CN1421927A - 半导体器件 - Google Patents
半导体器件 Download PDFInfo
- Publication number
- CN1421927A CN1421927A CN02152669A CN02152669A CN1421927A CN 1421927 A CN1421927 A CN 1421927A CN 02152669 A CN02152669 A CN 02152669A CN 02152669 A CN02152669 A CN 02152669A CN 1421927 A CN1421927 A CN 1421927A
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- electrode terminal
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/10—Integrated device layouts
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/189—High-frequency amplifiers, e.g. radio frequency amplifiers
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/20—Power amplifiers, e.g. Class B amplifiers, Class C amplifiers
- H03F3/21—Power amplifiers, e.g. Class B amplifiers, Class C amplifiers with semiconductor devices only
- H03F3/211—Power amplifiers, e.g. Class B amplifiers, Class C amplifiers with semiconductor devices only using a combination of several amplifiers
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/60—Amplifiers in which coupling networks have distributed constants, e.g. with waveguide resonators
- H03F3/601—Amplifiers in which coupling networks have distributed constants, e.g. with waveguide resonators using FET's, e.g. GaAs FET's
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/68—Combinations of amplifiers, e.g. multi-channel amplifiers for stereophonics
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/72—Gated amplifiers, i.e. amplifiers which are rendered operative or inoperative by means of a control signal
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/601—Insulated-gate field-effect transistors [IGFET] having lightly-doped drain or source extensions, e.g. LDD IGFETs or DDD IGFETs
- H10D30/603—Insulated-gate field-effect transistors [IGFET] having lightly-doped drain or source extensions, e.g. LDD IGFETs or DDD IGFETs having asymmetry in the channel direction, e.g. lateral high-voltage MISFETs having drain offset region or extended drain IGFETs [EDMOS]
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/23—Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
- H10D64/251—Source or drain electrodes for field-effect devices
- H10D64/257—Source or drain electrodes for field-effect devices for lateral devices wherein the source or drain electrodes are characterised by top-view geometrical layouts, e.g. interdigitated, semi-circular, annular or L-shaped electrodes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
- H10D64/311—Gate electrodes for field-effect devices
- H10D64/411—Gate electrodes for field-effect devices for FETs
- H10D64/511—Gate electrodes for field-effect devices for FETs for IGFETs
- H10D64/517—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers
- H10D64/519—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers characterised by their top-view geometrical layouts
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
- H10W20/482—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes for individual devices provided for in groups H10D8/00 - H10D48/00, e.g. for power transistors
- H10W20/484—Interconnections having extended contours, e.g. pads having mesh shape or interconnections comprising connected parallel stripes
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F2200/00—Indexing scheme relating to amplifiers
- H03F2200/294—Indexing scheme relating to amplifiers the amplifier being a low noise amplifier [LNA]
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F2200/00—Indexing scheme relating to amplifiers
- H03F2200/372—Noise reduction and elimination in amplifier
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/124—Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
- H10D62/126—Top-view geometrical layouts of the regions or the junctions
- H10D62/127—Top-view geometrical layouts of the regions or the junctions of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
- H10D62/351—Substrate regions of field-effect devices
- H10D62/357—Substrate regions of field-effect devices of FETs
- H10D62/364—Substrate regions of field-effect devices of FETs of IGFETs
- H10D62/371—Inactive supplementary semiconductor regions, e.g. for preventing punch-through, improving capacity effect or leakage current
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/23—Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
- H10D64/251—Source or drain electrodes for field-effect devices
- H10D64/254—Source or drain electrodes for field-effect devices for lateral devices wherein the source or drain electrodes extend entirely through the semiconductor bodies, e.g. via-holes for back side contacts
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W44/00—Electrical arrangements for controlling or matching impedance
- H10W44/20—Electrical arrangements for controlling or matching impedance at high-frequency [HF] or radio frequency [RF]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W44/00—Electrical arrangements for controlling or matching impedance
- H10W44/20—Electrical arrangements for controlling or matching impedance at high-frequency [HF] or radio frequency [RF]
- H10W44/226—Electrical arrangements for controlling or matching impedance at high-frequency [HF] or radio frequency [RF] for HF amplifiers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W44/00—Electrical arrangements for controlling or matching impedance
- H10W44/20—Electrical arrangements for controlling or matching impedance at high-frequency [HF] or radio frequency [RF]
- H10W44/255—Electrical arrangements for controlling or matching impedance at high-frequency [HF] or radio frequency [RF] for operation at multiple different frequencies
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/075—Connecting or disconnecting of bond wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/541—Dispositions of bond wires
- H10W72/547—Dispositions of multiple bond wires
- H10W72/5475—Dispositions of multiple bond wires multiple bond wires connected to common bond pads at both ends of the wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/551—Materials of bond wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/951—Materials of bond pads
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Amplifiers (AREA)
- Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP366351/2001 | 2001-11-30 | ||
| JP2001366351A JP2003168736A (ja) | 2001-11-30 | 2001-11-30 | 半導体素子及び高周波電力増幅装置並びに無線通信機 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1421927A true CN1421927A (zh) | 2003-06-04 |
Family
ID=19176263
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN02152669A Pending CN1421927A (zh) | 2001-11-30 | 2002-11-29 | 半导体器件 |
Country Status (3)
| Country | Link |
|---|---|
| US (5) | US6765268B2 (https=) |
| JP (1) | JP2003168736A (https=) |
| CN (1) | CN1421927A (https=) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104485361A (zh) * | 2014-12-25 | 2015-04-01 | 上海华虹宏力半导体制造有限公司 | 绝缘体上硅射频开关器件结构 |
| CN105075286A (zh) * | 2012-12-17 | 2015-11-18 | 微软技术许可有限责任公司 | 设备的充分刚性互连结构 |
| US9893015B2 (en) | 2015-09-24 | 2018-02-13 | Delta Electronics, Inc. | Semiconductor device |
| CN109494204A (zh) * | 2018-10-19 | 2019-03-19 | 隔空微电子(广州)有限公司 | 低噪声放大器芯片封装结构和卫星高频头电路 |
| CN112420841A (zh) * | 2020-11-09 | 2021-02-26 | 佛山立正不锈钢工业管有限公司 | 负微分电阻电路以及神经元晶体管结构 |
| CN108292907B (zh) * | 2015-12-08 | 2021-07-16 | 三菱电机株式会社 | 功率放大器 |
Families Citing this family (64)
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| US6856006B2 (en) * | 2002-03-28 | 2005-02-15 | Siliconix Taiwan Ltd | Encapsulation method and leadframe for leadless semiconductor packages |
| JP2003168736A (ja) * | 2001-11-30 | 2003-06-13 | Hitachi Ltd | 半導体素子及び高周波電力増幅装置並びに無線通信機 |
| US6825559B2 (en) * | 2003-01-02 | 2004-11-30 | Cree, Inc. | Group III nitride based flip-chip intergrated circuit and method for fabricating |
| JP2004260364A (ja) * | 2003-02-25 | 2004-09-16 | Renesas Technology Corp | 半導体装置及び高出力電力増幅装置並びにパソコンカード |
| JP4146290B2 (ja) * | 2003-06-06 | 2008-09-10 | 株式会社ルネサステクノロジ | 半導体装置 |
| TW200518345A (en) * | 2003-08-08 | 2005-06-01 | Renesas Tech Corp | Semiconductor device |
| US7211840B2 (en) * | 2003-10-31 | 2007-05-01 | Semiconductor Energy Laboratory Co., Ltd. | Transistor |
| US7166867B2 (en) | 2003-12-05 | 2007-01-23 | International Rectifier Corporation | III-nitride device with improved layout geometry |
| US20050134410A1 (en) * | 2003-12-18 | 2005-06-23 | Intel Corporation | Power addition apparatus, systems, and methods |
| JP3999759B2 (ja) * | 2004-04-02 | 2007-10-31 | 富士通株式会社 | 基板及び電子機器 |
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| CN101283449B (zh) * | 2005-07-01 | 2014-08-20 | 维税-希力康克斯公司 | 以单个贴装封装实现的完整功率管理系统 |
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| US8111001B2 (en) | 2007-07-17 | 2012-02-07 | Cree, Inc. | LED with integrated constant current driver |
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| US8629495B2 (en) * | 2008-04-15 | 2014-01-14 | Nxp, B.V. | High frequency field-effect transistor |
| JP5644042B2 (ja) * | 2008-10-20 | 2014-12-24 | 株式会社村田製作所 | 半導体装置 |
| GB2466313A (en) * | 2008-12-22 | 2010-06-23 | Cambridge Silicon Radio Ltd | Radio Frequency CMOS Transistor |
| JP2010171114A (ja) * | 2009-01-21 | 2010-08-05 | Renesas Technology Corp | 半導体装置 |
| US8798564B2 (en) * | 2009-03-17 | 2014-08-05 | Provigent Ltd. | Transmitter with replaceable power amplifier |
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| CN102867753B (zh) * | 2012-09-07 | 2015-10-28 | 清华大学 | 基于倒置工艺的射频功率管及其形成方法 |
| RU2504897C1 (ru) * | 2012-10-04 | 2014-01-20 | Открытое акционерное общество "Омский научно-исследовательский институт приборостроения" (ОАО "ОНИИП") | Полосовой высокоизбирательный перестраиваемый lс-фильтр |
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| US9214423B2 (en) * | 2013-03-15 | 2015-12-15 | Semiconductor Components Industries, Llc | Method of forming a HEMT semiconductor device and structure therefor |
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| KR101566155B1 (ko) * | 2013-12-17 | 2015-11-05 | 전자부품연구원 | 나노크기의 이산화티탄으로 표면이 코팅된 구형의 전이금속복합탄산물을 이용한 고전압용 비수계 리튬이차전지용 고용량 양극재료 및 그의 제조 방법 |
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| JP6488720B2 (ja) * | 2015-01-23 | 2019-03-27 | 三菱電機株式会社 | 半導体装置 |
| EP3259781B1 (en) * | 2015-02-20 | 2021-08-25 | Vishay General Semiconductor LLC | Gan-based schottky diode having large bond pads and reduced contact resistance |
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| CA3114695A1 (en) | 2020-04-08 | 2021-10-08 | National Research Council Of Canada | Distributed inductance integrated field effect transistor structure |
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| JP7689297B2 (ja) * | 2020-10-16 | 2025-06-06 | パナソニックIpマネジメント株式会社 | 窒化物半導体装置 |
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- 2002-11-29 CN CN02152669A patent/CN1421927A/zh active Pending
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105075286A (zh) * | 2012-12-17 | 2015-11-18 | 微软技术许可有限责任公司 | 设备的充分刚性互连结构 |
| CN105075286B (zh) * | 2012-12-17 | 2018-10-12 | 微软技术许可有限责任公司 | 印刷电路板系统及互连将印刷电路板系统互连的方法 |
| CN104485361A (zh) * | 2014-12-25 | 2015-04-01 | 上海华虹宏力半导体制造有限公司 | 绝缘体上硅射频开关器件结构 |
| CN104485361B (zh) * | 2014-12-25 | 2018-03-30 | 上海华虹宏力半导体制造有限公司 | 绝缘体上硅射频开关器件结构 |
| US9893015B2 (en) | 2015-09-24 | 2018-02-13 | Delta Electronics, Inc. | Semiconductor device |
| CN108292907B (zh) * | 2015-12-08 | 2021-07-16 | 三菱电机株式会社 | 功率放大器 |
| CN109494204A (zh) * | 2018-10-19 | 2019-03-19 | 隔空微电子(广州)有限公司 | 低噪声放大器芯片封装结构和卫星高频头电路 |
| CN112420841A (zh) * | 2020-11-09 | 2021-02-26 | 佛山立正不锈钢工业管有限公司 | 负微分电阻电路以及神经元晶体管结构 |
| CN112420841B (zh) * | 2020-11-09 | 2023-12-01 | 深圳必特跨境科技有限公司 | 负微分电阻电路以及神经元晶体管结构 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20090008774A1 (en) | 2009-01-08 |
| US20060076620A1 (en) | 2006-04-13 |
| US7141876B2 (en) | 2006-11-28 |
| US6765268B2 (en) | 2004-07-20 |
| US20040232485A1 (en) | 2004-11-25 |
| US8022537B2 (en) | 2011-09-20 |
| US20030102494A1 (en) | 2003-06-05 |
| US20070034946A1 (en) | 2007-02-15 |
| US7439622B2 (en) | 2008-10-21 |
| US6992528B2 (en) | 2006-01-31 |
| JP2003168736A (ja) | 2003-06-13 |
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