TWI315681B - Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus - Google Patents

Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus

Info

Publication number
TWI315681B
TWI315681B TW095132583A TW95132583A TWI315681B TW I315681 B TWI315681 B TW I315681B TW 095132583 A TW095132583 A TW 095132583A TW 95132583 A TW95132583 A TW 95132583A TW I315681 B TWI315681 B TW I315681B
Authority
TW
Taiwan
Prior art keywords
lithographic apparatus
cleaning
electrical discharge
discharge generator
generator
Prior art date
Application number
TW095132583A
Other languages
English (en)
Other versions
TW200719983A (en
Inventor
Tatyana Victorovna Rakhimova
Vadim Yevgenyevich Banine
Johannes Hubertus Josephina Moors
Vladimir Vitalevich Ivanov
Konstantin Nikolaevich Koshelev
A Kovalev
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of TW200719983A publication Critical patent/TW200719983A/zh
Application granted granted Critical
Publication of TWI315681B publication Critical patent/TWI315681B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
TW095132583A 2005-09-16 2006-09-04 Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus TWI315681B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US71724005P 2005-09-16 2005-09-16
US11/367,693 US8317929B2 (en) 2005-09-16 2006-03-06 Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus

Publications (2)

Publication Number Publication Date
TW200719983A TW200719983A (en) 2007-06-01
TWI315681B true TWI315681B (en) 2009-10-11

Family

ID=37508328

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095132583A TWI315681B (en) 2005-09-16 2006-09-04 Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus

Country Status (7)

Country Link
US (1) US8317929B2 (zh)
EP (1) EP1764653B1 (zh)
JP (2) JP4690277B2 (zh)
CN (1) CN1959541B (zh)
DE (1) DE602006021680D1 (zh)
SG (1) SG131060A1 (zh)
TW (1) TWI315681B (zh)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7495239B2 (en) * 2005-12-22 2009-02-24 Asml Netherlands B.V. Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement
US7504643B2 (en) * 2005-12-22 2009-03-17 Asml Netherlands B.V. Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement
DE102006054726B4 (de) * 2006-11-21 2014-09-11 Asml Netherlands B.V. Verfahren zum Entfernen von Kontaminationen auf optischen Oberflächen und optische Anordnung
EP1944652A1 (en) * 2007-01-10 2008-07-16 Carl Zeiss SMT AG A method for operating a euv lithography apparatus, and a euv lithography apparatus
DE102007033701A1 (de) * 2007-07-14 2009-01-22 Xtreme Technologies Gmbh Verfahren und Anordnung zur Reinigung von optischen Oberflächen in plasmabasierten Strahlungsquellen
US20090025750A1 (en) * 2007-07-24 2009-01-29 Asml Netherlands B.V. Method for removal of a deposition from an optical element, lithographic apparatus, and method for manufacturing a device
US7894037B2 (en) * 2007-07-30 2011-02-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20090038636A1 (en) * 2007-08-09 2009-02-12 Asml Netherlands B.V. Cleaning method
NL1036181A1 (nl) * 2007-11-30 2009-06-04 Asml Netherlands Bv A lithographic apparatus, a projection system and a device manufacturing method.
KR20100126775A (ko) * 2008-04-03 2010-12-02 칼 짜이스 에스엠테 아게 세척 모듈 및 세척 모듈을 갖는 ｅｕｖ 리소그래피 장치
DE102008041827A1 (de) * 2008-09-05 2010-03-18 Carl Zeiss Smt Ag Schutzmodul für EUV-Lithographievorrichtung sowie EUV-Lithographievorrichtung
JP5559562B2 (ja) * 2009-02-12 2014-07-23 ギガフォトン株式会社 極端紫外光光源装置
JP2012068579A (ja) * 2010-09-27 2012-04-05 Toppan Printing Co Ltd フォトマスクのクリーニング方法及びフォトマスクのクリーニング装置
US9539622B2 (en) * 2014-03-18 2017-01-10 Asml Netherlands B.V. Apparatus for and method of active cleaning of EUV optic with RF plasma field
KR102369935B1 (ko) 2015-08-31 2022-03-03 삼성전자주식회사 드립 홀을 갖는 콜렉팅 미러를 포함하는 euv 광 발생 장치
US9888554B2 (en) * 2016-01-21 2018-02-06 Asml Netherlands B.V. System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector
US9824893B1 (en) * 2016-06-28 2017-11-21 Lam Research Corporation Tin oxide thin film spacers in semiconductor device manufacturing
WO2018061212A1 (ja) * 2016-09-30 2018-04-05 ギガフォトン株式会社 チャンバ装置、ターゲット生成方法および極端紫外光生成装置
WO2019086397A1 (en) * 2017-11-02 2019-05-09 Asml Netherlands B.V. Cleaning a surface of an optic within a chamber of an extreme ultraviolet light source
US11347154B2 (en) * 2018-02-13 2022-05-31 Asml Netherlands B.V. Cleaning a structure surface in an EUV chamber
TWI673567B (zh) * 2018-02-13 2019-10-01 特銓股份有限公司 光罩靜電清潔設備以及光罩靜電清潔方法
CN111886689A (zh) 2018-03-19 2020-11-03 朗姆研究公司 无倒角通孔集成方案
US11979971B2 (en) * 2018-06-29 2024-05-07 Taiwan Semiconductor Manufacturing Company, Ltd. EUV light source and apparatus for lithography
KR20200052124A (ko) * 2018-11-06 2020-05-14 삼성전자주식회사 Euv 집광 장치 및 상기 euv 집광 장치를 포함하는 리소그래피 장치
US11347143B2 (en) * 2019-09-30 2022-05-31 Taiwan Semiconductor Manufacturing Company Ltd. Cleaning method, method for forming semiconductor structure and system thereof
KR20230121844A (ko) * 2020-12-30 2023-08-21 에이에스엠엘 네델란즈 비.브이. 검사 시스템을 세정하기 위한 장치 및 방법

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1987000346A1 (en) 1985-07-02 1987-01-15 Semiconductor Energy Laboratory Co., Ltd. Method of forming a thin film
US4786352A (en) * 1986-09-12 1988-11-22 Benzing Technologies, Inc. Apparatus for in-situ chamber cleaning
US5437765A (en) * 1994-04-29 1995-08-01 Texas Instruments Incorporated Semiconductor processing
JPH09306803A (ja) 1996-05-10 1997-11-28 Toshiba Corp 荷電粒子ビーム装置およびその洗浄方法
US5846332A (en) * 1996-07-12 1998-12-08 Applied Materials, Inc. Thermally floating pedestal collar in a chemical vapor deposition chamber
JPH10242029A (ja) * 1997-02-27 1998-09-11 Canon Inc 露光装置
JP4181647B2 (ja) * 1997-04-15 2008-11-19 キヤノン株式会社 露光方法
KR100636451B1 (ko) 1997-06-10 2006-10-18 가부시키가이샤 니콘 광학 장치 및 그 세정 방법과 투영 노광 장치 및 그 제조방법
JP2000082856A (ja) * 1998-06-30 2000-03-21 Nikon Corp 光学素子の光洗浄方法及び光洗浄装置
US6224738B1 (en) * 1999-11-09 2001-05-01 Pacesetter, Inc. Method for a patterned etch with electrolytically grown mask
US6362110B1 (en) * 2000-03-30 2002-03-26 Lam Research Corporation Enhanced resist strip in a dielectric etcher using downstream plasma
JP2001300453A (ja) * 2000-04-20 2001-10-30 Canon Inc 物品表面の洗浄方法と洗浄装置、およびこれらによる光学素子の製造方法と装置、並びに光学系、露光方法、露光装置、デバイス製造方法
JP2001321637A (ja) * 2000-05-15 2001-11-20 Nittetsu Mining Co Ltd 一酸化窒素含有気体の処理方法及び処理装置
EP1223468B1 (en) 2001-01-10 2008-07-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
US6736956B1 (en) * 2001-05-07 2004-05-18 Pacesetter, Inc. Non-uniform etching of anode foil to produce higher capacitance gain without sacrificing foil strength
US6724460B2 (en) * 2001-11-19 2004-04-20 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects
JP2003249475A (ja) * 2002-02-25 2003-09-05 Sony Corp 表面処理方法および表面処理装置
US6968850B2 (en) * 2002-07-15 2005-11-29 Intel Corporation In-situ cleaning of light source collector optics
JP3801548B2 (ja) * 2002-08-21 2006-07-26 三菱重工業株式会社 金属膜作製装置のクリーニング方法
JP3977316B2 (ja) * 2002-09-30 2007-09-19 エーエスエムエル ネザーランズ ビー．ブイ． リトグラフ装置及びデバイス製造方法
EP1429189B1 (en) 2002-12-13 2008-10-08 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
DE60323927D1 (de) * 2002-12-13 2008-11-20 Asml Netherlands Bv Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
JP4006341B2 (ja) 2003-01-16 2007-11-14 キヤノン株式会社 光学素子の洗浄装置及び方法
US7604708B2 (en) 2003-02-14 2009-10-20 Applied Materials, Inc. Cleaning of native oxide with hydrogen-containing radicals
CN1791793B (zh) 2003-05-22 2010-12-15 皇家飞利浦电子股份有限公司 至少一个光学元件的清洁方法和装置
US7452473B1 (en) * 2003-10-06 2008-11-18 Pacesetter, Inc. Laser marking of raw aluminum anode foil to induce uniform patterning etching
JP2005142198A (ja) * 2003-11-04 2005-06-02 Taiyo Nippon Sanso Corp クリーニングガス及びクリーニング方法
JP2005159182A (ja) * 2003-11-27 2005-06-16 Kyocera Corp プラズマｃｖｄ装置の処理方法
US7135692B2 (en) 2003-12-04 2006-11-14 Asml Netherlands B.V. Lithographic apparatus, illumination system and method for providing a projection beam of EUV radiation
US7207339B2 (en) * 2003-12-17 2007-04-24 Taiwan Semiconductor Manufacturing Co., Ltd. Method for cleaning a plasma enhanced CVD chamber
US7167232B2 (en) * 2003-12-30 2007-01-23 Asml Netherlands B.V. Lithographic apparatus and radiation source comprising a debris-mitigation system and method for mitigating debris particles in a lithographic apparatus
JP2005332972A (ja) * 2004-05-20 2005-12-02 Nikon Corp 光学素子、光学装置、及び半導体デバイスの製造方法
JP2006339346A (ja) * 2005-06-01 2006-12-14 Canon Inc 露光装置
US7750326B2 (en) * 2005-06-13 2010-07-06 Asml Netherlands B.V. Lithographic apparatus and cleaning method therefor
WO2006136967A2 (en) * 2005-06-21 2006-12-28 Philips Intellectual Property & Standards Gmbh Method of cleaning optical surfaces of an irradiation unit in a two-step process
DE102006050835A1 (de) * 2006-10-27 2008-05-08 Carl Zeiss Smt Ag Verfahren und Vorrichtung zum Austausch von Objetkivteilen

Also Published As

Publication number Publication date
JP2007096297A (ja) 2007-04-12
CN1959541B (zh) 2010-12-15
JP4690277B2 (ja) 2011-06-01
EP1764653B1 (en) 2011-05-04
JP2011082551A (ja) 2011-04-21
EP1764653A3 (en) 2008-01-30
CN1959541A (zh) 2007-05-09
SG131060A1 (en) 2007-04-26
US8317929B2 (en) 2012-11-27
US20070062557A1 (en) 2007-03-22
DE602006021680D1 (de) 2011-06-16
JP5513354B2 (ja) 2014-06-04
TW200719983A (en) 2007-06-01
EP1764653A2 (en) 2007-03-21

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees