JP2003114387A5 - - Google Patents

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Publication number
JP2003114387A5
JP2003114387A5 JP2001308754A JP2001308754A JP2003114387A5 JP 2003114387 A5 JP2003114387 A5 JP 2003114387A5 JP 2001308754 A JP2001308754 A JP 2001308754A JP 2001308754 A JP2001308754 A JP 2001308754A JP 2003114387 A5 JP2003114387 A5 JP 2003114387A5
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JP
Japan
Prior art keywords
optical system
image
mirror
disposed
catadioptric
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Pending
Application number
JP2001308754A
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English (en)
Japanese (ja)
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JP2003114387A (ja
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Priority to JP2001308754A priority Critical patent/JP2003114387A/ja
Priority claimed from JP2001308754A external-priority patent/JP2003114387A/ja
Publication of JP2003114387A publication Critical patent/JP2003114387A/ja
Publication of JP2003114387A5 publication Critical patent/JP2003114387A5/ja
Pending legal-status Critical Current

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JP2001308754A 2001-10-04 2001-10-04 反射屈折光学系および該光学系を備える投影露光装置 Pending JP2003114387A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001308754A JP2003114387A (ja) 2001-10-04 2001-10-04 反射屈折光学系および該光学系を備える投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001308754A JP2003114387A (ja) 2001-10-04 2001-10-04 反射屈折光学系および該光学系を備える投影露光装置

Publications (2)

Publication Number Publication Date
JP2003114387A JP2003114387A (ja) 2003-04-18
JP2003114387A5 true JP2003114387A5 (cg-RX-API-DMAC7.html) 2005-08-18

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JP2001308754A Pending JP2003114387A (ja) 2001-10-04 2001-10-04 反射屈折光学系および該光学系を備える投影露光装置

Country Status (1)

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JP (1) JP2003114387A (cg-RX-API-DMAC7.html)

Cited By (2)

* Cited by examiner, † Cited by third party
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US7782538B2 (en) 2003-12-15 2010-08-24 Carl Zeiss Smt Ag Projection objective having a high aperture and a planar end surface
US7859748B2 (en) 2000-01-14 2010-12-28 Carl Zeiss Smt Gmbh Microlithographic reduction projection catadioptric objective

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004090952A1 (ja) 2003-04-09 2004-10-21 Nikon Corporation 露光方法及び装置、並びにデバイス製造方法
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
EP2722703A3 (en) * 2003-05-06 2014-07-23 Nikon Corporation Projection optical system, and exposure apparatus and exposure method
JP2004333761A (ja) * 2003-05-06 2004-11-25 Nikon Corp 反射屈折型の投影光学系、露光装置、および露光方法
JP2005115127A (ja) * 2003-10-09 2005-04-28 Nikon Corp 反射屈折投影光学系、露光装置及び露光方法
US7085075B2 (en) 2003-08-12 2006-08-01 Carl Zeiss Smt Ag Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
WO2006005547A1 (en) 2004-07-14 2006-01-19 Carl Zeiss Smt Ag Catadioptric projection objective
TWI474132B (zh) 2003-10-28 2015-02-21 尼康股份有限公司 照明光學裝置、投影曝光裝置、曝光方法以及元件製造方法
TWI512335B (zh) 2003-11-20 2015-12-11 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
JP5102492B2 (ja) 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
US7463422B2 (en) 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
JP5420821B2 (ja) 2004-01-14 2014-02-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 反射屈折投影対物レンズ
TWI379344B (en) 2004-02-06 2012-12-11 Nikon Corp Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
US7712905B2 (en) * 2004-04-08 2010-05-11 Carl Zeiss Smt Ag Imaging system with mirror group
KR101213831B1 (ko) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
WO2006037651A1 (en) * 2004-10-08 2006-04-13 Carl Zeiss Smt Ag Optical projection system
DE102005042005A1 (de) 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
WO2006069725A1 (de) * 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges objektiv mit obskurierter pupille
US7218453B2 (en) 2005-02-04 2007-05-15 Carl Zeiss Smt Ag Projection system, in particular for a microlithographic projection exposure apparatus
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006309220A (ja) 2005-04-29 2006-11-09 Carl Zeiss Smt Ag 投影対物レンズ
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101544336B1 (ko) 2005-05-12 2015-08-12 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
TWI451125B (zh) 2005-09-13 2014-09-01 Zeiss Carl Smt Gmbh 顯微蝕刻投影光學系統、包含此一光學系統之顯微蝕刻工具、使用此一顯微蝕刻工具於顯微蝕刻生產微結構元件之方法、藉此一方法所生產之微結構元件以及於此一光學系統中設計一光學表面的方法
EP1984789B1 (de) 2006-02-17 2013-11-06 Carl Zeiss SMT GmbH Beleuchtungssystem für die mikro-lithographie, projektionsbelichtungsanlage mit einem derartigen beleuchtungssystem
DE102006014380A1 (de) 2006-03-27 2007-10-11 Carl Zeiss Smt Ag Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
US7920338B2 (en) 2006-03-28 2011-04-05 Carl Zeiss Smt Gmbh Reduction projection objective and projection exposure apparatus including the same
US7738188B2 (en) 2006-03-28 2010-06-15 Carl Zeiss Smt Ag Projection objective and projection exposure apparatus including the same
DE102007023411A1 (de) 2006-12-28 2008-07-03 Carl Zeiss Smt Ag Optisches Element, Beleuchtungsoptik für die Mikrolithographie mit mindestens einem derartigen optischen Element sowie Beleuchtungssystem mit einer derartigen Beleuchtungsoptik
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP2010026526A (ja) * 2009-10-26 2010-02-04 Nikon Corp 反射屈折型の投影光学系、露光装置、および露光方法
JP5877965B2 (ja) * 2011-07-04 2016-03-08 株式会社ニコン 投影光学系、露光装置、露光方法、およびデバイス製造方法
JP5664697B2 (ja) * 2013-05-13 2015-02-04 株式会社ニコン 反射屈折型の投影光学系、露光装置、および露光方法
JP2014194552A (ja) * 2014-04-28 2014-10-09 Nikon Corp 反射屈折型の投影光学系、露光装置、および露光方法
JP6358242B2 (ja) * 2015-11-30 2018-07-18 株式会社ニコン 露光装置、露光方法、デバイス製造方法およびパターン形成方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7859748B2 (en) 2000-01-14 2010-12-28 Carl Zeiss Smt Gmbh Microlithographic reduction projection catadioptric objective
US7782538B2 (en) 2003-12-15 2010-08-24 Carl Zeiss Smt Ag Projection objective having a high aperture and a planar end surface

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