JP4488623B2 - インジウムスズ酸化物に基づくサスペンション及び粉末の調製方法並びにその使用 - Google Patents

インジウムスズ酸化物に基づくサスペンション及び粉末の調製方法並びにその使用 Download PDF

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Publication number
JP4488623B2
JP4488623B2 JP2000568781A JP2000568781A JP4488623B2 JP 4488623 B2 JP4488623 B2 JP 4488623B2 JP 2000568781 A JP2000568781 A JP 2000568781A JP 2000568781 A JP2000568781 A JP 2000568781A JP 4488623 B2 JP4488623 B2 JP 4488623B2
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indium
powder
tin oxide
suspension
ito
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Expired - Lifetime
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JP2000568781A
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Japanese (ja)
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JP2002524374A (ja
JP2002524374A5 (enExample
Inventor
ラルフ ノニンゲル
クリスティアン ゲッベルト
ヘルムート シュミット
ロベルト ドルム
シュテファン セプール
Original Assignee
ライプニッツ−インスティトゥート フィア ノイエ マテリアーリエン ゲマインニュッツィゲ ゲゼルシャフト ミット ベシュレンクタ ハフトゥンク
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Priority claimed from DE1998140527 external-priority patent/DE19840527B4/de
Priority claimed from DE1998149048 external-priority patent/DE19849048A1/de
Application filed by ライプニッツ−インスティトゥート フィア ノイエ マテリアーリエン ゲマインニュッツィゲ ゲゼルシャフト ミット ベシュレンクタ ハフトゥンク filed Critical ライプニッツ−インスティトゥート フィア ノイエ マテリアーリエン ゲマインニュッツィゲ ゲゼルシャフト ミット ベシュレンクタ ハフトゥンク
Publication of JP2002524374A publication Critical patent/JP2002524374A/ja
Publication of JP2002524374A5 publication Critical patent/JP2002524374A5/ja
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    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G19/00Compounds of tin
    • C01G19/02Oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/086Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G19/00Compounds of tin
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/25Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
    • Y10T428/256Heavy metal or aluminum or compound thereof

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Catalysts (AREA)
  • Non-Insulated Conductors (AREA)
  • Surface Treatment Of Glass (AREA)
  • Paints Or Removers (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Conductive Materials (AREA)
JP2000568781A 1998-09-06 1999-09-03 インジウムスズ酸化物に基づくサスペンション及び粉末の調製方法並びにその使用 Expired - Lifetime JP4488623B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
DE1998140527 DE19840527B4 (de) 1998-09-06 1998-09-06 Verfahren zur Herstellung von Suspensionen und Pulvern von Indium-Zinn-Oxid
DE19840527.8 1998-09-06
DE19849048.8 1998-10-23
DE1998149048 DE19849048A1 (de) 1998-10-23 1998-10-23 Verfahren zur Herstellung von Suspensionen und Pulvern von Indium-Zinn-Oxid und deren Verwendung
PCT/EP1999/006498 WO2000014017A1 (de) 1998-09-06 1999-09-03 Verfahren zur herstellung von suspensionen und pulvern auf basis von indium-zinn-oxid und deren verwendung

Publications (3)

Publication Number Publication Date
JP2002524374A JP2002524374A (ja) 2002-08-06
JP2002524374A5 JP2002524374A5 (enExample) 2006-10-19
JP4488623B2 true JP4488623B2 (ja) 2010-06-23

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JP2000568781A Expired - Lifetime JP4488623B2 (ja) 1998-09-06 1999-09-03 インジウムスズ酸化物に基づくサスペンション及び粉末の調製方法並びにその使用

Country Status (10)

Country Link
US (1) US6533966B1 (enExample)
EP (1) EP1113992B1 (enExample)
JP (1) JP4488623B2 (enExample)
KR (1) KR100737657B1 (enExample)
CN (1) CN1211287C (enExample)
AT (1) ATE330908T1 (enExample)
DE (1) DE59913605D1 (enExample)
ES (1) ES2268881T3 (enExample)
PT (1) PT1113992E (enExample)
WO (1) WO2000014017A1 (enExample)

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KR100737657B1 (ko) 2007-07-09
JP2002524374A (ja) 2002-08-06
WO2000014017A1 (de) 2000-03-16
CN1211287C (zh) 2005-07-20
EP1113992A1 (de) 2001-07-11
KR20010074957A (ko) 2001-08-09
CN1314871A (zh) 2001-09-26
ES2268881T3 (es) 2007-03-16
US6533966B1 (en) 2003-03-18
ATE330908T1 (de) 2006-07-15
PT1113992E (pt) 2006-09-29
EP1113992B1 (de) 2006-06-21
DE59913605D1 (de) 2006-08-03

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