JP2004525527A5 - - Google Patents

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Publication number
JP2004525527A5
JP2004525527A5 JP2002589877A JP2002589877A JP2004525527A5 JP 2004525527 A5 JP2004525527 A5 JP 2004525527A5 JP 2002589877 A JP2002589877 A JP 2002589877A JP 2002589877 A JP2002589877 A JP 2002589877A JP 2004525527 A5 JP2004525527 A5 JP 2004525527A5
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JP
Japan
Prior art keywords
projection
projection lens
lens
birefringence
image plane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002589877A
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English (en)
Japanese (ja)
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JP2004525527A (ja
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Publication date
Priority claimed from DE10123725A external-priority patent/DE10123725A1/de
Application filed filed Critical
Publication of JP2004525527A publication Critical patent/JP2004525527A/ja
Publication of JP2004525527A5 publication Critical patent/JP2004525527A5/ja
Pending legal-status Critical Current

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JP2002589877A 2001-05-15 2002-05-04 マイクロリソグラフィーの投射露光装置、光学システム、マイクロリソグラフィー投射レンズの製造方法、およびマイクロリソグラフィーによる構造化方法 Pending JP2004525527A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10123725A DE10123725A1 (de) 2001-05-15 2001-05-15 Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren
PCT/EP2002/004900 WO2002093257A2 (de) 2001-05-15 2002-05-04 Projektionsbelichtungsanlage der mikrolithographie,

Publications (2)

Publication Number Publication Date
JP2004525527A JP2004525527A (ja) 2004-08-19
JP2004525527A5 true JP2004525527A5 (cg-RX-API-DMAC7.html) 2005-12-22

Family

ID=7684936

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002589877A Pending JP2004525527A (ja) 2001-05-15 2002-05-04 マイクロリソグラフィーの投射露光装置、光学システム、マイクロリソグラフィー投射レンズの製造方法、およびマイクロリソグラフィーによる構造化方法

Country Status (7)

Country Link
US (3) US6879379B2 (cg-RX-API-DMAC7.html)
EP (1) EP1390813A2 (cg-RX-API-DMAC7.html)
JP (1) JP2004525527A (cg-RX-API-DMAC7.html)
KR (1) KR20030019577A (cg-RX-API-DMAC7.html)
DE (1) DE10123725A1 (cg-RX-API-DMAC7.html)
TW (1) TWI266149B (cg-RX-API-DMAC7.html)
WO (1) WO2002093257A2 (cg-RX-API-DMAC7.html)

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US7460206B2 (en) * 2003-12-19 2008-12-02 Carl Zeiss Smt Ag Projection objective for immersion lithography
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WO2006013100A2 (en) * 2004-08-06 2006-02-09 Carl Zeiss Smt Ag Projection objective for microlithography
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