DE60042808D1 - Durch Strahlung härtbare Harzzusammensetzung - Google Patents
Durch Strahlung härtbare HarzzusammensetzungInfo
- Publication number
- DE60042808D1 DE60042808D1 DE60042808T DE60042808T DE60042808D1 DE 60042808 D1 DE60042808 D1 DE 60042808D1 DE 60042808 T DE60042808 T DE 60042808T DE 60042808 T DE60042808 T DE 60042808T DE 60042808 D1 DE60042808 D1 DE 60042808D1
- Authority
- DE
- Germany
- Prior art keywords
- energy
- curing
- ray
- resin composition
- irradiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/38—Layered products comprising a layer of synthetic resin comprising epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/24—Di-epoxy compounds carbocyclic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
- C08G59/4207—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof aliphatic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31511—Of epoxy ether
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Inorganic Chemistry (AREA)
- Epoxy Resins (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Polymerisation Methods In General (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Paints Or Removers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26964899A JP2001089639A (ja) | 1999-09-24 | 1999-09-24 | エネルギー線硬化樹脂組成物 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60042808D1 true DE60042808D1 (de) | 2009-10-08 |
Family
ID=17475285
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60042808T Expired - Lifetime DE60042808D1 (de) | 1999-09-24 | 2000-09-22 | Durch Strahlung härtbare Harzzusammensetzung |
Country Status (10)
Country | Link |
---|---|
US (1) | US6919385B2 (de) |
EP (1) | EP1087262B1 (de) |
JP (1) | JP2001089639A (de) |
KR (1) | KR100394404B1 (de) |
CN (2) | CN1198863C (de) |
AT (1) | ATE441134T1 (de) |
CA (1) | CA2320545C (de) |
DE (1) | DE60042808D1 (de) |
RU (1) | RU2223281C2 (de) |
TW (1) | TW581776B (de) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003012896A (ja) * | 2001-06-29 | 2003-01-15 | Stanley Electric Co Ltd | 耐紫外線エポキシ樹脂および該エポキシ樹脂を用いて封止が行われた発光ダイオードもしくは発光ダイオード用波長変換素子 |
US6773474B2 (en) | 2002-04-19 | 2004-08-10 | 3M Innovative Properties Company | Coated abrasive article |
US20050058911A1 (en) * | 2003-09-17 | 2005-03-17 | Konica Minolta Medical & Graphic, Inc. | Holographic recording medium, holographic recording method and holographic information medium |
JP4555611B2 (ja) * | 2004-05-26 | 2010-10-06 | 積水化学工業株式会社 | 有機エレクトロルミネッセンス素子封止剤及びトップエミッション方式の有機エレクトロルミネッセンス素子 |
JP4498232B2 (ja) * | 2004-06-28 | 2010-07-07 | キヤノン株式会社 | 光カチオン重合性エポキシ樹脂組成物、並びに、これを用いた微細構造体の製造方法及びインクジェットヘッドの製造方法 |
TW200716361A (en) | 2005-07-27 | 2007-05-01 | Mitsubishi Heavy Ind Ltd | Rtm process |
WO2007034914A1 (ja) * | 2005-09-22 | 2007-03-29 | Kaneka Corporation | 光ラジカル硬化/光カチオン硬化併用硬化性組成物 |
JP4969095B2 (ja) * | 2005-12-19 | 2012-07-04 | 株式会社ダイセル | 硬化性樹脂組成物およびその製造方法 |
FR2904321B1 (fr) * | 2006-07-25 | 2008-09-05 | Rhodia Recherches Et Technologies Sas | Composition polymerisable et/ou reticulable sous irradiation par voie cationique et/ou radicalaire |
JP4444248B2 (ja) | 2006-08-08 | 2010-03-31 | 三菱重工業株式会社 | Rtm成形装置及びrtm成形体の製造方法 |
US8784723B2 (en) * | 2007-04-01 | 2014-07-22 | Stratasys Ltd. | Method and system for three-dimensional fabrication |
RU2455317C1 (ru) * | 2008-04-14 | 2012-07-10 | Хексел Композитс, Лтд. | Термореактивная смола, содержащая облученный термопластический агент для повышения ударной прочности |
US20100140850A1 (en) * | 2008-12-04 | 2010-06-10 | Objet Geometries Ltd. | Compositions for 3D printing |
US20100140852A1 (en) | 2008-12-04 | 2010-06-10 | Objet Geometries Ltd. | Preparation of building material for solid freeform fabrication |
JP4784698B1 (ja) * | 2010-05-06 | 2011-10-05 | 横浜ゴム株式会社 | 熱硬化性エポキシ樹脂組成物 |
JP2013022835A (ja) | 2011-07-21 | 2013-02-04 | Mitsubishi Heavy Ind Ltd | 繊維強化樹脂を備える製品を少なくとも2つ製造する方法および装置 |
KR101973229B1 (ko) * | 2011-11-21 | 2019-04-26 | 교리쯔 가가꾸 산교 가부시키가이샤 | 접합용 에너지선 경화형 액상 수지 조성물, 차광용 잉크 조성물 및 그들을 사용하는 광학 부품의 제조 방법 |
JP6271130B2 (ja) | 2013-01-18 | 2018-01-31 | 三菱重工業株式会社 | 複合材の製造方法 |
EP3458538B1 (de) * | 2016-05-19 | 2020-10-28 | Sicpa Holding SA | Klebstoffe zum zusammenbau von komponenten aus einem inertmaterial |
JP6907223B2 (ja) * | 2016-10-07 | 2021-07-21 | 株式会社Moresco | 接着剤組成物およびこれを含有する接着剤層、支持接合体、およびこの支持接合体を備えるガスバリア性評価装置 |
CN109135392B (zh) * | 2017-06-15 | 2021-11-02 | 常州强力电子新材料股份有限公司 | 一种双硫鎓盐光引发剂 |
US11729915B1 (en) | 2022-03-22 | 2023-08-15 | Tactotek Oy | Method for manufacturing a number of electrical nodes, electrical node module, electrical node, and multilayer structure |
Family Cites Families (41)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1526923A (en) | 1974-09-18 | 1978-10-04 | Ici Ltd | Photopolymerisable compositions |
GB1587536A (en) * | 1977-07-05 | 1981-04-08 | Ciba Geigy Ag | Expoxide resin-impregnated composites |
US4299938A (en) * | 1979-06-19 | 1981-11-10 | Ciba-Geigy Corporation | Photopolymerizable and thermally polymerizable compositions |
JPS57208210A (en) | 1981-06-18 | 1982-12-21 | Shin Kobe Electric Mach Co Ltd | Manufacture of laminated plate |
JPS58206622A (ja) | 1982-05-25 | 1983-12-01 | Sanyurejin Kk | 一液型エポキシ樹脂組成物 |
JPH064694B2 (ja) * | 1983-04-28 | 1994-01-19 | 三井東圧化学株式会社 | 紫外線硬化組成物 |
JPS6138023A (ja) | 1984-07-31 | 1986-02-24 | Asahi Chem Ind Co Ltd | 法面緑化工法 |
JPS61203120A (ja) | 1985-03-05 | 1986-09-09 | Idemitsu Petrochem Co Ltd | エポキシ樹脂用硬化剤 |
US4707432A (en) * | 1985-09-23 | 1987-11-17 | Ciba-Geigy Corporation | Ferrocenium/alpha-cleavage photoinitiator systems for free radical polymerizable compositions |
US4985340A (en) * | 1988-06-01 | 1991-01-15 | Minnesota Mining And Manufacturing Company | Energy curable compositions: two component curing agents |
DE58908927D1 (de) * | 1988-08-04 | 1995-03-09 | Ciba Geigy Ag | Härterkombination für kationisch polymerisierbare Materialien. |
JP2797025B2 (ja) | 1989-10-31 | 1998-09-17 | 三新化学工業株式会社 | ジアルキルスルホニウム化合物 |
JPH055006A (ja) * | 1990-11-16 | 1993-01-14 | Nippon Kayaku Co Ltd | カチオン重合性有機材料組成物および当該組成物の安定化法 |
KR100189642B1 (ko) * | 1991-02-18 | 1999-06-01 | 디어터 크리스트 | 전자 부품 및 조립체를 피복시키거나 접착시키는 방법 |
JP2868984B2 (ja) | 1992-11-13 | 1999-03-10 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 回路用基板 |
JP3151975B2 (ja) * | 1992-11-25 | 2001-04-03 | ジェイエスアール株式会社 | 耐熱性感放射線性樹脂組成物 |
US5384339A (en) * | 1993-03-09 | 1995-01-24 | Starkey; Donn R. | Epoxy based balancing compound and method for balancing a rotor utilizing an ultraviolet-curable epoxy resin composition |
JPH0764072A (ja) | 1993-08-24 | 1995-03-10 | Okuno Chem Ind Co Ltd | 液晶表示用ブラックマトリックス材料及びブラックマトリックス層の形成方法 |
TW307791B (de) | 1994-02-09 | 1997-06-11 | Ciba Sc Holding Ag | |
US5747599A (en) * | 1994-12-12 | 1998-05-05 | Kansai Paint Company, Limited | Thermosetting coating composition |
IT1271311B (it) * | 1994-12-21 | 1997-05-27 | Enichem Spa | Composizioni reattive liquide termoindurenti e procedimento per la loro reticolazione |
JPH08283388A (ja) | 1995-04-06 | 1996-10-29 | Mitsubishi Rayon Co Ltd | 活性エネルギー線硬化性組成物 |
JP3368094B2 (ja) | 1995-04-21 | 2003-01-20 | キヤノン株式会社 | インクジェット記録ヘッドの製造方法 |
JPH0971636A (ja) | 1995-09-07 | 1997-03-18 | Mitsubishi Rayon Co Ltd | 活性エネルギー線硬化性組成物 |
JPH10120766A (ja) | 1996-10-21 | 1998-05-12 | Nippon Kayaku Co Ltd | エネルギー線硬化性組成物及び物品 |
JPH10245431A (ja) | 1997-03-04 | 1998-09-14 | Nagase Chiba Kk | 非接触icカード用モジュール封止剤及びそれを用いたモジュールの予備封止体 |
JP3975305B2 (ja) | 1997-03-27 | 2007-09-12 | 大阪瓦斯株式会社 | エポキシ樹脂組成物および成形体 |
US5879859A (en) * | 1997-07-16 | 1999-03-09 | International Business Machines Corporation | Strippable photoimageable compositions |
JPH11147285A (ja) | 1997-09-11 | 1999-06-02 | Sumitomo Bakelite Co Ltd | 銅張積層板の製造方法 |
JP3950241B2 (ja) | 1997-10-17 | 2007-07-25 | 三菱重工業株式会社 | 樹脂組成物、樹脂硬化物、及び構造物の補修方法、補強方法、補修用材料、補強用材料 |
DE19750147A1 (de) * | 1997-11-12 | 1999-05-27 | Siemens Ag | Einkomponenten-Epoxidharz zur Abdeckung von elektronischen Bauelementen |
JP3419436B2 (ja) | 1997-12-26 | 2003-06-23 | ソニーケミカル株式会社 | 異方性導電接着フィルム |
JPH11242111A (ja) | 1998-02-26 | 1999-09-07 | Asahi Glass Co Ltd | カラーフィルタ保護膜用組成物、カラーフィルタ付き基板、その製法及び液晶表示素子 |
JP3926921B2 (ja) | 1998-03-26 | 2007-06-06 | 三井化学株式会社 | 熱硬化性粉体塗料組成物 |
US6350791B1 (en) * | 1998-06-22 | 2002-02-26 | 3M Innovative Properties Company | Thermosettable adhesive |
DE69830620T2 (de) | 1998-06-22 | 2006-05-11 | Minnesota Mining & Manufacturing Company, St. Paul | Wärmehärtbarer klebstoff |
US6166100A (en) * | 1998-07-22 | 2000-12-26 | Kansai Paint Co., Ltd. | Cationically polymerizable pigmented composition |
JP2000169553A (ja) | 1998-12-09 | 2000-06-20 | Kyoeisha Chem Co Ltd | 高耐熱性樹脂組成物 |
JP2001002760A (ja) | 1999-04-23 | 2001-01-09 | Mitsubishi Heavy Ind Ltd | エネルギー線遮蔽物含有樹脂のエネルギー線照射による樹脂硬化組成物、及び硬化方法 |
JP2001092130A (ja) | 1999-09-21 | 2001-04-06 | Kansai Paint Co Ltd | 無電解金メッキ用フォトソルダーレジスト樹脂組成物及びレジストパターン形成方法 |
JP4240733B2 (ja) * | 2000-02-22 | 2009-03-18 | 三菱重工業株式会社 | 薄型ディスプレイパネルの隔壁用組成物 |
-
1999
- 1999-09-24 JP JP26964899A patent/JP2001089639A/ja active Pending
-
2000
- 2000-09-14 TW TW89118824A patent/TW581776B/zh not_active IP Right Cessation
- 2000-09-22 AT AT00120166T patent/ATE441134T1/de not_active IP Right Cessation
- 2000-09-22 RU RU2000124308A patent/RU2223281C2/ru not_active IP Right Cessation
- 2000-09-22 EP EP20000120166 patent/EP1087262B1/de not_active Expired - Lifetime
- 2000-09-22 CA CA 2320545 patent/CA2320545C/en not_active Expired - Lifetime
- 2000-09-22 DE DE60042808T patent/DE60042808D1/de not_active Expired - Lifetime
- 2000-09-23 KR KR10-2000-0055975A patent/KR100394404B1/ko not_active IP Right Cessation
- 2000-09-24 CN CNB001309838A patent/CN1198863C/zh not_active Expired - Lifetime
- 2000-09-24 CN CNB2004100825871A patent/CN1309787C/zh not_active Expired - Lifetime
-
2003
- 2003-02-04 US US10/357,380 patent/US6919385B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1087262A3 (de) | 2002-04-17 |
US20030176525A1 (en) | 2003-09-18 |
US6919385B2 (en) | 2005-07-19 |
CN1304945A (zh) | 2001-07-25 |
EP1087262B1 (de) | 2009-08-26 |
CA2320545C (en) | 2005-03-22 |
CA2320545A1 (en) | 2001-03-24 |
CN1198863C (zh) | 2005-04-27 |
TW581776B (en) | 2004-04-01 |
ATE441134T1 (de) | 2009-09-15 |
RU2223281C2 (ru) | 2004-02-10 |
KR100394404B1 (ko) | 2003-08-09 |
EP1087262A2 (de) | 2001-03-28 |
KR20010050611A (ko) | 2001-06-15 |
CN1616549A (zh) | 2005-05-18 |
JP2001089639A (ja) | 2001-04-03 |
CN1309787C (zh) | 2007-04-11 |
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