CN1832191B - 薄膜晶体管、有机薄膜晶体管阵列板及其制作方法 - Google Patents

薄膜晶体管、有机薄膜晶体管阵列板及其制作方法 Download PDF

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Publication number
CN1832191B
CN1832191B CN2006100064901A CN200610006490A CN1832191B CN 1832191 B CN1832191 B CN 1832191B CN 2006100064901 A CN2006100064901 A CN 2006100064901A CN 200610006490 A CN200610006490 A CN 200610006490A CN 1832191 B CN1832191 B CN 1832191B
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electrode
film transistor
organic
thin film
array panel
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CN1832191A (zh
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金保成
李容旭
洪雯杓
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Samsung Display Co Ltd
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Samsung Electronics Co Ltd
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K19/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic element specially adapted for rectifying, amplifying, oscillating or switching, covered by group H10K10/00
    • H10K19/10—Integrated devices, or assemblies of multiple devices, comprising at least one organic element specially adapted for rectifying, amplifying, oscillating or switching, covered by group H10K10/00 comprising field-effect transistors
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40—Organic transistors
    • H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462—Insulated gate field-effect transistors [IGFETs]
    • H10K10/464—Lateral top-gate IGFETs comprising only a single gate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40—Organic transistors
    • H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462—Insulated gate field-effect transistors [IGFETs]
    • H10K10/466—Lateral bottom-gate IGFETs comprising only a single gate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40—Organic transistors
    • H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462—Insulated gate field-effect transistors [IGFETs]
    • H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
    • H10K10/474—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising a multilayered structure
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/60—Forming conductive regions or layers, e.g. electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/125—Active-matrix OLED [AMOLED] displays including organic TFTs [OTFT]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/114—Poly-phenylenevinylene; Derivatives thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60—Organic compounds having low molecular weight
    • H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Thin Film Transistor (AREA)
  • Liquid Crystal (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
CN2006100064901A 2005-03-09 2006-02-06 薄膜晶体管、有机薄膜晶体管阵列板及其制作方法 Active CN1832191B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR10-2005-0019616 2005-03-09
KR1020050019616A KR101133767B1 (ko) 2005-03-09 2005-03-09 유기 박막 트랜지스터 표시판 및 그 제조 방법
KR1020050019616 2005-03-09

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CN1832191A CN1832191A (zh) 2006-09-13
CN1832191B true CN1832191B (zh) 2010-05-12

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US (2) US7838872B2 (enExample)
EP (1) EP1701387B1 (enExample)
JP (1) JP2006253674A (enExample)
KR (1) KR101133767B1 (enExample)
CN (1) CN1832191B (enExample)
TW (1) TWI377675B (enExample)

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KR101197059B1 (ko) * 2006-07-11 2012-11-06 삼성디스플레이 주식회사 박막 트랜지스터 표시판 및 그 제조 방법
US20080128685A1 (en) * 2006-09-26 2008-06-05 Hiroyuki Honda Organic semiconductor device, manufacturing method of same, organic transistor array, and display
JP5181586B2 (ja) * 2006-09-26 2013-04-10 大日本印刷株式会社 有機半導体素子、有機半導体素子の製造方法、有機トランジスタアレイ、およびディスプレイ
KR101363714B1 (ko) * 2006-12-11 2014-02-14 엘지디스플레이 주식회사 유기 박막트랜지스터, 그 제조 방법, 이를 이용한 정전기방지 소자, 액정표시장치 및 그 제조 방법
KR101062108B1 (ko) * 2007-03-26 2011-09-02 파이오니아 가부시키가이샤 유기 반도체 소자 및 그 제조방법
KR101415560B1 (ko) * 2007-03-30 2014-07-07 삼성디스플레이 주식회사 박막 트랜지스터 표시판 및 그 제조 방법
KR100875102B1 (ko) 2007-09-03 2008-12-19 삼성모바일디스플레이주식회사 유기 발광 디스플레이 장치
JP5205894B2 (ja) * 2007-09-21 2013-06-05 大日本印刷株式会社 有機半導体素子、有機半導体素子の製造方法、有機トランジスタアレイ、およびディスプレイ
JP5256676B2 (ja) * 2007-09-21 2013-08-07 大日本印刷株式会社 有機半導体素子、有機半導体素子の製造方法、有機トランジスタアレイ、およびディスプレイ
JP2009087996A (ja) * 2007-09-27 2009-04-23 Dainippon Printing Co Ltd 有機半導体素子、有機半導体素子の製造方法、有機トランジスタアレイ、およびディスプレイ
KR101427707B1 (ko) * 2008-02-21 2014-08-11 삼성디스플레이 주식회사 유기 박막 트랜지스터 기판 및 그의 제조 방법
KR101480004B1 (ko) 2008-02-21 2015-01-08 삼성디스플레이 주식회사 표시판 및 그 제조 방법
US8049862B2 (en) * 2008-08-08 2011-11-01 Apple Inc. Indium tin oxide (ITO) layer forming
KR101448000B1 (ko) * 2008-08-26 2014-10-14 삼성디스플레이 주식회사 박막 트랜지스터 기판 및 그 제조 방법
KR101051075B1 (ko) * 2008-09-19 2011-07-21 경희대학교 산학협력단 유기박막 트랜지스터 어레이 및 그 제조방법
KR20140032155A (ko) * 2012-09-06 2014-03-14 삼성디스플레이 주식회사 박막 트랜지스터 기판 및 그 제조방법
WO2016042924A1 (ja) * 2014-09-18 2016-03-24 富士フイルム株式会社 トランジスタ、および、トランジスタの製造方法
KR102526111B1 (ko) * 2017-12-27 2023-04-25 엘지디스플레이 주식회사 표시 장치
CN109360857A (zh) * 2018-08-15 2019-02-19 南昌工程学院 一种可降解的自支撑薄膜晶体管器件及其制备方法
CN110610684B (zh) * 2019-10-29 2021-03-30 厦门天马微电子有限公司 一种有机电致发光显示面板及显示装置

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JP2006253674A (ja) 2006-09-21
EP1701387A3 (en) 2012-05-09
US7838872B2 (en) 2010-11-23
US20110039363A1 (en) 2011-02-17
EP1701387A2 (en) 2006-09-13
TWI377675B (en) 2012-11-21
KR101133767B1 (ko) 2012-04-09
KR20060098982A (ko) 2006-09-19
EP1701387B1 (en) 2015-04-08
TW200703656A (en) 2007-01-16
US20060202199A1 (en) 2006-09-14
US8039296B2 (en) 2011-10-18
CN1832191A (zh) 2006-09-13

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