DE69922155D1 - Vorläufer einer photoempfindlichen harzzusammensetzung und verfahren zu dessen herstellung - Google Patents

Vorläufer einer photoempfindlichen harzzusammensetzung und verfahren zu dessen herstellung

Info

Publication number
DE69922155D1
DE69922155D1 DE69922155T DE69922155T DE69922155D1 DE 69922155 D1 DE69922155 D1 DE 69922155D1 DE 69922155 T DE69922155 T DE 69922155T DE 69922155 T DE69922155 T DE 69922155T DE 69922155 D1 DE69922155 D1 DE 69922155D1
Authority
DE
Germany
Prior art keywords
precursor
photo
production
resin composition
sensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69922155T
Other languages
English (en)
Other versions
DE69922155T2 (de
Inventor
Masao Tomikawa
Naoyo Okamoto
Satoshi Yoshida
Ryoji Okuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP29048198A external-priority patent/JP4026246B2/ja
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Publication of DE69922155D1 publication Critical patent/DE69922155D1/de
Application granted granted Critical
Publication of DE69922155T2 publication Critical patent/DE69922155T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1003—Preparatory processes
    • C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
    • C08G73/1025—Preparatory processes from tetracarboxylic acids or derivatives and diamines polymerised by radiations
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
DE69922155T 1998-09-09 1999-09-07 Vorläufer einer photoempfindlichen harzzusammensetzung und verfahren zu dessen herstellung Expired - Lifetime DE69922155T2 (de)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP25535698 1998-09-09
JP25535698 1998-09-09
JP29048198A JP4026246B2 (ja) 1998-10-13 1998-10-13 ポジ型感光性樹脂組成物の製造方法
JP29048198 1998-10-13
JP31599098 1998-11-06
JP31599098 1998-11-06
PCT/JP1999/004849 WO2000014604A1 (fr) 1998-09-09 1999-09-07 Composition-precurseur de resine photosensible positive et procede de fabrication correspondant

Publications (2)

Publication Number Publication Date
DE69922155D1 true DE69922155D1 (de) 2004-12-30
DE69922155T2 DE69922155T2 (de) 2005-12-08

Family

ID=27334425

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69922155T Expired - Lifetime DE69922155T2 (de) 1998-09-09 1999-09-07 Vorläufer einer photoempfindlichen harzzusammensetzung und verfahren zu dessen herstellung

Country Status (7)

Country Link
US (2) US6723484B1 (de)
EP (1) EP1037112B1 (de)
KR (1) KR100605414B1 (de)
CN (1) CN1246738C (de)
DE (1) DE69922155T2 (de)
TW (1) TWI226353B (de)
WO (1) WO2000014604A1 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6696112B2 (en) * 2000-06-28 2004-02-24 Toray Industries, Inc. Display device having a polyimide insulating layer
KR100801785B1 (ko) * 2002-01-31 2008-02-05 스미토모 베이클리트 컴퍼니 리미티드 양성형 감광성 수지조성물
JP4665333B2 (ja) 2000-11-27 2011-04-06 東レ株式会社 ポジ型感光性樹脂前駆体組成物
TW574620B (en) * 2001-02-26 2004-02-01 Toray Industries Precursor composition of positive photosensitive resin and display device using it
JP3895945B2 (ja) * 2001-04-24 2007-03-22 ソニーケミカル＆インフォメーションデバイス株式会社 樹脂組成物及び樹脂組成物製造方法
JP3882817B2 (ja) * 2001-09-26 2007-02-21 日産化学工業株式会社 ポジ型感光性ポリイミド樹脂組成物
EP1471540A4 (de) * 2002-01-28 2009-09-23 Jsr Corp Zusammensetzung zur bildung eines lichtempfindlichen dielektrischen materials, transferfilm, dielektrisches material und elektronische teile damit
EP1475665B1 (de) * 2003-04-07 2009-12-30 Toray Industries, Inc. Zusammensetzung von photoempfindlichem Harz des Positivtyps
JP4386454B2 (ja) * 2006-08-22 2009-12-16 信越化学工業株式会社 アルカリ水溶液に可溶な感光性ポリイミド樹脂、該樹脂を含む組成物、及び該組成物から得られる膜
JP5549801B2 (ja) * 2007-12-14 2014-07-16 日産化学工業株式会社 ポリヒドロキシイミドの製造方法並びに該製造方法より得られたポリヒドロキシイミドを含有するポジ型感光性樹脂組成物
CN107407876A (zh) * 2015-03-06 2017-11-28 东丽株式会社 感光性树脂组合物及电子部件
KR20180095228A (ko) 2017-02-17 2018-08-27 동우 화인켐 주식회사 네가티브형 감광성 수지 조성물
TWI678596B (zh) * 2018-09-13 2019-12-01 新應材股份有限公司 正型光阻組成物及圖案化聚醯亞胺層之形成方法
CN117836716A (zh) * 2021-08-20 2024-04-05 株式会社东进世美肯 感光树脂组合物以及包含所述感光树脂组合物的显示设备
CN114621437B (zh) * 2022-04-01 2023-08-18 吉林奥来德光电材料股份有限公司 用于制备感光树脂薄膜的化合物、其制备方法和应用

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03115461A (ja) 1989-09-29 1991-05-16 Toshiba Corp 感光性樹脂組成物
US5288588A (en) * 1989-10-27 1994-02-22 Nissan Chemical Industries Ltd. Positive photosensitive polyimide resin composition comprising an o-quinone diazide as a photosensitive compound
EP0478321B1 (de) * 1990-09-28 1997-11-12 Kabushiki Kaisha Toshiba Fotoempfindliche Harzzusammensetzung zum Herstellen eines Polyimidfilmmusters und Verfahren zum Herstellen eines Polyimidfilmmusters
JP2895203B2 (ja) * 1990-10-18 1999-05-24 東洋合成工業株式会社 ポジ型ホトレジスト組成物及び該組成物を用いたパターン形成方法
JP2890213B2 (ja) * 1991-02-25 1999-05-10 チッソ株式会社 感光性重合体組成物及びパターンの形成方法
US5302489A (en) * 1991-10-29 1994-04-12 E. I. Du Pont De Nemours And Company Positive photoresist compositions containing base polymer which is substantially insoluble at pH between 7 and 10, quinonediazide acid generator and silanol solubility enhancer
KR0134753B1 (ko) * 1993-02-26 1998-04-18 사토 후미오 폴리아미드산 조성물
JP3115461B2 (ja) 1993-12-06 2000-12-04 松下電器産業株式会社 パネル一体型タブレット
JPH10153857A (ja) * 1996-11-22 1998-06-09 Nippon Zeon Co Ltd ポジ型フォトレジスト組成物
JPH10186664A (ja) * 1996-12-20 1998-07-14 Asahi Chem Ind Co Ltd ポジ型感光性耐熱材料
JPH10186658A (ja) 1996-12-24 1998-07-14 Hitachi Ltd ポジ型感光性樹脂組成物とそれを用いた大規模集積回路の製法
JP3407653B2 (ja) * 1997-05-07 2003-05-19 東レ株式会社 感光性組成物
JPH10307394A (ja) 1997-05-09 1998-11-17 Hitachi Ltd ポジ型感光性樹脂組成物とそれを用いたパターン形成方法並びに電子装置の製法
JP3440832B2 (ja) * 1997-07-14 2003-08-25 東レ株式会社 感光性ポリイミド前駆体組成物
JP3890699B2 (ja) 1997-09-29 2007-03-07 東レ株式会社 ポジ型感光性樹脂組成物とその製造方法
JPH11106651A (ja) * 1997-10-01 1999-04-20 Toray Ind Inc 感光性耐熱性樹脂前駆体組成物
JP4186250B2 (ja) * 1997-12-01 2008-11-26 東レ株式会社 感光性耐熱性樹脂前駆体組成物
JPH11174679A (ja) * 1997-12-10 1999-07-02 Hitachi Chem Co Ltd ポジ型感光性樹脂組成物及びレリーフパターンの製造法
JP3509612B2 (ja) * 1998-05-29 2004-03-22 日立化成デュポンマイクロシステムズ株式会社 感光性重合体組成物、レリーフパターンの製造法及び電子部品
JP2000075478A (ja) * 1998-08-31 2000-03-14 Toray Ind Inc ポジ型感光性樹脂前駆体組成物

Also Published As

Publication number Publication date
EP1037112A4 (de) 2002-12-18
US20040170914A1 (en) 2004-09-02
WO2000014604A1 (fr) 2000-03-16
CN1471659A (zh) 2004-01-28
US6723484B1 (en) 2004-04-20
CN1246738C (zh) 2006-03-22
EP1037112B1 (de) 2004-11-24
KR20010031874A (ko) 2001-04-16
TWI226353B (en) 2005-01-11
DE69922155T2 (de) 2005-12-08
KR100605414B1 (ko) 2006-08-02
EP1037112A1 (de) 2000-09-20

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