DE69220868T2 - System zur Stabilisierung der Formen von optischen Elementen, Belichtungsvorrichtung unter Verwendung dieses Systems und Verfahren zur Herstellung von Halbleitervorrichtungen - Google Patents
System zur Stabilisierung der Formen von optischen Elementen, Belichtungsvorrichtung unter Verwendung dieses Systems und Verfahren zur Herstellung von HalbleitervorrichtungenInfo
- Publication number
- DE69220868T2 DE69220868T2 DE69220868T DE69220868T DE69220868T2 DE 69220868 T2 DE69220868 T2 DE 69220868T2 DE 69220868 T DE69220868 T DE 69220868T DE 69220868 T DE69220868 T DE 69220868T DE 69220868 T2 DE69220868 T2 DE 69220868T2
- Authority
- DE
- Germany
- Prior art keywords
- stabilizing
- shapes
- semiconductor devices
- optical elements
- exposure device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
- G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
- G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G03F7/70891—Temperature
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP03255800A JP3132086B2 (ja) | 1991-09-07 | 1991-09-07 | 光学素子の形状制御方法および露光装置 |
JP02326292A JP3238737B2 (ja) | 1992-01-13 | 1992-01-13 | 被照明部材の温度制御方法およびその装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69220868D1 DE69220868D1 (de) | 1997-08-21 |
DE69220868T2 true DE69220868T2 (de) | 1997-11-06 |
Family
ID=26360579
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69220868T Expired - Fee Related DE69220868T2 (de) | 1991-09-07 | 1992-09-04 | System zur Stabilisierung der Formen von optischen Elementen, Belichtungsvorrichtung unter Verwendung dieses Systems und Verfahren zur Herstellung von Halbleitervorrichtungen |
Country Status (4)
Country | Link |
---|---|
US (1) | US5390228A (de) |
EP (1) | EP0532236B1 (de) |
CA (1) | CA2077572C (de) |
DE (1) | DE69220868T2 (de) |
Families Citing this family (65)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0772318A (ja) * | 1993-04-28 | 1995-03-17 | Canon Inc | 反射装置とこれを用いた照明装置や露光装置、並びにデバイス製造方法 |
JP3311126B2 (ja) * | 1993-12-20 | 2002-08-05 | キヤノン株式会社 | ミラーユニットおよび該ミラーユニットを備えた露光装置 |
JP3368091B2 (ja) * | 1994-04-22 | 2003-01-20 | キヤノン株式会社 | 投影露光装置及びデバイスの製造方法 |
JP3814359B2 (ja) * | 1996-03-12 | 2006-08-30 | キヤノン株式会社 | X線投影露光装置及びデバイス製造方法 |
JP3563224B2 (ja) * | 1996-03-25 | 2004-09-08 | 住友電気工業株式会社 | 半導体ウエハの評価方法、熱処理方法、および熱処理装置 |
JP3231241B2 (ja) * | 1996-05-01 | 2001-11-19 | キヤノン株式会社 | X線縮小露光装置、及び該装置を用いた半導体製造方法 |
US5881088A (en) * | 1997-01-08 | 1999-03-09 | Trw Inc. | Face-cooled high-power laser optic cell |
DE19752713A1 (de) * | 1997-11-28 | 1999-06-02 | Zeiss Carl Fa | UV-Optisches System mit reduzierter Alterung |
DE19807094A1 (de) | 1998-02-20 | 1999-08-26 | Zeiss Carl Fa | Optische Anordnung und Projektionsbelichtungsanlage der Mikrolithographie mit passiver thermischer Kompensation |
US6377655B1 (en) * | 1998-05-08 | 2002-04-23 | Nikon Corporation | Reflective mirror for soft x-ray exposure apparatus |
DE19827602A1 (de) * | 1998-06-20 | 1999-12-23 | Zeiss Carl Fa | Verfahren zur Korrektur nicht-rotationssymmetrischer Bildfehler |
US6385290B1 (en) * | 1998-09-14 | 2002-05-07 | Nikon Corporation | X-ray apparatus |
DE19956353C1 (de) * | 1999-11-24 | 2001-08-09 | Zeiss Carl | Optische Anordnung |
DE19956354B4 (de) * | 1999-11-24 | 2004-02-19 | Carl Zeiss | Verfahren zum Ausgleich von nicht rotationssymmetrischen Abbildungsfehlern in einem optischen System |
US6445439B1 (en) * | 1999-12-27 | 2002-09-03 | Svg Lithography Systems, Inc. | EUV reticle thermal management |
DE19963588C2 (de) | 1999-12-29 | 2002-01-10 | Zeiss Carl | Optische Anordnung |
DE10033472A1 (de) * | 2000-07-10 | 2002-01-24 | Metz Elektronik Gmbh | Optisches Gerät |
US6455821B1 (en) | 2000-08-17 | 2002-09-24 | Nikon Corporation | System and method to control temperature of an article |
EP1197803B1 (de) * | 2000-10-10 | 2012-02-01 | ASML Netherlands B.V. | Lithographischer Apparat |
EP1220038B1 (de) * | 2000-12-22 | 2007-03-14 | ASML Netherlands B.V. | Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung |
US6924492B2 (en) | 2000-12-22 | 2005-08-02 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
JP4006251B2 (ja) * | 2002-03-20 | 2007-11-14 | キヤノン株式会社 | ミラー装置、ミラーの調整方法、露光装置、露光方法及び半導体デバイスの製造方法 |
US20050099611A1 (en) * | 2002-06-20 | 2005-05-12 | Nikon Corporation | Minimizing thermal distortion effects on EUV mirror |
JP3944008B2 (ja) * | 2002-06-28 | 2007-07-11 | キヤノン株式会社 | 反射ミラー装置及び露光装置及びデバイス製造方法 |
JP4458323B2 (ja) * | 2003-02-13 | 2010-04-28 | キヤノン株式会社 | 保持装置、当該保持装置を有する露光装置、及びデバイス製造方法 |
JP4018564B2 (ja) * | 2003-03-14 | 2007-12-05 | キヤノン株式会社 | 光学系、及びそれを用いた露光装置、デバイスの製造方法 |
DE10317662A1 (de) * | 2003-04-17 | 2004-11-18 | Carl Zeiss Smt Ag | Projektionsobjektiv, mikrolithographische Projektionsbelichtungsanlage und Verfahren zur Herstellung einer Halbleiterschaltung |
JP2004363559A (ja) * | 2003-05-14 | 2004-12-24 | Canon Inc | 光学部材保持装置 |
WO2005022614A1 (ja) * | 2003-08-28 | 2005-03-10 | Nikon Corporation | 露光方法及び装置、並びにデバイス製造方法 |
DE60315986T2 (de) * | 2003-10-09 | 2008-05-21 | Asml Netherlands B.V. | Lithographischer Apparat und Methode zur Herstellung einer Vorrichtung |
JP4666908B2 (ja) * | 2003-12-12 | 2011-04-06 | キヤノン株式会社 | 露光装置、計測方法及びデバイス製造方法 |
US7098994B2 (en) | 2004-01-16 | 2006-08-29 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
WO2005078774A1 (ja) * | 2004-02-13 | 2005-08-25 | Nikon Corporation | 露光方法及び装置、並びにデバイス製造方法 |
WO2005109104A2 (en) * | 2004-05-06 | 2005-11-17 | Carl Zeiss Laser Optics Gmbh | Optical component having an improved thermal behavior |
US7483223B2 (en) | 2004-05-06 | 2009-01-27 | Carl Zeiss Smt Ag | Optical component having an improved transient thermal behavior and method for improving the transient thermal behavior of an optical component |
US7375794B2 (en) * | 2004-08-04 | 2008-05-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7186978B2 (en) * | 2004-10-15 | 2007-03-06 | Millennium Enginerring And Integration Company | Compact emissivity and temperature measuring infrared detector |
US7959310B2 (en) * | 2006-09-13 | 2011-06-14 | Carl Zeiss Smt Gmbh | Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element |
DE102006045075A1 (de) * | 2006-09-21 | 2008-04-03 | Carl Zeiss Smt Ag | Steuerbares optisches Element |
US7525640B2 (en) * | 2006-11-07 | 2009-04-28 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
KR101492287B1 (ko) | 2007-03-27 | 2015-02-11 | 칼 짜이스 에스엠테 게엠베하 | 편평하게 조사된 보정광을 이용한 광학 소자의 보정 |
US8064151B2 (en) * | 2007-08-14 | 2011-11-22 | Asml Netherlands B.V. | Lithographic apparatus and thermal optical manipulator control method |
EP2181357A1 (de) * | 2007-08-24 | 2010-05-05 | Carl Zeiss SMT AG | Steuerbares optisches element und verfahren zum betrieb eines optischen elements mit thermischen stellgliedern und projektionsbelichtungsvorrichtung für die halbleiterlithografie |
US7740362B1 (en) * | 2008-02-19 | 2010-06-22 | Jefferson Science Associates | Mirror with thermally controlled radius of curvature |
WO2009152959A1 (en) * | 2008-06-17 | 2009-12-23 | Carl Zeiss Smt Ag | Projection exposure apparatus for semiconductor lithography comprising a device for the thermal manipulation of an optical element |
DE102009033818A1 (de) | 2008-09-19 | 2010-03-25 | Carl Zeiss Smt Ag | Temperiervorrichtung für eine optische Baugruppe |
EP2169464A1 (de) | 2008-09-29 | 2010-03-31 | Carl Zeiss SMT AG | Beleuchtungssystem eines mikrolithografischen Projektionsbelichtungsgerätes |
WO2010133231A1 (en) * | 2009-05-16 | 2010-11-25 | Carl Zeiss Smt Ag | Projection exposure apparatus for semiconductor lithography comprising an optical correction arrangement |
WO2012013747A1 (en) | 2010-07-30 | 2012-02-02 | Carl Zeiss Smt Gmbh | Euv exposure apparatus |
DE102010039930A1 (de) * | 2010-08-30 | 2012-03-01 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage |
DE102010041298A1 (de) | 2010-09-24 | 2012-03-29 | Carl Zeiss Smt Gmbh | EUV-Mikrolithographie-Projektionsbelichtungsanlage mit einer Heizlichtquelle |
DE102010041528A1 (de) | 2010-09-28 | 2012-03-29 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage mit optimierter Justagemöglichkeit |
DE102011005778A1 (de) * | 2011-03-18 | 2012-09-20 | Carl Zeiss Smt Gmbh | Optisches Element |
DE102011086513A1 (de) * | 2011-11-16 | 2013-05-16 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithographie |
JP6236095B2 (ja) | 2013-03-13 | 2017-11-22 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ装置 |
DE102013219986A1 (de) * | 2013-10-02 | 2015-04-02 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithographie |
DE102014204171A1 (de) | 2014-03-06 | 2015-09-24 | Carl Zeiss Smt Gmbh | Optisches Element und optische Anordnung damit |
DE102015212859A1 (de) * | 2015-07-09 | 2016-07-07 | Carl Zeiss Smt Gmbh | Lithographieanlage sowie Verfahren |
DE102017217121A1 (de) * | 2017-09-26 | 2019-03-28 | Robert Bosch Gmbh | Anordnung eines optischen Systems und Temperierungsverfahren |
DE102019217185A1 (de) * | 2019-11-07 | 2021-05-12 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage für die Halbleiterlithographie |
DE102020203753A1 (de) | 2020-03-24 | 2021-09-30 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage für die Halbleiterlithographie |
US11287751B2 (en) * | 2020-07-29 | 2022-03-29 | Taiwan Semiconductor Manufacturing Co., Ltd. | System and method for lens heating control |
CN113204175B (zh) * | 2021-04-25 | 2022-10-28 | 华虹半导体(无锡)有限公司 | 浸润式光刻机曝光方法 |
DE102021212971A1 (de) * | 2021-11-18 | 2023-05-25 | Carl Zeiss Smt Gmbh | Optisches system, projektionsbelichtungsanlage und verfahren |
US11693326B1 (en) * | 2022-03-11 | 2023-07-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | System and method for dynamically controlling temperature of thermostatic reticles |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58112329A (ja) * | 1981-12-26 | 1983-07-04 | Fujitsu Ltd | X線露光方法 |
DE3752314T2 (de) * | 1986-07-11 | 2000-09-14 | Canon Kk | Verkleinerndes Projektionsbelichtungssystem des Reflexionstyps für Röntgenstrahlung |
JPS63119233A (ja) * | 1986-11-07 | 1988-05-23 | Hitachi Ltd | X線転写装置 |
JP2546312B2 (ja) * | 1987-12-29 | 1996-10-23 | キヤノン株式会社 | 反射型マスクおよび該反射型マスクを用いた露光装置と露光方法 |
EP0279670B1 (de) * | 1987-02-18 | 1997-10-29 | Canon Kabushiki Kaisha | Reflexionsmaske |
JPS6441215A (en) * | 1987-08-06 | 1989-02-13 | Sharp Kk | X-ray aligner |
JP2748127B2 (ja) * | 1988-09-02 | 1998-05-06 | キヤノン株式会社 | ウエハ保持方法 |
EP0357423B1 (de) * | 1988-09-02 | 1995-03-15 | Canon Kabushiki Kaisha | Belichtungseinrichtung |
US5004319A (en) * | 1988-12-29 | 1991-04-02 | The United States Of America As Represented By The Department Of Energy | Crystal diffraction lens with variable focal length |
EP0422814B1 (de) * | 1989-10-02 | 1999-03-17 | Canon Kabushiki Kaisha | Belichtungsvorrichtung |
-
1992
- 1992-09-04 EP EP92308030A patent/EP0532236B1/de not_active Expired - Lifetime
- 1992-09-04 CA CA002077572A patent/CA2077572C/en not_active Expired - Fee Related
- 1992-09-04 DE DE69220868T patent/DE69220868T2/de not_active Expired - Fee Related
-
1994
- 1994-07-05 US US08/270,794 patent/US5390228A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0532236B1 (de) | 1997-07-16 |
EP0532236A1 (de) | 1993-03-17 |
DE69220868D1 (de) | 1997-08-21 |
CA2077572C (en) | 1998-08-18 |
CA2077572A1 (en) | 1993-03-08 |
US5390228A (en) | 1995-02-14 |
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