DE1252683B - Verfahren zur Herstellung von Cyclodisilazanen - Google Patents
Verfahren zur Herstellung von CyclodisilazanenInfo
- Publication number
- DE1252683B DE1252683B DENDAT1252683D DE1252683DA DE1252683B DE 1252683 B DE1252683 B DE 1252683B DE NDAT1252683 D DENDAT1252683 D DE NDAT1252683D DE 1252683D A DE1252683D A DE 1252683DA DE 1252683 B DE1252683 B DE 1252683B
- Authority
- DE
- Germany
- Prior art keywords
- general formula
- carbon atoms
- radical
- atom
- disilylamines
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 9
- 238000002360 preparation method Methods 0.000 title claims description 5
- IVSQMSIRHKTHCB-UHFFFAOYSA-N 1,3,2,4-diazadisiletidine Chemical class N1[SiH2]N[SiH2]1 IVSQMSIRHKTHCB-UHFFFAOYSA-N 0.000 title claims description 3
- 150000003254 radicals Chemical class 0.000 claims description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- -1 heterocyclic radical Chemical class 0.000 claims description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 125000003342 alkenyl group Chemical group 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 4
- 125000000392 cycloalkenyl group Chemical group 0.000 claims description 4
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 150000005840 aryl radicals Chemical class 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 2
- 230000007717 exclusion Effects 0.000 claims description 2
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 claims description 2
- 229910052783 alkali metal Inorganic materials 0.000 claims 1
- 150000001340 alkali metals Chemical group 0.000 claims 1
- 125000004430 oxygen atom Chemical group O* 0.000 claims 1
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 6
- 239000008096 xylene Substances 0.000 description 6
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 4
- QARVLSVVCXYDNA-UHFFFAOYSA-N bromobenzene Chemical compound BrC1=CC=CC=C1 QARVLSVVCXYDNA-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000007363 ring formation reaction Methods 0.000 description 3
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- SMBQBQBNOXIFSF-UHFFFAOYSA-N dilithium Chemical class [Li][Li] SMBQBQBNOXIFSF-UHFFFAOYSA-N 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 150000003141 primary amines Chemical class 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N trimethylsilyl-trifluoromethansulfonate Natural products C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- HLIHJZNYCSLSMF-UHFFFAOYSA-N 2,2,4,4-tetramethyl-1,3-diphenyl-1,3,2,4-diazadisiletidine Chemical compound C[Si]1(C)N(C=2C=CC=CC=2)[Si](C)(C)N1C1=CC=CC=C1 HLIHJZNYCSLSMF-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910014299 N-Si Inorganic materials 0.000 description 1
- QFXSTOWZINJUOF-UHFFFAOYSA-N N1[SiH2]N=[SiH]1 Chemical class N1[SiH2]N=[SiH]1 QFXSTOWZINJUOF-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical group [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- UMVBXBACMIOFDO-UHFFFAOYSA-N [N].[Si] Chemical compound [N].[Si] UMVBXBACMIOFDO-UHFFFAOYSA-N 0.000 description 1
- 150000001447 alkali salts Chemical class 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 239000003701 inert diluent Substances 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 229910003002 lithium salt Inorganic materials 0.000 description 1
- 159000000002 lithium salts Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- RVLBDCKUSUCRPP-UHFFFAOYSA-N n,n-bis[chloro(dimethyl)silyl]aniline Chemical compound C[Si](C)(Cl)N([Si](C)(C)Cl)C1=CC=CC=C1 RVLBDCKUSUCRPP-UHFFFAOYSA-N 0.000 description 1
- IPJPAQIHUIKFLV-UHFFFAOYSA-N n-trimethylsilylaniline Chemical compound C[Si](C)(C)NC1=CC=CC=C1 IPJPAQIHUIKFLV-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Chemical group 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F1/00—Shielding characterised by the composition of the materials
- G21F1/02—Selection of uniform shielding materials
- G21F1/10—Organic substances; Dispersions in organic carriers
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/02—Boron compounds
- C07F5/022—Boron compounds without C-boron linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/025—Silicon compounds without C-silicon linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/21—Cyclic compounds having at least one ring containing silicon, but no carbon in the ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/38—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
- C07F9/44—Amides thereof
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/6564—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms
- C07F9/6571—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus and oxygen atoms as the only ring hetero atoms
- C07F9/657154—Cyclic esteramides of oxyacids of phosphorus
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/6564—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms
- C07F9/6581—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus and nitrogen atoms with or without oxygen or sulfur atoms, as ring hetero atoms
- C07F9/6587—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus and nitrogen atoms with or without oxygen or sulfur atoms, as ring hetero atoms having two phosphorus atoms as ring hetero atoms in the same ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/6596—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having atoms other than oxygen, sulfur, selenium, tellurium, nitrogen or phosphorus as ring hetero atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/549—Silicon-containing compounds containing silicon in a ring
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K5/00—Heat-transfer, heat-exchange or heat-storage materials, e.g. refrigerants; Materials for the production of heat or cold by chemical reactions other than by combustion
- C09K5/08—Materials not undergoing a change of physical state when used
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M105/00—Lubricating compositions characterised by the base-material being a non-macromolecular organic compound
- C10M105/74—Lubricating compositions characterised by the base-material being a non-macromolecular organic compound containing phosphorus
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M105/00—Lubricating compositions characterised by the base-material being a non-macromolecular organic compound
- C10M105/76—Lubricating compositions characterised by the base-material being a non-macromolecular organic compound containing silicon
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M105/00—Lubricating compositions characterised by the base-material being a non-macromolecular organic compound
- C10M105/78—Lubricating compositions characterised by the base-material being a non-macromolecular organic compound containing boron
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M105/00—Lubricating compositions characterised by the base-material being a non-macromolecular organic compound
- C10M105/80—Lubricating compositions characterised by the base-material being a non-macromolecular organic compound containing atoms of elements not provided for in groups C10M105/02 - C10M105/78
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2223/00—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions
- C10M2223/02—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions having no phosphorus-to-carbon bonds
- C10M2223/04—Phosphate esters
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2223/00—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions
- C10M2223/02—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions having no phosphorus-to-carbon bonds
- C10M2223/04—Phosphate esters
- C10M2223/042—Metal salts thereof
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2223/00—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions
- C10M2223/02—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions having no phosphorus-to-carbon bonds
- C10M2223/04—Phosphate esters
- C10M2223/047—Thioderivatives not containing metallic elements
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2223/00—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions
- C10M2223/06—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions having phosphorus-to-carbon bonds
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2223/00—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions
- C10M2223/06—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions having phosphorus-to-carbon bonds
- C10M2223/061—Metal salts
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2227/00—Organic non-macromolecular compounds containing atoms of elements not provided for in groups C10M2203/00, C10M2207/00, C10M2211/00, C10M2215/00, C10M2219/00 or C10M2223/00 as ingredients in lubricant compositions
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2227/00—Organic non-macromolecular compounds containing atoms of elements not provided for in groups C10M2203/00, C10M2207/00, C10M2211/00, C10M2215/00, C10M2219/00 or C10M2223/00 as ingredients in lubricant compositions
- C10M2227/02—Esters of silicic acids
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2227/00—Organic non-macromolecular compounds containing atoms of elements not provided for in groups C10M2203/00, C10M2207/00, C10M2211/00, C10M2215/00, C10M2219/00 or C10M2223/00 as ingredients in lubricant compositions
- C10M2227/04—Organic non-macromolecular compounds containing atoms of elements not provided for in groups C10M2203/00, C10M2207/00, C10M2211/00, C10M2215/00, C10M2219/00 or C10M2223/00 as ingredients in lubricant compositions having a silicon-to-carbon bond, e.g. organo-silanes
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2227/00—Organic non-macromolecular compounds containing atoms of elements not provided for in groups C10M2203/00, C10M2207/00, C10M2211/00, C10M2215/00, C10M2219/00 or C10M2223/00 as ingredients in lubricant compositions
- C10M2227/06—Organic compounds derived from inorganic acids or metal salts
- C10M2227/061—Esters derived from boron
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2227/00—Organic non-macromolecular compounds containing atoms of elements not provided for in groups C10M2203/00, C10M2207/00, C10M2211/00, C10M2215/00, C10M2219/00 or C10M2223/00 as ingredients in lubricant compositions
- C10M2227/06—Organic compounds derived from inorganic acids or metal salts
- C10M2227/061—Esters derived from boron
- C10M2227/062—Cyclic esters
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2227/00—Organic non-macromolecular compounds containing atoms of elements not provided for in groups C10M2203/00, C10M2207/00, C10M2211/00, C10M2215/00, C10M2219/00 or C10M2223/00 as ingredients in lubricant compositions
- C10M2227/08—Organic non-macromolecular compounds containing atoms of elements not provided for in groups C10M2203/00, C10M2207/00, C10M2211/00, C10M2215/00, C10M2219/00 or C10M2223/00 as ingredients in lubricant compositions having metal-to-carbon bonds
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2227/00—Organic non-macromolecular compounds containing atoms of elements not provided for in groups C10M2203/00, C10M2207/00, C10M2211/00, C10M2215/00, C10M2219/00 or C10M2223/00 as ingredients in lubricant compositions
- C10M2227/08—Organic non-macromolecular compounds containing atoms of elements not provided for in groups C10M2203/00, C10M2207/00, C10M2211/00, C10M2215/00, C10M2219/00 or C10M2223/00 as ingredients in lubricant compositions having metal-to-carbon bonds
- C10M2227/081—Organic non-macromolecular compounds containing atoms of elements not provided for in groups C10M2203/00, C10M2207/00, C10M2211/00, C10M2215/00, C10M2219/00 or C10M2223/00 as ingredients in lubricant compositions having metal-to-carbon bonds with a metal carbon bond belonging to a ring, e.g. ferocene
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2227/00—Organic non-macromolecular compounds containing atoms of elements not provided for in groups C10M2203/00, C10M2207/00, C10M2211/00, C10M2215/00, C10M2219/00 or C10M2223/00 as ingredients in lubricant compositions
- C10M2227/08—Organic non-macromolecular compounds containing atoms of elements not provided for in groups C10M2203/00, C10M2207/00, C10M2211/00, C10M2215/00, C10M2219/00 or C10M2223/00 as ingredients in lubricant compositions having metal-to-carbon bonds
- C10M2227/083—Sn compounds
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2229/00—Organic macromolecular compounds containing atoms of elements not provided for in groups C10M2205/00, C10M2209/00, C10M2213/00, C10M2217/00, C10M2221/00 or C10M2225/00 as ingredients in lubricant compositions
- C10M2229/04—Siloxanes with specific structure
- C10M2229/05—Siloxanes with specific structure containing atoms other than silicon, hydrogen, oxygen or carbon
- C10M2229/052—Siloxanes with specific structure containing atoms other than silicon, hydrogen, oxygen or carbon containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2229/00—Organic macromolecular compounds containing atoms of elements not provided for in groups C10M2205/00, C10M2209/00, C10M2213/00, C10M2217/00, C10M2221/00 or C10M2225/00 as ingredients in lubricant compositions
- C10M2229/04—Siloxanes with specific structure
- C10M2229/05—Siloxanes with specific structure containing atoms other than silicon, hydrogen, oxygen or carbon
- C10M2229/053—Siloxanes with specific structure containing atoms other than silicon, hydrogen, oxygen or carbon containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2229/00—Organic macromolecular compounds containing atoms of elements not provided for in groups C10M2205/00, C10M2209/00, C10M2213/00, C10M2217/00, C10M2221/00 or C10M2225/00 as ingredients in lubricant compositions
- C10M2229/04—Siloxanes with specific structure
- C10M2229/05—Siloxanes with specific structure containing atoms other than silicon, hydrogen, oxygen or carbon
- C10M2229/054—Siloxanes with specific structure containing atoms other than silicon, hydrogen, oxygen or carbon containing phosphorus
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2290/00—Mixtures of base materials or thickeners or additives
- C10M2290/02—Mineral base oils; Mixtures of fractions
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2010/00—Metal present as such or in compounds
- C10N2010/04—Groups 2 or 12
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2010/00—Metal present as such or in compounds
- C10N2010/06—Groups 3 or 13
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2010/00—Metal present as such or in compounds
- C10N2010/08—Groups 4 or 14
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2030/00—Specified physical or chemical properties which is improved by the additive characterising the lubricating composition, e.g. multifunctional additives
- C10N2030/08—Resistance to extreme temperature
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2040/00—Specified use or application for which the lubricating composition is intended
- C10N2040/08—Hydraulic fluids, e.g. brake-fluids
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2040/00—Specified use or application for which the lubricating composition is intended
- C10N2040/12—Gas-turbines
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2040/00—Specified use or application for which the lubricating composition is intended
- C10N2040/12—Gas-turbines
- C10N2040/13—Aircraft turbines
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2040/00—Specified use or application for which the lubricating composition is intended
- C10N2040/46—Textile oils
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2050/00—Form in which the lubricant is applied to the material being lubricated
- C10N2050/015—Dispersions of solid lubricants
- C10N2050/02—Dispersions of solid lubricants dissolved or suspended in a carrier which subsequently evaporates to leave a lubricant coating
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2050/00—Form in which the lubricant is applied to the material being lubricated
- C10N2050/10—Semi-solids; greasy
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Dispersion Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Combustion & Propulsion (AREA)
- Thermal Sciences (AREA)
- Materials Engineering (AREA)
Description
DEUTSCHES
PATENTAMT
AUSLEGESCHRIFT
1 252 Wo Int. Cl.:
C07d
C O 7 F 7/10
Deutsche Kl.: 12 ο - 26/03
1252JL
Nummer:
Aktenzeichen: M 60285 IV b/12 ο
Anmeldetag: 13. April 1964
Auslegetag:
r 1967
Gegenstand des Patentes 1 214 683 ist ein Verfahren zur Herstellung von heterocyclischen Viererringverbindungen
der allgemeinen Formel
R2Si NR'
Verfahren zur Herstellung von Cyclodisilazanen
Zusatz zum Patent: 1 214 683
worin die Symbole die folgende Bedeutung besitzen: M = Silicium, Bor, Phosphor, O = P-Rest, S = P-Rest to
oder Mg; R = gegebenenfalls halogenierter Alkyl-, Alkenyl-, Cycloalkyl-, Cycloalkenyl-, Aralkyl-, Aralkenyl-
oder Arylrest mit bis zu 20 Kohlenstoffatomen, über Sauerstoff gebundener Rest eines einwertigen
Alkohols oder Phenols mit bis zu 20 Kohlenstoffatomen, wobei zwei Reste am gleichen Silicium- bzw.
M-Atom zusammengenommen eine cyclische Struktur bilden; R' = Alkyl-, Cycloalkyl-, Alkenyl-, Cycloalkenyl-,
Aralkyl-, Aralkenyl-, Aryl- oder heterocyclischer Rest mit bis zu 20 Kohlenstoffatomen;
R" = Halogenatom oder die Gruppe
— NR' — SiR2 — NR' — MR„
Anmelder:
Monsanto Company, St. Louis, Mo. (V. St. A.)
Vertreter:
Dr.-Ing. H. Ruschke und Dipl.-Ing. H. Agular,
Patentanwälte, München 27, Pienzenauer Str. 2
Als Erfinder benannt:
Dr. Chem. Walter Fink,
Rüschlikon, Zürich (Schweiz)
Dr. Chem. Walter Fink,
Rüschlikon, Zürich (Schweiz)
Beanspruchte Priorität:
Schweiz vom 15. März 1963 (3275)
die an ihrem anderen Ende den gleichen Viererring aufweist; η = Null oder ganze Zahl; ν = Valenz von
M, wobei M, anstatt mit den Radikalen R und R" verbunden zu sein, auch Teil eines zweiten, identischen
Viererringes sein kann, das dadurch gekennzeichnet ist, daß man ein Diaminodiorganosilan der allgemeinen
Formel
R'NH — SiR2 — NHR'
worin R und R' die gleiche Bedeutung wie oben haben, in Form eines Dialkalisalzes oder Di-Grignard-Derivates,
mit mindestens einer äquimolaren Menge eines Halogenids der allgemeinen Formel
Sauerstoffausschluß erhitzt, Die Erhitzung wird abgebrochen, wenn die Abspaltung der berechneten
Menge Halogensilan praktisch beendet ist.
Die Herstellung der Disilylamine aus primären Aminen und Halogensilanen ist bekannt.
Nach dem vorliegenden Verfahren verläuft die Cyclisierung zum Viererring mit z. B. Bis-(dimethylchlorsilyl)-anilin
nach der folgenden Gleichung:
Cl(CHa)2Si — N(C6H5) — Si(CHa)2Cl
C6H5N- Si(CHa)2
C6H5N- Si(CHa)2
worin R und ν die gleiche Bedeutung wie oben haben, X ein Halogenatom und m mindestens 2 ist, in einem
inerten Lösungs- oder Verdünnungsmittel umsetzt.
Tn weiterer Ausgestaltung des Verfahrens gemäß Patent 1 214 683 wurde nun gefunden, daß man zu
den Cyclodisilazenen (Formel 1,M = Si) gelangt, wenn man Disilylamine der allgemeinen Formel
X3-„R„Si — N R' — SiR„X3_„
worin R, R', X und η die gleiche Bedeutung wie oben haben und mindestens ein X vorhanden ist, unter
+ 2Si(CHa)2Cl2
(CH3)2Si NC6H5
Die zweckmäßige Reaktionstemperatur liegt in der Regel im Bereich von etwa 100° C und der Siedetemperatur
des Disilylamins. Das sich abspaltende Halogensilan wird vorzugsweise aus der Reaktionsmischung kontinuierlich entfernt. Die Leichtigkeit,
mit welcher diese Reaktion abläuft, ist von der Festigkeit der Silicium-Stickstoff- und Silicium-Halogen-Bindungen
abhängig. Die Cyclisierung verläuft besonders leicht, wenn an einem Siliciumatom, neben
wenigstens einem für die Reaktion notwendigen Halogenatom, aliphatische Reste und am Stickstoffatom
ein aromatischer Rest vorhanden sind.
709 609/465
Man kann die Herstellung der Disilylamine und deren Cyclisierung zu einem einzigen Verfahren
kombinieren. Man kann beispielsweise ein Dialkalisalz eines primären Amins mit dem Halogensilan zum
entsprechenden Disilylamin umsetzen und das letztere ohne vorherige Isolierung, nötigenfalls unter Druckanwendung,
cyclisieren. In gleicher Weise kann man beispielsweise ein sekundäres Silylamin in Form eines
Alkalisalzes mit dem Halogensilan umsetzen und anschließend cyclisieren.
Zu 29,8 g (0,18 Mol) Trimethylsilylanilin in 30 ml Xylol werden in einer Stickstoffatmosphäre unter
Rühren 30 ml (0,18 Mol) einer 6n-Lösung von Butyllithium in Hexan zugetropft und die Mischung
während einer Stunde auf 50 bis 60°C erwärmt. Die Suspension des Lithiumsalzes tropft man zu 23,2 g
(0,18 Mol) Dimethylsiliciumdichlorid in 100 ml Xylol und kocht anschließend 5 Stunden. Die Umwandlung
ist 100°/0ig, bezogen auf das isolierte Lithiumchlorid (7,63 g). Die abzentrifugierte Lösung wird vom Xylol
befreit und der Rückstand (45,3 g) fraktioniert destilliert.
Ausbeute 39,8 g (86,0 °/0) unsymmetrisches Disilylamin
der Formel
(CH3)3Si — N(C6H5) — Si(CH3)2Cl;
Kp.0>2 = 71 bis 720C; n%° 1,4977.
Molgewicht:
Molgewicht:
Berechnet
gefunden
gefunden
257,0;
257,0.
257,0.
gegeben. Nachdem die Mischung 5 Stunden zum Rückfluß (etwa 140° C) erhitzt worden ist, wird sie anschließend
15 Stunden bei 250 bis 3000C in einem Autoklav gehalten. Der ausgefallene Niederschlag, bestehend
aus der Viererringverbindung und nebenbei gebildetem Lithiumchlorid, wird abgetrennt und mit
Xylol oder Brombenzol extrahiert. Es hinterbleiben 12,1 g Lithiumchlorid, was einem Umsatz von 95 °/0
entspricht.
ίο Der Extrakt besteht aus 19,8 g Hexaphenyl-1,3,2,4-diazadisiletidin
(48,5 °/0 der Theorie). Aus Nitrobenzol oder Brombenzol umkristallisiert beträgt der Schmelzpunkt
355,5°C (korrigiert).
Molgewicht
Molgewicht
Berechnet
gefunden
gefunden
546,8,
576.
576.
11,46 g (0,042 Mol) der obigen Verbindung werden in einem mit Rückflußkühler versehenen Kolben zum
Sieden erhitzt. Nach kurzer Zeit beginnt die Reaktion und Trimethylsiliciumchlorid destilliert durch den
auf 60° C erwärmten Kühler ab. Im Laufe von 3 Stunden steigt die Kolbentemperatur auf 250 bis 270° C,
wobei sich der Kolbeninhalt verdickt. Die erkaltete Reaktionsmischung wird mit Hexan versetzt und die
Kristalle abgenutscht.
Rohausbeute 6,8 g (80,5 %) l,3-Diphenyl-2,2,4,4-tetramethyl-l,3,2,4-diazadisiletidin;
Fp. 252,5°C (aus Xylol umkristallisiert).
Aus 14,0 g (0,15 Mol) Anilin und 50 ml Butyllithium (6n-Lösung in Hexan) wird in bekannter Weise das
Dilithiumsalz dargestellt.
Zur Suspension des Dilithiumsalzes wird in einer Stickstoffatmosphäre unter Rühren eine Lösung von
95,0 g (0,37 Mol) reines (CeHs)2SiCl2 in 50 ml Xylol
Wenn eine äquimolare Menge Diphenyldichlorsilan verwendet wird, beträgt die Ausbeute an Viererringverbindung
nur etwa 23 °/u·
Claims (2)
1. Verfahren zur Herstellung von Cyclodisilazanen nach Patent 1 214 683, dadurch g e kennzeichnet,
daß man Disilylamine der allgemeinen Formel
Xp c: TvTl?' QiP V"
3— reiN.«öi — iNiv — οΐχ\.»Λ.3 — η
in der R einen gegebenenfalls halogenierten Alkyl-, Alkenyl-, Cycloalkyl-, Cycloalkenyl-, Aralkyl-,
Aralkenyl- oder Arylrest mit bis zu 20 Kohlenstoffatomen oder einen über das Sauerstoffatom gebundenen
Rest eines einwertigen Alkohols oder Phenols mit bis zu 20 Kohlenstoffatomen, zwei
Reste am gleichen Siliciumatom zusammengenommen einen heterocyclischen Rest, R' einen Alkyl-,
Alkenyl-, Cycloalkyl-, Cycloalkenyl-, Aralkyl-, Aralkenyl-, Arylrest oder heterocyclischen Rest
mit bis zu 20 Kohlenstoffatomen, X ein Halogenatom und η 0, 1, 2 oder 3 bedeutet und mindestens
ein X vorhanden ist, unter Sauerstoffausschluß erhitzt.
2. Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß man an Stelle von Disilylaminen
Mischungen aus einem Silylamin der Allgemeinen Formel
R'NM — SiR3
in welcher M ein Alkalimetallatom bedeutet, und einem Halogensilan der allgemeinen Formel
SlR 771X4— m
in welcher m 0, 1 oder 2 bedeutet, verwendet.
709 609/465 6.67 © Bundesdruckerei Berlin
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH384062A CH407114A (de) | 1962-03-30 | 1962-03-30 | Verfahren zur Herstellung heterocyclischer Viererringverbindungen |
CH327563A CH460000A (de) | 1963-03-15 | 1963-03-15 | Verfahren zur Herstellung von hochtemperaturbeständigen Cyclodisilazanen |
Publications (1)
Publication Number | Publication Date |
---|---|
DE1252683B true DE1252683B (de) | 1967-10-26 |
Family
ID=25692633
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DENDAT1252683D Pending DE1252683B (de) | 1962-03-30 | Verfahren zur Herstellung von Cyclodisilazanen | |
DEM56295A Pending DE1214683B (de) | 1962-03-30 | 1963-03-28 | Verfahren zur Herstellung von heterocyclischen Viererringverbindungen |
DEM74665A Pending DE1291338B (de) | 1962-03-30 | 1964-03-13 | Verfahren zur Herstellung von Cyclodisilazanen |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DEM56295A Pending DE1214683B (de) | 1962-03-30 | 1963-03-28 | Verfahren zur Herstellung von heterocyclischen Viererringverbindungen |
DEM74665A Pending DE1291338B (de) | 1962-03-30 | 1964-03-13 | Verfahren zur Herstellung von Cyclodisilazanen |
Country Status (4)
Country | Link |
---|---|
BE (2) | BE645148A (de) |
DE (3) | DE1214683B (de) |
GB (2) | GB1040726A (de) |
NL (1) | NL290900A (de) |
-
0
- BE BE630249D patent/BE630249A/xx unknown
- NL NL290900D patent/NL290900A/xx unknown
- DE DENDAT1252683D patent/DE1252683B/de active Pending
-
1963
- 1963-03-28 DE DEM56295A patent/DE1214683B/de active Pending
- 1963-03-29 GB GB12527/63A patent/GB1040726A/en not_active Expired
-
1964
- 1964-03-13 BE BE645148D patent/BE645148A/xx unknown
- 1964-03-13 DE DEM74665A patent/DE1291338B/de active Pending
- 1964-03-16 GB GB11069/64A patent/GB1063086A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
NL290900A (de) | |
GB1040726A (en) | 1966-09-01 |
BE645148A (de) | 1964-09-14 |
DE1214683B (de) | 1966-04-21 |
DE1291338B (de) | 1969-03-27 |
BE630249A (de) | |
GB1063086A (en) | 1967-03-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE960461C (de) | Verfahren zur Herstellung von Organohalogenmonosilanen aus Organohalogenpolysilanen | |
DE10139963A1 (de) | Quaternäre Ammoniumgruppen aufweisende Organopolysiloxane und Verfahren zu deren Herstellung | |
DE824048C (de) | Verfahren zur Herstellung von Alkylhalogensilanen | |
DE1136491B (de) | Verfahren zur Herstellung von Arylaminoalkylpolysiloxanen | |
DE2365272C2 (de) | ||
DE1206899B (de) | Verfahren zur Herstellung von siliciumhaltigen N, N', N"-Triorgano-B, B', B"-trihydrido-borazolen | |
DE1203773B (de) | Verfahren zur Herstellung von tertiaeren Phosphinen | |
DE1252683B (de) | Verfahren zur Herstellung von Cyclodisilazanen | |
DE3742068A1 (de) | Verfahren zur herstellung von in den endstaendigen einheiten je eine si-gebundene hydroxylgruppe aufweisenden diorganopolysiloxanen | |
DE2044888B2 (de) | Verfahren zur herstellung ungesaettigter organosiliciumverbindungen | |
DE947475C (de) | Verfahren zur Herstellung von neuen Hexaorganoaethinyldisilanen | |
DE1170409B (de) | Verfahren zur Herstellung von Cyanalkylsilanen | |
DE1158972B (de) | Verfahren zur Herstellung von Trisilylaminen | |
DE1154477B (de) | Verfahren zur Herstellung von Nitro- oder Nitritogruppen enthaltenden Silanen | |
DE1216302B (de) | Verfahren zur Herstellung von Polyorganocyclosiloxanen | |
DE1593341A1 (de) | Verfahren zur Trennung von Organochlorsilanen | |
DE1206425B (de) | Verfahren zur Herstellung von Phosphorsaeureestern | |
DE1185609B (de) | Verfahren zur Herstellung von Silcarbanen | |
DE1276633B (de) | Verfahren zur Herstellung von Estern einiger Saeuren des Phosphors | |
DE1221635B (de) | Verfahren zur Reinigung von Tetraphenyl-disiloxandiol-(1, 3) oder Hexaphenyltrisil-oxandiol-(1, 5) | |
DE877306C (de) | Verfahren zur Herstellung von siliciumorganischen Verbindungen | |
DE1249864B (de) | Verfahren zur Herstellung von cyclischen Organosiliciumverbmdungen | |
DE1169948B (de) | Verfahren zur Herstellung von antibakteriell wirksamen N, N'-Alkylen-1, 1'-alkylen-bis-(4-aminochinolinium-halogeniden) | |
DE1165027B (de) | Verfahren zur Herstellung von 1, 2-Siloxaalkanen | |
DE830645C (de) | Verfahren zur Herstellung von Organochlorsilanen mit aromatischen Radikalen |