CN1263899C - 制造电解铜箔的电解质溶液和使用该电解质溶液的电解铜箔制造方法 - Google Patents

制造电解铜箔的电解质溶液和使用该电解质溶液的电解铜箔制造方法 Download PDF

Info

Publication number
CN1263899C
CN1263899C CNB031565093A CN03156509A CN1263899C CN 1263899 C CN1263899 C CN 1263899C CN B031565093 A CNB031565093 A CN B031565093A CN 03156509 A CN03156509 A CN 03156509A CN 1263899 C CN1263899 C CN 1263899C
Authority
CN
China
Prior art keywords
copper foil
electrolyte solution
electrolytic copper
sulfopropyl
sulfo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB031565093A
Other languages
English (en)
Chinese (zh)
Other versions
CN1500915A (zh
Inventor
梁点植
林承麟
金相范
金起中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Day To Day Material Industry (strain)
Original Assignee
Day To Day Material Industry (strain)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Day To Day Material Industry (strain) filed Critical Day To Day Material Industry (strain)
Publication of CN1500915A publication Critical patent/CN1500915A/zh
Application granted granted Critical
Publication of CN1263899C publication Critical patent/CN1263899C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0635In radial cells
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00Electroforming
    • C25D1/04Wires; Strips; Foils
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cell Electrode Carriers And Collectors (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Metals (AREA)
CNB031565093A 2002-11-14 2003-09-03 制造电解铜箔的电解质溶液和使用该电解质溶液的电解铜箔制造方法 Expired - Fee Related CN1263899C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020020070802 2002-11-14
KR20020070802 2002-11-14

Publications (2)

Publication Number Publication Date
CN1500915A CN1500915A (zh) 2004-06-02
CN1263899C true CN1263899C (zh) 2006-07-12

Family

ID=29578347

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB031565093A Expired - Fee Related CN1263899C (zh) 2002-11-14 2003-09-03 制造电解铜箔的电解质溶液和使用该电解质溶液的电解铜箔制造方法

Country Status (6)

Country Link
US (1) US20040104117A1 (ko)
JP (1) JP2004162172A (ko)
KR (1) KR100389061B1 (ko)
CN (1) CN1263899C (ko)
CA (1) CA2448892A1 (ko)
TW (1) TWI245082B (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103348041A (zh) * 2011-07-29 2013-10-09 古河电气工业株式会社 电解铜合金箔、其制备方法、制备中所用的电解液、使用该电解铜合金箔的二次电池用负极集电体、二次电池及其电极
CN112030199A (zh) * 2020-08-27 2020-12-04 江苏艾森半导体材料股份有限公司 一种用于先进封装的高速电镀铜添加剂及电镀液

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100553840B1 (ko) * 2003-05-29 2006-02-24 일진소재산업주식회사 인쇄회로기판용 동박의 제조 방법
CN1806067B (zh) * 2003-07-29 2010-06-16 日矿金属株式会社 含有具有特定骨架的含二烷基氨基的聚合物和有机硫化合物作为添加剂的铜电解液以及由该电解液制造的电解铜箔
JP4583149B2 (ja) * 2004-12-01 2010-11-17 三井金属鉱業株式会社 電解銅箔及びその製造方法
KR100704685B1 (ko) * 2005-03-26 2007-04-06 한국기계연구원 메쉬형 회전 음극드럼 도금법에 의한 연속 금속메쉬 제조장치
TWI285686B (en) * 2005-03-31 2007-08-21 Mitsui Mining & Smelting Co Electrolytic copper foil and process for producing electrolytic copper foil, surface treated electrolytic copper foil using said electrolytic copper foil, and copper-clad laminate plate and printed wiring board using said surface treated electrolytic
TW200718347A (en) * 2005-07-14 2007-05-01 Mitsui Mining & Smelting Co Blackening surface treated copper foil and electromagnetic wave shielding conductive mesh for front panel of plasma display using the blackening surface treated copper foil
US7575666B2 (en) * 2006-04-05 2009-08-18 James Watkowski Process for electrolytically plating copper
CN101517131B (zh) * 2006-10-03 2011-02-16 三井金属矿业株式会社 硫酸酸性铜电解液制备方法及使用该制备方法制备的硫酸酸性铜电解液及电析铜薄膜
JP4954686B2 (ja) * 2006-11-29 2012-06-20 福田金属箔粉工業株式会社 電解銅箔とその製造方法
US20080142249A1 (en) * 2006-12-13 2008-06-19 International Business Machines Corporation Selective surface roughness for high speed signaling
KR101135332B1 (ko) * 2007-03-15 2012-04-17 닛코킨조쿠 가부시키가이샤 구리전해액 및 그것을 이용하여 얻어진 2층 플렉시블 기판
JP5752301B2 (ja) * 2007-10-31 2015-07-22 三井金属鉱業株式会社 電解銅箔及びその電解銅箔の製造方法
TWI410529B (zh) * 2008-12-16 2013-10-01 Ind Tech Res Inst 電解液及利用此電解液製造銅箔之方法
KR101298999B1 (ko) * 2009-09-01 2013-08-23 일진머티리얼즈 주식회사 미세회로 형성을 위한 임베디드용 동박
KR101386093B1 (ko) * 2010-04-14 2014-04-24 일진머티리얼즈 주식회사 전해동박 제조용 구리전해액, 전해동박의 제조방법 및 전해동박
JP5352542B2 (ja) 2010-07-15 2013-11-27 エル エス エムトロン リミテッド リチウム二次電池の集電体用銅箔
JP5771392B2 (ja) * 2010-12-28 2015-08-26 日本電解株式会社 電解銅箔およびその製造方法
KR20140041804A (ko) * 2011-06-30 2014-04-04 후루카와 덴키 고교 가부시키가이샤 전해 동박, 상기 전해 동박의 제조 방법 및 상기 전해 동박을 집전체로 하는 리튬 이온 이차 전지
EP2568063A1 (en) * 2011-09-09 2013-03-13 Rohm and Haas Electronic Materials LLC Low internal stress copper electroplating method
CN104812943B (zh) * 2013-01-29 2016-11-16 古河电气工业株式会社 电解铜箔、使用该电解铜箔的锂离子二次电池用电极及使用该电极的锂离子二次电池
CN103074657B (zh) * 2013-02-26 2015-07-29 灵宝华鑫铜箔有限责任公司 一种电解铜箔用添加剂及7μm双光锂离子电池用电解铜箔生产工艺
CN104805478A (zh) * 2014-01-29 2015-07-29 金居开发铜箔股份有限公司 负极集电体用电解铜箔及其制造方法
KR101897474B1 (ko) * 2015-06-26 2018-09-12 케이씨에프테크놀로지스 주식회사 리튬 이차전지용 전해동박 및 이를 포함하는 리튬 이차전지
JP6346244B2 (ja) * 2015-11-10 2018-06-20 Jx金属株式会社 電解銅箔、電解銅箔の製造方法、銅張積層板、プリント配線板、プリント配線板の製造方法及び電子機器の製造方法
CN105543907A (zh) * 2015-12-09 2016-05-04 深圳市正天伟科技有限公司 一种耐高电流密度电镀铜添加剂及其制备方法
CN105887144B (zh) * 2016-06-21 2018-09-21 广东光华科技股份有限公司 电镀铜镀液及其电镀铜工艺
KR102669501B1 (ko) 2016-08-23 2024-05-24 에스케이넥실리스 주식회사 전해동박, 그것을 포함하는 전극, 그것을 포함하는 이차전지, 및 그것의 제조방법
CN106350836B (zh) * 2016-08-29 2019-02-26 灵宝华鑫铜箔有限责任公司 一种电解铜箔用添加剂及制备双光电池用电解铜箔的生产工艺
KR20180040754A (ko) * 2016-10-12 2018-04-23 케이씨에프테크놀로지스 주식회사 핸들링이 용이한 전해동박, 그것을 포함하는 전극, 그것을 포함하는 이차전지, 및 그것의 제조방법
CN106521564A (zh) * 2016-10-27 2017-03-22 建滔(连州)铜箔有限公司 一种用于生产低轮廓电解铜箔的复合添加剂及其沉积工艺
KR101733410B1 (ko) * 2016-11-11 2017-05-10 일진머티리얼즈 주식회사 저온 물성이 우수한 이차전지용 전해동박 및 그의 제조방법
KR20180083515A (ko) * 2017-01-13 2018-07-23 케이씨에프테크놀로지스 주식회사 울음 불량이 실질적으로 없는 전해동박, 그것을 포함하는 전극, 그것을 포함하는 이차전지, 및 그것의 제조방법
WO2018207788A1 (ja) 2017-05-09 2018-11-15 Jx金属株式会社 電解銅箔及びその製造方法、銅張積層板、プリント配線板及びその製造方法、並びに電子機器及びその製造方法
CN111910223B (zh) * 2020-08-24 2022-04-22 九江德福科技股份有限公司 适用于hdi板的电解铜箔用添加剂及电解铜箔生产工艺
CN112111761B (zh) * 2020-09-07 2021-09-21 浙江大学 一种高延伸率电解铜箔的电解液及其应用
CN112839436B (zh) * 2020-12-30 2022-08-05 广东嘉元科技股份有限公司 一种高频高速印制电路板用电解铜箔及其制备方法
CN112779569B (zh) * 2020-12-30 2022-01-18 铜陵市华创新材料有限公司 一种改善锂离子电池用电解铜箔激光模切熔珠的方法
KR102405236B1 (ko) 2022-05-11 2022-06-07 고려아연 주식회사 전해 동박의 제조방법

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50104143A (ko) * 1974-01-23 1975-08-16
DE2746938C2 (de) * 1977-10-17 1987-04-09 Schering AG, 1000 Berlin und 4709 Bergkamen Wäßriges saures Bad zur galvanischen Abscheidung von glänzenden und rißfreien Kupferüberzügen und Verwendung dieses Bades
US4551212A (en) * 1985-03-11 1985-11-05 Rca Corporation Bath and process for the electrodeposition of micromachinable copper and additive for said bath
US5051154A (en) * 1988-08-23 1991-09-24 Shipley Company Inc. Additive for acid-copper electroplating baths to increase throwing power
DE3836521C2 (de) * 1988-10-24 1995-04-13 Atotech Deutschland Gmbh Wäßriges saures Bad zur galvanischen Abscheidung von glänzenden und rißfreien Kupferüberzügen und Verwendung des Bades
ATE151474T1 (de) * 1990-05-30 1997-04-15 Gould Electronics Inc Elektroplattierte kupferfolie und deren herstellung unter verwendung elektrolytischer lösungen mit niedrigen konzentrationen von chlor ionen
US5431803A (en) * 1990-05-30 1995-07-11 Gould Electronics Inc. Electrodeposited copper foil and process for making same
JPH07316876A (ja) * 1994-05-23 1995-12-05 C Uyemura & Co Ltd 電気銅めっき用添加剤及び電気銅めっき浴
US6132887A (en) * 1995-06-16 2000-10-17 Gould Electronics Inc. High fatigue ductility electrodeposited copper foil
JP3313277B2 (ja) * 1995-09-22 2002-08-12 古河サーキットフォイル株式会社 ファインパターン用電解銅箔とその製造方法
DE19545231A1 (de) * 1995-11-21 1997-05-22 Atotech Deutschland Gmbh Verfahren zur elektrolytischen Abscheidung von Metallschichten
JPH1036992A (ja) * 1996-07-19 1998-02-10 Japan Energy Corp 電解銅箔及びその製造方法
US5863410A (en) * 1997-06-23 1999-01-26 Circuit Foil Usa, Inc. Process for the manufacture of high quality very low profile copper foil and copper foil produced thereby
US6773573B2 (en) * 2001-10-02 2004-08-10 Shipley Company, L.L.C. Plating bath and method for depositing a metal layer on a substrate
JP3789107B2 (ja) * 2002-07-23 2006-06-21 株式会社日鉱マテリアルズ 特定骨格を有するアミン化合物及び有機硫黄化合物を添加剤として含む銅電解液並びにそれにより製造される電解銅箔
JP4115240B2 (ja) * 2002-10-21 2008-07-09 日鉱金属株式会社 特定骨格を有する四級アミン化合物及び有機硫黄化合物を添加剤として含む銅電解液並びにそれにより製造される電解銅箔
JP4083171B2 (ja) * 2002-12-25 2008-04-30 日鉱金属株式会社 特定骨格を有する四級アミン化合物重合体及び有機硫黄化合物を添加剤として含む銅電解液並びにそれにより製造される電解銅箔

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103348041A (zh) * 2011-07-29 2013-10-09 古河电气工业株式会社 电解铜合金箔、其制备方法、制备中所用的电解液、使用该电解铜合金箔的二次电池用负极集电体、二次电池及其电极
CN112030199A (zh) * 2020-08-27 2020-12-04 江苏艾森半导体材料股份有限公司 一种用于先进封装的高速电镀铜添加剂及电镀液

Also Published As

Publication number Publication date
CN1500915A (zh) 2004-06-02
CA2448892A1 (en) 2004-05-14
KR20030036415A (ko) 2003-05-09
JP2004162172A (ja) 2004-06-10
US20040104117A1 (en) 2004-06-03
TW200407465A (en) 2004-05-16
TWI245082B (en) 2005-12-11
KR100389061B1 (ko) 2003-06-25

Similar Documents

Publication Publication Date Title
CN1263899C (zh) 制造电解铜箔的电解质溶液和使用该电解质溶液的电解铜箔制造方法
WO2017219797A1 (zh) 电镀铜镀液及其电镀铜工艺
EP2071057B1 (en) Electroplating copper-tin alloy
CN1263570A (zh) 高质量型面很矮的铜箔制造工艺及由其制成的铜箔
CN1540040A (zh) 反向脉冲电镀组合物和方法
CN1337475A (zh) 电沉积铜箔的制造方法和电沉积铜箔
EP1842939B1 (en) Copper electrolysis solution containing compound having specific skeleton as additive, and electrolytic copper foil produced therefrom
JP2004339558A (ja) 低粗面電解銅箔及びその製造方法
CN1993501A (zh) 复合铜箔及其制造方法
CN1220709A (zh) 作铜添加剂用的烷氧基化二硫醇
CN1715457A (zh) 铜箔的粗面化处理方法以及粗面化处理液
EP1574599B1 (en) Copper electrolytic solution and electrolytic copper foil produced therewith
CN1854347A (zh) 具有高强度的低粗度铜箔及其制造方法
CN101122035B (zh) 铜箔的制造方法
CN113122845A (zh) 一种铝合金金属镀件的制备方法
CN1294642A (zh) 镍-钨合金的延性剂
CN1292432A (zh) 电沉积铜箔及其制造方法
US20040074775A1 (en) Pulse reverse electrolysis of acidic copper electroplating solutions
CN1536948A (zh) 薄膜电阻层形成用电镀浴、电阻层形成法、带电阻层的导电基材及带电阻层的电路基板材料
CN1791945A (zh) 锌镧系磺酸电解质
CN88100717A (zh) 高性能电镀铬层
KR102681509B1 (ko) 이중층 전해동박 및 그 제조방법
KR102336506B1 (ko) 청화동 도금액 및 이를 이용하는 청화동 도금방법
KR101086693B1 (ko) 내굴곡성이 우수한 연성 동박 적층판의 제조 방법
CN1806067A (zh) 含有具有特定骨架的含二烷基氨基的聚合物和有机硫化合物作为添加剂的铜电解液以及由该电解液制造的电解铜箔

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20060712