DE602006002439D1 - Lithografische Vorrichtung, Kontaminantfalle und Verfahren zur Herstellung einer Vorrichtung - Google Patents

Lithografische Vorrichtung, Kontaminantfalle und Verfahren zur Herstellung einer Vorrichtung

Info

Publication number
DE602006002439D1
DE602006002439D1 DE602006002439T DE602006002439T DE602006002439D1 DE 602006002439 D1 DE602006002439 D1 DE 602006002439D1 DE 602006002439 T DE602006002439 T DE 602006002439T DE 602006002439 T DE602006002439 T DE 602006002439T DE 602006002439 D1 DE602006002439 D1 DE 602006002439D1
Authority
DE
Germany
Prior art keywords
making
lithographic apparatus
contaminant trap
contaminant
trap
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006002439T
Other languages
English (en)
Inventor
Leonid Aizikovitch Sjmaenok
Josephus Jacobus Smits
Vadim Yevgenyevich Banine
Den Wildenberg Lambertus A Van
Alexander Alexandrovit Schmidt
Arnoud Cornelis Wassink
Paul Peter Anna Antonius Brom
Eric Louis Willem Verpalen
De Pas Antonius Johannes Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE602006002439D1 publication Critical patent/DE602006002439D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

Landscapes

  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE602006002439T 2005-07-06 2006-07-05 Lithografische Vorrichtung, Kontaminantfalle und Verfahren zur Herstellung einer Vorrichtung Active DE602006002439D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/175,036 US7397056B2 (en) 2005-07-06 2005-07-06 Lithographic apparatus, contaminant trap, and device manufacturing method

Publications (1)

Publication Number Publication Date
DE602006002439D1 true DE602006002439D1 (de) 2008-10-09

Family

ID=37116128

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006002439T Active DE602006002439D1 (de) 2005-07-06 2006-07-05 Lithografische Vorrichtung, Kontaminantfalle und Verfahren zur Herstellung einer Vorrichtung

Country Status (8)

Country Link
US (2) US7397056B2 (de)
EP (1) EP1742110B1 (de)
JP (1) JP4463243B2 (de)
KR (1) KR100803741B1 (de)
CN (1) CN1892441B (de)
DE (1) DE602006002439D1 (de)
SG (2) SG128670A1 (de)
TW (1) TWI341443B (de)

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US7839482B2 (en) * 2007-05-21 2010-11-23 Asml Netherlands B.V. Assembly comprising a radiation source, a reflector and a contaminant barrier
US8227771B2 (en) * 2007-07-23 2012-07-24 Asml Netherlands B.V. Debris prevention system and lithographic apparatus
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WO2009144609A1 (en) * 2008-05-28 2009-12-03 Philips Intellectual Property & Standards Gmbh Debris mitigation device
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CN103901737B (zh) 2010-06-25 2017-08-25 Asml荷兰有限公司 用于euv掩模版的表膜和多层反射镜
US9268031B2 (en) * 2012-04-09 2016-02-23 Kla-Tencor Corporation Advanced debris mitigation of EUV light source
US9753383B2 (en) * 2012-06-22 2017-09-05 Asml Netherlands B.V. Radiation source and lithographic apparatus
EP2866753A1 (de) 2012-06-29 2015-05-06 The Procter & Gamble Company System und verfahren für kontinuierliche hochgeschwindigkeitsanwendung eines streifenmaterials auf ein bewegtes blattförmiges substratmaterial
KR20140036538A (ko) * 2012-09-17 2014-03-26 삼성전자주식회사 극자외선 생성 장치, 이를 포함하는 노광 장치 및 이러한 노광 장치를 사용해서 제조된 전자 디바이스
CN103237401A (zh) * 2013-04-01 2013-08-07 哈尔滨工业大学 一种去除毛细管放电极紫外光刻光源中碎屑的除屑系统
KR102115543B1 (ko) * 2013-04-26 2020-05-26 삼성전자주식회사 극자외선 광원 장치
KR102094800B1 (ko) * 2013-07-25 2020-03-31 삼성디스플레이 주식회사 오염 물질 측정 기판, 이를 이용한 기판 제조 장치 및 제조 방법
CN106030413B (zh) * 2014-02-20 2018-09-14 Asml荷兰有限公司 光刻设备和器件制造方法
US9609731B2 (en) 2014-07-07 2017-03-28 Media Lario Srl Systems and methods for synchronous operation of debris-mitigation devices
WO2019043773A1 (ja) * 2017-08-29 2019-03-07 ギガフォトン株式会社 極端紫外光生成装置
US11307119B2 (en) * 2019-04-23 2022-04-19 Pall Corporation Aircraft air contaminant collector device and method of use

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US7485881B2 (en) * 2004-12-29 2009-02-03 Asml Netherlands B.V. Lithographic apparatus, illumination system, filter system and method for cooling a support of such a filter system
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Also Published As

Publication number Publication date
TWI341443B (en) 2011-05-01
JP4463243B2 (ja) 2010-05-19
KR20070005528A (ko) 2007-01-10
SG128670A1 (en) 2007-01-30
KR100803741B1 (ko) 2008-02-15
CN1892441B (zh) 2011-04-06
US7397056B2 (en) 2008-07-08
US7612353B2 (en) 2009-11-03
US20070018118A1 (en) 2007-01-25
EP1742110B1 (de) 2008-08-27
CN1892441A (zh) 2007-01-10
US20070023706A1 (en) 2007-02-01
TW200712787A (en) 2007-04-01
JP2007019510A (ja) 2007-01-25
EP1742110A2 (de) 2007-01-10
SG149006A1 (en) 2009-01-29
EP1742110A3 (de) 2007-05-23

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