HK1205715A1 - 用於在透明材料內執行激光成絲的方法和設備 - Google Patents

用於在透明材料內執行激光成絲的方法和設備

Info

Publication number
HK1205715A1
HK1205715A1 HK15102226.5A HK15102226A HK1205715A1 HK 1205715 A1 HK1205715 A1 HK 1205715A1 HK 15102226 A HK15102226 A HK 15102226A HK 1205715 A1 HK1205715 A1 HK 1205715A1
Authority
HK
Hong Kong
Prior art keywords
transparent materials
performing laser
laser filamentation
filamentation
transparent
Prior art date
Application number
HK15102226.5A
Other languages
English (en)
Inventor
.侯賽尼
Original Assignee
羅芬-新納技術公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 羅芬-新納技術公司 filed Critical 羅芬-新納技術公司
Publication of HK1205715A1 publication Critical patent/HK1205715A1/zh

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0626Energy control of the laser beam
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/0006Working by laser beam, e.g. welding, cutting or boring taking account of the properties of the material involved
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/04Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • B23K26/0624Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1ns or less
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/0648Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • B23K26/082Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • B23K26/083Devices involving movement of the workpiece in at least one axial direction
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/50Working by transmitting the laser beam through or within the workpiece
    • B23K26/53Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/0222Scoring using a focussed radiation beam, e.g. laser
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/07Cutting armoured, multi-layered, coated or laminated, glass products
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/09Severing cooled glass by thermal shock
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C14/00Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
    • C03C14/002Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix the non-glass component being in the form of fibres, filaments, yarns, felts or woven material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/30Organic material
    • B23K2103/42Plastics
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/50Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/50Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • B23K2103/52Ceramics
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/50Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • B23K2103/54Glass
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/50Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • B23K2103/56Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26 semiconducting
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/033Apparatus for opening score lines in glass sheets
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/04Cutting or splitting in curves, especially for making spectacle lenses
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2214/00Nature of the non-vitreous component
    • C03C2214/02Fibres; Filaments; Yarns; Felts; Woven material
HK15102226.5A 2013-08-02 2015-03-05 用於在透明材料內執行激光成絲的方法和設備 HK1205715A1 (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201361861880P 2013-08-02 2013-08-02

Publications (1)

Publication Number Publication Date
HK1205715A1 true HK1205715A1 (zh) 2015-12-24

Family

ID=51265551

Family Applications (2)

Application Number Title Priority Date Filing Date
HK15102226.5A HK1205715A1 (zh) 2013-08-02 2015-03-05 用於在透明材料內執行激光成絲的方法和設備
HK15102225.6A HK1202094A1 (zh) 2013-08-02 2015-03-05 用於在透明材料內執行激光成絲的系統

Family Applications After (1)

Application Number Title Priority Date Filing Date
HK15102225.6A HK1202094A1 (zh) 2013-08-02 2015-03-05 用於在透明材料內執行激光成絲的系統

Country Status (10)

Country Link
US (3) US20150034613A1 (zh)
EP (3) EP2859983B1 (zh)
JP (4) JP2015030040A (zh)
KR (5) KR101753184B1 (zh)
CN (2) CN104339088B (zh)
CA (2) CA2857820C (zh)
HK (2) HK1205715A1 (zh)
MY (1) MY177289A (zh)
SG (2) SG10201404455QA (zh)
TW (3) TWI592244B (zh)

Families Citing this family (183)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014079478A1 (en) 2012-11-20 2014-05-30 Light In Light Srl High speed laser processing of transparent materials
EP2754524B1 (de) 2013-01-15 2015-11-25 Corning Laser Technologies GmbH Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie
EP2781296B1 (de) 2013-03-21 2020-10-21 Corning Laser Technologies GmbH Vorrichtung und verfahren zum ausschneiden von konturen aus flächigen substraten mittels laser
EP2964417B1 (de) * 2013-04-04 2022-01-12 LPKF Laser & Electronics AG Verfahren zum einbringen von durchbrechungen in ein substrat
EP2964416B1 (de) 2013-04-04 2023-07-19 LPKF Laser & Electronics SE Verfahren zum trennen eines substrates
IL227458A0 (en) * 2013-07-11 2013-12-31 Technion Res & Dev Foundation A method and cave for transmitting light
US9102011B2 (en) 2013-08-02 2015-08-11 Rofin-Sinar Technologies Inc. Method and apparatus for non-ablative, photoacoustic compression machining in transparent materials using filamentation by burst ultrafast laser pulses
US10017410B2 (en) 2013-10-25 2018-07-10 Rofin-Sinar Technologies Llc Method of fabricating a glass magnetic hard drive disk platter using filamentation by burst ultrafast laser pulses
US10252507B2 (en) 2013-11-19 2019-04-09 Rofin-Sinar Technologies Llc Method and apparatus for forward deposition of material onto a substrate using burst ultrafast laser pulse energy
US10005152B2 (en) 2013-11-19 2018-06-26 Rofin-Sinar Technologies Llc Method and apparatus for spiral cutting a glass tube using filamentation by burst ultrafast laser pulses
US11053156B2 (en) 2013-11-19 2021-07-06 Rofin-Sinar Technologies Llc Method of closed form release for brittle materials using burst ultrafast laser pulses
US9517929B2 (en) 2013-11-19 2016-12-13 Rofin-Sinar Technologies Inc. Method of fabricating electromechanical microchips with a burst ultrafast laser pulses
US10144088B2 (en) 2013-12-03 2018-12-04 Rofin-Sinar Technologies Llc Method and apparatus for laser processing of silicon by filamentation of burst ultrafast laser pulses
US20150166393A1 (en) * 2013-12-17 2015-06-18 Corning Incorporated Laser cutting of ion-exchangeable glass substrates
US11556039B2 (en) 2013-12-17 2023-01-17 Corning Incorporated Electrochromic coated glass articles and methods for laser processing the same
US9701563B2 (en) 2013-12-17 2017-07-11 Corning Incorporated Laser cut composite glass article and method of cutting
US20150165560A1 (en) 2013-12-17 2015-06-18 Corning Incorporated Laser processing of slots and holes
US9687936B2 (en) * 2013-12-17 2017-06-27 Corning Incorporated Transparent material cutting with ultrafast laser and beam optics
US9815730B2 (en) 2013-12-17 2017-11-14 Corning Incorporated Processing 3D shaped transparent brittle substrate
US9850160B2 (en) 2013-12-17 2017-12-26 Corning Incorporated Laser cutting of display glass compositions
US10442719B2 (en) 2013-12-17 2019-10-15 Corning Incorporated Edge chamfering methods
US10293436B2 (en) 2013-12-17 2019-05-21 Corning Incorporated Method for rapid laser drilling of holes in glass and products made therefrom
JP6588911B2 (ja) * 2013-12-17 2019-10-09 コーニング インコーポレイテッド ガラスの3d形成
US9676167B2 (en) 2013-12-17 2017-06-13 Corning Incorporated Laser processing of sapphire substrate and related applications
US10189117B2 (en) 2013-12-31 2019-01-29 The United States Of America, As Represented By The Secretary Of The Navy Adhesion improvement via material nanostructuring or texturizing
US10106880B2 (en) 2013-12-31 2018-10-23 The United States Of America, As Represented By The Secretary Of The Navy Modifying the surface chemistry of a material
JP6785658B2 (ja) * 2014-03-04 2020-11-18 サン−ゴバン グラス フランスSaint−Gobain Glass France 積層された極薄ガラス層を切断する方法
JP6262039B2 (ja) 2014-03-17 2018-01-17 株式会社ディスコ 板状物の加工方法
US10369663B1 (en) * 2014-05-30 2019-08-06 Gentex Corporation Laser process with controlled polarization
JP6301203B2 (ja) * 2014-06-02 2018-03-28 株式会社ディスコ チップの製造方法
RU2661977C1 (ru) * 2014-07-03 2018-07-23 Ниппон Стил Энд Сумитомо Метал Корпорейшн Устройство лазерной обработки
KR102445217B1 (ko) 2014-07-08 2022-09-20 코닝 인코포레이티드 재료를 레이저 가공하는 방법 및 장치
US10335902B2 (en) 2014-07-14 2019-07-02 Corning Incorporated Method and system for arresting crack propagation
EP3552753A3 (en) * 2014-07-14 2019-12-11 Corning Incorporated System for and method of processing transparent materials using laser beam focal lines adjustable in length and diameter
EP3169635B1 (en) 2014-07-14 2022-11-23 Corning Incorporated Method and system for forming perforations
US10526234B2 (en) 2014-07-14 2020-01-07 Corning Incorporated Interface block; system for and method of cutting a substrate being transparent within a range of wavelengths using such interface block
US9873628B1 (en) 2014-12-02 2018-01-23 Coherent Kaiserslautern GmbH Filamentary cutting of brittle materials using a picosecond pulsed laser
US10047001B2 (en) 2014-12-04 2018-08-14 Corning Incorporated Glass cutting systems and methods using non-diffracting laser beams
TWI558044B (zh) * 2014-12-09 2016-11-11 國立清華大學 連續光譜產生裝置及其組裝方法
EP3708548A1 (en) 2015-01-12 2020-09-16 Corning Incorporated Laser cutting of thermally tempered substrates using the multiphoton absorption method
JP6734202B2 (ja) 2015-01-13 2020-08-05 ロフィン−シナール テクノロジーズ エルエルシー 脆性材料をスクライブして化学エッチングする方法およびシステム
CN107922237B (zh) * 2015-03-24 2022-04-01 康宁股份有限公司 显示器玻璃组合物的激光切割和加工
CN107666983B (zh) 2015-03-27 2020-10-02 康宁股份有限公司 可透气窗及其制造方法
JP6654813B2 (ja) 2015-06-02 2020-02-26 川崎重工業株式会社 面取り加工装置および面取り加工方法
US10384306B1 (en) 2015-06-10 2019-08-20 Seagate Technology Llc Laser cutting array with multiple laser source arrangement
US20160368086A1 (en) * 2015-06-16 2016-12-22 Electro Scientific Industries, Inc. Methods and apparatus for processing transparent materials
EP3109208A1 (de) 2015-06-22 2016-12-28 Flabeg France SAS Verfahren zum vereinzeln eines glassubstrats
DE102015110422A1 (de) * 2015-06-29 2016-12-29 Schott Ag Laserbearbeitung eines mehrphasigen transparenten Materials, sowie mehrphasiger Kompositwerkstoff
US11307475B2 (en) * 2015-07-10 2022-04-19 View, Inc. Bird friendly electrochromic devices
JP7082042B2 (ja) * 2015-07-10 2022-06-07 コーニング インコーポレイテッド 可撓性基体シートに孔を連続形成する方法およびそれに関する製品
DE102015111491A1 (de) * 2015-07-15 2017-01-19 Schott Ag Verfahren und Vorrichtung zum Abtrennen von Glas- oder Glaskeramikteilen
DE102015111490A1 (de) 2015-07-15 2017-01-19 Schott Ag Verfahren und Vorrichtung zum lasergestützten Abtrennen eines Teilstücks von einem flächigen Glaselement
KR102077667B1 (ko) * 2015-08-10 2020-02-14 쌩-고벵 글래스 프랑스 박형 유리 층의 절단 방법
EP3145036B1 (en) 2015-09-17 2020-03-18 Academia Sinica Supercontinuum generation apparatus and method
DE102015116846A1 (de) * 2015-10-05 2017-04-06 Schott Ag Verfahren zum Filamentieren eines Werkstückes mit einer von der Sollkontur abweichenden Form sowie durch Filamentation erzeugtes Werkstück
JP6529414B2 (ja) * 2015-10-15 2019-06-12 株式会社ディスコ ウエーハの加工方法
JP6757491B2 (ja) * 2015-10-20 2020-09-23 日本電気硝子株式会社 管ガラスの切断方法及び切断装置、並びに管ガラス製品の製造方法
DE102015120950B4 (de) 2015-12-02 2022-03-03 Schott Ag Verfahren zum lasergestützten Ablösen eines Teilstücks von einem flächigen Glas- oder Glaskeramikelement, flächiges zumindest teilweise keramisiertes Glaselement oder Glaskeramikelement und Kochfläche umfassend ein flächiges Glas- oder Glaskeramikelement
DE102015225929B4 (de) * 2015-12-18 2018-01-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Überprüfung eines Trennschrittes bei der Zerteilung eines flachen Werkstückes in Teilstücke
WO2017108950A1 (de) * 2015-12-22 2017-06-29 Heraeus Deutschland Gmbh Verfahren zur herstellung eines metall-keramik substrates mit picolaser
US20170189992A1 (en) * 2015-12-31 2017-07-06 Nlight, Inc. Black sub-anodized marking using picosecond bursts
CN107030390A (zh) * 2016-02-04 2017-08-11 苏州沃特维自动化系统有限公司 一种太阳能电池片切割装置
DE102016102768A1 (de) * 2016-02-17 2017-08-17 Schott Ag Verfahren zur Kantenbearbeitung von Glaselementen und verfahrensgemäß bearbeitetes Glaselement
CN109311725B (zh) * 2016-05-06 2022-04-26 康宁股份有限公司 从透明基材激光切割及移除轮廓形状
JP6755705B2 (ja) * 2016-05-09 2020-09-16 株式会社ディスコ レーザー加工装置
JP6755707B2 (ja) * 2016-05-12 2020-09-16 株式会社ディスコ レーザー加工装置
JP6770340B2 (ja) * 2016-05-30 2020-10-14 株式会社ディスコ ウエーハの生成方法
US10410883B2 (en) 2016-06-01 2019-09-10 Corning Incorporated Articles and methods of forming vias in substrates
JP6705014B2 (ja) * 2016-06-08 2020-06-03 ハンズ レーザー テクノロジー インダストリー グループ カンパニー リミテッド サファイアを切断するための方法及び装置
KR102548461B1 (ko) 2016-06-10 2023-06-28 삼성디스플레이 주식회사 표시장치 및 이의 제조방법
JP2019527466A (ja) * 2016-06-14 2019-09-26 エバナ テクノロジーズ ユーエービー 多分割レンズ及びウェハをダイシングまたは切断するためのレーザー加工システム
US10794679B2 (en) 2016-06-29 2020-10-06 Corning Incorporated Method and system for measuring geometric parameters of through holes
WO2018022476A1 (en) 2016-07-29 2018-02-01 Corning Incorporated Apparatuses and methods for laser processing
KR102423775B1 (ko) 2016-08-30 2022-07-22 코닝 인코포레이티드 투명 재료의 레이저 가공
TWI583982B (zh) * 2016-09-26 2017-05-21 峰安車業股份有限公司 位移量測裝置及加工系統
JP6775822B2 (ja) * 2016-09-28 2020-10-28 三星ダイヤモンド工業株式会社 脆性材料基板の分断方法並びに分断装置
JP6944703B2 (ja) * 2016-09-28 2021-10-06 三星ダイヤモンド工業株式会社 脆性材料基板の改質層形成方法
CN109803786B (zh) 2016-09-30 2021-05-07 康宁股份有限公司 使用非轴对称束斑对透明工件进行激光加工的设备和方法
EP3529214B1 (en) * 2016-10-24 2020-12-23 Corning Incorporated Substrate processing station for laser-based machining of sheet-like glass substrates
US10752534B2 (en) 2016-11-01 2020-08-25 Corning Incorporated Apparatuses and methods for laser processing laminate workpiece stacks
US20180118602A1 (en) * 2016-11-01 2018-05-03 Corning Incorporated Glass sheet transfer apparatuses for laser-based machining of sheet-like glass substrates
US10668561B2 (en) 2016-11-15 2020-06-02 Coherent, Inc. Laser apparatus for cutting brittle material
CN108122807A (zh) * 2016-11-30 2018-06-05 北大方正集团有限公司 一种晶圆承载盒、晶圆激光打标系统及方法
US10688599B2 (en) 2017-02-09 2020-06-23 Corning Incorporated Apparatus and methods for laser processing transparent workpieces using phase shifted focal lines
US11478880B2 (en) * 2017-03-06 2022-10-25 Lpkf Laser & Electronics Ag Method for producing at least one recess in a material by means of electromagnetic radiation and subsequent etching process
US20180257170A1 (en) 2017-03-13 2018-09-13 Coherent Lasersystems Gmbh & Co. Kg Controlled separation of laser processed brittle material
US10962857B2 (en) 2017-04-12 2021-03-30 Saint-Gobain Glass France Electrochromic structure and method of separating electrochromic structure
US20200164469A1 (en) * 2017-05-15 2020-05-28 The Trustees Of The University Of Pennsylvania Systems and methods for laser cleaving diamonds
US10580725B2 (en) 2017-05-25 2020-03-03 Corning Incorporated Articles having vias with geometry attributes and methods for fabricating the same
US11078112B2 (en) 2017-05-25 2021-08-03 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
US10626040B2 (en) 2017-06-15 2020-04-21 Corning Incorporated Articles capable of individual singulation
DE102018005010A1 (de) * 2017-07-13 2019-01-17 Wika Alexander Wiegand Se & Co. Kg Transfer und Aufschmelzen von Schichten
JP6923158B2 (ja) * 2017-07-27 2021-08-18 三菱重工業株式会社 レーザービーム照射装置及びレーザービーム照射システム
CN107402151B (zh) * 2017-07-31 2020-06-05 水利部交通运输部国家能源局南京水利科学研究院 一种超声激励控制脆性材料表面及贯穿裂纹尺寸的方法
CN110519590B (zh) * 2017-08-08 2020-11-06 广东弘景光电科技股份有限公司 摄像头模组的检测方法及系统
CO2017012225A1 (es) 2017-08-23 2018-02-20 Agp America Sa Blindaje transparente multi impacto
US20190067049A1 (en) * 2017-08-23 2019-02-28 Asm Technology Singapore Pte Ltd Radiative wafer cutting using selective focusing depths
EP3672755A1 (en) * 2017-08-25 2020-07-01 Corning Incorporated Apparatus and method for laser processing transparent workpieces using an afocal beam adjustment assembly
EP3460520B1 (en) 2017-09-25 2023-07-19 Hexagon Technology Center GmbH Multi-beam laser scanner
JP6893691B2 (ja) * 2017-09-29 2021-06-23 三星ダイヤモンド工業株式会社 複層脆性材料基板の作製方法および作製システム
KR101870137B1 (ko) 2017-10-25 2018-07-19 영원산업개발 주식회사 친환경 식생토낭을 이용한 사면보강 및 녹화공법
KR102587002B1 (ko) 2017-11-15 2023-10-10 삼성디스플레이 주식회사 표시 장치 및 표시 장치의 제조 방법
JP6925745B2 (ja) * 2017-11-30 2021-08-25 株式会社ディスコ ウェーハのレーザー加工方法
JP6925945B2 (ja) * 2017-11-30 2021-08-25 株式会社ディスコ ウエーハの加工方法
TWI699252B (zh) * 2018-01-02 2020-07-21 財團法人工業技術研究院 出光方法及出光裝置
US10705327B2 (en) 2018-01-02 2020-07-07 Industrial Technology Research Institute Light emitting method and light emitting device
DE102018200029A1 (de) * 2018-01-03 2019-07-04 Trumpf Laser- Und Systemtechnik Gmbh Verfahren und Laserbearbeitungsmaschine zur Oberflächenstrukturierung lasertransparenter Werkstücke
RU2691806C1 (ru) * 2018-01-09 2019-06-18 Александр Андреевич Никитин Устройство для лазерной обработки изделий
RU2685288C1 (ru) * 2018-01-09 2019-04-17 Александр Андреевич Никитин Устройство для лазерной обработки изделий
DE102018100443A1 (de) 2018-01-10 2019-07-11 Schott Ag Verfahren und Vorrichtung zur Herstellung von Glasvorprodukten und von Glasprodukten
WO2019151185A1 (ja) * 2018-01-31 2019-08-08 Hoya株式会社 磁気ディスク用ガラス基板の製造方法
US11554984B2 (en) 2018-02-22 2023-01-17 Corning Incorporated Alkali-free borosilicate glasses with low post-HF etch roughness
US20190263709A1 (en) * 2018-02-26 2019-08-29 Corning Incorporated Methods for laser forming transparent articles from a transparent mother sheet and processing the transparent articles in-situ
EP3537100B1 (en) * 2018-03-01 2020-08-05 Mitutoyo Corporation Methods and apparatuses for refractive index measurement of transparent tube
EP3768461A1 (en) 2018-03-19 2021-01-27 Medtronic, Inc. Surface texturing using energy pulses
CN108549160A (zh) * 2018-04-20 2018-09-18 北京工业大学 一种连续调整激光成丝长度的装置及方法
US11524366B2 (en) 2018-07-26 2022-12-13 Coherent Munich GmbH & Co. KG Separation and release of laser-processed brittle material
US11167375B2 (en) 2018-08-10 2021-11-09 The Research Foundation For The State University Of New York Additive manufacturing processes and additively manufactured products
US20200061750A1 (en) 2018-08-22 2020-02-27 Coherent Munich GmbH & Co. KG Mitigating low surface quality
JP6740299B2 (ja) * 2018-08-24 2020-08-12 ファナック株式会社 加工条件調整装置及び機械学習装置
DE102018216440A1 (de) * 2018-09-26 2020-03-26 Flabeg Deutschland Gmbh Verfahren zum Schneiden eines laminierten Verbundelements, insbesondere eines Verbundglaselements, und Schneidsystem
DE102018216873A1 (de) * 2018-10-01 2020-04-02 Trumpf Werkzeugmaschinen Gmbh + Co. Kg Verfahren und Vorrichtung zur Bearbeitung eines Werkstücks
EP3867003A1 (en) 2018-11-16 2021-08-25 University of Rochester Scalable manufacturing with laser induced refractive index change
CN109270764B (zh) * 2018-11-26 2021-01-19 西安交通大学 基于反馈迭代波前整形技术飞秒激光成丝调控装置与方法
CN109373243B (zh) * 2018-11-28 2023-11-14 江苏集萃有机光电技术研究所有限公司 一种oled灯片和灯具
KR102631826B1 (ko) * 2018-12-18 2024-01-30 니프로 가부시키가이샤 의료용 글라스 제품 절단을 위한 절단 부위의 데미징 가공 장치 및 방법
CN109631948B (zh) * 2018-12-29 2022-06-24 中国电子科技集团公司第四十一研究所 一种用于全站仪校准的光纤传递装置及方法
CN109693032A (zh) * 2019-02-27 2019-04-30 大族激光科技产业集团股份有限公司 激光切割方法和装置
KR20200111421A (ko) 2019-03-19 2020-09-29 삼성전자주식회사 레이저 장치 및 이를 이용한 기판 다이싱 장치 및 방법
EP3712717A1 (fr) 2019-03-19 2020-09-23 Comadur S.A. Methode pour marquer une glace de montre en saphir
JP7287084B2 (ja) 2019-04-17 2023-06-06 セイコーエプソン株式会社 電気光学装置の製造方法、および有機エレクトロルミネッセンス装置の製造方法
JP7330771B2 (ja) * 2019-06-14 2023-08-22 株式会社ディスコ ウエーハの生成方法およびウエーハの生成装置
EP3908423A4 (en) * 2019-06-20 2022-08-24 Yangtze Memory Technologies Co., Ltd. SYSTEMS AND METHODS FOR LASER CUTTING OF CONNECTED STRUCTURES
KR20220025060A (ko) * 2019-07-01 2022-03-03 코닝 인코포레이티드 곡선형 준-비-회절 레이저 빔을 사용하여 투명 가공물을 레이저 가공하는 방법
US20210035767A1 (en) * 2019-07-29 2021-02-04 Applied Materials, Inc. Methods for repairing a recess of a chamber component
CN110426306B (zh) * 2019-08-31 2024-03-26 山东省计量科学研究院 室内加热器玻璃面板耐受热冲击试验装置
CN110539085A (zh) * 2019-09-11 2019-12-06 华东师范大学重庆研究院 一种飞秒光丝隐切方法及装置
WO2021047773A1 (en) * 2019-09-11 2021-03-18 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Aperture for electromagnetic radiation, method for aligning an aperture, system for applying electromagnetic radiation onto a source material and dispersing element
DE102019125124A1 (de) * 2019-09-18 2021-03-18 Rogers Germany Gmbh Verfahren zum Bearbeiten eines Metall-Keramik-Substrats, Anlage für ein solches Verfahren und Metall-Keramik-Substrate hergestellt mit einem solchen Verfahren
CN110550873A (zh) * 2019-09-20 2019-12-10 中国建筑材料科学研究总院有限公司 一种镀膜夹层玻璃内标识的制备方法
CN110788500B (zh) * 2019-10-28 2022-02-01 北京航天控制仪器研究所 一种硬脆材料复杂构件飞秒激光精密成型加工系统
CN110837215B (zh) * 2019-11-05 2021-02-26 中国科学院光电技术研究所 一种可实现长焦深小焦斑结构的高效率激光直写光刻方法
CN112775539A (zh) * 2019-11-07 2021-05-11 大族激光科技产业集团股份有限公司 激光加工方法及装置
CN110773871B (zh) * 2019-11-08 2021-10-12 合肥工业大学 一种在空速管的非平表面上制备防结冰表面的制备方法
WO2021100477A1 (ja) * 2019-11-21 2021-05-27 Agc株式会社 ガラス板の加工方法、ガラス板
US11383430B2 (en) 2019-11-21 2022-07-12 Arevo, Inc. Heating system for fiber-reinforced thermoplastic feedstock and workpiece
US11383431B2 (en) 2019-11-21 2022-07-12 Arevo, Inc. Heating system for fiber-reinforced thermoplastic feedstock and workpiece
US11390024B2 (en) 2019-11-21 2022-07-19 Arevo, Inc. Heating system for fiber-reinforced thermoplastic feedstock and workpiece
US11312068B2 (en) 2019-11-21 2022-04-26 Arevo, Inc. Heating system for fiber-reinforced thermoplastic feedstock and workpiece
DE102019219462A1 (de) * 2019-12-12 2021-06-17 Flabeg Deutschland Gmbh Verfahren zum Schneiden eines Glaselements und Schneidsystem
KR20210080718A (ko) 2019-12-20 2021-07-01 삼성전자주식회사 반도체 패키지
JP7436212B2 (ja) 2020-01-06 2024-02-21 株式会社ディスコ ウエーハ加工方法、及びウエーハ加工装置
CN113210879A (zh) * 2020-01-17 2021-08-06 大族激光科技产业集团股份有限公司 屏幕倒角加工方法
JP7421951B2 (ja) 2020-02-26 2024-01-25 浜松ホトニクス株式会社 レーザ加工装置及びレーザ加工方法
KR20210113501A (ko) 2020-03-06 2021-09-16 삼성디스플레이 주식회사 표시 장치 및 이의 제조 방법
US20210283719A1 (en) * 2020-03-12 2021-09-16 Rohr, Inc. Substrate perforation system & method using beamlets
KR20210141870A (ko) 2020-05-14 2021-11-23 삼성전자주식회사 웨이퍼 처리 장치 및 이를 이용한 반도체 소자 제조 방법
KR20230020498A (ko) * 2020-06-04 2023-02-10 코닝 인코포레이티드 수정된 펄스 버스트 프로파일을 사용하여 투명 작업편을 레이저 처리하는 방법
CN111822886B (zh) * 2020-06-11 2022-11-22 华东师范大学重庆研究院 一种微流控芯片微通道的多焦点超快激光制备装置及方法
US20220081342A1 (en) * 2020-09-11 2022-03-17 Corning Incorporated Laser forming non-square edges in transparent workpieces using low intensity airy beams
JP7170694B2 (ja) * 2020-09-11 2022-11-14 ソフトバンク株式会社 顧客管理装置、通信システム、プログラム及び通信用表示名の管理方法
DE102020126231A1 (de) 2020-10-07 2022-04-07 Trumpf Werkzeugmaschinen Gmbh + Co. Kg Verfahren und Maschine zum Schneiden und Entnehmen von Werkstückteilen aus einem plattenförmigen Material
CN112404705A (zh) * 2020-10-30 2021-02-26 山东师范大学 一种飞秒激光微纳加工装置及其使用方法与应用
DE102020132700A1 (de) 2020-12-08 2022-06-09 Trumpf Laser- Und Systemtechnik Gmbh Hochenergieglasschneiden
DE102020134198A1 (de) 2020-12-18 2022-06-23 Trumpf Laser- Und Systemtechnik Gmbh Vorrichtung und Verfahren zum Trennen eines Materials
DE102020134197A1 (de) * 2020-12-18 2022-06-23 Trumpf Laser- Und Systemtechnik Gmbh Vorrichtung und Verfahren zum Trennen eines Materials
CN112798574A (zh) * 2020-12-19 2021-05-14 北京工业大学 一种超快激光成丝对大气组分的远程实时探测系统
CN112589286B (zh) * 2020-12-21 2022-05-27 天津长荣科技集团股份有限公司 一种快速添加激光模板的方法及装置
CN112723733B (zh) * 2020-12-22 2022-12-02 武汉锐科光纤激光技术股份有限公司 用于玻璃管切割的激光切割装置
CN112775569A (zh) * 2020-12-24 2021-05-11 苏州禾弘电子科技有限公司 一种电路板的激光钻孔方法
WO2022141233A1 (zh) * 2020-12-30 2022-07-07 泉州三安半导体科技有限公司 一种半导体发光元件及其制备方法
DE102021100675B4 (de) * 2021-01-14 2022-08-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Verfahren zum Zerteilen eines transparenten Werkstücks
DE102021101598A1 (de) 2021-01-26 2022-07-28 Trumpf Laser- Und Systemtechnik Gmbh Vorrichtung und Verfahren zum Laserbearbeiten eines Werkstücks
US20220267200A1 (en) * 2021-02-19 2022-08-25 Incom, Inc. Glass structures and fabrication methods using laser induced deep etching
CN113146051B (zh) * 2021-04-23 2022-05-13 吉林大学 一种高灵活性的非晶合金表面大面积微结构制备方法
US20220399394A1 (en) * 2021-06-11 2022-12-15 Raytheon Company Thin film obscurant for microelectronics
NL2029054B1 (en) * 2021-07-28 2023-02-02 Corning Inc Phase modified quasi-non-diffracting laser beams for simultaneous high angle laser processing of transparent workpieces
WO2023009331A1 (en) * 2021-07-28 2023-02-02 Corning Incorporated Phase modified quasi-non-diffracting laser beams for simultaneous high angle laser processing of transparent workpieces
CN113732511B (zh) * 2021-08-30 2023-01-06 中国科学院西安光学精密机械研究所 光纤表面包层微纳结构飞秒激光加工方法及装置
CA3228513A1 (en) * 2021-10-15 2023-04-20 David Jung Dynamic laser pulse control
WO2023166583A1 (ja) * 2022-03-02 2023-09-07 ギガフォトン株式会社 レーザ装置、スペクトル線幅の計測方法、及び電子デバイスの製造方法
CN116237654B (zh) * 2023-02-22 2023-07-21 武汉荣科激光自动化设备有限公司 一种激光加工设备的智能控制方法
CN116674108A (zh) * 2023-07-07 2023-09-01 安徽华晟新材料有限公司 一种晶棒切割中出现断线处理的方法

Family Cites Families (63)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58151085A (ja) * 1982-03-03 1983-09-08 Toshiba Corp 半導体レ−ザ装置の製造法
US5107510A (en) 1989-09-29 1992-04-21 Seguin Herb J J Apparatus and method for burst-mode operation of a pulsed laser
US5291008A (en) * 1992-01-10 1994-03-01 Welch Allyn, Inc. Optical assembly and apparatus employing same using an aspherical lens and an aperture stop
JP2724993B2 (ja) 1995-08-31 1998-03-09 株式会社小松製作所 レーザ加工装置およびレーザ装置
US6154593A (en) 1996-03-18 2000-11-28 Japan Science & Technology Corp Optical device and formation of optical waveguide using light-induced effect on refractive index
JP4396953B2 (ja) * 1998-08-26 2010-01-13 三星電子株式会社 レーザ切断装置および切断方法
CA2332154C (en) 2000-01-25 2009-09-15 Peter R. Herman Burst-ultrafast laser machining method
US6552301B2 (en) 2000-01-25 2003-04-22 Peter R. Herman Burst-ultrafast laser machining method
US7253032B2 (en) * 2001-04-20 2007-08-07 Semiconductor Energy Laboratory Co., Ltd. Method of flattening a crystallized semiconductor film surface by using a plate
SG108262A1 (en) 2001-07-06 2005-01-28 Inst Data Storage Method and apparatus for cutting a multi-layer substrate by dual laser irradiation
ATE362653T1 (de) * 2002-03-12 2007-06-15 Hamamatsu Photonics Kk Methode zur trennung von substraten
JP4606741B2 (ja) * 2002-03-12 2011-01-05 浜松ホトニクス株式会社 加工対象物切断方法
DE10213044B3 (de) * 2002-03-22 2004-01-29 Freie Universität Berlin, Körperschaft des öffentlichen Rechts Verfahren zur Materialbearbeitung und/oder Materialanalyse mit Lasern
US20040017428A1 (en) 2002-07-25 2004-01-29 John Cronin Method of using a sacrificial layer to create smooth exit holes using a laser drilling system
US7168935B1 (en) * 2002-08-02 2007-01-30 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Solid freeform fabrication apparatus and methods
GB0302590D0 (en) 2003-02-05 2003-03-12 Koninkl Philips Electronics Nv Communications systems and methods
JP4357944B2 (ja) * 2003-12-05 2009-11-04 トヨタ自動車株式会社 固体レーザ加工装置およびレーザ溶接方法
JP4418282B2 (ja) * 2004-03-31 2010-02-17 株式会社レーザーシステム レーザ加工方法
US7486705B2 (en) * 2004-03-31 2009-02-03 Imra America, Inc. Femtosecond laser processing system with process parameters, controls and feedback
US7303977B2 (en) 2004-11-10 2007-12-04 Intel Corporation Laser micromachining method
JP4781661B2 (ja) * 2004-11-12 2011-09-28 浜松ホトニクス株式会社 レーザ加工方法
US20060207976A1 (en) 2005-01-21 2006-09-21 Bovatsek James M Laser material micromachining with green femtosecond pulses
US20070031056A1 (en) * 2005-08-02 2007-02-08 Perz Cynthia B System for and method of focusing in automated microscope systems
DE102005039833A1 (de) 2005-08-22 2007-03-01 Rowiak Gmbh Vorrichtung und Verfahren zur Materialtrennung mit Laserpulsen
US9138913B2 (en) * 2005-09-08 2015-09-22 Imra America, Inc. Transparent material processing with an ultrashort pulse laser
DE102006042280A1 (de) 2005-09-08 2007-06-06 IMRA America, Inc., Ann Arbor Bearbeitung von transparentem Material mit einem Ultrakurzpuls-Laser
US7838331B2 (en) * 2005-11-16 2010-11-23 Denso Corporation Method for dicing semiconductor substrate
US20070117287A1 (en) * 2005-11-23 2007-05-24 Semiconductor Energy Laboratory Co., Ltd. Laser irradiation apparatus
WO2007067999A2 (en) * 2005-12-09 2007-06-14 Amnis Corporation Extended depth of field imaging for high speed object analysis
WO2007087354A2 (en) * 2006-01-24 2007-08-02 Baer Stephen C Cleaving wafers from silicon crystals
US20070298529A1 (en) 2006-05-31 2007-12-27 Toyoda Gosei, Co., Ltd. Semiconductor light-emitting device and method for separating semiconductor light-emitting devices
JP5221007B2 (ja) * 2006-05-31 2013-06-26 アイシン精機株式会社 発光ダイオードチップ及びウェハ分割加工方法
JP5784273B2 (ja) * 2007-04-05 2015-09-24 チャーム エンジニアリング株式会社 レーザ加工方法及び切断方法並びに多層基板を有する構造体の分割方法
JP5162163B2 (ja) * 2007-06-27 2013-03-13 株式会社ディスコ ウェーハのレーザ加工方法
KR100876502B1 (ko) * 2007-09-21 2008-12-31 한국정보통신대학교 산학협력단 초단파 레이저 빔을 이용한 기판 절단장치 및 그 절단방법
US20090190108A1 (en) * 2008-01-30 2009-07-30 Toshiba America Electronic Components, Inc. Method and system for leveling topography of semiconductor chip surface
CN102318451B (zh) 2008-12-13 2013-11-06 万佳雷射有限公司 用于激光加工相对窄和相对宽的结构的方法和设备
WO2010116917A1 (ja) * 2009-04-07 2010-10-14 浜松ホトニクス株式会社 レーザ加工装置及びレーザ加工方法
US20100279067A1 (en) * 2009-04-30 2010-11-04 Robert Sabia Glass sheet having enhanced edge strength
JP2011000631A (ja) * 2009-06-22 2011-01-06 Seiko Epson Corp レーザー加工方法およびレーザー加工装置
US20120234807A1 (en) * 2009-12-07 2012-09-20 J.P. Sercel Associates Inc. Laser scribing with extended depth affectation into a workplace
US8450638B2 (en) * 2010-01-28 2013-05-28 Seishin Trading Co., Ltd. Laser scribing method and apparatus
JP2011187479A (ja) * 2010-03-04 2011-09-22 Disco Corp ウエーハの加工方法
JP5528904B2 (ja) * 2010-05-20 2014-06-25 株式会社ディスコ サファイアウェーハの分割方法
JP2011248241A (ja) * 2010-05-28 2011-12-08 Disco Abrasive Syst Ltd 板状物の加工方法及びレーザー加工装置
CA2805003C (en) 2010-07-12 2017-05-30 S. Abbas Hosseini Method of material processing by laser filamentation
EP2599576B1 (en) * 2010-07-26 2019-12-11 Hamamatsu Photonics K.K. Laser processing method
JP5770446B2 (ja) * 2010-09-30 2015-08-26 株式会社ディスコ 分割方法
US8933367B2 (en) 2011-02-09 2015-01-13 Sumitomo Electric Industries, Ltd. Laser processing method
WO2012108054A1 (ja) 2011-02-10 2012-08-16 信越ポリマー株式会社 単結晶基板の製造方法および内部改質層形成単結晶部材の製造方法
JP5789802B2 (ja) * 2011-03-22 2015-10-07 株式会社ソシオネクスト 半導体チップの製造方法
KR101285717B1 (ko) * 2011-05-12 2013-07-12 한국기계연구원 극초단 펄스 레이저를 응용한 고종횡비 미세 형상 가공 장치
JP2012240107A (ja) * 2011-05-23 2012-12-10 Hamamatsu Photonics Kk レーザ加工方法
WO2013065450A1 (ja) 2011-11-04 2013-05-10 株式会社フジクラ 微細孔を備えた基板の製造方法
JP6039217B2 (ja) * 2011-11-18 2016-12-07 浜松ホトニクス株式会社 レーザ加工方法
JP5980504B2 (ja) * 2011-12-27 2016-08-31 株式会社ディスコ ウエーハの加工方法およびレーザー加工装置
JP2013133259A (ja) * 2011-12-27 2013-07-08 Fujikura Ltd 微細孔を備えた基板及び該基板の製造方法
JP2013136071A (ja) * 2011-12-28 2013-07-11 Mitsuboshi Diamond Industrial Co Ltd 被加工物の分断方法および光学素子パターン付き基板の分断方法
JP5727433B2 (ja) * 2012-09-04 2015-06-03 イムラ アメリカ インコーポレイテッド 超短パルスレーザでの透明材料処理
JP2013031880A (ja) * 2012-09-12 2013-02-14 Hamamatsu Photonics Kk レーザ加工装置およびレーザ加工方法
EP2754524B1 (de) * 2013-01-15 2015-11-25 Corning Laser Technologies GmbH Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie
EP2964416B1 (de) * 2013-04-04 2023-07-19 LPKF Laser & Electronics SE Verfahren zum trennen eines substrates
DE102020132700A1 (de) * 2020-12-08 2022-06-09 Trumpf Laser- Und Systemtechnik Gmbh Hochenergieglasschneiden

Also Published As

Publication number Publication date
KR20180070533A (ko) 2018-06-26
CN104339088B (zh) 2017-03-01
HK1202094A1 (zh) 2015-09-18
CA2857820C (en) 2018-07-10
KR101753184B1 (ko) 2017-07-03
TW201521931A (zh) 2015-06-16
JP6505773B2 (ja) 2019-04-24
TW201519980A (zh) 2015-06-01
EP2859984A2 (en) 2015-04-15
JP2017221977A (ja) 2017-12-21
JP2017213603A (ja) 2017-12-07
KR101869796B1 (ko) 2018-06-22
JP6526396B2 (ja) 2019-06-05
MY177289A (en) 2020-09-10
EP2859983A3 (en) 2015-10-14
KR20150016177A (ko) 2015-02-11
CA2857820A1 (en) 2015-02-02
TWI653115B (zh) 2019-03-11
EP2859984B1 (en) 2019-02-20
JP2015037808A (ja) 2015-02-26
TW201733730A (zh) 2017-10-01
SG10201404455QA (en) 2015-03-30
KR20170081145A (ko) 2017-07-11
JP6585120B2 (ja) 2019-10-02
US20200324368A1 (en) 2020-10-15
TWI592244B (zh) 2017-07-21
TWI520804B (zh) 2016-02-11
KR20150016176A (ko) 2015-02-11
EP2859984A3 (en) 2016-02-10
US20150038313A1 (en) 2015-02-05
KR101998761B1 (ko) 2019-07-10
CA2857814A1 (en) 2015-02-02
KR20170003898A (ko) 2017-01-10
CN104339081A (zh) 2015-02-11
CN104339081B (zh) 2016-10-12
US9102007B2 (en) 2015-08-11
EP2859983B1 (en) 2018-05-16
SG10201404459UA (en) 2015-03-30
CN104339088A (zh) 2015-02-11
US20150034613A1 (en) 2015-02-05
EP2859983A2 (en) 2015-04-15
JP2015030040A (ja) 2015-02-16
EP3366413A1 (en) 2018-08-29
CA2857814C (en) 2016-09-13

Similar Documents

Publication Publication Date Title
HK1205715A1 (zh) 用於在透明材料內執行激光成絲的方法和設備
IL244344B (en) Install fund delivery and method
IL246327A0 (en) Optical tomography device and method
GB201302787D0 (en) Method and apparatus
GB201311264D0 (en) Apparatus and method
EP2950969A4 (en) DEVICE AND METHOD FOR CONTINUOUS LASER CUTTING OF BENDING GLASS
EP3018838A4 (en) METHOD AND APPARATUS FOR PROCESSING OPTICAL PATH
EP3072629A4 (en) Laser processing apparatus and laser processing method
GB201306083D0 (en) Method and apparatus
PL2883648T3 (pl) Urządzenie do cięcia laserem i zastosowanie sposobu cięcia
PL2918689T3 (pl) Urządzenie dla procesów obróbki laserowej oraz sposób napromieniowywania laserowego
GB201309915D0 (en) Stall-start method and apparatus
GB201306495D0 (en) Apparatus and method
GB201311150D0 (en) Apparatus and method
GB201309689D0 (en) Method and apparatus
GB2518159B (en) Platform apparatus and method
GB201314252D0 (en) Apparatus and method
GB201305942D0 (en) Apparatus and method
EP2975372A4 (en) METHOD AND APPARATUS FOR MEASURING A LIGHT WAVE LENGTH
EP2940501A4 (en) OPTICAL PATH PROCESSING AND DEVICE
GB201300021D0 (en) Laser oscillator and laser processing apparatus
GB201316121D0 (en) Inspection apparatus and method
GB201314077D0 (en) Method and apparatus
GB201308664D0 (en) Method and apparatus
GB201308460D0 (en) Apparatus and method

Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20230802