CN1211287C - 铟锡氧化物的悬浮液和粉末的制备方法及其用途 - Google Patents
铟锡氧化物的悬浮液和粉末的制备方法及其用途 Download PDFInfo
- Publication number
- CN1211287C CN1211287C CNB998100889A CN99810088A CN1211287C CN 1211287 C CN1211287 C CN 1211287C CN B998100889 A CNB998100889 A CN B998100889A CN 99810088 A CN99810088 A CN 99810088A CN 1211287 C CN1211287 C CN 1211287C
- Authority
- CN
- China
- Prior art keywords
- indium
- powder
- indium tin
- carries out
- precipitation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G19/00—Compounds of tin
- C01G19/02—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G19/00—Compounds of tin
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/256—Heavy metal or aluminum or compound thereof
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Catalysts (AREA)
- Non-Insulated Conductors (AREA)
- Surface Treatment Of Glass (AREA)
- Paints Or Removers (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Conductive Materials (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE1998140527 DE19840527B4 (de) | 1998-09-06 | 1998-09-06 | Verfahren zur Herstellung von Suspensionen und Pulvern von Indium-Zinn-Oxid |
| DE19840527.8 | 1998-09-06 | ||
| DE19849048.8 | 1998-10-23 | ||
| DE1998149048 DE19849048A1 (de) | 1998-10-23 | 1998-10-23 | Verfahren zur Herstellung von Suspensionen und Pulvern von Indium-Zinn-Oxid und deren Verwendung |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1314871A CN1314871A (zh) | 2001-09-26 |
| CN1211287C true CN1211287C (zh) | 2005-07-20 |
Family
ID=26048642
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB998100889A Expired - Lifetime CN1211287C (zh) | 1998-09-06 | 1999-09-03 | 铟锡氧化物的悬浮液和粉末的制备方法及其用途 |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US6533966B1 (enExample) |
| EP (1) | EP1113992B1 (enExample) |
| JP (1) | JP4488623B2 (enExample) |
| KR (1) | KR100737657B1 (enExample) |
| CN (1) | CN1211287C (enExample) |
| AT (1) | ATE330908T1 (enExample) |
| DE (1) | DE59913605D1 (enExample) |
| ES (1) | ES2268881T3 (enExample) |
| PT (1) | PT1113992E (enExample) |
| WO (1) | WO2000014017A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103101966A (zh) * | 2011-11-10 | 2013-05-15 | 财团法人工业技术研究院 | 氧化铟锡的回收方法 |
Families Citing this family (70)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6989608B2 (en) * | 2004-04-01 | 2006-01-24 | Atmel Corporation | Method and apparatus to eliminate galvanic corrosion on copper doped aluminum bond pads on integrated circuits |
| DE19960091A1 (de) * | 1999-12-14 | 2001-07-12 | Bosch Gmbh Robert | Keramikhaltiges Dispergat, Verfahren zu dessen Herstellung und Verwendung des Dispergates in Dickschichtpasten |
| DE10022037A1 (de) | 2000-05-05 | 2001-11-08 | Bayer Ag | IR-absorbierende Zusammensetzungen |
| DE10129376A1 (de) * | 2001-06-20 | 2003-01-09 | Degussa | Indium-Zinn-Oxide |
| EP1417263A2 (de) * | 2001-07-05 | 2004-05-12 | Nanogate Advanced Materials GmbH | Optisches bauelement |
| JP3722282B2 (ja) * | 2001-08-21 | 2005-11-30 | Tdk株式会社 | 金属粒子含有組成物、導電ペースト及びその製造方法 |
| GB0126284D0 (en) * | 2001-11-01 | 2002-01-02 | Oxonica Ltd | Water soluble luminescent nanoparticles |
| DE10160356A1 (de) * | 2001-12-08 | 2003-06-26 | Nanogate Technologies Gmbh | IR-Schutz |
| DE10205920A1 (de) * | 2002-02-12 | 2003-08-21 | Itn Nanovation Gmbh | Nanoskaliger Rutil, sowie Verfahren zu dessen Herstellung |
| EP1517967B1 (de) * | 2002-06-24 | 2008-12-17 | Air Products and Chemicals, Inc. | Beschichtungsmaterial |
| JP4170735B2 (ja) * | 2002-11-13 | 2008-10-22 | 信越化学工業株式会社 | ゼオライトゾルとその製造方法、多孔質膜形成用組成物、多孔質膜とその製造方法、層間絶縁膜及び半導体装置 |
| DE10304849A1 (de) * | 2003-02-06 | 2004-08-19 | Institut für Neue Materialien gemeinnützige Gesellschaft mit beschränkter Haftung | Chemomechanische Herstellung von Funktionskolloiden |
| JP4867130B2 (ja) * | 2003-02-17 | 2012-02-01 | 三菱瓦斯化学株式会社 | 絶縁化超微粉末とその製造方法、およびそれを用いた高誘電率樹脂複合材料 |
| DE10316472A1 (de) | 2003-04-09 | 2004-10-28 | Heidelberger Druckmaschinen Ag | Verfahren zum Trocknen einer Druckfarbe auf einem Bedruckstoff in einer Druckmaschine und Druckmaschine |
| DE10329626A1 (de) * | 2003-06-25 | 2005-01-20 | Itn Nanovation Gmbh | Mischmetalloxide und ihre Verwendung in CO2-Sensoren |
| KR100727760B1 (ko) * | 2003-09-18 | 2007-06-13 | 주식회사 엘지화학 | 베타-디케톤을 분산제로 사용한 금속 산화물의 분산액 및이를 이용한 대전 방지용 도전성 코팅막 |
| WO2005049520A2 (en) * | 2003-11-21 | 2005-06-02 | The National University Of Ireland, Galway | Method for solubilizing metal oxides by surface treatment, surface treated metal oxide solutions and method for separating metal oxides |
| US20050153171A1 (en) * | 2004-01-12 | 2005-07-14 | Chris Beatty | Mixed metal oxide layer and method of manufacture |
| GB0407114D0 (en) * | 2004-03-30 | 2004-05-05 | Colormatrix Europe Ltd | Polymer additives and methods of use thereof |
| US7713896B2 (en) * | 2004-04-14 | 2010-05-11 | Robert Bosch Gmbh | Method for producing ceramic green compacts for ceramic components |
| GB0411883D0 (en) * | 2004-05-28 | 2004-06-30 | Ici Plc | Mixed metal oxides |
| GB0411945D0 (en) * | 2004-05-28 | 2004-06-30 | Ici Plc | Mixed metal oxides |
| GB0411949D0 (en) * | 2004-05-28 | 2004-06-30 | Ici Plc | Mixed metal oxides |
| JP2006024535A (ja) * | 2004-07-09 | 2006-01-26 | Seiko Epson Corp | 有機薄膜素子の製造方法、電気光学装置の製造方法及び電子機器の製造方法 |
| KR20060008046A (ko) * | 2004-07-23 | 2006-01-26 | 한양대학교 산학협력단 | 나노크기의 금속분말 피드스톡 제조방법 및 이를 이용한소결체 제조방법 |
| DE102004057707A1 (de) * | 2004-11-30 | 2006-06-01 | Degussa Ag | Oberflächenmodifizierte Indium-Zinn-Oxide |
| CN1622283A (zh) * | 2004-12-15 | 2005-06-01 | 贺平 | 复合氧化物半导体纳米材料的制备方法 |
| CN100364897C (zh) * | 2005-02-25 | 2008-01-30 | 昆明理工大学 | 一种纳米铟锡氧化物粉体的制备方法 |
| JP4984204B2 (ja) * | 2005-03-22 | 2012-07-25 | Dowaエレクトロニクス株式会社 | 酸化インジウム粉末およびその製造方法 |
| WO2007015250A2 (en) * | 2005-08-04 | 2007-02-08 | Bar-Ilan University | Method for production of nanoporous electrodes for photoelectrochemical applications |
| DE102005040157A1 (de) | 2005-08-25 | 2007-03-01 | Degussa Ag | Paste aus nanoskaligem Pulver und Dispergiermittel |
| AU2011218713B2 (en) * | 2005-11-15 | 2013-11-21 | Pola Chemical Industries Inc. | Organic inorganic composite powder, method of producing the same, and composition containing the powder |
| EP1950258A4 (en) * | 2005-11-15 | 2011-08-03 | Pola Chem Ind Inc | ORGANIC-INORGANIC COMPOUND POWDER, METHOD OF MANUFACTURING THEREOF AND COMPOSITION COMPRISING THE POWDER |
| CN100479071C (zh) * | 2006-02-08 | 2009-04-15 | 南亚塑胶工业股份有限公司 | 一种导电性纳米细粉的制造方法 |
| CN100427192C (zh) * | 2006-04-04 | 2008-10-22 | 张文知 | 无添加剂的长期稳定的高固体分的透明导电纳米晶水分散液及其制备方法 |
| JP5398525B2 (ja) * | 2007-04-18 | 2014-01-29 | パナソニック株式会社 | 光触媒性材料及びこれを用いた光触媒性部材と浄化装置 |
| US8148289B2 (en) | 2007-04-18 | 2012-04-03 | Panasonic Corporation | Titanium oxide photocatalyst and method for producing the same |
| JP5589214B2 (ja) * | 2007-10-01 | 2014-09-17 | Dowaエレクトロニクス株式会社 | Ito粉体およびその製造方法、透明導電材用塗料、並びに透明導電膜 |
| TW200918457A (en) | 2007-10-25 | 2009-05-01 | Univ Nat Taiwan | Mono-dispersive spherical indium oxide-based particles and the method for producing the same |
| US20080138600A1 (en) * | 2007-10-26 | 2008-06-12 | National University Of Ireland, Galway | Soluble Metal Oxides and Metal Oxide Solutions |
| EP2116513B1 (de) | 2008-05-06 | 2017-07-05 | Evonik Degussa GmbH | Verfahren zur herstellung eines oberflächenmodifizierten agglomerates von indiumzinnoxid, das nach diesem verfahren erhältliche oberflächenmodifizierte agglomerat selbst, sowie eine beschichtungsmasse hiermit |
| GB2459917B (en) * | 2008-05-12 | 2013-02-27 | Sinito Shenzhen Optoelectrical Advanced Materials Company Ltd | A process for the manufacture of a high density ITO sputtering target |
| EP2143689A1 (de) * | 2008-07-07 | 2010-01-13 | Evonik Degussa GmbH | Indiumzinnoxid-Partikel enthaltende Dispersion |
| JP5472589B2 (ja) * | 2008-07-10 | 2014-04-16 | 国立大学法人東北大学 | Ito粒子の製造方法 |
| US8163205B2 (en) * | 2008-08-12 | 2012-04-24 | The Boeing Company | Durable transparent conductors on polymeric substrates |
| CN101372358B (zh) * | 2008-10-21 | 2010-06-02 | 北京科技大学 | 常压气相沉积制备氧化锡纳米线的方法 |
| DE102008058365A1 (de) | 2008-11-20 | 2010-05-27 | Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh | Leitfähige Beschichtungen auf ITO-Basis |
| CN101704547B (zh) * | 2008-12-09 | 2011-04-27 | 南昌航空大学 | 晶形可控的铟锡氧化物纳米粉体的制备方法 |
| DE102009033417C5 (de) | 2009-04-09 | 2022-10-06 | Interpane Entwicklungs-Und Beratungsgesellschaft Mbh | Verfahren und Anlage zur Herstellung eines beschichteten Gegenstands mittels Tempern |
| WO2010131674A1 (ja) * | 2009-05-12 | 2010-11-18 | Dowaエレクトロニクス株式会社 | Ito粉体、ito塗料、並びに、ito塗料を用いて成膜される透明導電膜 |
| DE102009022097B4 (de) * | 2009-05-20 | 2011-09-01 | Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh | Zusammensetzung und Verfahren zur Herstellung von ITO-Pulvern oder ITO-Beschichtungen |
| JP5835860B2 (ja) | 2009-10-29 | 2015-12-24 | 三菱マテリアル電子化成株式会社 | 熱線遮蔽組成物とその製造方法 |
| KR101336395B1 (ko) * | 2010-05-31 | 2013-12-04 | 정의산업(주) | 투명전극용 ito 페이스트 제조방법 및 이에 의해 제조된 투명전극용 ito 페이스트 |
| GB2482544A (en) * | 2010-08-06 | 2012-02-08 | Advanced Tech Materials | Making high density indium tin oxide sputtering targets |
| JP5754580B2 (ja) * | 2010-10-26 | 2015-07-29 | 三菱マテリアル電子化成株式会社 | インジウム錫酸化物粉末 |
| CN102760509A (zh) * | 2011-04-26 | 2012-10-31 | 张文知 | Ito纳米晶水分散液及其制备方法 |
| WO2013002919A1 (en) | 2011-06-28 | 2013-01-03 | 3M Innovative Properties Company | Tin dioxide nanopartcles and method for making the same |
| DE102011084269A1 (de) | 2011-10-11 | 2013-04-11 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Polymer-Nanopartikel-Compounds mittels einerNanopartikel-Dispersion |
| CA2787584A1 (en) | 2012-08-22 | 2014-02-22 | Hy-Power Nano Inc. | Method for continuous preparation of indium-tin coprecipitates and indium-tin-oxide nanopowders with substantially homogeneous indium/tin composition, controllable shape and particle size |
| JP5954082B2 (ja) * | 2012-09-27 | 2016-07-20 | 三菱マテリアル株式会社 | Ito粉末及びその製造方法 |
| JP5924214B2 (ja) * | 2012-09-27 | 2016-05-25 | 三菱マテリアル株式会社 | Ito粉末及びその製造方法 |
| JP5397794B1 (ja) | 2013-06-04 | 2014-01-22 | Roca株式会社 | 酸化物結晶薄膜の製造方法 |
| US10590000B1 (en) * | 2013-08-16 | 2020-03-17 | United States Of America As Represented By The Administrator Of National Aeronautics And Space Administration | High temperature, flexible aerogel composite and method of making same |
| FR3041528A1 (fr) | 2015-09-25 | 2017-03-31 | Rhodia Operations | Composition cosmetique photoprotectrice |
| CN107400394B (zh) * | 2016-05-19 | 2019-10-15 | 福建坤彩材料科技股份有限公司 | 一种直接用于静电粉末喷涂的珠光颜料及其制备方法 |
| CN106676579B (zh) * | 2017-01-05 | 2018-10-23 | 京东方科技集团股份有限公司 | 处理氧化锡铟刻蚀废液的方法 |
| CN109887962B (zh) * | 2019-02-18 | 2021-09-24 | 京东方科技集团股份有限公司 | 有机发光显示基板及其制作方法、显示装置 |
| CN110673235B (zh) * | 2019-10-14 | 2021-08-17 | 宁波盈瑞聚合科技有限公司 | 多功能光学膜及其生产方法 |
| JP6729779B1 (ja) * | 2019-11-25 | 2020-07-22 | 東洋インキScホールディングス株式会社 | 錫ドープ酸化インジウム粒子分散体、成形用組成物および成形体 |
| CN115784297B (zh) * | 2022-11-21 | 2024-03-29 | 西安近代化学研究所 | 一种纺锤形In2O3纳米材料的制备方法及应用 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2691918B1 (fr) * | 1992-06-09 | 1994-07-22 | Kodak Pathe | Preparation de poudres conductrices d'oxydes metalliques. |
| JPH0649394A (ja) * | 1992-07-29 | 1994-02-22 | Sekisui Chem Co Ltd | 帯電防止性溶剤型透明塗料の製造方法 |
| US5518810A (en) * | 1993-06-30 | 1996-05-21 | Mitsubishi Materials Corporation | Infrared ray cutoff material and infrared cutoff powder use for same |
| JPH0841441A (ja) * | 1994-05-25 | 1996-02-13 | Sumitomo Metal Mining Co Ltd | 紫外線、近赤外線遮へい用インジウム−錫酸化物粉末とこれを用いた紫外線、近赤外線遮へいガラスおよびその製造方法 |
| KR100434646B1 (ko) * | 1995-11-08 | 2004-09-01 | 도소 가부시키가이샤 | 소결된ito콤팩트의제조공정 |
-
1999
- 1999-09-03 PT PT99944597T patent/PT1113992E/pt unknown
- 1999-09-03 KR KR1020017002857A patent/KR100737657B1/ko not_active Expired - Lifetime
- 1999-09-03 ES ES99944597T patent/ES2268881T3/es not_active Expired - Lifetime
- 1999-09-03 WO PCT/EP1999/006498 patent/WO2000014017A1/de not_active Ceased
- 1999-09-03 EP EP99944597A patent/EP1113992B1/de not_active Expired - Lifetime
- 1999-09-03 DE DE59913605T patent/DE59913605D1/de not_active Expired - Lifetime
- 1999-09-03 AT AT99944597T patent/ATE330908T1/de active
- 1999-09-03 US US09/763,643 patent/US6533966B1/en not_active Expired - Lifetime
- 1999-09-03 CN CNB998100889A patent/CN1211287C/zh not_active Expired - Lifetime
- 1999-09-03 JP JP2000568781A patent/JP4488623B2/ja not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103101966A (zh) * | 2011-11-10 | 2013-05-15 | 财团法人工业技术研究院 | 氧化铟锡的回收方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR100737657B1 (ko) | 2007-07-09 |
| JP2002524374A (ja) | 2002-08-06 |
| WO2000014017A1 (de) | 2000-03-16 |
| EP1113992A1 (de) | 2001-07-11 |
| KR20010074957A (ko) | 2001-08-09 |
| CN1314871A (zh) | 2001-09-26 |
| ES2268881T3 (es) | 2007-03-16 |
| US6533966B1 (en) | 2003-03-18 |
| ATE330908T1 (de) | 2006-07-15 |
| PT1113992E (pt) | 2006-09-29 |
| EP1113992B1 (de) | 2006-06-21 |
| JP4488623B2 (ja) | 2010-06-23 |
| DE59913605D1 (de) | 2006-08-03 |
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