DE602007012636D1 - Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung - Google Patents

Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung

Info

Publication number
DE602007012636D1
DE602007012636D1 DE602007012636T DE602007012636T DE602007012636D1 DE 602007012636 D1 DE602007012636 D1 DE 602007012636D1 DE 602007012636 T DE602007012636 T DE 602007012636T DE 602007012636 T DE602007012636 T DE 602007012636T DE 602007012636 D1 DE602007012636 D1 DE 602007012636D1
Authority
DE
Germany
Prior art keywords
making
lithographic apparatus
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602007012636T
Other languages
English (en)
Inventor
Bastiaan Stephanus Hendricus Jansen
Erik Roelof Loopstra
Marius Ravensbergen
Markus Josef Hauf
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
ASML Netherlands BV
Original Assignee
Carl Zeiss SMT GmbH
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH, ASML Netherlands BV filed Critical Carl Zeiss SMT GmbH
Publication of DE602007012636D1 publication Critical patent/DE602007012636D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/028—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
DE602007012636T 2006-11-07 2007-11-05 Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung Active DE602007012636D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/593,648 US7525640B2 (en) 2006-11-07 2006-11-07 Lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
DE602007012636D1 true DE602007012636D1 (de) 2011-04-07

Family

ID=39093001

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602007012636T Active DE602007012636D1 (de) 2006-11-07 2007-11-05 Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung

Country Status (8)

Country Link
US (1) US7525640B2 (de)
EP (1) EP1921505B1 (de)
JP (1) JP4686527B2 (de)
KR (1) KR100909455B1 (de)
CN (1) CN101178547B (de)
DE (1) DE602007012636D1 (de)
SG (1) SG142264A1 (de)
TW (1) TWI372317B (de)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006045075A1 (de) * 2006-09-21 2008-04-03 Carl Zeiss Smt Ag Steuerbares optisches Element
US8064151B2 (en) * 2007-08-14 2011-11-22 Asml Netherlands B.V. Lithographic apparatus and thermal optical manipulator control method
WO2009026970A1 (en) * 2007-08-24 2009-03-05 Carl Zeiss Smt Ag Controllable optical element and method for operating an optical element with thermal actuators and projection exposure apparatus for semiconductor lithography
CN103299249B (zh) 2007-10-09 2015-08-26 卡尔蔡司Smt有限责任公司 用于控制光学元件的温度的装置
NL1036905A1 (nl) * 2008-06-03 2009-12-04 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP4970498B2 (ja) 2008-06-24 2012-07-04 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置およびデバイス製造方法
NL2003640A (en) 2008-11-17 2010-05-18 Asml Netherlands Bv Method for a lithographic apparatus.
NL2003689A (en) * 2008-11-26 2010-05-27 Asml Netherlands Bv Method for a lithographic apparatus.
NL2003806A (en) * 2008-12-15 2010-06-16 Asml Netherlands Bv Method for a lithographic apparatus.
NL2004323A (en) * 2009-04-16 2010-10-18 Asml Netherlands Bv Device manufacturing method and lithographic apparatus.
WO2010133231A1 (en) * 2009-05-16 2010-11-25 Carl Zeiss Smt Ag Projection exposure apparatus for semiconductor lithography comprising an optical correction arrangement
NL2005009A (en) * 2009-07-27 2011-01-31 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
NL2005449A (en) * 2009-11-16 2012-04-05 Asml Netherlands Bv Lithographic method and apparatus.
KR101156431B1 (ko) * 2009-12-01 2012-06-18 삼성모바일디스플레이주식회사 증착 장치 및 이를 이용한 유기 발광 소자 제조 방법
EP2365390A3 (de) 2010-03-12 2017-10-04 ASML Netherlands B.V. Lithographische Vorrichtung und Verfahren
JP5127875B2 (ja) * 2010-04-28 2013-01-23 キヤノン株式会社 リソグラフィ装置及び物品の製造方法
US11105686B2 (en) * 2010-05-10 2021-08-31 University of Pittshurgh-Of the Commonwealth System of Higher Education Spatial-domain low-coherence quantitative phase microscopy
CN102375344B (zh) * 2010-08-18 2013-09-11 上海微电子装备有限公司 控制透镜像质变化的方法
DE102010041528A1 (de) 2010-09-28 2012-03-29 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit optimierter Justagemöglichkeit
NL2007439A (en) * 2010-10-19 2012-04-23 Asml Netherlands Bv Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method.
NL2007477A (en) * 2010-10-22 2012-04-24 Asml Netherlands Bv Method of optimizing a lithographic process, device manufacturing method, lithographic apparatus, computer program product and simulation apparatus.
NL2007498A (en) * 2010-12-23 2012-06-27 Asml Netherlands Bv Lithographic apparatus and method of modifying a beam of radiation within a lithographic apparatus.
NL2008184A (en) 2011-02-28 2012-08-29 Asml Netherlands Bv Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method.
US8736814B2 (en) * 2011-06-13 2014-05-27 Micron Technology, Inc. Lithography wave-front control system and method
DE102011077784A1 (de) 2011-06-20 2012-12-20 Carl Zeiss Smt Gmbh Projektionsanordnung
KR101693950B1 (ko) * 2011-09-29 2017-01-06 칼 짜이스 에스엠테 게엠베하 마이크로리소그래피 투영 노광 장치의 투영 대물 렌즈
NL2009850A (en) 2011-12-02 2013-06-05 Asml Netherlands Bv Lithographic method and apparatus.
FR3011331B1 (fr) 2013-10-01 2017-02-17 Univ Aix Marseille Capteur a gaz a couche sensible chauffee
US9946166B2 (en) 2014-05-02 2018-04-17 Asml Netherlands B.V. Reduction of hotspots of dense features
CN107111244A (zh) 2014-12-17 2017-08-29 Asml荷兰有限公司 使用图案形成装置形貌引入的相位的方法和设备
US20170315441A1 (en) 2014-12-17 2017-11-02 Asml Netherlands B.V. Method and apparatus for using patterning device topography induced phase
CN107111240A (zh) 2014-12-17 2017-08-29 Asml荷兰有限公司 使用图案形成装置形貌引入的相位的方法和设备
DE102017203571A1 (de) * 2017-03-06 2018-09-06 Carl Zeiss Smt Gmbh Optische anordnung für eine lithographieanlage sowie verfahren zum betreiben einer lithographieanlage
DE102017206256A1 (de) * 2017-04-11 2018-10-11 Carl Zeiss Smt Gmbh Wellenfrontkorrekturelement zur Verwendung in einem optischen System
JP2022185871A (ja) 2021-06-03 2022-12-15 キヤノン株式会社 露光方法、露光装置、および物品製造方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57114327A (en) * 1980-12-29 1982-07-16 Fanuc Ltd Method for correcting corner shape
JPS60163046A (ja) * 1984-02-03 1985-08-24 Nippon Kogaku Kk <Nikon> 投影露光光学装置及び投影露光方法
US4790654A (en) * 1987-07-17 1988-12-13 Trw Inc. Spectral filter
DE69220868T2 (de) * 1991-09-07 1997-11-06 Canon Kk System zur Stabilisierung der Formen von optischen Elementen, Belichtungsvorrichtung unter Verwendung dieses Systems und Verfahren zur Herstellung von Halbleitervorrichtungen
JP3368091B2 (ja) 1994-04-22 2003-01-20 キヤノン株式会社 投影露光装置及びデバイスの製造方法
JP3652325B2 (ja) * 1994-04-22 2005-05-25 キヤノン株式会社 投影露光装置及びデバイスの製造方法
JPH09232213A (ja) * 1996-02-26 1997-09-05 Nikon Corp 投影露光装置
JPH1167651A (ja) * 1997-08-25 1999-03-09 Nikon Corp 投影露光装置
JPH11154643A (ja) * 1997-09-16 1999-06-08 Nikon Corp 露光装置および該装置を用いた露光方法
DE19956353C1 (de) * 1999-11-24 2001-08-09 Zeiss Carl Optische Anordnung
US7095484B1 (en) * 2001-06-27 2006-08-22 University Of South Florida Method and apparatus for maskless photolithography
JP2003297729A (ja) * 2002-04-03 2003-10-17 Nikon Corp 投影光学系、露光装置および露光方法
US7343271B2 (en) * 2003-10-27 2008-03-11 International Business Machines Corporation Incorporation of a phase map into fast model-based optical proximity correction simulation kernels to account for near and mid-range flare
JP4980922B2 (ja) 2004-11-18 2012-07-18 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置及びマイクロリソグラフィ投影露光装置の像面湾曲を修正するための方法
DE102006045075A1 (de) * 2006-09-21 2008-04-03 Carl Zeiss Smt Ag Steuerbares optisches Element

Also Published As

Publication number Publication date
KR20080041583A (ko) 2008-05-13
KR100909455B1 (ko) 2009-07-28
JP2008118135A (ja) 2008-05-22
JP4686527B2 (ja) 2011-05-25
US7525640B2 (en) 2009-04-28
TWI372317B (en) 2012-09-11
EP1921505B1 (de) 2011-02-23
CN101178547A (zh) 2008-05-14
SG142264A1 (en) 2008-05-28
US20080123066A1 (en) 2008-05-29
TW200827941A (en) 2008-07-01
EP1921505A1 (de) 2008-05-14
CN101178547B (zh) 2010-09-29

Similar Documents

Publication Publication Date Title
DE602007012636D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602007012032D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602006001507D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005020720D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005002155D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005000696D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005000147D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005021180D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005004856D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005020893D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005018150D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005020891D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005007563D1 (de) Lithografische Vorrichtung und Verfahren zur Herstellung einer Vorrichtung
DE602005001835D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005010014D1 (de) Lithographischer Apparat und Methode zur Herstellung einer Vorrichtung
DE602006018552D1 (de) Lithografischer Apparat mit zwei Trägerplatten und Verfahren zur Herstellung einer Vorrichtung
DE602005004949D1 (de) Lithographischer Apparat und Methode zur Herstellung einer Vorrichtung
DE60302897D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005013038D1 (de) Lithographischer Apparat, Verfahren zur Herstellung einer Vorrichtung
DE602004025893D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602007011160D1 (de) Lithographische Vorrichtung und Methode zur Herstellung einer Vorrichtung
DE602006002439D1 (de) Lithografische Vorrichtung, Kontaminantfalle und Verfahren zur Herstellung einer Vorrichtung
DE602005011239D1 (de) Lithografischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602008005236D1 (de) Verfahren und Vorrichtung zur Herstellung einer vertikalen Beschichtungsmaske
DE602005022957D1 (de) Lithographischer Apparat und Methode zur Herstellung einer Vorrichtung