric Co Ltd 不揮発性多値メモリ装置及びそのデータの消去方法
JP2000021181A (ja) * 1998-06-30 2000-01-21 Matsushita Electric Ind Co Ltd 不揮発性半導体記憶装置
KR100357644B1 (ko) * 1999-02-19 2002-10-25 미쓰비시덴키 가부시키가이샤 비휘발성 반도체 기억장치 및 그 구동방법, 동작방법 및제조방법
TW546840B (en) * 2001-07-27 2003-08-11 Hitachi Ltd Non-volatile semiconductor memory device
JP3980874B2 (ja) * 2001-11-30 2007-09-26 スパンション エルエルシー 半導体記憶装置及びその駆動方法
JP2003257192A (ja) * 2002-03-06 2003-09-12 Mitsubishi Electric Corp 半導体記憶装置および不揮発性半導体記憶装置
KR100456596B1 (ko) * 2002-05-08 2004-11-09 삼성전자주식회사 부유트랩형 비휘발성 기억소자의 소거 방법
US6894931B2 (en) * 2002-06-20 2005-05-17 Kabushiki Kaisha Toshiba Nonvolatile semiconductor memory device
JP2004303918A (ja) * 2003-03-31 2004-10-28 Renesas Technology Corp 半導体装置の製造方法および半導体装置

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