DE602007011160D1 - Lithographische Vorrichtung und Methode zur Herstellung einer Vorrichtung - Google Patents

Lithographische Vorrichtung und Methode zur Herstellung einer Vorrichtung

Info

Publication number
DE602007011160D1
DE602007011160D1 DE602007011160T DE602007011160T DE602007011160D1 DE 602007011160 D1 DE602007011160 D1 DE 602007011160D1 DE 602007011160 T DE602007011160 T DE 602007011160T DE 602007011160 T DE602007011160 T DE 602007011160T DE 602007011160 D1 DE602007011160 D1 DE 602007011160D1
Authority
DE
Germany
Prior art keywords
making
lithographic apparatus
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602007011160T
Other languages
English (en)
Inventor
Hans Butler
Martijn Houkes
Der Toorn Jan-Gerard Cornelis Van
Wilhelmus Franciscus Johannes Simons
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE602007011160D1 publication Critical patent/DE602007011160D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Feedback Control In General (AREA)
DE602007011160T 2006-07-24 2007-07-24 Lithographische Vorrichtung und Methode zur Herstellung einer Vorrichtung Active DE602007011160D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/491,493 US7630059B2 (en) 2006-07-24 2006-07-24 Lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
DE602007011160D1 true DE602007011160D1 (de) 2011-01-27

Family

ID=38441869

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602007011160T Active DE602007011160D1 (de) 2006-07-24 2007-07-24 Lithographische Vorrichtung und Methode zur Herstellung einer Vorrichtung

Country Status (8)

Country Link
US (1) US7630059B2 (de)
EP (1) EP1882985B1 (de)
JP (1) JP4734298B2 (de)
KR (1) KR100869308B1 (de)
CN (1) CN100565351C (de)
DE (1) DE602007011160D1 (de)
SG (1) SG139663A1 (de)
TW (1) TWI356276B (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1036662A1 (nl) * 2008-04-08 2009-10-09 Asml Netherlands Bv Stage system and lithographic apparatus comprising such stage system.
NL2003993A (nl) * 2009-01-22 2010-07-26 Asml Netherlands Bv Control system, lithographic apparatus and a method to control a position quantity of a control location of a movable object.
JP5235707B2 (ja) * 2009-02-03 2013-07-10 キヤノン株式会社 制御装置
JP5349093B2 (ja) * 2009-03-16 2013-11-20 株式会社日立ハイテクノロジーズ プロキシミティ露光装置、プロキシミティ露光装置の基板位置決め方法、及び表示用パネル基板の製造方法
NL2005013A (en) * 2009-07-31 2011-02-02 Asml Netherlands Bv Positioning system, lithographic apparatus and method.
NL2006804A (en) * 2010-06-24 2011-12-28 Asml Netherlands Bv Measurement system, method and lithographic apparatus.
NL2006981A (en) * 2010-07-26 2012-01-30 Asml Netherlands Bv Position control system, lithographic apparatus, and method to control a position of a movable object.
NL2007606A (en) * 2010-11-22 2012-05-23 Asml Netherlands Bv Controller, lithographic apparatus, method of controlling the position of an object and device manufacturing method.
CN102087482B (zh) * 2010-12-27 2012-10-03 中国科学院光电技术研究所 光刻机工件台同步运动误差校正控制系统
CN102768468B (zh) 2011-05-03 2015-07-22 上海微电子装备有限公司 用于光刻设备的粗动台的质心测校的方法
NL2010456A (en) * 2012-04-18 2013-10-21 Asml Holding Nv Lithographic apparatuses and methods for compensating for eigenmode coupling.
CN105142711B (zh) * 2013-03-12 2019-01-22 考里安国际公司 微突起施加器
CN105706001B (zh) * 2013-10-30 2017-10-03 Asml荷兰有限公司 在光刻术中的物体定位
US10095123B2 (en) * 2014-04-04 2018-10-09 Asml Netherlands B.V. Control system, positioning system, lithographic apparatus, control method, device manufacturing method and control program
AU2015274601B2 (en) 2014-06-11 2020-02-27 Arizona Board Of Regents On Behalf Of Arizona State University Systems and methods for non-intrusive deception detection
JP7148295B2 (ja) 2018-07-04 2022-10-05 キヤノン株式会社 制御装置、露光装置及び物品の製造方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3215280B2 (ja) * 1995-03-02 2001-10-02 キヤノン株式会社 ステージ位置決め制御装置
JP3733174B2 (ja) * 1996-06-19 2006-01-11 キヤノン株式会社 走査型投影露光装置
JPH11150062A (ja) * 1997-11-14 1999-06-02 Nikon Corp 除振装置及び露光装置並びに除振台の除振方法
US6287735B2 (en) * 1998-09-16 2001-09-11 Nikon Corporation Method and apparatus for controlling the leveling table of a wafer stage
EP1164352A4 (de) * 1999-02-17 2007-09-05 Nikon Corp Positionsdetektierungsverfahren, positionssensor, beleuchtungsvorrichtung und -verfahren, vorrichtung und verfahren zu dessen fabrikation
JP3298069B2 (ja) * 1999-05-20 2002-07-02 住友重機械工業株式会社 ステージの位置制御装置及び速度制御装置
JP3312297B2 (ja) * 1999-07-02 2002-08-05 住友重機械工業株式会社 ステージ位置制御装置
US6504162B1 (en) * 2000-09-15 2003-01-07 Nikon Corporation Stage device, control system, and method for stabilizing wafer stage and wafer table
CN1229624C (zh) * 2000-10-19 2005-11-30 株式会社尼康 位置探测法和装置、曝光法和设备、控制程序以及器件制造法
WO2002077484A2 (en) * 2001-03-26 2002-10-03 Cymer, Inc. Method and device for vibration control
JP2003264134A (ja) * 2002-03-08 2003-09-19 Nikon Corp ステージ制御装置、露光装置、及びデバイス製造方法
JP2003264133A (ja) * 2002-03-08 2003-09-19 Nikon Corp ステージ制御装置、露光装置、デバイス製造方法、及びステージ制御方法
JP2004100953A (ja) * 2002-08-23 2004-04-02 Nikon Corp 制振装置及び露光装置
JP2005051197A (ja) * 2003-07-17 2005-02-24 Nikon Corp ステージ制御方法及び装置、ステージ制御プログラム、露光装置、並びにデバイス製造方法
TWI254190B (en) * 2003-09-22 2006-05-01 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
US7289858B2 (en) * 2004-05-25 2007-10-30 Asml Netherlands B.V. Lithographic motion control system and method
JP4493484B2 (ja) * 2004-11-29 2010-06-30 株式会社日立ハイテクノロジーズ アクティブ除振方法及び装置
US7327437B2 (en) * 2004-12-07 2008-02-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7307262B2 (en) * 2004-12-23 2007-12-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7265813B2 (en) * 2004-12-28 2007-09-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
SG139663A1 (en) 2008-02-29
JP4734298B2 (ja) 2011-07-27
EP1882985B1 (de) 2010-12-15
US20080018877A1 (en) 2008-01-24
EP1882985A2 (de) 2008-01-30
CN101114133A (zh) 2008-01-30
EP1882985A3 (de) 2009-07-29
KR100869308B1 (ko) 2008-11-18
JP2008028392A (ja) 2008-02-07
US7630059B2 (en) 2009-12-08
KR20080009649A (ko) 2008-01-29
TW200821736A (en) 2008-05-16
CN100565351C (zh) 2009-12-02
TWI356276B (en) 2012-01-11

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