DE69223088T2 - Apparat zur Musterüberprüfung und Elektronenstrahlgerät - Google Patents
Apparat zur Musterüberprüfung und ElektronenstrahlgerätInfo
- Publication number
- DE69223088T2 DE69223088T2 DE69223088T DE69223088T DE69223088T2 DE 69223088 T2 DE69223088 T2 DE 69223088T2 DE 69223088 T DE69223088 T DE 69223088T DE 69223088 T DE69223088 T DE 69223088T DE 69223088 T2 DE69223088 T2 DE 69223088T2
- Authority
- DE
- Germany
- Prior art keywords
- electron beam
- beam device
- checking apparatus
- pattern checking
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
- G03F1/86—Inspecting by charged particle beam [CPB]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3005—Observing the objects or the point of impact on the object
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/22—Treatment of data
- H01J2237/221—Image processing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2441—Semiconductor detectors, e.g. diodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/24435—Microchannel plates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2446—Position sensitive detectors
- H01J2237/2447—Imaging plates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/24495—Signal processing, e.g. mixing of two or more signals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24592—Inspection and quality control of devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2813—Scanning microscopes characterised by the application
- H01J2237/2817—Pattern inspection
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP03137692A JP3107593B2 (ja) | 1991-06-10 | 1991-06-10 | パターン検査装置 |
JP24154991A JP2970113B2 (ja) | 1991-09-20 | 1991-09-20 | パターン検査装置 |
JP29883891 | 1991-11-14 | ||
JP31667691 | 1991-11-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69223088D1 DE69223088D1 (de) | 1997-12-18 |
DE69223088T2 true DE69223088T2 (de) | 1998-03-05 |
Family
ID=27472085
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69223088T Expired - Fee Related DE69223088T2 (de) | 1991-06-10 | 1992-06-10 | Apparat zur Musterüberprüfung und Elektronenstrahlgerät |
Country Status (3)
Country | Link |
---|---|
US (1) | US5430292A (de) |
EP (1) | EP0518633B1 (de) |
DE (1) | DE69223088T2 (de) |
Families Citing this family (88)
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WO2001075949A1 (fr) * | 2000-04-04 | 2001-10-11 | Advantest Corporation | Appareil d'exposition multifaisceau comprenant une lentille electronique multiaxe, et procede de fabrication d'un dispositif a semi-conducteur |
KR20030028461A (ko) * | 2000-04-04 | 2003-04-08 | 주식회사 아도반테스토 | 다축전자렌즈를 이용한 멀티빔 노광장치, 반도체소자제조방법 |
WO2001075950A1 (fr) * | 2000-04-04 | 2001-10-11 | Advantest Corporation | Appareil d'exposition multifaisceau comprenant une lentille electronique multiaxe, procede de fabrication de ladite lentille, et procede de fabrication d'un dispositif a semi-conducteur |
WO2001075947A1 (fr) * | 2000-04-04 | 2001-10-11 | Advantest Corporation | Appareil d'exposition multifaisceau comprenant une lentille elctronique multi-axiale, une lentille electronique multi-axiale pour la focalisation de faisceaux d'electrons, et procede de fabrication de dispositif semi-conducteur |
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US4902898A (en) * | 1988-04-26 | 1990-02-20 | Microelectronics Center Of North Carolina | Wand optics column and associated array wand and charged particle source |
CA1317035C (en) * | 1989-01-25 | 1993-04-27 | Matthias Brunner | Method for examining a specimen in a particle beam instrument |
DE69017095T2 (de) * | 1989-05-19 | 1995-06-14 | Fujitsu Ltd | Anordnung von Strahlaustastungsblenden, Verfahren zur Herstellung derselben, Gerät und Verfahren zur Belichtung von mit einem Strahl geladenen Teilchen. |
US4983830A (en) * | 1989-06-29 | 1991-01-08 | Seiko Instruments Inc. | Focused ion beam apparatus having charged particle energy filter |
JPH0395829A (ja) * | 1989-09-08 | 1991-04-22 | Fujitsu Ltd | 微小冷陰極の製造方法 |
DE3938660A1 (de) * | 1989-11-21 | 1991-05-23 | Integrated Circuit Testing | Korpuskularstrahlgeraet |
US5173634A (en) * | 1990-11-30 | 1992-12-22 | Motorola, Inc. | Current regulated field-emission device |
US5122663A (en) * | 1991-07-24 | 1992-06-16 | International Business Machine Corporation | Compact, integrated electron beam imaging system |
-
1992
- 1992-06-10 DE DE69223088T patent/DE69223088T2/de not_active Expired - Fee Related
- 1992-06-10 EP EP92305311A patent/EP0518633B1/de not_active Expired - Lifetime
-
1993
- 1993-10-12 US US08/134,860 patent/US5430292A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US5430292A (en) | 1995-07-04 |
EP0518633B1 (de) | 1997-11-12 |
EP0518633A1 (de) | 1992-12-16 |
DE69223088D1 (de) | 1997-12-18 |
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