TWI315681B - Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus - Google Patents

Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus

Info

Publication number
TWI315681B
TWI315681B TW095132583A TW95132583A TWI315681B TW I315681 B TWI315681 B TW I315681B TW 095132583 A TW095132583 A TW 095132583A TW 95132583 A TW95132583 A TW 95132583A TW I315681 B TWI315681 B TW I315681B
Authority
TW
Taiwan
Prior art keywords
lithographic apparatus
cleaning
electrical discharge
discharge generator
generator
Prior art date
Application number
TW095132583A
Other languages
English (en)
Other versions
TW200719983A (en
Inventor
Tatyana Victorovna Rakhimova
Vadim Yevgenyevich Banine
Johannes Hubertus Josephina Moors
Vladimir Vitalevich Ivanov
Konstantin Nikolaevich Koshelev
A Kovalev
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of TW200719983A publication Critical patent/TW200719983A/zh
Application granted granted Critical
Publication of TWI315681B publication Critical patent/TWI315681B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
TW095132583A 2005-09-16 2006-09-04 Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus TWI315681B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US71724005P 2005-09-16 2005-09-16
US11/367,693 US8317929B2 (en) 2005-09-16 2006-03-06 Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus

Publications (2)

Publication Number Publication Date
TW200719983A TW200719983A (en) 2007-06-01
TWI315681B true TWI315681B (en) 2009-10-11

Family

ID=37508328

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095132583A TWI315681B (en) 2005-09-16 2006-09-04 Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus

Country Status (7)

Country Link
US (1) US8317929B2 (zh)
EP (1) EP1764653B1 (zh)
JP (2) JP4690277B2 (zh)
CN (1) CN1959541B (zh)
DE (1) DE602006021680D1 (zh)
SG (1) SG131060A1 (zh)
TW (1) TWI315681B (zh)

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US11979971B2 (en) * 2018-06-29 2024-05-07 Taiwan Semiconductor Manufacturing Company, Ltd. EUV light source and apparatus for lithography
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Also Published As

Publication number Publication date
SG131060A1 (en) 2007-04-26
JP2007096297A (ja) 2007-04-12
JP2011082551A (ja) 2011-04-21
US8317929B2 (en) 2012-11-27
JP5513354B2 (ja) 2014-06-04
TW200719983A (en) 2007-06-01
EP1764653B1 (en) 2011-05-04
CN1959541A (zh) 2007-05-09
EP1764653A3 (en) 2008-01-30
CN1959541B (zh) 2010-12-15
US20070062557A1 (en) 2007-03-22
JP4690277B2 (ja) 2011-06-01
DE602006021680D1 (de) 2011-06-16
EP1764653A2 (en) 2007-03-21

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees