JP2000171706A5 - - Google Patents
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- Publication number
- JP2000171706A5 JP2000171706A5 JP1999317966A JP31796699A JP2000171706A5 JP 2000171706 A5 JP2000171706 A5 JP 2000171706A5 JP 1999317966 A JP1999317966 A JP 1999317966A JP 31796699 A JP31796699 A JP 31796699A JP 2000171706 A5 JP2000171706 A5 JP 2000171706A5
- Authority
- JP
- Japan
- Prior art keywords
- lens
- lens group
- projection objective
- microlithography
- objective lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001393 microlithography Methods 0.000 description 16
- 230000003287 optical effect Effects 0.000 description 9
- 230000004907 flux Effects 0.000 description 6
- 238000005286 illumination Methods 0.000 description 5
- 238000001459 lithography Methods 0.000 description 2
- 230000005499 meniscus Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19855108A DE19855108A1 (de) | 1998-11-30 | 1998-11-30 | Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren |
| DE19855108.8 | 1999-09-04 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000171706A JP2000171706A (ja) | 2000-06-23 |
| JP2000171706A5 true JP2000171706A5 (enExample) | 2006-12-28 |
Family
ID=7889445
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11317966A Pending JP2000171706A (ja) | 1998-11-30 | 1999-11-09 | マイクロリソグラフィ用縮小対物レンズ,投影露光装置及び投影露光方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6349005B1 (enExample) |
| EP (2) | EP1006389A3 (enExample) |
| JP (1) | JP2000171706A (enExample) |
| KR (1) | KR100671317B1 (enExample) |
| DE (1) | DE19855108A1 (enExample) |
| TW (1) | TW480347B (enExample) |
Families Citing this family (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1195095A (ja) | 1997-09-22 | 1999-04-09 | Nikon Corp | 投影光学系 |
| US6700645B1 (en) | 1998-01-22 | 2004-03-02 | Nikon Corporation | Projection optical system and exposure apparatus and method |
| US6635914B2 (en) * | 2000-09-08 | 2003-10-21 | Axon Technologies Corp. | Microelectronic programmable device and methods of forming and programming the same |
| EP1139138A4 (en) | 1999-09-29 | 2006-03-08 | Nikon Corp | PROJECTION EXPOSURE PROCESS, DEVICE AND OPTICAL PROJECTION SYSTEM |
| WO2001023933A1 (en) | 1999-09-29 | 2001-04-05 | Nikon Corporation | Projection optical system |
| EP1094350A3 (en) * | 1999-10-21 | 2001-08-16 | Carl Zeiss | Optical projection lens system |
| US6590715B2 (en) * | 1999-12-21 | 2003-07-08 | Carl-Zeiss-Stiftung | Optical projection system |
| JP2001343582A (ja) * | 2000-05-30 | 2001-12-14 | Nikon Corp | 投影光学系、当該投影光学系を備えた露光装置、及び当該露光装置を用いたマイクロデバイスの製造方法 |
| JP3413160B2 (ja) * | 2000-06-15 | 2003-06-03 | キヤノン株式会社 | 照明装置及びそれを用いた走査型露光装置 |
| DE10064685A1 (de) * | 2000-12-22 | 2002-07-04 | Zeiss Carl | Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft |
| WO2002052303A2 (de) * | 2000-12-22 | 2002-07-04 | Carl Zeiss Smt Ag | Projektionsobjektiv |
| JP2002244034A (ja) | 2001-02-21 | 2002-08-28 | Nikon Corp | 投影光学系および該投影光学系を備えた露光装置 |
| JP2002323652A (ja) | 2001-02-23 | 2002-11-08 | Nikon Corp | 投影光学系,該投影光学系を備えた投影露光装置および投影露光方法 |
| JP2002323653A (ja) | 2001-02-23 | 2002-11-08 | Nikon Corp | 投影光学系,投影露光装置および投影露光方法 |
| DE10138847A1 (de) * | 2001-08-15 | 2003-02-27 | Zeiss Carl | Blende für eine Integratoreinheit |
| DE10143385C2 (de) * | 2001-09-05 | 2003-07-17 | Zeiss Carl | Projektionsbelichtungsanlage |
| WO2003075096A2 (de) * | 2002-03-01 | 2003-09-12 | Carl Zeiss Smt Ag | Refraktives projektionsobjektiv |
| US7154676B2 (en) * | 2002-03-01 | 2006-12-26 | Carl Zeiss Smt A.G. | Very-high aperture projection objective |
| US7190527B2 (en) | 2002-03-01 | 2007-03-13 | Carl Zeiss Smt Ag | Refractive projection objective |
| AU2003208872A1 (en) * | 2002-03-01 | 2003-09-16 | Carl Zeiss Smt Ag | Refractive projection lens with a middle part |
| DE10229249A1 (de) | 2002-03-01 | 2003-09-04 | Zeiss Carl Semiconductor Mfg | Refraktives Projektionsobjektiv mit einer Taille |
| DE10210899A1 (de) * | 2002-03-08 | 2003-09-18 | Zeiss Carl Smt Ag | Refraktives Projektionsobjektiv für Immersions-Lithographie |
| DE10221386A1 (de) | 2002-05-14 | 2003-11-27 | Zeiss Carl Smt Ag | Projektionsbelichtungssystem |
| US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| KR101200654B1 (ko) | 2003-12-15 | 2012-11-12 | 칼 짜이스 에스엠티 게엠베하 | 고 개구율 및 평평한 단부면을 가진 투사 대물렌즈 |
| US20080151364A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
| KR101213831B1 (ko) | 2004-05-17 | 2012-12-24 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
| CN100370313C (zh) * | 2005-05-20 | 2008-02-20 | 清华大学 | 傅里叶变换光学系统及体全息存储傅里叶变换光学系统 |
| US7952803B2 (en) * | 2006-05-15 | 2011-05-31 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| DE102008001497A1 (de) | 2007-05-07 | 2008-11-13 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage für die Halbleiterlithographie und Subsystem einer Projektionsbelichtungsanlage |
| CN101587230B (zh) * | 2009-04-09 | 2010-12-29 | 上海微电子装备有限公司 | 一种投影物镜 |
| CN102486569B (zh) | 2010-12-01 | 2014-06-18 | 上海微电子装备有限公司 | 一种投影物镜系统 |
| CN102540416B (zh) * | 2010-12-10 | 2014-09-17 | 上海微电子装备有限公司 | 大视场大工作距投影光刻物镜 |
| CN102540415B (zh) * | 2010-12-10 | 2014-06-18 | 上海微电子装备有限公司 | 一种投影光刻物镜 |
| CN102981249B (zh) * | 2012-09-21 | 2015-01-28 | 中国科学院光电技术研究所 | 一种投影光学系统 |
| WO2017004791A1 (en) | 2015-07-07 | 2017-01-12 | Colgate-Palmolive Company | Oral care implement and monofilament bristle for use with the same |
| CN109581622B (zh) * | 2017-09-29 | 2020-12-04 | 上海微电子装备(集团)股份有限公司 | 一种投影物镜 |
| CN115542675B (zh) * | 2021-06-30 | 2025-08-12 | 上海微电子装备(集团)股份有限公司 | 投影光刻物镜及光刻机 |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US337647A (en) | 1886-03-09 | Band-saw mill | ||
| DD299017A7 (de) | 1988-09-02 | 1992-03-26 | Jenoptik Carl Zeiss Jena Gmbh,De | Projektionsobjektiv |
| US5105075A (en) | 1988-09-19 | 1992-04-14 | Canon Kabushiki Kaisha | Projection exposure apparatus |
| SU1659955A1 (ru) | 1989-07-31 | 1991-06-30 | Конструкторское бюро точного электронного машиностроения | Проекционный объектив с увеличением - 1/5 @ |
| US5469299A (en) * | 1990-05-15 | 1995-11-21 | Olympus Optical Co., Ltd. | Objective lens system |
| JP3041939B2 (ja) * | 1990-10-22 | 2000-05-15 | 株式会社ニコン | 投影レンズ系 |
| DE4124311A1 (de) | 1991-07-23 | 1993-01-28 | Zeiss Carl Fa | Anordnung zur kohaerenzreduktion und strahlformung eines laserstrahls |
| US6285443B1 (en) | 1993-12-13 | 2001-09-04 | Carl-Zeiss-Stiftung | Illuminating arrangement for a projection microlithographic apparatus |
| DE19520563A1 (de) | 1995-06-06 | 1996-12-12 | Zeiss Carl Fa | Beleuchtungseinrichtung für ein Projektions-Mikrolithographie-Gerät |
| ES1027924Y (es) | 1994-05-06 | 1995-04-01 | Medina Manuel Sierra | Chaleco de seguridad autoinchable para motoristas. |
| EP0687956B2 (de) | 1994-06-17 | 2005-11-23 | Carl Zeiss SMT AG | Beleuchtungseinrichtung |
| DE4421053A1 (de) | 1994-06-17 | 1995-12-21 | Zeiss Carl Fa | Beleuchtungseinrichtung |
| JPH08179204A (ja) * | 1994-11-10 | 1996-07-12 | Nikon Corp | 投影光学系及び投影露光装置 |
| JP3500745B2 (ja) | 1994-12-14 | 2004-02-23 | 株式会社ニコン | 投影光学系、投影露光装置及び投影露光方法 |
| JP3454390B2 (ja) | 1995-01-06 | 2003-10-06 | 株式会社ニコン | 投影光学系、投影露光装置及び投影露光方法 |
| JP3819048B2 (ja) | 1995-03-15 | 2006-09-06 | 株式会社ニコン | 投影光学系及びそれを備えた露光装置並びに露光方法 |
| JP3402850B2 (ja) | 1995-05-09 | 2003-05-06 | キヤノン株式会社 | 投影露光装置及びそれを用いたデバイスの製造方法 |
| JP3624973B2 (ja) | 1995-10-12 | 2005-03-02 | 株式会社ニコン | 投影光学系 |
| DE19548805A1 (de) * | 1995-12-27 | 1997-07-03 | Zeiss Carl Fa | REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen |
| JP3750123B2 (ja) | 1996-04-25 | 2006-03-01 | 株式会社ニコン | 投影光学系 |
| JPH1048517A (ja) * | 1996-08-07 | 1998-02-20 | Nikon Corp | 投影光学系 |
| JPH1079345A (ja) | 1996-09-04 | 1998-03-24 | Nikon Corp | 投影光学系及び露光装置 |
| US5852490A (en) * | 1996-09-30 | 1998-12-22 | Nikon Corporation | Projection exposure method and apparatus |
| DE19653983A1 (de) * | 1996-12-21 | 1998-06-25 | Zeiss Carl Fa | REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen |
| DE19818444A1 (de) * | 1997-04-25 | 1998-10-29 | Nikon Corp | Abbildungsoptik, Projektionsoptikvorrichtung und Projektionsbelichtungsverfahren |
| JP3925576B2 (ja) * | 1997-07-24 | 2007-06-06 | 株式会社ニコン | 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法 |
| JPH11133301A (ja) * | 1997-08-29 | 1999-05-21 | Nikon Corp | 投影光学系、露光装置及び半導体デバイスの製造方法 |
| JPH1195095A (ja) * | 1997-09-22 | 1999-04-09 | Nikon Corp | 投影光学系 |
| JPH11214293A (ja) * | 1998-01-22 | 1999-08-06 | Nikon Corp | 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法 |
| JP2000056219A (ja) * | 1998-08-11 | 2000-02-25 | Nikon Corp | 投影光学系 |
| JP2000066075A (ja) * | 1998-08-17 | 2000-03-03 | Nikon Corp | 光学系及びその製造方法、並びに前記光学系を備えた露光装置 |
| JP2000121933A (ja) * | 1998-10-13 | 2000-04-28 | Nikon Corp | 投影光学系及びそれを備えた露光装置並びにデバイス製造方法 |
-
1998
- 1998-11-30 DE DE19855108A patent/DE19855108A1/de not_active Withdrawn
-
1999
- 1999-09-14 KR KR1019990039313A patent/KR100671317B1/ko not_active Expired - Fee Related
- 1999-10-12 US US09/416,105 patent/US6349005B1/en not_active Expired - Lifetime
- 1999-10-23 EP EP99121205A patent/EP1006389A3/de not_active Ceased
- 1999-10-23 EP EP06003699A patent/EP1686405A1/de not_active Withdrawn
- 1999-11-09 JP JP11317966A patent/JP2000171706A/ja active Pending
- 1999-11-09 TW TW088119509A patent/TW480347B/zh not_active IP Right Cessation
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