TWI266149B - Microlithographic projection illumination system, optical system, method for the production of a microlithographic projection lens system and microlithographic structuring method - Google Patents
Microlithographic projection illumination system, optical system, method for the production of a microlithographic projection lens system and microlithographic structuring method Download PDFInfo
- Publication number
- TWI266149B TWI266149B TW091108888A TW91108888A TWI266149B TW I266149 B TWI266149 B TW I266149B TW 091108888 A TW091108888 A TW 091108888A TW 91108888 A TW91108888 A TW 91108888A TW I266149 B TWI266149 B TW I266149B
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- Taiwan
- Prior art keywords
- force
- projection
- projection lens
- optical element
- lens
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 99
- 238000005286 illumination Methods 0.000 title claims abstract description 9
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- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims abstract description 4
- 238000009826 distribution Methods 0.000 claims description 26
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- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 5
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- 229910001637 strontium fluoride Inorganic materials 0.000 claims 1
- FVRNDBHWWSPNOM-UHFFFAOYSA-L strontium fluoride Chemical compound [F-].[F-].[Sr+2] FVRNDBHWWSPNOM-UHFFFAOYSA-L 0.000 claims 1
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/08—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of polarising materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
- G03F7/70966—Birefringence
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Public Health (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lenses (AREA)
- Lens Barrels (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10123725A DE10123725A1 (de) | 2001-05-15 | 2001-05-15 | Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWI266149B true TWI266149B (en) | 2006-11-11 |
Family
ID=7684936
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW091108888A TWI266149B (en) | 2001-05-15 | 2002-04-29 | Microlithographic projection illumination system, optical system, method for the production of a microlithographic projection lens system and microlithographic structuring method |
Country Status (7)
| Country | Link |
|---|---|
| US (3) | US6879379B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP1390813A2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP2004525527A (cg-RX-API-DMAC7.html) |
| KR (1) | KR20030019577A (cg-RX-API-DMAC7.html) |
| DE (1) | DE10123725A1 (cg-RX-API-DMAC7.html) |
| TW (1) | TWI266149B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2002093257A2 (cg-RX-API-DMAC7.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115684203A (zh) * | 2019-02-17 | 2023-02-03 | 科磊股份有限公司 | 利用空间变化偏振转子及偏振器进行敏感性粒子检测 |
Families Citing this family (52)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100870585B1 (ko) | 2000-10-10 | 2008-11-25 | 가부시키가이샤 니콘 | 결상성능의 평가방법 |
| EP1390783A2 (de) * | 2001-05-15 | 2004-02-25 | Carl Zeiss | Objektiv mit fluorid-kristall-linsen |
| US7239447B2 (en) | 2001-05-15 | 2007-07-03 | Carl Zeiss Smt Ag | Objective with crystal lenses |
| US6683710B2 (en) | 2001-06-01 | 2004-01-27 | Optical Research Associates | Correction of birefringence in cubic crystalline optical systems |
| EP1780570A3 (en) * | 2001-06-01 | 2008-01-02 | ASML Netherlands B.V. | Correction of birefringence in cubic crystalline optical systems |
| US6831731B2 (en) | 2001-06-28 | 2004-12-14 | Nikon Corporation | Projection optical system and an exposure apparatus with the projection optical system |
| US6775063B2 (en) | 2001-07-10 | 2004-08-10 | Nikon Corporation | Optical system and exposure apparatus having the optical system |
| DE10133841A1 (de) | 2001-07-18 | 2003-02-06 | Zeiss Carl | Objektiv mit Kristall-Linsen |
| US6844915B2 (en) | 2001-08-01 | 2005-01-18 | Nikon Corporation | Optical system and exposure apparatus provided with the optical system |
| US6970232B2 (en) | 2001-10-30 | 2005-11-29 | Asml Netherlands B.V. | Structures and methods for reducing aberration in integrated circuit fabrication systems |
| US6995908B2 (en) | 2001-10-30 | 2006-02-07 | Asml Netherlands B.V. | Methods for reducing aberration in optical systems |
| US7453641B2 (en) | 2001-10-30 | 2008-11-18 | Asml Netherlands B.V. | Structures and methods for reducing aberration in optical systems |
| TW583657B (en) * | 2002-04-03 | 2004-04-11 | Ind Tech Res Inst | Driving structure of optical head |
| JP4333078B2 (ja) | 2002-04-26 | 2009-09-16 | 株式会社ニコン | 投影光学系、該投影光学系を備えた露光装置および該投影光学系を用いた露光方法並びにデバイス製造方法 |
| US7072102B2 (en) | 2002-08-22 | 2006-07-04 | Asml Netherlands B.V. | Methods for reducing polarization aberration in optical systems |
| EP1535100A1 (en) * | 2002-09-03 | 2005-06-01 | Carl Zeiss SMT AG | Objective with birefringent lenses |
| WO2004023172A1 (de) | 2002-09-03 | 2004-03-18 | Carl Zeiss Smt Ag | Optimierverfahren für ein objektiv mit fluorid-kristall-linsen sowie objektiv mit fluorid-kristall-linsen |
| DE10258715B4 (de) * | 2002-12-10 | 2006-12-21 | Carl Zeiss Smt Ag | Verfahren zur Herstellung eines optischen Abbildungssystems |
| WO2004090952A1 (ja) | 2003-04-09 | 2004-10-21 | Nikon Corporation | 露光方法及び装置、並びにデバイス製造方法 |
| DE10324477A1 (de) * | 2003-05-30 | 2004-12-30 | Carl Zeiss Smt Ag | Mikrolithographische Projektionsbelichtungsanlage |
| DE10328938A1 (de) * | 2003-06-27 | 2005-01-20 | Carl Zeiss Smt Ag | Korrektureinrichtung zur Kompensation von Störungen der Polarisationsverteilung sowie Projektionsobjektiv für die Mikrolithografie |
| DE10344010A1 (de) * | 2003-09-15 | 2005-04-07 | Carl Zeiss Smt Ag | Wabenkondensor und Beleuchtungssystem damit |
| TWI474132B (zh) | 2003-10-28 | 2015-02-21 | 尼康股份有限公司 | 照明光學裝置、投影曝光裝置、曝光方法以及元件製造方法 |
| TWI512335B (zh) | 2003-11-20 | 2015-12-11 | 尼康股份有限公司 | 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法 |
| EP1695148B1 (en) * | 2003-11-24 | 2015-10-28 | Carl Zeiss SMT GmbH | Immersion objective |
| US7466489B2 (en) | 2003-12-15 | 2008-12-16 | Susanne Beder | Projection objective having a high aperture and a planar end surface |
| JP5102492B2 (ja) | 2003-12-19 | 2012-12-19 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 結晶素子を有するマイクロリソグラフィー投影用対物レンズ |
| US7460206B2 (en) * | 2003-12-19 | 2008-12-02 | Carl Zeiss Smt Ag | Projection objective for immersion lithography |
| US20070195676A1 (en) * | 2004-01-16 | 2007-08-23 | Koninklijke Philips Electronic, N.V. | Optical system |
| TWI379344B (en) | 2004-02-06 | 2012-12-11 | Nikon Corp | Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method |
| DE102004011733A1 (de) | 2004-03-04 | 2005-09-22 | Carl Zeiss Smt Ag | Transmissionsfiltervorrichtung |
| WO2006013100A2 (en) * | 2004-08-06 | 2006-02-09 | Carl Zeiss Smt Ag | Projection objective for microlithography |
| WO2006016469A1 (ja) * | 2004-08-10 | 2006-02-16 | Nikon Corporation | 照明光学装置、露光装置、および露光方法 |
| US20060204204A1 (en) * | 2004-12-20 | 2006-09-14 | Markus Zenzinger | Method for improving the optical polarization properties of a microlithographic projection exposure apparatus |
| US20070115551A1 (en) * | 2005-04-01 | 2007-05-24 | Alexis Spilman | Space-variant waveplate for polarization conversion, methods and applications |
| DE102006021334B3 (de) * | 2006-05-05 | 2007-08-30 | Carl Zeiss Smt Ag | Polarisationsbeeinflussendes optisches Element sowie Verfahren zu dessen Herstellung sowie optisches System und mikrolithographische Projektionsbelichtungsanlage mit einem solchen Element |
| JP5174810B2 (ja) * | 2006-06-16 | 2013-04-03 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光装置の投影対物器械 |
| DE102006034755A1 (de) * | 2006-07-24 | 2008-01-31 | Carl Zeiss Smt Ag | Optische Vorrichtung sowie Verfahren zur Korrektur bzw. Verbesserung des Abbildungsverhaltens einer optischen Vorrichtung |
| DE102006047665A1 (de) * | 2006-09-28 | 2008-04-03 | Carl Zeiss Smt Ag | Optisches System für eine Mikrolithographieanlage mit verbesserten Abbildungseigenschaften und Verfahren zum Verbessern der Abbildungseigenschaften des optischen Systems |
| DE102007014587A1 (de) | 2007-03-23 | 2008-09-25 | Carl Zeiss Smt Ag | Doppelbrechende Verzögerungsplattenanordnung |
| US9018561B2 (en) * | 2007-05-23 | 2015-04-28 | Cymer, Llc | High power seed/amplifier laser system with beam shaping intermediate the seed and amplifier |
| DE102007055567A1 (de) | 2007-11-20 | 2009-05-28 | Carl Zeiss Smt Ag | Optisches System |
| DE102008054818A1 (de) | 2008-01-29 | 2009-07-30 | Carl Zeiss Smt Ag | Verfahren zum Manipulieren eines optischen Systems, sowie optisches System |
| WO2010010034A1 (en) * | 2008-07-21 | 2010-01-28 | Asml Netherlands B.V. | Optical element mount for lithographic apparatus |
| US8504328B2 (en) | 2010-05-21 | 2013-08-06 | Eastman Kodak Company | Designing lenses using stress birefringence performance criterion |
| US8649094B2 (en) | 2010-05-21 | 2014-02-11 | Eastman Kodak Company | Low thermal stress birefringence imaging lens |
| US8287129B2 (en) | 2010-05-21 | 2012-10-16 | Eastman Kodak Company | Low thermal stress birefringence imaging system |
| US8786943B2 (en) | 2011-10-27 | 2014-07-22 | Eastman Kodak Company | Low thermal stress catadioptric imaging system |
| US8830580B2 (en) | 2011-10-27 | 2014-09-09 | Eastman Kodak Company | Low thermal stress catadioptric imaging optics |
| DE102013109274B3 (de) * | 2013-08-27 | 2014-10-16 | Jenoptik Optical Systems Gmbh | Thermisch kompensierte optische Baugruppe mit einem zwischen Wälzkörpern gelagerten optischen Element |
| DE102016215540A1 (de) * | 2016-08-18 | 2018-02-22 | Carl Zeiss Smt Gmbh | Optisches system, lithographieanlage sowie verfahren |
| US10732336B2 (en) * | 2017-02-02 | 2020-08-04 | Corning Incorporated | Method of assembling optical systems and minimizing retardance distortions in optical assemblies |
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| US1332410A (en) * | 1919-03-22 | 1920-03-02 | Oscero W Potts | Lens and method of making the same |
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| DE19637563A1 (de) | 1996-09-14 | 1998-03-19 | Zeiss Carl Fa | Doppelbrechende Planplattenanordnung und DUV-Viertelwellenplatte |
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| DE19807120A1 (de) * | 1998-02-20 | 1999-08-26 | Zeiss Carl Fa | Optisches System mit Polarisationskompensator |
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| DE19942281A1 (de) | 1999-05-14 | 2000-11-16 | Zeiss Carl Fa | Projektionsobjektiv |
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-
2001
- 2001-05-15 DE DE10123725A patent/DE10123725A1/de not_active Withdrawn
-
2002
- 2002-04-29 TW TW091108888A patent/TWI266149B/zh not_active IP Right Cessation
- 2002-05-04 KR KR10-2003-7000622A patent/KR20030019577A/ko not_active Withdrawn
- 2002-05-04 EP EP02769464A patent/EP1390813A2/de not_active Withdrawn
- 2002-05-04 WO PCT/EP2002/004900 patent/WO2002093257A2/de not_active Ceased
- 2002-05-04 JP JP2002589877A patent/JP2004525527A/ja active Pending
-
2003
- 2003-11-14 US US10/714,573 patent/US6879379B2/en not_active Expired - Fee Related
-
2005
- 2005-03-03 US US10/906,737 patent/US20050134967A1/en not_active Abandoned
- 2005-04-07 US US11/101,235 patent/US7170585B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115684203A (zh) * | 2019-02-17 | 2023-02-03 | 科磊股份有限公司 | 利用空间变化偏振转子及偏振器进行敏感性粒子检测 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20030019577A (ko) | 2003-03-06 |
| WO2002093257A3 (de) | 2003-09-25 |
| US20040150806A1 (en) | 2004-08-05 |
| JP2004525527A (ja) | 2004-08-19 |
| DE10123725A1 (de) | 2002-11-21 |
| EP1390813A2 (de) | 2004-02-25 |
| WO2002093257A2 (de) | 2002-11-21 |
| US20050264786A1 (en) | 2005-12-01 |
| US6879379B2 (en) | 2005-04-12 |
| US20050134967A1 (en) | 2005-06-23 |
| US7170585B2 (en) | 2007-01-30 |
| WO2002093257A8 (de) | 2003-12-31 |
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| MM4A | Annulment or lapse of patent due to non-payment of fees |