CN1404495A - 聚有机硅倍半氧烷及其制备方法 - Google Patents
聚有机硅倍半氧烷及其制备方法 Download PDFInfo
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- CN1404495A CN1404495A CN01805248A CN01805248A CN1404495A CN 1404495 A CN1404495 A CN 1404495A CN 01805248 A CN01805248 A CN 01805248A CN 01805248 A CN01805248 A CN 01805248A CN 1404495 A CN1404495 A CN 1404495A
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- carbon atom
- replacement
- hydrogen atom
- polycondensation
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Classifications
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
- C08G77/16—Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/21—Cyclic compounds having at least one ring containing silicon, but no carbon in the ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/045—Polysiloxanes containing less than 25 silicon atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
- C08G77/08—Preparatory processes characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
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Abstract
本发明涉及聚有机硅倍半氧烷及其制备方法。目前的聚有机硅倍半氧烷可通过各种方法获得,包括聚合1,3-二有机硅氧烷的前体,这种化合物可通过使用硅烷化合物作为原料制得。与常规的聚有机硅倍半氧烷相比,这种聚有机硅倍半氧烷便于处理和控制聚合反应速度,具有高度规整的结构,并具有高官能度和各种特性。
Description
技术领域
本发明涉及聚有机硅倍半氧烷(polyorganosilsesquioxane)及其制备方法。具体而言,本发明涉及以硅烷基化合物作为原料的聚有机硅倍半氧烷及其制备方法。
现有技术背景
随着高水平技术的发展,许多领域正对高性能多功能高技术材料进行研究。尤其是对新颖聚合物材料的研究,更多的注意力已集中在新颖的高功能有机聚合物如具有改进的耐热性和玻璃转变温度(Tg)的有机聚合物,以及形成有机或无机杂化物材料如有机或无机的杂化配合物技术。
已知存在许多有机或无机的杂化物材料。特别地,由于有机聚合物和无机聚合物间的重要性,注意力集中在聚有机硅倍半氧烷上,这是一种耐高热的聚合物。
聚有机硅倍半氧烷第一次是出现在Brown等人在J.Am.Chem.Soc,82,6194(1960)的论文中,Owens Illinois and Gelest以“玻璃树脂”和“SST树脂”的商品名出售。然而,聚有机硅倍半氧烷由于难以控制聚合物的结构和调节其分子量,还未作为工业材料投入实际使用,
聚有机硅倍半氧烷的高度规整的梯形结构是其具有改进的性能特点的原因。因此,随着能形成完美梯形结构的新颖原料的发展,人们以各种方式在工业的各领域开展了对这些原料的缩合方法的研究。
在已知制备聚有机硅倍半氧烷的方法中,代表性方法是对前体的水解产物(低聚物)进行脱水和缩合,在碱性/酸性催化剂存在下通过水解三氯硅烷或三烷氧基硅烷合成,从而容易地获得低分子量聚合物[数均分子量(Mn)为10,000-30,000,分布度(Mw/Mn)为3-20]。
首先描述使用三氯硅烷制备聚有机硅倍半氧烷的常用方法。水解三氯硅烷时通过共水解缩合产生的低聚物的Mn为1,000-2,000,多分散指数(PDI)值为2-5,与单一结构的硅烷三醇(silanetriol)相比,这样的低聚物具有复杂多变的结构。在形成高分子量低聚物时,由于存在内羟基,容易通过结构变形形成三维网结构,低聚物的这种固有的结构存在下列缺陷:1)产生的聚合物结构不能控制;2)难以调节产生的聚合物的分子量和获得高分子量聚合物;3)产生的聚合物失去高规整度,降低在溶剂中的溶解性;4)残留的低分子量组分对聚合物的耐热性和机械性能有不良影响。
从方便处理的角度看,使用三烷氧基硅烷制备聚有机硅倍半氧烷的常用方法与使用三氯硅烷相比具有优势,例如水解速度的可控性。然而,大量研究报道这种方法由于存在内羟基而使低聚物变形以及存在烷氧基会引起下列缺陷:1)形成的聚合物为支链结构而不是梯形结构;2)不易达到所用催化剂的选择性、所选催化剂的量、反应物溶剂的选择、所选反应物溶剂的pH的细微调节等;和3)三维网结构引起微胶凝。这些缺陷对制备高度规整的梯形硅聚合物有不良影响。
如上所述,人们对聚有机硅倍半氧烷已付出大量关注并一直进行研究。根据已知的合成方法如溶胶-凝胶法、开环聚合法或平衡聚合法以及对聚有机硅倍半氧烷的结构研究,其缩合是非常复杂和多样的,不能完全控制聚合物的结构。因此,即使以玻璃树脂(也称T-形树脂)的商品名称出售的产品也不能满足用作新颖的工业材料的各种要求,这将成为对实际使用的障碍。
对使用有机或无机杂化物材料的新颖工业材料的要求如下:2-3的低介电常数;优良的热稳定性如400℃或更高的起始热解温度;低吸湿性;低的热膨胀系数;优良的间隙填充能力;优良的粘合性。
为解决上述问题,本发明人提出具有高规整度和高结晶度的聚有机硅倍半氧烷,但这种聚合物通过常用方法(溶胶-凝胶法)不能控制,需使用高纯度有机硅三醇作为原料,而不是具有多种分子量和结构的低聚物。
然而,仍需要具有高规整度和高结晶度的聚有机硅倍半氧烷。
本发明的目的是通过研制新的前体提供新的具有优良性能的高技术无机材料及其制备方法,这种前体:1)易于处理;2)能调节聚合反应速度;3)能在聚合物两端均匀分布羟基;4)能在聚合物主链中高度规整地引入R-SiO3/2;5)容易调节溶胶聚合物的交联结构,特别是可交联性和交联密度;6)通过扩展聚合物结构能实施化学改性;7)在聚合物骨架上能容易地形成纳米尺寸的孔;8)能赋予聚合物高官能度和多种性能。
为达到本发明的上述目的,提供了聚有机硅倍半氧烷及其制备方法。
发明内容
本发明的聚有机硅倍半氧烷是由式1所示的化合物:其中,R1和R2各自独立地是氢原子、有1-30个碳原子的未取代或取代的脂族烃基、有1-30个碳原子的未取代或取代的芳族烃基、有1-30个碳原子的未取代或取代的脂环烃基、有1-30个碳原子的未取代或取代的甲硅烷基、有1-30个碳原子的未取代或取代的烯丙基、有1-30个碳原子的未取代或取代的酰基、乙烯基、胺基、乙酸基或碱金属,n是2-300,000的整数。
本发明提供下式2所示的1,3-二有机硅氧烷作为制备由式1所示的聚有机硅倍半氧烷的前体:其中,R1和R2如上定义,R3是氢原子、低级烷基、乙酸基、钠或钾,X代表氢原子、卤原子、羟基、胺基或羧基。
本发明制备聚有机硅倍半氧烷的方法以下面反应路线1表示:
反应路线1的步骤(A)是制备本发明由式1所示的聚有机硅倍半氧烷的前体化合物的步骤,该前体为式2代表的化合物。步骤(A)中,作为原料的式4代表的化合物如三氯甲基硅烷与式3代表的化合物如三甲氧基苯基硅烷,在酸性催化剂存在下或没有催化剂下反应,易于制备式2代表的各种化合物。
对上述反应中使用的有机溶剂没有特别的限制,只要是本领域一般采用的,但宜使用THF、苯、苯甲醚、氯苯、二甲苯、甲基异丁基酮(MIBK)、二甲基乙酰胺(DMAC)、丙酮或甲苯。
作为上述反应中使用的催化剂,宜使用HCl、丙酮、三乙胺、锡、吡啶、三氯乙酸或乙酸-胺配合物催化剂,但从反应速度、温度和产率角度看,最好使用三氯乙酸。
反应温度宜在30-350℃范围,反应时间较好为1-300小时。
所得式2所示的化合物作为前体,这种化合物在有机溶剂中缩聚,如常用方法的反应路线1的步骤(B)所代表的,从而获得式1代表的聚有机硅倍半氧烷。
对反应路线1的步骤(B)中采用的缩聚法没有特别的限制,可以采用各种方法包括加热、光辐照、电子束扫描、微波辐照等。在加入催化剂的情况下,可获得具有大n值的化合物。
反应路线1的步骤(B)中使用的化合物的量,以100重量份有机溶剂为基准,较好在5-300重量份范围,更好为10-100重量份。如果式2代表的化合物用量小于5重量份,缩聚延缓或该反应完全不能进行,如果大于300重量份,反应期间会发生不希望的胶凝。
对用于实施反应路线1的步骤(B)中缩聚的催化剂没有特别的限制,但至少是一种选自下列的物质:碱金属氢氧化物如氢氧化钠、氢氧化钾或氢氧化铯,胺如三乙胺、二亚乙基三胺、甲-丁基胺(meth-butylamine)、对二甲胺乙醇(para-dimethylamine ethanol)、三乙醇胺或季铵盐,以及氟化物。用于缩聚的催化剂用量,以100重量份式2所示的化合物为基准,较好在0.001-5重量份范围,更好为0.001-1重量份。
尤其在使用碱金属氢氧化物作为催化剂的情况下,宣事先水解式2所示的化合物得到的水解产物,然后进行缩聚。
对反应路线2的步骤(B)中使用的有机溶剂没有特别的限制,宜使用沸点为100℃或更高的有机溶剂,如甲苯或NMP。
反应路线1的步骤(B)中,反应温度宜为50-350℃,更好为100-200℃。反应时间在使用催化剂的情况下宜为1-50小时。在不使用催化剂的情况下,反应温度宜为150-350℃,反应时间宜为1-200小时。如果反应温度超出这一范围,缩聚的效率不能满足工业的要求。
如果用于缩聚的式2代表的化合物纯度大于或等于90%,通过相转移法可以获得高分子量聚合物,即Mn>500,000。
本发明由式1代表的聚有机硅倍半氧烷在一般有机溶剂中具有高溶解性,能溶解它的有机溶剂包括:芳族烃如甲苯、二甲苯、苯或氯苯,烃如二氯甲烷或氯乙烷,醚类如THF、1,4-二噁烷、二乙醚或二丁醚,酮类如丙酮、甲基乙基酮或甲基醚酮、酯或二甲基甲酰胺。
本发明中,R1和R2各自独立地是氢原子、有1-30个碳原子的未取代或取代的脂族烃基、有1-30个碳原子的未取代或取代的芳族烃基、有1-30个碳原子的未取代或取代的脂环烃基、有1-30个碳原子的未取代或取代的甲硅烷基、有1-30个碳原子的未取代或取代的烯丙基、有1-30个碳原子的未取代或取代的酰基、乙烯基、胺基、乙酸基或碱金属,较好是低级烷基如氢原子、甲基、乙基或丙基、苯基、苯酚基、氯苯基、乙烯基、羧基、三甲基甲硅烷基、乙酸基或碱金属,更好是氢原子、甲基、乙烯基或三甲基甲硅烷基。
如上所述,与热缩合通过水解常用三氯硅烷或三乙氧基硅烷制得的低聚物获得的常规聚有机硅倍半氧烷不同,本发明中,硅烷基化合物首先作为原料反应,获得1,3-二有机硅烷作为前体,然后缩聚获得聚有机硅倍半氧烷,从而制得具有环四有机倍半硅氧烷重复单元的高度规整的梯形聚合物。
如上所述,因为容易在聚合物主链形成高度规整的Si-O-Si键和梯形结构,可以保持高的耐热性。同时,由于可减少聚合物主链中存在的内羟基或缺陷,不需要热处理,而能引入各种功能侧链(如光敏基团或脱烷基反应基团)。特别是,可以改变聚合物依赖于所引入的侧链组成比值如苯基与甲基比值的物理性能,从而能设计新的聚合物分子。由于在聚合物末端规整地排列了硅烷醇端基,在制备有机或无机杂化物材料时可以调节引入的有机聚合物的量,从而容易制备有机或无机共聚物。
特别是,本发明制备的聚有机硅倍半氧烷具有独特的分子结构,即本发明制备的聚有机硅倍半氧烷主链中存在的硅氧烷(Si-O-Si)键与刚性梯形结构(R-SiO3/2)的比例比常规聚有机硅倍半氧烷的比值大97%,该比值百分数由式{(R-SiO3/2数)/(羟基数+硅烷醇端基数)×100}表示。因此,本发明制备的聚有机硅倍半氧烷在一般的有机溶剂中具有高溶解性,优异的抗磨性、低表面张力、光学透明性、3.0或更小的介电常数、低吸收比、优良的间隙填充能力等。通过引入不同侧链,本发明的聚有机硅倍半氧烷在玻璃或金属如铝、铜、钛或硅的粘合方面性能优良,具有优良的电绝缘性、水排泄、耐化学性或透明性,并能应用于各种工业材料。
本发明制备的聚有机硅倍半氧烷可在各种领域使用:广泛使用UV可固化树脂和硅烷化合物的领域,以及一些使用玻璃树脂的领域。本发明制备的聚有机硅倍半氧烷材料包括聚碳酸酯、丙烯酸类树脂、二乙基乙二醇二烷基碳酸酯(商品名“CR-39”)等。本发明制得的聚有机硅倍半氧烷可用于塑料、太阳镜、防护玻璃、控制板、汽车灯、飞机窗或防弹玻璃。本发明制备的聚有机硅倍半氧烷还可以和玻璃树脂用于热处理的玻璃透镜。
另外,本发明制备的聚有机硅倍半氧烷在电绝缘、耐热性、低吸收、自旋玻璃(spin-on glass,SOG)溶液的平面化方面性能优良,从而可适用于电子用途。例如,本发明制备的聚有机硅倍半氧烷是用于一般目的的材料,可用作薄膜的保护涂层、在LSI多层电线中的中间介电层、低介电材料、多重绝缘薄膜、LCD绝缘器薄膜等。
近年来,随着集成半导体设备的线路问隔变得更窄,形成的涂层厚度不可避免地增加,导致碎裂。有人设想碎裂的产生是由下列因素引起的:1)当内羟基或硅烷醇端基相互缩合时产生的热固化收缩应力;2)取决于固化膜、铝线和硅晶片的热膨胀系数的差异的热应力差异。本发明中,因为内羟基存在的比例由于有缺陷结构而较低,小于或等于5%,通过在硅烷醇端基引入甲硅烷基化或双键可防止在末端发生的反应,通过引起其它有机聚合物特别是聚酰亚胺、聚酰胺、PMMA、聚丙烯酸、聚碳酸酯、聚苯乙烯或聚氨酯,可获得有机-无机杂化物材料新的功能。
另外,本发明制备的聚有机硅倍半氧烷能溶解在各种溶剂中,容易形成薄膜,并具有4-8H的高硬度。另外,由于这种聚有机硅倍半氧烷能形成高度透明的薄膜,可以和光学功能的有机聚合物一起工业化,从而提高光纤的长期可靠性。另外,由于本发明制备的聚有机硅倍半氧烷还可用作在电阻器表面形成涂层的材料,可应用于电器/电子材料。
另外,本发明制备的聚有机硅倍半氧烷可用作在成形塑料如氨基甲酸反应注模(RIM)或在制造玻璃中的金属脱模剂。而且,RTV与本发明制备的聚有机硅倍半氧烷的混合物可用作砖瓦粘合剂或空间飞船的外表面涂层、光纤粘合剂等,由于其耐热性和耐腐蚀性,可用于热敏涂层材料。
随着所述技术的发展,本发明最终产品的应用可以无限扩大,不限于上述领域。
实施本发明的最佳模式
为更好理解本发明,将结合附图,通过较好实施方案详细描述本发明。但是,本发明可以不同形式实施,不受上述实施方案的限制。提供的实施方案使这些说明完整全面,并将本发明的范围告之本领域的技术人员。
实施例1:制备式1所示的化合物(1,1-二氯甲基-3,3-二乙氧基苯基硅氧烷)(R1=甲基,R2=苯基)
在500毫升的三口圆底烧瓶上配备回流冷凝器和100毫升滴液漏斗,该烧瓶在氮气氛下用火焰干燥。将19.8毫升三甲氧基苯基硅烷和1.6毫升CCl3COOH溶解在丙酮中搅拌4小时。之后,通过滴液漏斗缓慢滴加15毫升三氯甲基硅烷,于室温下反应72小时。然后,在该反应系统设置真空蒸馏装置,真空除去未反应的三甲氧基硅烷、三氯硅烷和CCl3COOH,从而获得白色清澈溶液(产率:86%)。
1H NMR(500MHz/CDCl3):δ0.2(s,Si-Me),3.5(s,Si-OMe),7.2-7.8(d,Si-Ph)ppm
29Si NMR(99.3MHz/CDCl3):δ-7.5(s,Si-OCH3),-24.8(s,Si-Cl)ppm
GC/质谱:Mn=296
实施例2:水解式2所示的化合物:(1,1-二氯甲基-3,3-二乙氧基苯基硅烷)
在500毫升的三口圆底烧瓶上配备回流冷凝器和100毫升滴液漏斗,该烧瓶在氮气氛下用火焰干燥。将30毫升实施例1中制得的(1,1-二氯甲基-3,3-二乙氧基苯基硅氧烷)溶解在70毫升甲苯中,然后转移到滴液漏斗。将350毫升三次蒸馏水和HCl放入500毫升圆底烧瓶,使溶液pH为2.5,然后,通过滴液漏斗缓慢滴加1,1-二氯-3,3-二乙氧基苯基硅氧烷,于3℃进行水解。水解后,使用分液漏斗分离出有机层和含水层,含水层于3℃重结晶,获得白色透明粉末的水解产物Ph(OH)2SiOSiMe(OH)2(产率:88%)。
白色粉末于3℃低温干燥,用作分析样品。
1H NMR(500MHz/CDCl3):δ0.8(s,Si-Me),2.7-3.25(s,Si-OH),7.3-7.78(d,Si-Ph)ppm;Si-Me/Si-OH/Si-Ph=25.77/23.18/16.36=3/4/5
LC/质谱:Mn=295.9
实施例3水解产物[Ph(OH)2SiOSiMe(OH)2]的缩聚
在50毫升的圆底烧瓶中放置一Dean Stark管,在氮气氛下用火焰干燥。将10克实施例2获得的水解产物[Ph(OH)2SiOSiMe(OH)2]和0.1克KOH投入该烧瓶,在其中加入38毫升甲苯,溶解该水解产物[Ph(OH)2SiOSiMe(OH)2]。随后,该产物在甲苯的回流温度下反应18小时。反应之后,将反应物滴加到过量甲醇中,搅拌30分钟,过滤沉淀物,从而获得白色粉末的目标产物(产率:98%)。该产物真空下于50℃干燥10小时,可用作分析样品。
1H NMR(500MHz/CDCl3):δ-0.5至0.8(s,Si-Me),7.11-7.8(d,Si-Ph)ppm;3089-2940(CH),1435(Si-Ph),1050(O-Si-Ph),1150(O-Si),750,700(Ph)cm-1
29Si NMR(99.3MHz/CDCl3):δ-67.7(Me-T3),-83.7(Ph-T3)ppm
GPC(PST):Mn=35,244
Td=480℃
DC(交联度)(%):T3/T总×100=98%
低k=2.72
上面已结合较好实施方案描述了本发明,这些实施方案仅用于说明,不构成对本发明在权利要求书中要求的范围的限制。
Claims (11)
1.一种式1所示的化合物,其中R1和R2各自独立地是氢原子、有1-30个碳原子的未取代或取代的脂族烃基、有1-30个碳原子的未取代或取代的芳族烃基、有1-30个碳原子的未取代或取代的脂环烃基、有1-30个碳原子的未取代或取代的甲硅烷基、有1-30个碳原子的未取代或取代的烯丙基、有1-30个碳原子的未取代或取代的酰基、乙烯基、胺基、乙酸基或碱金属,n是2-300,000的整数。
2.如权利要求1所述的化合物,其特征在于R1和R2各自独立地是氢原子、甲基、乙烯基或三甲基甲硅烷基,n是1,000-100,000的整数。
3.一种式2所示的化合物;其中R1和R2各自独立地是氢原子、有1-30个碳原子的未取代或取代的脂族烃基、有1-30个碳原子的未取代或取代的芳族烃基、有1-30个碳原子的未取代或取代的脂环烃基、有1-30个碳原子的未取代或取代的甲硅烷基、有1-30个碳原子的未取代或取代的烯丙基、有1-30个碳原子的未取代或取代的酰基、乙烯基、胺基、乙酸基或碱金属,R3是氢原子、低级烷基、乙酸基、钠或钾,X代表氢原子、卤原子、羟基、胺基或羧基。
4.如权利要求1所述的化合物,其中R1和R2各自独立地是氢原子、甲基、苯基或三甲基甲硅烷基,R3是氢原子、甲基、乙酸基、钠或钾,X代表氢原子、氯、羟基、胺基或羧基。
6.如权利要求5所述的方法,其特征在于所述缩聚反应选自加热缩聚反应、光辐照缩聚反应、微波辐照缩聚反应和电子束辐照缩聚反应。
7.如权利要求5所述的方法,其特征在于以100重量份有机溶剂为基准,所述式2所示的化合物量为5-300重量份。
8.如权利要求5所述的方法,其特征在于所述方法在缩聚催化剂存在下进行。
9.如权利要求8所述的方法,其特征在于所述缩聚催化剂选自氢氧化钠、氢氧化钾、氢氧化铯、三乙胺、二亚乙基三胺、甲-丁基胺、对二甲胺乙醇、三乙醇胺或季铵盐和氟化物。
10.如权利要求8所述的方法,其特征在于以100重量份式4所示的化合物为基准,用于缩聚的催化剂在0.001-5重量份范围内。
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
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Families Citing this family (57)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20000063142A (ko) * | 2000-02-17 | 2000-11-06 | 이응찬 | 폴리오르가노실세스키옥산 제조용 출발물질,폴리오르가노실세스키옥산 및 폴리오르가노실세스키옥산제조방법 |
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US20050069718A1 (en) * | 2003-09-30 | 2005-03-31 | Voss-Kehl Jessica L. | Printable insulating compositions and printable articles |
US7402648B2 (en) * | 2004-11-05 | 2008-07-22 | Toagosei Co., Ltd. | Method for producing cyclic organic silicon compound and organic silicon resin having alcoholic hydroxyl group |
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RU2415881C2 (ru) | 2005-03-24 | 2011-04-10 | Бриджстоун Корпорейшн | Составление резиновой смеси, армированной диоксидом кремния, с низким уровнем выделения летучих органических соединений (лос) |
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US7470466B2 (en) | 2005-12-23 | 2008-12-30 | Boston Scientific Scimed, Inc. | Nanoparticle structures and composite materials comprising a silicon-containing compound having a chemical linker that forms a non-covalent bond with a polymer |
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KR100853518B1 (ko) | 2007-01-09 | 2008-08-21 | 주식회사 옵틱스 | 다기능성 광학 필름, 이를 채용한 면광원장치와액정표시소자 |
US8026035B2 (en) * | 2007-03-30 | 2011-09-27 | Cheil Industries, Inc. | Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same |
CN101117441B (zh) * | 2007-04-20 | 2010-06-02 | 北京化工大学 | 一种含乙烯基笼型倍半硅氧烷的聚乙烯基硅树脂及其制备方法 |
US7915368B2 (en) * | 2007-05-23 | 2011-03-29 | Bridgestone Corporation | Method for making alkoxy-modified silsesquioxanes |
US8501895B2 (en) * | 2007-05-23 | 2013-08-06 | Bridgestone Corporation | Method for making alkoxy-modified silsesquioxanes and amino alkoxy-modified silsesquioxanes |
US8962746B2 (en) * | 2007-12-27 | 2015-02-24 | Bridgestone Corporation | Methods of making blocked-mercapto alkoxy-modified silsesquioxane compounds |
US8794282B2 (en) * | 2007-12-31 | 2014-08-05 | Bridgestone Corporation | Amino alkoxy-modified silsesquioxane adhesives for improved metal adhesion and metal adhesion retention to cured rubber |
US8097674B2 (en) | 2007-12-31 | 2012-01-17 | Bridgestone Corporation | Amino alkoxy-modified silsesquioxanes in silica-filled rubber with low volatile organic chemical evolution |
KR20090107882A (ko) * | 2008-04-10 | 2009-10-14 | 삼성전자주식회사 | 고정층을 포함하는 경사 조성 봉지 박막 및 그의 제조방법 |
US8063113B2 (en) * | 2008-04-23 | 2011-11-22 | Momentive Performance Materials Inc. | Polyurethane foam-forming compositions containing polysilsesquioxane cell opening agents |
US8053514B2 (en) * | 2008-10-30 | 2011-11-08 | The Regents Of The University Of Michigan | Properties tailoring in silsesquioxanes |
US20120270071A1 (en) | 2009-07-21 | 2012-10-25 | Toshiaki Takahashi | Chromene compound |
US8308996B2 (en) | 2009-08-04 | 2012-11-13 | Tokuyama Corporation | Chromene compound |
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KR101249798B1 (ko) * | 2010-08-18 | 2013-04-03 | 한국과학기술연구원 | 선택적으로 구조가 제어된 폴리실세스퀴옥산의 제조방법 및 이로부터 제조된 폴리실세스퀴옥산 |
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US8865926B2 (en) | 2011-09-26 | 2014-10-21 | Sivance, Llc | Process for the production of cyclosiloxanes |
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EP4108735A4 (en) | 2020-02-18 | 2024-03-27 | Tokuyama Corporation | PHOTOCHROMIC CYCLIC COMPOUND AND CURABLE COMPOSITION CONTAINING SAID PHOTOCHROMIC CYCLIC COMPOUND |
KR102394522B1 (ko) * | 2020-06-23 | 2022-05-06 | 엔씨케이 주식회사 | 박막 봉지용 조성물 |
CN111847464B (zh) * | 2020-07-27 | 2023-07-21 | 湖北科技学院 | 一种纳米二氧化硅的辐射制备方法 |
Family Cites Families (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3504006A (en) * | 1964-07-29 | 1970-03-31 | Gen Electric | Process for preparing 1,3,5,7-tetramethyl-1,3,5,7-tetrahydrocyclotetrasiloxane |
JPS5472300A (en) | 1977-11-21 | 1979-06-09 | Shin Etsu Chem Co Ltd | Preparation of polymethylsilsesquioxane |
JPS5760330A (en) * | 1980-09-27 | 1982-04-12 | Fujitsu Ltd | Resin composition |
JPS6013813A (ja) | 1983-07-05 | 1985-01-24 | Toshiba Silicone Co Ltd | ポリメチルシルセスキオキサンの製造方法 |
JPS60254036A (ja) * | 1984-05-30 | 1985-12-14 | Fujitsu Ltd | パタ−ン形成方法 |
CA1261196A (en) * | 1984-10-30 | 1989-09-26 | Alan D. Stall | Cellulosic food casings |
JPS61108628A (ja) | 1984-11-01 | 1986-05-27 | Fujitsu Ltd | 低級アルキルポリシルセスキオキサンの製法 |
US4670299A (en) * | 1984-11-01 | 1987-06-02 | Fujitsu Limited | Preparation of lower alkyl polysilsesquioxane and formation of insulating layer of silylated polymer on electronic circuit board |
JPS61144639A (ja) * | 1984-12-19 | 1986-07-02 | Hitachi Ltd | 放射線感応性組成物及びそれを用いたパタ−ン形成法 |
EP0239108B1 (en) * | 1986-03-28 | 1992-06-24 | Daikin Industries, Limited | Mold release composition |
JPS62249909A (ja) * | 1986-04-21 | 1987-10-30 | Lion Corp | コラ−ゲンの架橋反応抑制剤 |
JPS63146976A (ja) * | 1986-12-11 | 1988-06-18 | Daikin Ind Ltd | 撥水撥油剤組成物 |
US5030699A (en) * | 1988-06-07 | 1991-07-09 | Showa Denko K.K. | Ladder silicone oligomer composition |
JPH02107638A (ja) * | 1988-10-17 | 1990-04-19 | Shin Etsu Chem Co Ltd | ラダー型オルガノポリシロキサンの製造方法 |
US5026813A (en) * | 1989-12-27 | 1991-06-25 | General Electric Company | Polysilsequioxane and polymethyl-N-hexylsilsesquioxane coating compositions |
JP2718231B2 (ja) * | 1990-01-10 | 1998-02-25 | 三菱電機株式会社 | 高純度末端ヒドロキシフェニルラダーシロキサンプレポリマーの製造方法および高純度末端ヒドロキシフェニルラダーポリシロキサンの製造方法 |
JPH0539215A (ja) | 1991-08-02 | 1993-02-19 | Toshiba Silicone Co Ltd | 制汗剤組成物 |
JP2997105B2 (ja) | 1991-08-21 | 2000-01-11 | 昭和電工株式会社 | 半導体用絶縁膜等及びそれらの形成方法 |
JP3272002B2 (ja) * | 1991-09-02 | 2002-04-08 | 昭和電工株式会社 | ポリオルガノシルセスキオキサンの製造方法 |
JP2923408B2 (ja) * | 1992-12-21 | 1999-07-26 | 三菱電機株式会社 | 高純度シリコーンラダーポリマーの製造方法 |
JPH07331050A (ja) | 1994-06-10 | 1995-12-19 | Sekisui Chem Co Ltd | 硬化性樹脂組成物 |
JPH0859331A (ja) | 1994-08-17 | 1996-03-05 | Sekisui Chem Co Ltd | 硬化性無機質組成物 |
JPH0892374A (ja) * | 1994-09-19 | 1996-04-09 | Showa Denko Kk | ポリシルセスキオキサン及びそのビニル重合体 |
JPH08319422A (ja) * | 1995-05-26 | 1996-12-03 | Kanegafuchi Chem Ind Co Ltd | ラダー型ポリシロキサンを主成分とする成形体の作製方法 |
JP3128604B2 (ja) | 1995-09-07 | 2001-01-29 | 中部助川興業株式会社 | 生型造型用離型剤 |
JPH10130393A (ja) | 1996-09-03 | 1998-05-19 | Showa Denko Kk | 全側鎖メルカプト基含有ポリオルガノシルセスキオキサンおよびその製造方法 |
JPH10161315A (ja) | 1996-12-05 | 1998-06-19 | Nippon Steel Chem Co Ltd | アルカリ可溶性感光性樹脂組成物 |
JPH1160733A (ja) * | 1997-08-14 | 1999-03-05 | Showa Denko Kk | 重合体、レジスト樹脂組成物、及びそれらを用いたパターン形成方法 |
US5962067A (en) * | 1997-09-09 | 1999-10-05 | Lucent Technologies Inc. | Method for coating an article with a ladder siloxane polymer and coated article |
JP3533978B2 (ja) * | 1999-03-02 | 2004-06-07 | 信越化学工業株式会社 | ポリ(フェニルシルセスキオキサン)の製造方法 |
JP3543669B2 (ja) * | 1999-03-31 | 2004-07-14 | 信越化学工業株式会社 | 絶縁膜形成用塗布液及び絶縁膜の形成方法 |
KR100371070B1 (ko) * | 1999-12-02 | 2003-02-05 | 한국과학기술연구원 | 폴리지방족방향족실세스퀴옥산 및 그의 제조 방법 |
KR20010060881A (ko) * | 1999-12-28 | 2001-07-07 | 윤종용 | 파인 피치 볼 그리드 어레이(fbga) 패키지용 성형 금형 |
KR20010060880A (ko) * | 1999-12-28 | 2001-07-07 | 윤종용 | 리드 프레임을 이용한 적층 칩 패키지 |
KR20000063142A (ko) * | 2000-02-17 | 2000-11-06 | 이응찬 | 폴리오르가노실세스키옥산 제조용 출발물질,폴리오르가노실세스키옥산 및 폴리오르가노실세스키옥산제조방법 |
US6599995B2 (en) * | 2001-05-01 | 2003-07-29 | Korea Institute Of Science And Technology | Polyalkylaromaticsilsesquioxane and preparation method thereof |
-
2000
- 2000-02-17 KR KR1020000007549A patent/KR20000063142A/ko active Search and Examination
-
2001
- 2001-02-17 EP EP01908405A patent/EP1268612A4/en not_active Withdrawn
- 2001-02-17 US US10/204,225 patent/US6774202B2/en not_active Expired - Fee Related
- 2001-02-17 JP JP2001560261A patent/JP2003523423A/ja active Pending
- 2001-02-17 AU AU2001236148A patent/AU2001236148A1/en not_active Abandoned
- 2001-02-17 WO PCT/KR2001/000238 patent/WO2001060881A2/en not_active Application Discontinuation
- 2001-02-17 CN CNB018052495A patent/CN1162461C/zh not_active Expired - Fee Related
- 2001-02-17 AU AU36149/01A patent/AU3614901A/en not_active Abandoned
- 2001-02-17 EP EP01908406A patent/EP1268613A4/en not_active Withdrawn
- 2001-02-17 CN CNB018052487A patent/CN1183183C/zh not_active Expired - Fee Related
- 2001-02-17 JP JP2001560260A patent/JP2003523422A/ja active Pending
- 2001-02-17 US US10/204,226 patent/US6787625B2/en not_active Expired - Fee Related
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Cited By (7)
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US7385349B2 (en) | 2004-01-07 | 2008-06-10 | Koito Manufacturing Co., Ltd. | Light emitting module and lighting unit for vehicle |
CN1914251B (zh) * | 2004-02-02 | 2012-03-28 | 陶氏康宁公司 | Mq-t丙基硅氧烷树脂 |
CN101440161B (zh) * | 2007-11-23 | 2011-06-01 | 第一毛织株式会社 | 疏水和耐碱性优异的硅酮粒子、其制备方法和涂料组合物 |
CN101676023B (zh) * | 2008-09-17 | 2011-10-05 | 中国科学院化学研究所 | 一种制备聚有机硅倍半氧烷微球的方法 |
TWI616487B (zh) * | 2012-03-27 | 2018-03-01 | 東進世美肯有限公司 | 含梯狀矽倍半氧烷(silsesquioxane)高分子之光學薄膜用樹脂組成物 |
TWI656028B (zh) * | 2014-02-28 | 2019-04-11 | 南韓商東進世美肯有限公司 | 表面強化透明基板及其製造方法 |
CN105889756A (zh) * | 2016-04-06 | 2016-08-24 | 中国石油大学(华东) | 一种含蜡原油降凝降粘复合剂 |
Also Published As
Publication number | Publication date |
---|---|
WO2001060880A3 (en) | 2001-12-27 |
WO2001060881A3 (en) | 2002-01-17 |
EP1268613A4 (en) | 2004-12-15 |
WO2001060881A2 (en) | 2001-08-23 |
CN1183183C (zh) | 2005-01-05 |
CN1162461C (zh) | 2004-08-18 |
EP1268612A4 (en) | 2004-12-15 |
EP1268612A2 (en) | 2003-01-02 |
US6787625B2 (en) | 2004-09-07 |
EP1268613A2 (en) | 2003-01-02 |
US20030065121A1 (en) | 2003-04-03 |
AU3614901A (en) | 2001-08-27 |
US6774202B2 (en) | 2004-08-10 |
CN1418235A (zh) | 2003-05-14 |
JP2003523422A (ja) | 2003-08-05 |
JP2003523423A (ja) | 2003-08-05 |
WO2001060880A2 (en) | 2001-08-23 |
KR20000063142A (ko) | 2000-11-06 |
US20030055195A1 (en) | 2003-03-20 |
AU2001236148A1 (en) | 2001-08-27 |
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