TW480347B - Microlithographic reduction objective, projection exposure equipment and process - Google Patents

Microlithographic reduction objective, projection exposure equipment and process Download PDF

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Publication number
TW480347B
TW480347B TW088119509A TW88119509A TW480347B TW 480347 B TW480347 B TW 480347B TW 088119509 A TW088119509 A TW 088119509A TW 88119509 A TW88119509 A TW 88119509A TW 480347 B TW480347 B TW 480347B
Authority
TW
Taiwan
Prior art keywords
lens
projection
lenses
item
scope
Prior art date
Application number
TW088119509A
Other languages
English (en)
Chinese (zh)
Inventor
Karl-Heinz Schuster
Helmut Beierl
Gerhard Furter
Alois Herkommer
Gregor Klem
Original Assignee
Zeiss Stiftung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Stiftung filed Critical Zeiss Stiftung
Application granted granted Critical
Publication of TW480347B publication Critical patent/TW480347B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW088119509A 1998-11-30 1999-11-09 Microlithographic reduction objective, projection exposure equipment and process TW480347B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19855108A DE19855108A1 (de) 1998-11-30 1998-11-30 Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren

Publications (1)

Publication Number Publication Date
TW480347B true TW480347B (en) 2002-03-21

Family

ID=7889445

Family Applications (1)

Application Number Title Priority Date Filing Date
TW088119509A TW480347B (en) 1998-11-30 1999-11-09 Microlithographic reduction objective, projection exposure equipment and process

Country Status (6)

Country Link
US (1) US6349005B1 (enExample)
EP (2) EP1006389A3 (enExample)
JP (1) JP2000171706A (enExample)
KR (1) KR100671317B1 (enExample)
DE (1) DE19855108A1 (enExample)
TW (1) TW480347B (enExample)

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JP2002323652A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
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US7154676B2 (en) * 2002-03-01 2006-12-26 Carl Zeiss Smt A.G. Very-high aperture projection objective
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DE10221386A1 (de) 2002-05-14 2003-11-27 Zeiss Carl Smt Ag Projektionsbelichtungssystem
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
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US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101213831B1 (ko) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
CN100370313C (zh) * 2005-05-20 2008-02-20 清华大学 傅里叶变换光学系统及体全息存储傅里叶变换光学系统
US7952803B2 (en) 2006-05-15 2011-05-31 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102008001497A1 (de) 2007-05-07 2008-11-13 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Halbleiterlithographie und Subsystem einer Projektionsbelichtungsanlage
CN101587230B (zh) * 2009-04-09 2010-12-29 上海微电子装备有限公司 一种投影物镜
CN102486569B (zh) 2010-12-01 2014-06-18 上海微电子装备有限公司 一种投影物镜系统
CN102540416B (zh) * 2010-12-10 2014-09-17 上海微电子装备有限公司 大视场大工作距投影光刻物镜
CN102540415B (zh) * 2010-12-10 2014-06-18 上海微电子装备有限公司 一种投影光刻物镜
CN102981249B (zh) * 2012-09-21 2015-01-28 中国科学院光电技术研究所 一种投影光学系统
AU2015401762B2 (en) 2015-07-07 2019-03-14 Colgate-Palmolive Company Oral care implement and monofilament bristle for use with the same
CN109581622B (zh) * 2017-09-29 2020-12-04 上海微电子装备（集团）股份有限公司 一种投影物镜
CN115542675B (zh) * 2021-06-30 2025-08-12 上海微电子装备（集团）股份有限公司 投影光刻物镜及光刻机

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Also Published As

Publication number Publication date
EP1686405A1 (de) 2006-08-02
KR20000034926A (ko) 2000-06-26
JP2000171706A (ja) 2000-06-23
EP1006389A2 (de) 2000-06-07
EP1006389A3 (de) 2002-03-20
DE19855108A1 (de) 2000-05-31
KR100671317B1 (ko) 2007-01-18
US6349005B1 (en) 2002-02-19

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