FR2953636B1 - Procede de commande d'une cellule memoire dram sur seoi disposant d'une seconde grille de controle enterree sous la couche isolante - Google Patents

Procede de commande d'une cellule memoire dram sur seoi disposant d'une seconde grille de controle enterree sous la couche isolante

Info

Publication number
FR2953636B1
FR2953636B1 FR0958749A FR0958749A FR2953636B1 FR 2953636 B1 FR2953636 B1 FR 2953636B1 FR 0958749 A FR0958749 A FR 0958749A FR 0958749 A FR0958749 A FR 0958749A FR 2953636 B1 FR2953636 B1 FR 2953636B1
Authority
FR
France
Prior art keywords
seoi
controlling
insulating layer
memory cell
control grid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0958749A
Other languages
English (en)
Other versions
FR2953636A1 (fr
Inventor
Carlos Mazure
Richard Ferrant
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Soitec SA
Original Assignee
Soitec SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Soitec SA filed Critical Soitec SA
Priority to FR0958749A priority Critical patent/FR2953636B1/fr
Priority to US12/898,230 priority patent/US20110134690A1/en
Priority to EP10187012A priority patent/EP2333779A1/fr
Priority to TW099134576A priority patent/TW201123453A/zh
Priority to SG2010076537A priority patent/SG172527A1/en
Priority to CN2010105284181A priority patent/CN102087873A/zh
Priority to KR1020100106797A priority patent/KR20110065316A/ko
Priority to JP2010244690A priority patent/JP2011123985A/ja
Publication of FR2953636A1 publication Critical patent/FR2953636A1/fr
Application granted granted Critical
Publication of FR2953636B1 publication Critical patent/FR2953636B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/401—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
    • G11C11/403—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh
    • G11C11/404—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh with one charge-transfer gate, e.g. MOS transistor, per cell
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
    • H01L29/42312—Gate electrodes for field effect devices
    • H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
    • H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
    • H01L29/42356—Disposition, e.g. buried gate electrode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/7841—Field effect transistors with field effect produced by an insulated gate with floating body, e.g. programmable transistors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • H10B12/20—DRAM devices comprising floating-body transistors, e.g. floating-body cells
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C2211/00—Indexing scheme relating to digital stores characterized by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C2211/401—Indexing scheme relating to cells needing refreshing or charge regeneration, i.e. dynamic cells
    • G11C2211/4016—Memory devices with silicon-on-insulator cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1203—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body the substrate comprising an insulating body on a semiconductor body, e.g. SOI
FR0958749A 2009-12-08 2009-12-08 Procede de commande d'une cellule memoire dram sur seoi disposant d'une seconde grille de controle enterree sous la couche isolante Expired - Fee Related FR2953636B1 (fr)

Priority Applications (8)

Application Number Priority Date Filing Date Title
FR0958749A FR2953636B1 (fr) 2009-12-08 2009-12-08 Procede de commande d'une cellule memoire dram sur seoi disposant d'une seconde grille de controle enterree sous la couche isolante
US12/898,230 US20110134690A1 (en) 2009-12-08 2010-10-05 METHOD OF CONTROLLING A DRAM MEMORY CELL ON THE SeOI HAVING A SECOND CONTROL GATE BURIED UNDER THE INSULATING LAYER
EP10187012A EP2333779A1 (fr) 2009-12-08 2010-10-08 Procédé de commande d'une cellule mémoire dram sur SeOI disposant d'une seconde grille de contrôle enterrée sous la couche isolante
TW099134576A TW201123453A (en) 2009-12-08 2010-10-11 Method of controlling a SeOI dram memory cell having a second control gate buried under the insulating layer
SG2010076537A SG172527A1 (en) 2009-12-08 2010-10-18 Method of controlling a seoi dram memory cell having a second control gate buried under the insulating layer
CN2010105284181A CN102087873A (zh) 2009-12-08 2010-10-28 控制具有第二控制栅极的dram存储器单元的方法
KR1020100106797A KR20110065316A (ko) 2009-12-08 2010-10-29 절연층 아래에 매설된 제2 제어 게이트를 갖는 ＳｅＯＩ ＤＲＡＭ 메모리 셀을 제어하는 방법
JP2010244690A JP2011123985A (ja) 2009-12-08 2010-10-29 第２のコントロールゲートを絶縁層の下に埋め込んだＳｅＯＩＤＲＡＭメモリセルをコントロールする方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0958749A FR2953636B1 (fr) 2009-12-08 2009-12-08 Procede de commande d'une cellule memoire dram sur seoi disposant d'une seconde grille de controle enterree sous la couche isolante

Publications (2)

Publication Number Publication Date
FR2953636A1 FR2953636A1 (fr) 2011-06-10
FR2953636B1 true FR2953636B1 (fr) 2012-02-10

Family

ID=42173895

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0958749A Expired - Fee Related FR2953636B1 (fr) 2009-12-08 2009-12-08 Procede de commande d'une cellule memoire dram sur seoi disposant d'une seconde grille de controle enterree sous la couche isolante

Country Status (8)

Country Link
US (1) US20110134690A1 (fr)
EP (1) EP2333779A1 (fr)
JP (1) JP2011123985A (fr)
KR (1) KR20110065316A (fr)
CN (1) CN102087873A (fr)
FR (1) FR2953636B1 (fr)
SG (1) SG172527A1 (fr)
TW (1) TW201123453A (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9214400B2 (en) * 2011-08-31 2015-12-15 Institute of Microelectronics, Chinese Academy of Sciences Semiconductor device with back gate isolation regions and method for manufacturing the same
FR3001333B1 (fr) * 2013-01-22 2016-05-06 Soitec Silicon On Insulator Grille arriere dans transistor de selection pour dram embarquee
CN103824861A (zh) * 2014-01-15 2014-05-28 上海新储集成电路有限公司 一种鳍状背栅的存储结构及其浮体单元的自动刷新方法

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Also Published As

Publication number Publication date
SG172527A1 (en) 2011-07-28
EP2333779A1 (fr) 2011-06-15
KR20110065316A (ko) 2011-06-15
TW201123453A (en) 2011-07-01
JP2011123985A (ja) 2011-06-23
US20110134690A1 (en) 2011-06-09
CN102087873A (zh) 2011-06-08
FR2953636A1 (fr) 2011-06-10

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