CN1263899C - 制造电解铜箔的电解质溶液和使用该电解质溶液的电解铜箔制造方法 - Google Patents
制造电解铜箔的电解质溶液和使用该电解质溶液的电解铜箔制造方法 Download PDFInfo
- Publication number
- CN1263899C CN1263899C CNB031565093A CN03156509A CN1263899C CN 1263899 C CN1263899 C CN 1263899C CN B031565093 A CNB031565093 A CN B031565093A CN 03156509 A CN03156509 A CN 03156509A CN 1263899 C CN1263899 C CN 1263899C
- Authority
- CN
- China
- Prior art keywords
- copper foil
- electrolyte solution
- electrolytic copper
- sulfopropyl
- sulfo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
- C25D7/0635—In radial cells
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/04—Wires; Strips; Foils
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cell Electrode Carriers And Collectors (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electrolytic Production Of Metals (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020020070802 | 2002-11-14 | ||
KR20020070802 | 2002-11-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1500915A CN1500915A (zh) | 2004-06-02 |
CN1263899C true CN1263899C (zh) | 2006-07-12 |
Family
ID=29578347
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB031565093A Expired - Fee Related CN1263899C (zh) | 2002-11-14 | 2003-09-03 | 制造电解铜箔的电解质溶液和使用该电解质溶液的电解铜箔制造方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20040104117A1 (ko) |
JP (1) | JP2004162172A (ko) |
KR (1) | KR100389061B1 (ko) |
CN (1) | CN1263899C (ko) |
CA (1) | CA2448892A1 (ko) |
TW (1) | TWI245082B (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103348041A (zh) * | 2011-07-29 | 2013-10-09 | 古河电气工业株式会社 | 电解铜合金箔、其制备方法、制备中所用的电解液、使用该电解铜合金箔的二次电池用负极集电体、二次电池及其电极 |
CN112030199A (zh) * | 2020-08-27 | 2020-12-04 | 江苏艾森半导体材料股份有限公司 | 一种用于先进封装的高速电镀铜添加剂及电镀液 |
Families Citing this family (38)
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KR100553840B1 (ko) * | 2003-05-29 | 2006-02-24 | 일진소재산업주식회사 | 인쇄회로기판용 동박의 제조 방법 |
CN1806067B (zh) * | 2003-07-29 | 2010-06-16 | 日矿金属株式会社 | 含有具有特定骨架的含二烷基氨基的聚合物和有机硫化合物作为添加剂的铜电解液以及由该电解液制造的电解铜箔 |
JP4583149B2 (ja) * | 2004-12-01 | 2010-11-17 | 三井金属鉱業株式会社 | 電解銅箔及びその製造方法 |
KR100704685B1 (ko) * | 2005-03-26 | 2007-04-06 | 한국기계연구원 | 메쉬형 회전 음극드럼 도금법에 의한 연속 금속메쉬 제조장치 |
TWI285686B (en) * | 2005-03-31 | 2007-08-21 | Mitsui Mining & Smelting Co | Electrolytic copper foil and process for producing electrolytic copper foil, surface treated electrolytic copper foil using said electrolytic copper foil, and copper-clad laminate plate and printed wiring board using said surface treated electrolytic |
TW200718347A (en) * | 2005-07-14 | 2007-05-01 | Mitsui Mining & Smelting Co | Blackening surface treated copper foil and electromagnetic wave shielding conductive mesh for front panel of plasma display using the blackening surface treated copper foil |
US7575666B2 (en) * | 2006-04-05 | 2009-08-18 | James Watkowski | Process for electrolytically plating copper |
CN101517131B (zh) * | 2006-10-03 | 2011-02-16 | 三井金属矿业株式会社 | 硫酸酸性铜电解液制备方法及使用该制备方法制备的硫酸酸性铜电解液及电析铜薄膜 |
JP4954686B2 (ja) * | 2006-11-29 | 2012-06-20 | 福田金属箔粉工業株式会社 | 電解銅箔とその製造方法 |
US20080142249A1 (en) * | 2006-12-13 | 2008-06-19 | International Business Machines Corporation | Selective surface roughness for high speed signaling |
KR101135332B1 (ko) * | 2007-03-15 | 2012-04-17 | 닛코킨조쿠 가부시키가이샤 | 구리전해액 및 그것을 이용하여 얻어진 2층 플렉시블 기판 |
JP5752301B2 (ja) * | 2007-10-31 | 2015-07-22 | 三井金属鉱業株式会社 | 電解銅箔及びその電解銅箔の製造方法 |
TWI410529B (zh) * | 2008-12-16 | 2013-10-01 | Ind Tech Res Inst | 電解液及利用此電解液製造銅箔之方法 |
KR101298999B1 (ko) * | 2009-09-01 | 2013-08-23 | 일진머티리얼즈 주식회사 | 미세회로 형성을 위한 임베디드용 동박 |
KR101386093B1 (ko) * | 2010-04-14 | 2014-04-24 | 일진머티리얼즈 주식회사 | 전해동박 제조용 구리전해액, 전해동박의 제조방법 및 전해동박 |
JP5352542B2 (ja) | 2010-07-15 | 2013-11-27 | エル エス エムトロン リミテッド | リチウム二次電池の集電体用銅箔 |
JP5771392B2 (ja) * | 2010-12-28 | 2015-08-26 | 日本電解株式会社 | 電解銅箔およびその製造方法 |
KR20140041804A (ko) * | 2011-06-30 | 2014-04-04 | 후루카와 덴키 고교 가부시키가이샤 | 전해 동박, 상기 전해 동박의 제조 방법 및 상기 전해 동박을 집전체로 하는 리튬 이온 이차 전지 |
EP2568063A1 (en) * | 2011-09-09 | 2013-03-13 | Rohm and Haas Electronic Materials LLC | Low internal stress copper electroplating method |
CN104812943B (zh) * | 2013-01-29 | 2016-11-16 | 古河电气工业株式会社 | 电解铜箔、使用该电解铜箔的锂离子二次电池用电极及使用该电极的锂离子二次电池 |
CN103074657B (zh) * | 2013-02-26 | 2015-07-29 | 灵宝华鑫铜箔有限责任公司 | 一种电解铜箔用添加剂及7μm双光锂离子电池用电解铜箔生产工艺 |
CN104805478A (zh) * | 2014-01-29 | 2015-07-29 | 金居开发铜箔股份有限公司 | 负极集电体用电解铜箔及其制造方法 |
KR101897474B1 (ko) * | 2015-06-26 | 2018-09-12 | 케이씨에프테크놀로지스 주식회사 | 리튬 이차전지용 전해동박 및 이를 포함하는 리튬 이차전지 |
JP6346244B2 (ja) * | 2015-11-10 | 2018-06-20 | Jx金属株式会社 | 電解銅箔、電解銅箔の製造方法、銅張積層板、プリント配線板、プリント配線板の製造方法及び電子機器の製造方法 |
CN105543907A (zh) * | 2015-12-09 | 2016-05-04 | 深圳市正天伟科技有限公司 | 一种耐高电流密度电镀铜添加剂及其制备方法 |
CN105887144B (zh) * | 2016-06-21 | 2018-09-21 | 广东光华科技股份有限公司 | 电镀铜镀液及其电镀铜工艺 |
KR102669501B1 (ko) | 2016-08-23 | 2024-05-24 | 에스케이넥실리스 주식회사 | 전해동박, 그것을 포함하는 전극, 그것을 포함하는 이차전지, 및 그것의 제조방법 |
CN106350836B (zh) * | 2016-08-29 | 2019-02-26 | 灵宝华鑫铜箔有限责任公司 | 一种电解铜箔用添加剂及制备双光电池用电解铜箔的生产工艺 |
KR20180040754A (ko) * | 2016-10-12 | 2018-04-23 | 케이씨에프테크놀로지스 주식회사 | 핸들링이 용이한 전해동박, 그것을 포함하는 전극, 그것을 포함하는 이차전지, 및 그것의 제조방법 |
CN106521564A (zh) * | 2016-10-27 | 2017-03-22 | 建滔(连州)铜箔有限公司 | 一种用于生产低轮廓电解铜箔的复合添加剂及其沉积工艺 |
KR101733410B1 (ko) * | 2016-11-11 | 2017-05-10 | 일진머티리얼즈 주식회사 | 저온 물성이 우수한 이차전지용 전해동박 및 그의 제조방법 |
KR20180083515A (ko) * | 2017-01-13 | 2018-07-23 | 케이씨에프테크놀로지스 주식회사 | 울음 불량이 실질적으로 없는 전해동박, 그것을 포함하는 전극, 그것을 포함하는 이차전지, 및 그것의 제조방법 |
WO2018207788A1 (ja) | 2017-05-09 | 2018-11-15 | Jx金属株式会社 | 電解銅箔及びその製造方法、銅張積層板、プリント配線板及びその製造方法、並びに電子機器及びその製造方法 |
CN111910223B (zh) * | 2020-08-24 | 2022-04-22 | 九江德福科技股份有限公司 | 适用于hdi板的电解铜箔用添加剂及电解铜箔生产工艺 |
CN112111761B (zh) * | 2020-09-07 | 2021-09-21 | 浙江大学 | 一种高延伸率电解铜箔的电解液及其应用 |
CN112839436B (zh) * | 2020-12-30 | 2022-08-05 | 广东嘉元科技股份有限公司 | 一种高频高速印制电路板用电解铜箔及其制备方法 |
CN112779569B (zh) * | 2020-12-30 | 2022-01-18 | 铜陵市华创新材料有限公司 | 一种改善锂离子电池用电解铜箔激光模切熔珠的方法 |
KR102405236B1 (ko) | 2022-05-11 | 2022-06-07 | 고려아연 주식회사 | 전해 동박의 제조방법 |
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JPS50104143A (ko) * | 1974-01-23 | 1975-08-16 | ||
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US4551212A (en) * | 1985-03-11 | 1985-11-05 | Rca Corporation | Bath and process for the electrodeposition of micromachinable copper and additive for said bath |
US5051154A (en) * | 1988-08-23 | 1991-09-24 | Shipley Company Inc. | Additive for acid-copper electroplating baths to increase throwing power |
DE3836521C2 (de) * | 1988-10-24 | 1995-04-13 | Atotech Deutschland Gmbh | Wäßriges saures Bad zur galvanischen Abscheidung von glänzenden und rißfreien Kupferüberzügen und Verwendung des Bades |
ATE151474T1 (de) * | 1990-05-30 | 1997-04-15 | Gould Electronics Inc | Elektroplattierte kupferfolie und deren herstellung unter verwendung elektrolytischer lösungen mit niedrigen konzentrationen von chlor ionen |
US5431803A (en) * | 1990-05-30 | 1995-07-11 | Gould Electronics Inc. | Electrodeposited copper foil and process for making same |
JPH07316876A (ja) * | 1994-05-23 | 1995-12-05 | C Uyemura & Co Ltd | 電気銅めっき用添加剤及び電気銅めっき浴 |
US6132887A (en) * | 1995-06-16 | 2000-10-17 | Gould Electronics Inc. | High fatigue ductility electrodeposited copper foil |
JP3313277B2 (ja) * | 1995-09-22 | 2002-08-12 | 古河サーキットフォイル株式会社 | ファインパターン用電解銅箔とその製造方法 |
DE19545231A1 (de) * | 1995-11-21 | 1997-05-22 | Atotech Deutschland Gmbh | Verfahren zur elektrolytischen Abscheidung von Metallschichten |
JPH1036992A (ja) * | 1996-07-19 | 1998-02-10 | Japan Energy Corp | 電解銅箔及びその製造方法 |
US5863410A (en) * | 1997-06-23 | 1999-01-26 | Circuit Foil Usa, Inc. | Process for the manufacture of high quality very low profile copper foil and copper foil produced thereby |
US6773573B2 (en) * | 2001-10-02 | 2004-08-10 | Shipley Company, L.L.C. | Plating bath and method for depositing a metal layer on a substrate |
JP3789107B2 (ja) * | 2002-07-23 | 2006-06-21 | 株式会社日鉱マテリアルズ | 特定骨格を有するアミン化合物及び有機硫黄化合物を添加剤として含む銅電解液並びにそれにより製造される電解銅箔 |
JP4115240B2 (ja) * | 2002-10-21 | 2008-07-09 | 日鉱金属株式会社 | 特定骨格を有する四級アミン化合物及び有機硫黄化合物を添加剤として含む銅電解液並びにそれにより製造される電解銅箔 |
JP4083171B2 (ja) * | 2002-12-25 | 2008-04-30 | 日鉱金属株式会社 | 特定骨格を有する四級アミン化合物重合体及び有機硫黄化合物を添加剤として含む銅電解液並びにそれにより製造される電解銅箔 |
-
2003
- 2003-03-31 KR KR10-2003-0020166A patent/KR100389061B1/ko not_active IP Right Cessation
- 2003-07-29 TW TW092120619A patent/TWI245082B/zh not_active IP Right Cessation
- 2003-08-08 JP JP2003206688A patent/JP2004162172A/ja active Pending
- 2003-09-03 CN CNB031565093A patent/CN1263899C/zh not_active Expired - Fee Related
- 2003-11-12 CA CA002448892A patent/CA2448892A1/en not_active Abandoned
- 2003-11-13 US US10/713,795 patent/US20040104117A1/en not_active Abandoned
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103348041A (zh) * | 2011-07-29 | 2013-10-09 | 古河电气工业株式会社 | 电解铜合金箔、其制备方法、制备中所用的电解液、使用该电解铜合金箔的二次电池用负极集电体、二次电池及其电极 |
CN112030199A (zh) * | 2020-08-27 | 2020-12-04 | 江苏艾森半导体材料股份有限公司 | 一种用于先进封装的高速电镀铜添加剂及电镀液 |
Also Published As
Publication number | Publication date |
---|---|
CN1500915A (zh) | 2004-06-02 |
CA2448892A1 (en) | 2004-05-14 |
KR20030036415A (ko) | 2003-05-09 |
JP2004162172A (ja) | 2004-06-10 |
US20040104117A1 (en) | 2004-06-03 |
TW200407465A (en) | 2004-05-16 |
TWI245082B (en) | 2005-12-11 |
KR100389061B1 (ko) | 2003-06-25 |
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Granted publication date: 20060712 |