JP2004525527A - マイクロリソグラフィーの投射露光装置、光学システム、マイクロリソグラフィー投射レンズの製造方法、およびマイクロリソグラフィーによる構造化方法 - Google Patents

マイクロリソグラフィーの投射露光装置、光学システム、マイクロリソグラフィー投射レンズの製造方法、およびマイクロリソグラフィーによる構造化方法 Download PDF

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JP2004525527A
JP2004525527A JP2002589877A JP2002589877A JP2004525527A JP 2004525527 A JP2004525527 A JP 2004525527A JP 2002589877 A JP2002589877 A JP 2002589877A JP 2002589877 A JP2002589877 A JP 2002589877A JP 2004525527 A JP2004525527 A JP 2004525527A
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Prior art keywords
force
optical system
optical
optical element
exposure apparatus
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Pending
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JP2002589877A
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Japanese (ja)
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JP2004525527A5 (cg-RX-API-DMAC7.html
Inventor
ブルノッテ，マーティン
ハルトマイヤー，ユルゲン
ホルデラー，フーベルト
カイザー，ヴィンフリート
コール，アレクサンダー
クグラー，イェンズ
マウル，マンフレッド
ヴァグナー，クリスティアン
Original Assignee
カール・ツアイス・エスエムテイ・アーゲー
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Publication of JP2004525527A publication Critical patent/JP2004525527A/ja
Publication of JP2004525527A5 publication Critical patent/JP2004525527A5/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/08—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of polarising materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Lens Barrels (AREA)
JP2002589877A 2001-05-15 2002-05-04 マイクロリソグラフィーの投射露光装置、光学システム、マイクロリソグラフィー投射レンズの製造方法、およびマイクロリソグラフィーによる構造化方法 Pending JP2004525527A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10123725A DE10123725A1 (de) 2001-05-15 2001-05-15 Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren
PCT/EP2002/004900 WO2002093257A2 (de) 2001-05-15 2002-05-04 Projektionsbelichtungsanlage der mikrolithographie,

Publications (2)

Publication Number Publication Date
JP2004525527A true JP2004525527A (ja) 2004-08-19
JP2004525527A5 JP2004525527A5 (cg-RX-API-DMAC7.html) 2005-12-22

Family

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Family Applications (1)

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JP2002589877A Pending JP2004525527A (ja) 2001-05-15 2002-05-04 マイクロリソグラフィーの投射露光装置、光学システム、マイクロリソグラフィー投射レンズの製造方法、およびマイクロリソグラフィーによる構造化方法

Country Status (7)

Country Link
US (3) US6879379B2 (cg-RX-API-DMAC7.html)
EP (1) EP1390813A2 (cg-RX-API-DMAC7.html)
JP (1) JP2004525527A (cg-RX-API-DMAC7.html)
KR (1) KR20030019577A (cg-RX-API-DMAC7.html)
DE (1) DE10123725A1 (cg-RX-API-DMAC7.html)
TW (1) TWI266149B (cg-RX-API-DMAC7.html)
WO (1) WO2002093257A2 (cg-RX-API-DMAC7.html)

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JP2009540586A (ja) * 2006-06-16 2009-11-19 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影露光装置の投影対物器械
JP2009545146A (ja) * 2006-07-24 2009-12-17 カール・ツァイス・エスエムティー・アーゲー 光学装置及び光学装置の結像挙動を補正又は改善する方法
JP2011508409A (ja) * 2007-11-20 2011-03-10 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学系
JP2020507810A (ja) * 2017-02-02 2020-03-12 コーニング インコーポレイテッド 光学系の組立て方法および光学アセンブリでのリターダンスによる歪みを最小にする方法

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JP2009540586A (ja) * 2006-06-16 2009-11-19 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影露光装置の投影対物器械
US8325426B2 (en) 2006-06-16 2012-12-04 Carl Zeiss Smt Gmbh Projection objective of a microlithographic projection exposure apparatus
JP2009545146A (ja) * 2006-07-24 2009-12-17 カール・ツァイス・エスエムティー・アーゲー 光学装置及び光学装置の結像挙動を補正又は改善する方法
JP2011508409A (ja) * 2007-11-20 2011-03-10 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学系
US8379188B2 (en) 2007-11-20 2013-02-19 Carl Zeiss Smt Gmbh Optical system
JP2020507810A (ja) * 2017-02-02 2020-03-12 コーニング インコーポレイテッド 光学系の組立て方法および光学アセンブリでのリターダンスによる歪みを最小にする方法
JP7240321B2 (ja) 2017-02-02 2023-03-15 コーニング インコーポレイテッド 光学系の組立て方法および光学アセンブリでのリターダンスによる歪みを最小にする方法

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DE10123725A1 (de) 2002-11-21
EP1390813A2 (de) 2004-02-25
WO2002093257A2 (de) 2002-11-21
US20050264786A1 (en) 2005-12-01
US6879379B2 (en) 2005-04-12
US20050134967A1 (en) 2005-06-23
US7170585B2 (en) 2007-01-30
WO2002093257A8 (de) 2003-12-31

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