SG126866A1 - Dual stage lithographic apparatus and device manufacturing method - Google Patents

Dual stage lithographic apparatus and device manufacturing method

Info

Publication number
SG126866A1
SG126866A1 SG200602345A SG200602345A SG126866A1 SG 126866 A1 SG126866 A1 SG 126866A1 SG 200602345 A SG200602345 A SG 200602345A SG 200602345 A SG200602345 A SG 200602345A SG 126866 A1 SG126866 A1 SG 126866A1
Authority
SG
Singapore
Prior art keywords
lithographic apparatus
dual stage
stages
device manufacturing
confined
Prior art date
Application number
SG200602345A
Other languages
English (en)
Inventor
Van Den Marinus Aart Brink
Jozef Petrus Henricus Benschop
Erik Roelof Loopstra
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG126866A1 publication Critical patent/SG126866A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200602345A 2005-04-08 2006-04-07 Dual stage lithographic apparatus and device manufacturing method SG126866A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10163105A 2005-04-08 2005-04-08
US11/135,655 US7161659B2 (en) 2005-04-08 2005-05-24 Dual stage lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
SG126866A1 true SG126866A1 (en) 2006-11-29

Family

ID=36659724

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200602345A SG126866A1 (en) 2005-04-08 2006-04-07 Dual stage lithographic apparatus and device manufacturing method

Country Status (5)

Country Link
US (1) US7161659B2 (de)
EP (1) EP1710629B1 (de)
KR (1) KR100858980B1 (de)
DE (1) DE602006018552D1 (de)
SG (1) SG126866A1 (de)

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KR101626245B1 (ko) 2006-09-01 2016-05-31 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 디바이스 제조 방법, 그리고 캘리브레이션 방법
KR20180058861A (ko) 2006-09-01 2018-06-01 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
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JPWO2009011356A1 (ja) 2007-07-18 2010-09-24 株式会社ニコン 計測方法、ステージ装置、及び露光装置
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Also Published As

Publication number Publication date
US20060227308A1 (en) 2006-10-12
EP1710629B1 (de) 2010-12-01
US7161659B2 (en) 2007-01-09
KR100858980B1 (ko) 2008-09-17
DE602006018552D1 (de) 2011-01-13
KR20060107418A (ko) 2006-10-13
EP1710629A2 (de) 2006-10-11
EP1710629A3 (de) 2007-04-11

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