DE602006018552D1 - Lithografischer Apparat mit zwei Trägerplatten und Verfahren zur Herstellung einer Vorrichtung - Google Patents

Lithografischer Apparat mit zwei Trägerplatten und Verfahren zur Herstellung einer Vorrichtung

Info

Publication number
DE602006018552D1
DE602006018552D1 DE602006018552T DE602006018552T DE602006018552D1 DE 602006018552 D1 DE602006018552 D1 DE 602006018552D1 DE 602006018552 T DE602006018552 T DE 602006018552T DE 602006018552 T DE602006018552 T DE 602006018552T DE 602006018552 D1 DE602006018552 D1 DE 602006018552D1
Authority
DE
Germany
Prior art keywords
making
lithographic apparatus
plate lithographic
plate
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006018552T
Other languages
English (en)
Inventor
Erik Roelof Loopstra
Jozef Petrus Henricus Benschop
Den Brink Marinus Aaert Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE602006018552D1 publication Critical patent/DE602006018552D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE602006018552T 2005-04-08 2006-04-07 Lithografischer Apparat mit zwei Trägerplatten und Verfahren zur Herstellung einer Vorrichtung Active DE602006018552D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10163105A 2005-04-08 2005-04-08
US11/135,655 US7161659B2 (en) 2005-04-08 2005-05-24 Dual stage lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
DE602006018552D1 true DE602006018552D1 (de) 2011-01-13

Family

ID=36659724

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006018552T Active DE602006018552D1 (de) 2005-04-08 2006-04-07 Lithografischer Apparat mit zwei Trägerplatten und Verfahren zur Herstellung einer Vorrichtung

Country Status (5)

Country Link
US (1) US7161659B2 (de)
EP (1) EP1710629B1 (de)
KR (1) KR100858980B1 (de)
DE (1) DE602006018552D1 (de)
SG (1) SG126866A1 (de)

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US7903866B2 (en) 2007-03-29 2011-03-08 Asml Netherlands B.V. Measurement system, lithographic apparatus and method for measuring a position dependent signal of a movable object
CN105301918B (zh) 2007-07-18 2018-02-16 株式会社尼康 曝光装置、曝光方法、及元件制造方法
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WO2009060585A1 (ja) * 2007-11-07 2009-05-14 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
US8665455B2 (en) * 2007-11-08 2014-03-04 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
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JP6362312B2 (ja) 2013-09-09 2018-07-25 キヤノン株式会社 露光装置、それを用いたデバイスの製造方法
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KR20230107706A (ko) 2015-02-23 2023-07-17 가부시키가이샤 니콘 계측 장치, 리소그래피 시스템 및 노광 장치, 그리고디바이스 제조 방법
CN111158220A (zh) 2015-02-23 2020-05-15 株式会社尼康 测量装置及方法、光刻系统、曝光装置及方法
KR20240010551A (ko) 2015-02-23 2024-01-23 가부시키가이샤 니콘 기판 처리 시스템 및 기판 처리 방법, 그리고 디바이스 제조 방법
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Also Published As

Publication number Publication date
EP1710629B1 (de) 2010-12-01
EP1710629A3 (de) 2007-04-11
KR20060107418A (ko) 2006-10-13
KR100858980B1 (ko) 2008-09-17
US20060227308A1 (en) 2006-10-12
US7161659B2 (en) 2007-01-09
SG126866A1 (en) 2006-11-29
EP1710629A2 (de) 2006-10-11

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