HK1029443A1 - Semiconductor device. - Google Patents
Semiconductor device.Info
- Publication number
- HK1029443A1 HK1029443A1 HK01100207A HK01100207A HK1029443A1 HK 1029443 A1 HK1029443 A1 HK 1029443A1 HK 01100207 A HK01100207 A HK 01100207A HK 01100207 A HK01100207 A HK 01100207A HK 1029443 A1 HK1029443 A1 HK 1029443A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- semiconductor device
- semiconductor
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3114—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed the device being a chip scale package, e.g. CSP
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/5222—Capacitive arrangements or effects of, or between wiring layers
- H01L23/5223—Capacitor integral with wiring layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/5222—Capacitive arrangements or effects of, or between wiring layers
- H01L23/5225—Shielding layers formed together with wiring layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/5227—Inductive arrangements or effects of, or between, wiring layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/5228—Resistive arrangements or effects of, or between, wiring layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/525—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body with adaptable interconnections
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
- H01L2924/141—Analog devices
- H01L2924/1423—Monolithic Microwave Integrated Circuit [MMIC]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19041—Component type being a capacitor
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Semiconductor Integrated Circuits (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP03575999A JP3465617B2 (ja) | 1999-02-15 | 1999-02-15 | 半導体装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1029443A1 true HK1029443A1 (en) | 2001-03-30 |
Family
ID=12450785
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK01100207A HK1029443A1 (en) | 1999-02-15 | 2001-01-09 | Semiconductor device. |
Country Status (6)
Country | Link |
---|---|
US (3) | US6545354B1 (zh) |
JP (1) | JP3465617B2 (zh) |
KR (1) | KR100533517B1 (zh) |
CN (1) | CN1162908C (zh) |
HK (1) | HK1029443A1 (zh) |
TW (1) | TW455959B (zh) |
Families Citing this family (95)
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US6303423B1 (en) * | 1998-12-21 | 2001-10-16 | Megic Corporation | Method for forming high performance system-on-chip using post passivation process |
US8178435B2 (en) * | 1998-12-21 | 2012-05-15 | Megica Corporation | High performance system-on-chip inductor using post passivation process |
US6869870B2 (en) * | 1998-12-21 | 2005-03-22 | Megic Corporation | High performance system-on-chip discrete components using post passivation process |
US6495442B1 (en) | 2000-10-18 | 2002-12-17 | Magic Corporation | Post passivation interconnection schemes on top of the IC chips |
US7381642B2 (en) * | 2004-09-23 | 2008-06-03 | Megica Corporation | Top layers of metal for integrated circuits |
US7531417B2 (en) * | 1998-12-21 | 2009-05-12 | Megica Corporation | High performance system-on-chip passive device using post passivation process |
US6965165B2 (en) * | 1998-12-21 | 2005-11-15 | Mou-Shiung Lin | Top layers of metal for high performance IC's |
US8421158B2 (en) * | 1998-12-21 | 2013-04-16 | Megica Corporation | Chip structure with a passive device and method for forming the same |
JP3465617B2 (ja) * | 1999-02-15 | 2003-11-10 | カシオ計算機株式会社 | 半導体装置 |
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US7372161B2 (en) * | 2000-10-18 | 2008-05-13 | Megica Corporation | Post passivation interconnection schemes on top of the IC chips |
US7271489B2 (en) | 2003-10-15 | 2007-09-18 | Megica Corporation | Post passivation interconnection schemes on top of the IC chips |
KR20020070739A (ko) * | 2001-03-03 | 2002-09-11 | 삼성전자 주식회사 | 단일 칩 고주파 집적회로 및 그 제조 방법 |
JP3939504B2 (ja) * | 2001-04-17 | 2007-07-04 | カシオ計算機株式会社 | 半導体装置並びにその製造方法および実装構造 |
TW563142B (en) * | 2001-07-12 | 2003-11-21 | Hitachi Ltd | Thin film capacitor, and electronic circuit component |
US6759275B1 (en) | 2001-09-04 | 2004-07-06 | Megic Corporation | Method for making high-performance RF integrated circuits |
JP2003158214A (ja) * | 2001-11-26 | 2003-05-30 | Matsushita Electric Ind Co Ltd | 半導体モジュール |
JP3792635B2 (ja) | 2001-12-14 | 2006-07-05 | 富士通株式会社 | 電子装置 |
TW503496B (en) * | 2001-12-31 | 2002-09-21 | Megic Corp | Chip packaging structure and manufacturing process of the same |
US6673698B1 (en) | 2002-01-19 | 2004-01-06 | Megic Corporation | Thin film semiconductor package utilizing a glass substrate with composite polymer/metal interconnect layers |
TW517361B (en) * | 2001-12-31 | 2003-01-11 | Megic Corp | Chip package structure and its manufacture process |
TW544882B (en) | 2001-12-31 | 2003-08-01 | Megic Corp | Chip package structure and process thereof |
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JP3616605B2 (ja) | 2002-04-03 | 2005-02-02 | 沖電気工業株式会社 | 半導体装置 |
JP3529050B2 (ja) * | 2002-07-12 | 2004-05-24 | 沖電気工業株式会社 | 半導体装置の製造方法 |
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JP4126389B2 (ja) * | 2002-09-20 | 2008-07-30 | カシオ計算機株式会社 | 半導体パッケージの製造方法 |
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WO2004047174A1 (ja) * | 2002-11-21 | 2004-06-03 | Fujitsu Limited | 高q値インダクタンスを有する半導体集積回路装置 |
JP3808030B2 (ja) * | 2002-11-28 | 2006-08-09 | 沖電気工業株式会社 | 半導体装置及びその製造方法 |
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JP2004214561A (ja) * | 2003-01-08 | 2004-07-29 | Oki Electric Ind Co Ltd | 半導体装置及びその製造方法 |
JP3767821B2 (ja) * | 2003-01-22 | 2006-04-19 | 松下電器産業株式会社 | 半導体装置の設計方法 |
US7319277B2 (en) * | 2003-05-08 | 2008-01-15 | Megica Corporation | Chip structure with redistribution traces |
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JP4513302B2 (ja) * | 2003-10-07 | 2010-07-28 | カシオ計算機株式会社 | 半導体装置 |
US7919864B2 (en) * | 2003-10-13 | 2011-04-05 | Stmicroelectronics S.A. | Forming of the last metallization level of an integrated circuit |
US7459790B2 (en) * | 2003-10-15 | 2008-12-02 | Megica Corporation | Post passivation interconnection schemes on top of the IC chips |
JP2005123378A (ja) * | 2003-10-16 | 2005-05-12 | Sony Corp | 半導体装置およびその製造方法 |
CN1624919A (zh) * | 2003-12-05 | 2005-06-08 | 三星电子株式会社 | 具有整体连接器接触件的晶片级电子模块及其制造方法 |
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JP4431747B2 (ja) | 2004-10-22 | 2010-03-17 | 富士通株式会社 | 半導体装置の製造方法 |
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KR100642643B1 (ko) * | 2005-03-18 | 2006-11-10 | 삼성전자주식회사 | 내부회로의 전원/접지선들과 직접 접속되는 재배치된전원/접지선들을 갖는 반도체 칩들 및 그 제조방법들 |
US8384189B2 (en) | 2005-03-29 | 2013-02-26 | Megica Corporation | High performance system-on-chip using post passivation process |
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US20130146345A1 (en) * | 2011-12-12 | 2013-06-13 | Kazuki KAJIHARA | Printed wiring board and method for manufacturing the same |
US9171798B2 (en) * | 2013-01-25 | 2015-10-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | Methods and apparatus for transmission lines in packages |
KR20160006773A (ko) * | 2013-06-13 | 2016-01-19 | 가부시키가이샤 무라타 세이사쿠쇼 | 필터장치 및 듀플렉서 |
JP6019367B2 (ja) * | 2015-01-13 | 2016-11-02 | 株式会社野田スクリーン | 半導体装置 |
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CN111788679A (zh) * | 2018-02-13 | 2020-10-16 | 思睿逻辑国际半导体有限公司 | 包含无源电气组件的集成电路的制造 |
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KR100563122B1 (ko) * | 1998-01-30 | 2006-03-21 | 다이요 유덴 가부시키가이샤 | 하이브리드 모듈 및 그 제조방법 및 그 설치방법 |
US6108212A (en) | 1998-06-05 | 2000-08-22 | Motorola, Inc. | Surface-mount device package having an integral passive component |
US6140155A (en) * | 1998-12-24 | 2000-10-31 | Casio Computer Co., Ltd. | Method of manufacturing semiconductor device using dry photoresist film |
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US6180976B1 (en) | 1999-02-02 | 2001-01-30 | Conexant Systems, Inc. | Thin-film capacitors and methods for forming the same |
JP3465617B2 (ja) | 1999-02-15 | 2003-11-10 | カシオ計算機株式会社 | 半導体装置 |
US6031293A (en) * | 1999-04-26 | 2000-02-29 | United Microelectronics Corporation | Package-free bonding pad structure |
JP2001060664A (ja) | 1999-08-23 | 2001-03-06 | Mitsubishi Electric Corp | 半導体装置 |
SG99939A1 (en) | 2000-08-11 | 2003-11-27 | Casio Computer Co Ltd | Semiconductor device |
-
1999
- 1999-02-15 JP JP03575999A patent/JP3465617B2/ja not_active Expired - Fee Related
-
2000
- 2000-02-07 US US09/499,599 patent/US6545354B1/en not_active Expired - Lifetime
- 2000-02-10 KR KR10-2000-0006205A patent/KR100533517B1/ko not_active IP Right Cessation
- 2000-02-11 TW TW089102313A patent/TW455959B/zh not_active IP Right Cessation
- 2000-02-15 CN CNB001008633A patent/CN1162908C/zh not_active Expired - Lifetime
-
2001
- 2001-01-09 HK HK01100207A patent/HK1029443A1/xx not_active IP Right Cessation
-
2002
- 2002-09-25 US US10/254,222 patent/US6870256B2/en not_active Ceased
-
2007
- 2007-03-22 US US11/726,763 patent/USRE41511E1/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
TW455959B (en) | 2001-09-21 |
US6870256B2 (en) | 2005-03-22 |
USRE41511E1 (en) | 2010-08-17 |
KR100533517B1 (ko) | 2005-12-06 |
CN1162908C (zh) | 2004-08-18 |
CN1264178A (zh) | 2000-08-23 |
JP3465617B2 (ja) | 2003-11-10 |
US20030038331A1 (en) | 2003-02-27 |
JP2000235979A (ja) | 2000-08-29 |
US6545354B1 (en) | 2003-04-08 |
KR20000071342A (ko) | 2000-11-25 |
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Legal Events
Date | Code | Title | Description |
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PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20160215 |