NL2003993A - Control system, lithographic apparatus and a method to control a position quantity of a control location of a movable object. - Google Patents
Control system, lithographic apparatus and a method to control a position quantity of a control location of a movable object.Info
- Publication number
- NL2003993A NL2003993A NL2003993A NL2003993A NL2003993A NL 2003993 A NL2003993 A NL 2003993A NL 2003993 A NL2003993 A NL 2003993A NL 2003993 A NL2003993 A NL 2003993A NL 2003993 A NL2003993 A NL 2003993A
- Authority
- NL
- Netherlands
- Prior art keywords
- control
- movable object
- lithographic equipment
- position quantity
- location
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
- G03B27/52—Details
- G03B27/58—Baseboards, masking frames, or other holders for the sensitive material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14656109P | 2009-01-22 | 2009-01-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL2003993A true NL2003993A (nl) | 2010-07-26 |
Family
ID=42336716
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL2003993A NL2003993A (nl) | 2009-01-22 | 2009-12-21 | Control system, lithographic apparatus and a method to control a position quantity of a control location of a movable object. |
Country Status (3)
Country | Link |
---|---|
US (1) | US8675179B2 (nl) |
JP (1) | JP5313179B2 (nl) |
NL (1) | NL2003993A (nl) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014072139A1 (en) * | 2012-11-06 | 2014-05-15 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
WO2015062791A1 (en) * | 2013-10-30 | 2015-05-07 | Asml Netherlands B.V. | Object positioning in lithography |
CN116819902B (zh) * | 2023-07-06 | 2024-01-23 | 哈尔滨工业大学 | 超精密光刻装备六自由度分散式复合控制系统及控制方法 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0927443A (ja) * | 1995-07-11 | 1997-01-28 | Nikon Corp | ステージ駆動制御装置 |
US6504162B1 (en) * | 2000-09-15 | 2003-01-07 | Nikon Corporation | Stage device, control system, and method for stabilizing wafer stage and wafer table |
EP1265104A1 (en) * | 2001-06-06 | 2002-12-11 | ASML Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
JP2004193425A (ja) | 2002-12-12 | 2004-07-08 | Nikon Corp | 移動制御方法及び装置、露光装置、並びにデバイス製造方法 |
JP2004273828A (ja) | 2003-03-10 | 2004-09-30 | Nikon Corp | 面位置検出方法、面位置検出装置、合焦装置、露光装置及びデバイスの製造方法 |
TWI254190B (en) * | 2003-09-22 | 2006-05-01 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
US20060061751A1 (en) * | 2004-09-21 | 2006-03-23 | Ting-Chien Teng | Stage assembly including a stage having increased vertical stroke |
US7327437B2 (en) | 2004-12-07 | 2008-02-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP4834439B2 (ja) * | 2006-03-30 | 2011-12-14 | キヤノン株式会社 | ステージ装置及びその制御方法、露光装置及びデバイス製造方法 |
US7453228B2 (en) * | 2006-04-07 | 2008-11-18 | Asml Netherlands B.V. | Method for controlling a positioning device, positioning device, and lithographic apparatus provided with a positioning device |
US7576832B2 (en) | 2006-05-04 | 2009-08-18 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7630059B2 (en) | 2006-07-24 | 2009-12-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8014881B2 (en) | 2007-02-15 | 2011-09-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7782446B2 (en) | 2007-03-01 | 2010-08-24 | Asml Netherlands B.V. | Stage system and lithographic apparatus comprising such stage system |
US7710540B2 (en) | 2007-04-05 | 2010-05-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP4820842B2 (ja) * | 2007-05-30 | 2011-11-24 | エーエスエムエル ネザーランズ ビー.ブイ. | ステージシステムおよびそのようなステージシステムを備えるリソグラフィ装置 |
EP2202426A3 (en) * | 2008-12-23 | 2017-05-03 | ASML Netherlands B.V. | A method for damping an object, an active damping system, and a lithographic apparatus |
NL2004847A (en) * | 2009-06-30 | 2011-01-04 | Asml Holding Nv | Method for controlling the position of a movable object, a control system for controlling a positioning device, and a lithographic apparatus. |
JP5495801B2 (ja) * | 2010-01-06 | 2014-05-21 | キヤノン株式会社 | 位置決め装置、露光装置及びデバイス製造方法 |
-
2009
- 2009-12-21 NL NL2003993A patent/NL2003993A/nl unknown
-
2010
- 2010-01-06 US US12/683,228 patent/US8675179B2/en active Active
- 2010-01-15 JP JP2010006407A patent/JP5313179B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2010278416A (ja) | 2010-12-09 |
JP5313179B2 (ja) | 2013-10-09 |
US20100182585A1 (en) | 2010-07-22 |
US8675179B2 (en) | 2014-03-18 |
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