CN1914241B - 聚氨酯抛光垫 - Google Patents

聚氨酯抛光垫 Download PDF

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Publication number
CN1914241B
CN1914241B CN2005800037363A CN200580003736A CN1914241B CN 1914241 B CN1914241 B CN 1914241B CN 2005800037363 A CN2005800037363 A CN 2005800037363A CN 200580003736 A CN200580003736 A CN 200580003736A CN 1914241 B CN1914241 B CN 1914241B
Authority
CN
China
Prior art keywords
isocyanate
polishing pad
polymeric microspheres
curing agent
expandable polymeric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
CN2005800037363A
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English (en)
Chinese (zh)
Other versions
CN1914241A (zh
Inventor
M·J·库尔普
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Electronic Materials Holding Inc
Original Assignee
Rohm and Haas Electronic Materials CMP Holdings Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=34808579&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=CN1914241(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Rohm and Haas Electronic Materials CMP Holdings Inc filed Critical Rohm and Haas Electronic Materials CMP Holdings Inc
Publication of CN1914241A publication Critical patent/CN1914241A/zh
Application granted granted Critical
Publication of CN1914241B publication Critical patent/CN1914241B/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/08—Processes
    • C08G18/10—Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/48—Polyethers
    • C08G18/4854—Polyethers containing oxyalkylene groups having four carbon atoms in the alkylene group

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
CN2005800037363A 2004-02-03 2005-01-13 聚氨酯抛光垫 Ceased CN1914241B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/772,054 US20050171224A1 (en) 2004-02-03 2004-02-03 Polyurethane polishing pad
US10/772,054 2004-02-03
PCT/US2005/001192 WO2005077999A1 (en) 2004-02-03 2005-01-13 Polyurethane polishing pad

Publications (2)

Publication Number Publication Date
CN1914241A CN1914241A (zh) 2007-02-14
CN1914241B true CN1914241B (zh) 2011-03-23

Family

ID=34808579

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2005800037363A Ceased CN1914241B (zh) 2004-02-03 2005-01-13 聚氨酯抛光垫

Country Status (7)

Country Link
US (3) US20050171224A1 (https=)
EP (1) EP1716193A1 (https=)
JP (2) JP4954716B2 (https=)
KR (1) KR101141880B1 (https=)
CN (1) CN1914241B (https=)
TW (1) TWI378994B (https=)
WO (1) WO2005077999A1 (https=)

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JP4954716B2 (ja) 2012-06-20
KR20060124686A (ko) 2006-12-05
US20110054057A9 (en) 2011-03-03
WO2005077999A1 (en) 2005-08-25
JP5593337B2 (ja) 2014-09-24
US20050171225A1 (en) 2005-08-04
CN1914241A (zh) 2007-02-14
JP2007520617A (ja) 2007-07-26
US20080242755A1 (en) 2008-10-02
US8288448B2 (en) 2012-10-16
KR101141880B1 (ko) 2012-05-03
US7414080B2 (en) 2008-08-19
EP1716193A1 (en) 2006-11-02
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