JP2000171706A - マイクロリソグラフィ用縮小対物レンズ，投影露光装置及び投影露光方法 - Google Patents

マイクロリソグラフィ用縮小対物レンズ，投影露光装置及び投影露光方法

Info

Publication number
JP2000171706A
JP2000171706A JP11317966A JP31796699A JP2000171706A JP 2000171706 A JP2000171706 A JP 2000171706A JP 11317966 A JP11317966 A JP 11317966A JP 31796699 A JP31796699 A JP 31796699A JP 2000171706 A JP2000171706 A JP 2000171706A
Authority
JP
Japan
Prior art keywords
lens
lens group
projection objective
microlithography
refractive power
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11317966A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000171706A5 (enExample
Inventor
Karl-Heinz Schuster
カール−ハインツ・シュースター
Helmut Beierl
バイエル・ヘルムート
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Carl Zeiss AG
Original Assignee
Carl Zeiss SMT GmbH
Carl Zeiss AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH, Carl Zeiss AG filed Critical Carl Zeiss SMT GmbH
Publication of JP2000171706A publication Critical patent/JP2000171706A/ja
Publication of JP2000171706A5 publication Critical patent/JP2000171706A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP11317966A 1998-11-30 1999-11-09 マイクロリソグラフィ用縮小対物レンズ，投影露光装置及び投影露光方法 Pending JP2000171706A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19855108A DE19855108A1 (de) 1998-11-30 1998-11-30 Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren
DE19855108.8 1998-11-30

Publications (2)

Publication Number Publication Date
JP2000171706A true JP2000171706A (ja) 2000-06-23
JP2000171706A5 JP2000171706A5 (enExample) 2006-12-28

Family

ID=7889445

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11317966A Pending JP2000171706A (ja) 1998-11-30 1999-11-09 マイクロリソグラフィ用縮小対物レンズ，投影露光装置及び投影露光方法

Country Status (6)

Country Link
US (1) US6349005B1 (enExample)
EP (2) EP1006389A3 (enExample)
JP (1) JP2000171706A (enExample)
KR (1) KR100671317B1 (enExample)
DE (1) DE19855108A1 (enExample)
TW (1) TW480347B (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007311783A (ja) * 2006-05-15 2007-11-29 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
WO2012072004A1 (zh) * 2010-12-01 2012-06-07 上海微电子装备有限公司 一种投影物镜系统及使用该投影物镜系统的微光刻系统
KR101200654B1 (ko) 2003-12-15 2012-11-12 칼 짜이스 에스엠티 게엠베하 고 개구율 및 평평한 단부면을 가진 투사 대물렌즈
JP2020535482A (ja) * 2017-09-29 2020-12-03 シャンハイ マイクロ エレクトロニクス イクイプメント（グループ）カンパニー リミティド 投影対物レンズ

Families Citing this family (34)

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Publication number Priority date Publication date Assignee Title
JPH1195095A (ja) 1997-09-22 1999-04-09 Nikon Corp 投影光学系
US6700645B1 (en) 1998-01-22 2004-03-02 Nikon Corporation Projection optical system and exposure apparatus and method
US6635914B2 (en) * 2000-09-08 2003-10-21 Axon Technologies Corp. Microelectronic programmable device and methods of forming and programming the same
WO2001023933A1 (en) 1999-09-29 2001-04-05 Nikon Corporation Projection optical system
EP1139138A4 (en) 1999-09-29 2006-03-08 Nikon Corp PROJECTION EXPOSURE PROCESS, DEVICE AND OPTICAL PROJECTION SYSTEM
EP1094350A3 (en) * 1999-10-21 2001-08-16 Carl Zeiss Optical projection lens system
US6590715B2 (en) * 1999-12-21 2003-07-08 Carl-Zeiss-Stiftung Optical projection system
JP2001343582A (ja) * 2000-05-30 2001-12-14 Nikon Corp 投影光学系、当該投影光学系を備えた露光装置、及び当該露光装置を用いたマイクロデバイスの製造方法
JP3413160B2 (ja) * 2000-06-15 2003-06-03 キヤノン株式会社 照明装置及びそれを用いた走査型露光装置
DE10064685A1 (de) * 2000-12-22 2002-07-04 Zeiss Carl Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft
EP1344112A2 (de) * 2000-12-22 2003-09-17 Carl Zeiss SMT AG Projektionsobjektiv
JP2002244034A (ja) 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2002323652A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
JP2002323653A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，投影露光装置および投影露光方法
DE10138847A1 (de) * 2001-08-15 2003-02-27 Zeiss Carl Blende für eine Integratoreinheit
DE10143385C2 (de) * 2001-09-05 2003-07-17 Zeiss Carl Projektionsbelichtungsanlage
US7190527B2 (en) 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
JP2005519332A (ja) * 2002-03-01 2005-06-30 カール・ツアイス・エスエムテイ・アーゲー 屈折型投影対物レンズ
DE10229249A1 (de) 2002-03-01 2003-09-04 Zeiss Carl Semiconductor Mfg Refraktives Projektionsobjektiv mit einer Taille
EP1481286A2 (de) * 2002-03-01 2004-12-01 Carl Zeiss SMT AG Refraktives projektionsobjektiv mit einer taille
US7154676B2 (en) * 2002-03-01 2006-12-26 Carl Zeiss Smt A.G. Very-high aperture projection objective
DE10210899A1 (de) * 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refraktives Projektionsobjektiv für Immersions-Lithographie
DE10221386A1 (de) 2002-05-14 2003-11-27 Zeiss Carl Smt Ag Projektionsbelichtungssystem
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101213831B1 (ko) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
CN100370313C (zh) * 2005-05-20 2008-02-20 清华大学 傅里叶变换光学系统及体全息存储傅里叶变换光学系统
DE102008001497A1 (de) 2007-05-07 2008-11-13 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Halbleiterlithographie und Subsystem einer Projektionsbelichtungsanlage
CN101587230B (zh) * 2009-04-09 2010-12-29 上海微电子装备有限公司 一种投影物镜
CN102540416B (zh) * 2010-12-10 2014-09-17 上海微电子装备有限公司 大视场大工作距投影光刻物镜
CN102540415B (zh) * 2010-12-10 2014-06-18 上海微电子装备有限公司 一种投影光刻物镜
CN102981249B (zh) * 2012-09-21 2015-01-28 中国科学院光电技术研究所 一种投影光学系统
AU2015401762B2 (en) 2015-07-07 2019-03-14 Colgate-Palmolive Company Oral care implement and monofilament bristle for use with the same
CN115542675B (zh) * 2021-06-30 2025-08-12 上海微电子装备（集团）股份有限公司 投影光刻物镜及光刻机

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DE19818444A1 (de) * 1997-04-25 1998-10-29 Nikon Corp Abbildungsoptik, Projektionsoptikvorrichtung und Projektionsbelichtungsverfahren
JPH1195095A (ja) * 1997-09-22 1999-04-09 Nikon Corp 投影光学系
JPH1197344A (ja) * 1997-07-24 1999-04-09 Nikon Corp 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法
JPH11133301A (ja) * 1997-08-29 1999-05-21 Nikon Corp 投影光学系、露光装置及び半導体デバイスの製造方法
JPH11214293A (ja) * 1998-01-22 1999-08-06 Nikon Corp 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法
JP2000056219A (ja) * 1998-08-11 2000-02-25 Nikon Corp 投影光学系
JP2000066075A (ja) * 1998-08-17 2000-03-03 Nikon Corp 光学系及びその製造方法、並びに前記光学系を備えた露光装置
JP2000121933A (ja) * 1998-10-13 2000-04-28 Nikon Corp 投影光学系及びそれを備えた露光装置並びにデバイス製造方法

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DE19818444A1 (de) * 1997-04-25 1998-10-29 Nikon Corp Abbildungsoptik, Projektionsoptikvorrichtung und Projektionsbelichtungsverfahren
JPH1197344A (ja) * 1997-07-24 1999-04-09 Nikon Corp 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法
JPH11133301A (ja) * 1997-08-29 1999-05-21 Nikon Corp 投影光学系、露光装置及び半導体デバイスの製造方法
JPH1195095A (ja) * 1997-09-22 1999-04-09 Nikon Corp 投影光学系
JPH11214293A (ja) * 1998-01-22 1999-08-06 Nikon Corp 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法
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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101200654B1 (ko) 2003-12-15 2012-11-12 칼 짜이스 에스엠티 게엠베하 고 개구율 및 평평한 단부면을 가진 투사 대물렌즈
JP2007311783A (ja) * 2006-05-15 2007-11-29 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
US7952803B2 (en) 2006-05-15 2011-05-31 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2012072004A1 (zh) * 2010-12-01 2012-06-07 上海微电子装备有限公司 一种投影物镜系统及使用该投影物镜系统的微光刻系统
US8970964B2 (en) 2010-12-01 2015-03-03 Shanghai Micro Electronics Equipment Co., Ltd. Projection objective lens system
JP2020535482A (ja) * 2017-09-29 2020-12-03 シャンハイ マイクロ エレクトロニクス イクイプメント（グループ）カンパニー リミティド 投影対物レンズ

Also Published As

Publication number Publication date
TW480347B (en) 2002-03-21
EP1686405A1 (de) 2006-08-02
KR20000034926A (ko) 2000-06-26
EP1006389A2 (de) 2000-06-07
EP1006389A3 (de) 2002-03-20
DE19855108A1 (de) 2000-05-31
KR100671317B1 (ko) 2007-01-18
US6349005B1 (en) 2002-02-19

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