SG131060A1 - Lithographic appparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus - Google Patents

Lithographic appparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus

Info

Publication number
SG131060A1
SG131060A1 SG200606307-7A SG2006063077A SG131060A1 SG 131060 A1 SG131060 A1 SG 131060A1 SG 2006063077 A SG2006063077 A SG 2006063077A SG 131060 A1 SG131060 A1 SG 131060A1
Authority
SG
Singapore
Prior art keywords
lithographic
cleaning
electrical discharge
lithographic apparatus
appparatus
Prior art date
Application number
SG200606307-7A
Other languages
English (en)
Inventor
Tatyana Victorovna Rakhimova
Vadim Yevgenyevich Banine
Vladimir Vitalevitch Ivanov
Konstantin Nikolaevit Koshelev
Johannes Hubertus Joseph Moors
Aleksander Sergeevich Kovalev
Dmitriy Victorovich Lopaev
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG131060A1 publication Critical patent/SG131060A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements

Landscapes

  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
SG200606307-7A 2005-09-16 2006-09-12 Lithographic appparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus SG131060A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US71724005P 2005-09-16 2005-09-16
US11/367,693 US8317929B2 (en) 2005-09-16 2006-03-06 Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus

Publications (1)

Publication Number Publication Date
SG131060A1 true SG131060A1 (en) 2007-04-26

Family

ID=37508328

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200606307-7A SG131060A1 (en) 2005-09-16 2006-09-12 Lithographic appparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus

Country Status (7)

Country Link
US (1) US8317929B2 (de)
EP (1) EP1764653B1 (de)
JP (2) JP4690277B2 (de)
CN (1) CN1959541B (de)
DE (1) DE602006021680D1 (de)
SG (1) SG131060A1 (de)
TW (1) TWI315681B (de)

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US11347143B2 (en) * 2019-09-30 2022-05-31 Taiwan Semiconductor Manufacturing Company Ltd. Cleaning method, method for forming semiconductor structure and system thereof
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Also Published As

Publication number Publication date
TWI315681B (en) 2009-10-11
JP2007096297A (ja) 2007-04-12
JP2011082551A (ja) 2011-04-21
US8317929B2 (en) 2012-11-27
JP5513354B2 (ja) 2014-06-04
TW200719983A (en) 2007-06-01
EP1764653B1 (de) 2011-05-04
CN1959541A (zh) 2007-05-09
EP1764653A3 (de) 2008-01-30
CN1959541B (zh) 2010-12-15
US20070062557A1 (en) 2007-03-22
JP4690277B2 (ja) 2011-06-01
DE602006021680D1 (de) 2011-06-16
EP1764653A2 (de) 2007-03-21

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