CN1854743B - 在线电子束测试系统 - Google Patents

在线电子束测试系统 Download PDF

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Publication number
CN1854743B
CN1854743B CN2006100790744A CN200610079074A CN1854743B CN 1854743 B CN1854743 B CN 1854743B CN 2006100790744 A CN2006100790744 A CN 2006100790744A CN 200610079074 A CN200610079074 A CN 200610079074A CN 1854743 B CN1854743 B CN 1854743B
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China
Prior art keywords
test
substrate
area
chamber
substrate support
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CN2006100790744A
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English (en)
Chinese (zh)
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CN1854743A (zh
Inventor
法耶茨·E·阿波德
西拉姆·克里施纳斯瓦弥
本杰明·M·约翰斯通
亨·T·恩古尹
麦特瑟斯·波拉纳
拉尔夫·施密德
约翰·M·怀特
栗田伸一
詹姆斯·C·亨特
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Applied Materials Inc
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Applied Materials Inc
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Publication of CN1854743A publication Critical patent/CN1854743A/zh
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Publication of CN1854743B publication Critical patent/CN1854743B/zh
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67236—Apparatus for manufacturing or treating in a plurality of work-stations the substrates being processed being not semiconductor wafers, e.g. leadframes or chips
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2809—Scanning microscopes characterised by the imaging problems involved
    • H01J2237/2811—Large objects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2817—Pattern inspection

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
CN2006100790744A 2005-04-29 2006-04-29 在线电子束测试系统 Active CN1854743B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US67655805P 2005-04-29 2005-04-29
US60/676,558 2005-04-29
US11/375,625 US7535238B2 (en) 2005-04-29 2006-03-14 In-line electron beam test system
US11/375,625 2006-03-14

Publications (2)

Publication Number Publication Date
CN1854743A CN1854743A (zh) 2006-11-01
CN1854743B true CN1854743B (zh) 2012-12-12

Family

ID=37195046

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2006100790744A Active CN1854743B (zh) 2005-04-29 2006-04-29 在线电子束测试系统

Country Status (5)

Country Link
US (3) US7535238B2 (enExample)
JP (1) JP2006317437A (enExample)
KR (1) KR101255750B1 (enExample)
CN (1) CN1854743B (enExample)
TW (1) TWI277759B (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
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US7535238B2 (en) * 2005-04-29 2009-05-19 Applied Materials, Inc. In-line electron beam test system
US8115506B2 (en) * 2007-05-14 2012-02-14 Applied Materials, Inc. Localization of driver failures within liquid crystal displays
EP2180327A1 (en) * 2008-10-21 2010-04-28 Applied Materials, Inc. Apparatus and method for active voltage compensation
EP2390906A1 (en) 2010-05-26 2011-11-30 Applied Materials, Inc. Apparatus and method for electrostatic discharge (ESD) reduction
EP2732299A4 (en) 2011-07-15 2015-03-25 Orbotech Ltd ELECTRICAL TESTING OF ELECTRONIC DEVICES BY MEANS OF ELECTRON BEAM-INDUCED PLASMA STONES
KR102119930B1 (ko) * 2014-08-31 2020-06-08 케이엘에이 코포레이션 복수의 이동가능한 빔 칼럼을 갖는 이미징 장치 및 실질적으로 일치하도록 의도된 기판의 복수의 영역을 검사하는 방법
US11530962B2 (en) 2017-04-06 2022-12-20 Kyutaek Cho Automated functional testing systems and methods of making and using the same
US10663382B2 (en) * 2018-08-30 2020-05-26 Canada Scaffold Supply Co. Ltd. Testing apparatus for applying test load using vacuum pressure

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US7535238B2 (en) 2009-05-19
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US20060244467A1 (en) 2006-11-02
US7746088B2 (en) 2010-06-29
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