DE60217771D1 - Belichtungssystem, Projektionsbelichtungsapparat und Verfahren zur Herstellung eines Artikels - Google Patents

Belichtungssystem, Projektionsbelichtungsapparat und Verfahren zur Herstellung eines Artikels

Info

Publication number
DE60217771D1
DE60217771D1 DE60217771T DE60217771T DE60217771D1 DE 60217771 D1 DE60217771 D1 DE 60217771D1 DE 60217771 T DE60217771 T DE 60217771T DE 60217771 T DE60217771 T DE 60217771T DE 60217771 D1 DE60217771 D1 DE 60217771D1
Authority
DE
Germany
Prior art keywords
article
making
exposure apparatus
projection exposure
exposure system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60217771T
Other languages
English (en)
Other versions
DE60217771T2 (de
DE60217771T3 (de
Inventor
Toshihiko Tsuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26619491&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE60217771(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from JP2001228796A external-priority patent/JP3605053B2/ja
Priority claimed from JP2001232682A external-priority patent/JP3605055B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE60217771D1 publication Critical patent/DE60217771D1/de
Publication of DE60217771T2 publication Critical patent/DE60217771T2/de
Application granted granted Critical
Publication of DE60217771T3 publication Critical patent/DE60217771T3/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE60217771T 2001-07-27 2002-07-25 Belichtungssystem, Projektionsbelichtungsapparat und Verfahren zur Herstellung eines Artikels Expired - Lifetime DE60217771T3 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2001228796A JP3605053B2 (ja) 2001-07-27 2001-07-27 照明光学系、露光装置及びデバイス製造方法
JP2001228796 2001-07-27
JP2001232682 2001-07-31
JP2001232682A JP3605055B2 (ja) 2001-07-31 2001-07-31 照明光学系、露光装置及びデバイス製造方法
EP02255194A EP1280008B2 (de) 2001-07-27 2002-07-25 Belichtungssystem, Projektionsbelichtungsapparat und Verfahren zur Herstellung eines Artikels

Publications (3)

Publication Number Publication Date
DE60217771D1 true DE60217771D1 (de) 2007-03-15
DE60217771T2 DE60217771T2 (de) 2007-06-14
DE60217771T3 DE60217771T3 (de) 2012-02-09

Family

ID=26619491

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60217771T Expired - Lifetime DE60217771T3 (de) 2001-07-27 2002-07-25 Belichtungssystem, Projektionsbelichtungsapparat und Verfahren zur Herstellung eines Artikels

Country Status (6)

Country Link
US (1) US6919951B2 (de)
EP (1) EP1280008B2 (de)
KR (2) KR100486073B1 (de)
CN (1) CN1199086C (de)
DE (1) DE60217771T3 (de)
TW (1) TW594847B (de)

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JP2005109304A (ja) 2003-10-01 2005-04-21 Canon Inc 照明光学系及び露光装置
JP2005141158A (ja) * 2003-11-10 2005-06-02 Canon Inc 照明光学系及び露光装置
JP4630567B2 (ja) * 2004-04-23 2011-02-09 キヤノン株式会社 露光装置およびデバイス製造方法
CN101006557A (zh) * 2004-11-17 2007-07-25 株式会社尼康 照明装置、曝光装置以及微元件的制造方法
CN101069267A (zh) * 2005-02-03 2007-11-07 株式会社尼康 光学积分器、照明光学装置、曝光装置以及曝光方法
JP2006303370A (ja) * 2005-04-25 2006-11-02 Canon Inc 露光装置及びそれを用いたデバイス製造方法
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DE102006059024A1 (de) 2006-12-14 2008-06-19 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie, Beleuchtungsoptik für eine derartige Projektionsbelichtungsanlage, Verfahren zum Betrieb einer derartigen Projektionsbelichtungsanlage, Verfahren zur Herstellung eines mikrostrukturierten Bauteils sowie durch das Verfahren hergestelltes mikrostrukturiertes Bauteil
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US7719661B2 (en) * 2007-11-27 2010-05-18 Nikon Corporation Illumination optical apparatus, exposure apparatus, and method for producing device
JP5241270B2 (ja) * 2008-02-27 2013-07-17 キヤノン株式会社 照明光学系、これを用いた露光装置及びデバイス製造方法
JP2009253214A (ja) * 2008-04-10 2009-10-29 Canon Inc 露光装置及びデバイス製造方法
JP2009267188A (ja) 2008-04-28 2009-11-12 Canon Inc 液浸露光装置及びデバイス製造方法
TW201006112A (en) * 2008-07-29 2010-02-01 Delta Electronics Inc Sensor-controlled flushing device and method and system for managing power thereof
JP5142892B2 (ja) * 2008-09-03 2013-02-13 キヤノン株式会社 照明光学系及び露光装置
DE102008046699B4 (de) * 2008-09-10 2014-03-13 Carl Zeiss Smt Gmbh Abbildende Optik
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JP5534910B2 (ja) * 2009-04-23 2014-07-02 ギガフォトン株式会社 極端紫外光源装置
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US9099292B1 (en) * 2009-05-28 2015-08-04 Kla-Tencor Corporation Laser-sustained plasma light source
JP2011077142A (ja) * 2009-09-29 2011-04-14 Nikon Corp 照明光学装置、露光装置及びデバイス製造方法
DE102009045491A1 (de) 2009-10-08 2010-11-25 Carl Zeiss Smt Ag Beleuchtungsoptik
WO2011065374A1 (ja) 2009-11-24 2011-06-03 株式会社ニコン 結像光学系、露光装置、およびデバイス製造方法
JP5704519B2 (ja) * 2010-04-02 2015-04-22 株式会社ニコン 光源装置、光学装置、露光装置、デバイス製造方法、照明方法、露光方法、および光学装置の製造方法
JP5220136B2 (ja) 2011-01-01 2013-06-26 キヤノン株式会社 照明光学系、露光装置およびデバイス製造方法
EP2506291A1 (de) * 2011-03-28 2012-10-03 Excico France Verfahren und Vorrichtung zur Bildung einer Projektion mit geraden Linien auf einem Halbleitersubstrat
US8823921B2 (en) 2011-08-19 2014-09-02 Ultratech, Inc. Programmable illuminator for a photolithography system
US8845163B2 (en) 2012-08-17 2014-09-30 Ultratech, Inc. LED-based photolithographic illuminator with high collection efficiency
DE102013204444A1 (de) * 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Beleuchtungsoptik für ein Maskeninspektionssystem sowie Maskeninspektionssystem mit einer derartigen Beleuchtungsoptik
DE102013223935A1 (de) 2013-11-22 2015-05-28 Carl Zeiss Smt Gmbh Beleuchtungssystem für die EUV-Belichtungslithographie
JP6362095B2 (ja) * 2014-06-17 2018-07-25 キヤノン株式会社 照明装置、露光装置、調整方法、及び、物品の製造方法
CN104317169B (zh) * 2014-11-03 2016-03-30 北京理工大学 一种极紫外光刻波纹板照明系统
NL2016266A (en) * 2015-03-02 2016-09-30 Asml Netherlands Bv Radiation System.
JP6761306B2 (ja) * 2016-08-30 2020-09-23 キヤノン株式会社 照明光学系、リソグラフィ装置、及び物品製造方法
JP6567005B2 (ja) * 2017-08-31 2019-08-28 キヤノン株式会社 露光装置、調整方法、および、物品製造方法
US10775700B2 (en) 2018-08-14 2020-09-15 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography system and method for exposing wafer
KR102497600B1 (ko) 2020-11-27 2023-02-08 (주)아이앤유앤아이 기능성 브래지어

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Also Published As

Publication number Publication date
EP1280008B2 (de) 2011-09-14
US6919951B2 (en) 2005-07-19
EP1280008A2 (de) 2003-01-29
EP1280008A3 (de) 2004-05-26
DE60217771T2 (de) 2007-06-14
TW594847B (en) 2004-06-21
US20030031017A1 (en) 2003-02-13
CN1199086C (zh) 2005-04-27
KR100478683B1 (ko) 2005-03-24
CN1400507A (zh) 2003-03-05
KR20030010568A (ko) 2003-02-05
EP1280008B1 (de) 2007-01-24
DE60217771T3 (de) 2012-02-09
KR100486073B1 (ko) 2005-04-29
KR20050002699A (ko) 2005-01-10

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