DE602006021680D1 - Verfahren zur Reinigung eines Elements einer lithografischen Vorrichtung - Google Patents

Verfahren zur Reinigung eines Elements einer lithografischen Vorrichtung

Info

Publication number
DE602006021680D1
DE602006021680D1 DE602006021680T DE602006021680T DE602006021680D1 DE 602006021680 D1 DE602006021680 D1 DE 602006021680D1 DE 602006021680 T DE602006021680 T DE 602006021680T DE 602006021680 T DE602006021680 T DE 602006021680T DE 602006021680 D1 DE602006021680 D1 DE 602006021680D1
Authority
DE
Germany
Prior art keywords
cleaning
lithographic apparatus
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006021680T
Other languages
English (en)
Inventor
Tatyana Victorovna Rakhimova
Vadim Yevgenyevich Banine
Vladimir Vitalevitch Ivanov
Konstantin Nikolaevitch Koshelev
Johannes Hubertus Josephina Moors
Aleksander Sergeevich Kovalev
Dmitriy Victorovich Lopaev
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE602006021680D1 publication Critical patent/DE602006021680D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE602006021680T 2005-09-16 2006-09-14 Verfahren zur Reinigung eines Elements einer lithografischen Vorrichtung Active DE602006021680D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US71724005P 2005-09-16 2005-09-16
US11/367,693 US8317929B2 (en) 2005-09-16 2006-03-06 Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus

Publications (1)

Publication Number Publication Date
DE602006021680D1 true DE602006021680D1 (de) 2011-06-16

Family

ID=37508328

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006021680T Active DE602006021680D1 (de) 2005-09-16 2006-09-14 Verfahren zur Reinigung eines Elements einer lithografischen Vorrichtung

Country Status (7)

Country Link
US (1) US8317929B2 (de)
EP (1) EP1764653B1 (de)
JP (2) JP4690277B2 (de)
CN (1) CN1959541B (de)
DE (1) DE602006021680D1 (de)
SG (1) SG131060A1 (de)
TW (1) TWI315681B (de)

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US7504643B2 (en) * 2005-12-22 2009-03-17 Asml Netherlands B.V. Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement
DE102006054726B4 (de) * 2006-11-21 2014-09-11 Asml Netherlands B.V. Verfahren zum Entfernen von Kontaminationen auf optischen Oberflächen und optische Anordnung
EP1944652A1 (de) * 2007-01-10 2008-07-16 Carl Zeiss SMT AG Verfahren für den Betrieb eines EUV-Lithografiegeräts und EUV-Lithografiegerät
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US20090025750A1 (en) * 2007-07-24 2009-01-29 Asml Netherlands B.V. Method for removal of a deposition from an optical element, lithographic apparatus, and method for manufacturing a device
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US20090038636A1 (en) * 2007-08-09 2009-02-12 Asml Netherlands B.V. Cleaning method
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JP2012068579A (ja) * 2010-09-27 2012-04-05 Toppan Printing Co Ltd フォトマスクのクリーニング方法及びフォトマスクのクリーニング装置
US9539622B2 (en) * 2014-03-18 2017-01-10 Asml Netherlands B.V. Apparatus for and method of active cleaning of EUV optic with RF plasma field
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US9888554B2 (en) * 2016-01-21 2018-02-06 Asml Netherlands B.V. System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector
US9824893B1 (en) * 2016-06-28 2017-11-21 Lam Research Corporation Tin oxide thin film spacers in semiconductor device manufacturing
JP6763959B2 (ja) * 2016-09-30 2020-09-30 ギガフォトン株式会社 チャンバ装置、ターゲット生成方法および極端紫外光生成装置
JP2021501907A (ja) * 2017-11-02 2021-01-21 エーエスエムエル ネザーランズ ビー．ブイ． 極端紫外線光源のチャンバ内の光学系の表面の洗浄
TWI673567B (zh) * 2018-02-13 2019-10-01 特銓股份有限公司 光罩靜電清潔設備以及光罩靜電清潔方法
JP7340524B2 (ja) * 2018-02-13 2023-09-07 エーエスエムエル ネザーランズ ビー．ブイ． Ｅｕｖチャンバにおける構造物表面の洗浄
US11979971B2 (en) * 2018-06-29 2024-05-07 Taiwan Semiconductor Manufacturing Company, Ltd. EUV light source and apparatus for lithography
KR20200052124A (ko) * 2018-11-06 2020-05-14 삼성전자주식회사 Euv 집광 장치 및 상기 euv 집광 장치를 포함하는 리소그래피 장치
US11347143B2 (en) 2019-09-30 2022-05-31 Taiwan Semiconductor Manufacturing Company Ltd. Cleaning method, method for forming semiconductor structure and system thereof
WO2022144179A1 (en) * 2020-12-30 2022-07-07 Asml Netherlands B.V. Apparatus and method for cleaning an inspection system

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Also Published As

Publication number Publication date
EP1764653A3 (de) 2008-01-30
JP4690277B2 (ja) 2011-06-01
CN1959541A (zh) 2007-05-09
TW200719983A (en) 2007-06-01
SG131060A1 (en) 2007-04-26
JP2007096297A (ja) 2007-04-12
JP2011082551A (ja) 2011-04-21
US8317929B2 (en) 2012-11-27
JP5513354B2 (ja) 2014-06-04
EP1764653B1 (de) 2011-05-04
US20070062557A1 (en) 2007-03-22
CN1959541B (zh) 2010-12-15
EP1764653A2 (de) 2007-03-21
TWI315681B (en) 2009-10-11

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