KR100737657B1 - 산화 인듐 주석을 기재로 하는 현탁액 및 분말의 제조방법및 그의 용도 - Google Patents

산화 인듐 주석을 기재로 하는 현탁액 및 분말의 제조방법및 그의 용도 Download PDF

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KR100737657B1
KR100737657B1 KR1020017002857A KR20017002857A KR100737657B1 KR 100737657 B1 KR100737657 B1 KR 100737657B1 KR 1020017002857 A KR1020017002857 A KR 1020017002857A KR 20017002857 A KR20017002857 A KR 20017002857A KR 100737657 B1 KR100737657 B1 KR 100737657B1
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South Korea
Prior art keywords
indium
powder
tin
suspension
tin oxide
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Expired - Lifetime
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KR1020017002857A
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English (en)
Korean (ko)
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KR20010074957A (ko
Inventor
노닌거랄프
고위베르트크리스티안
스미드트헬무트
드룸로버트
제포이어슈테판
Original Assignee
라이브니츠-인스티투트 퓌어 노이에 마테리알리엔 게마인누찌게 게엠베하
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Priority claimed from DE1998140527 external-priority patent/DE19840527B4/de
Priority claimed from DE1998149048 external-priority patent/DE19849048A1/de
Application filed by 라이브니츠-인스티투트 퓌어 노이에 마테리알리엔 게마인누찌게 게엠베하 filed Critical 라이브니츠-인스티투트 퓌어 노이에 마테리알리엔 게마인누찌게 게엠베하
Publication of KR20010074957A publication Critical patent/KR20010074957A/ko
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G19/00—Compounds of tin
    • C01G19/02—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G19/00—Compounds of tin
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
    • Y10T428/256—Heavy metal or aluminum or compound thereof

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Catalysts (AREA)
  • Non-Insulated Conductors (AREA)
  • Surface Treatment Of Glass (AREA)
  • Paints Or Removers (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Conductive Materials (AREA)
KR1020017002857A 1998-09-06 1999-09-03 산화 인듐 주석을 기재로 하는 현탁액 및 분말의 제조방법및 그의 용도 Expired - Lifetime KR100737657B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE1998140527 DE19840527B4 (de) 1998-09-06 1998-09-06 Verfahren zur Herstellung von Suspensionen und Pulvern von Indium-Zinn-Oxid
DE19840527.8 1998-09-06
DE19849048.8 1998-10-23
DE1998149048 DE19849048A1 (de) 1998-10-23 1998-10-23 Verfahren zur Herstellung von Suspensionen und Pulvern von Indium-Zinn-Oxid und deren Verwendung

Publications (2)

Publication Number Publication Date
KR20010074957A KR20010074957A (ko) 2001-08-09
KR100737657B1 true KR100737657B1 (ko) 2007-07-09

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020017002857A Expired - Lifetime KR100737657B1 (ko) 1998-09-06 1999-09-03 산화 인듐 주석을 기재로 하는 현탁액 및 분말의 제조방법및 그의 용도

Country Status (10)

Country Link
US (1) US6533966B1 (enExample)
EP (1) EP1113992B1 (enExample)
JP (1) JP4488623B2 (enExample)
KR (1) KR100737657B1 (enExample)
CN (1) CN1211287C (enExample)
AT (1) ATE330908T1 (enExample)
DE (1) DE59913605D1 (enExample)
ES (1) ES2268881T3 (enExample)
PT (1) PT1113992E (enExample)
WO (1) WO2000014017A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
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KR101336395B1 (ko) * 2010-05-31 2013-12-04 정의산업(주) 투명전극용 ｉｔｏ 페이스트 제조방법 및 이에 의해 제조된 투명전극용 ｉｔｏ 페이스트

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Publication number Priority date Publication date Assignee Title
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Also Published As

Publication number Publication date
JP2002524374A (ja) 2002-08-06
WO2000014017A1 (de) 2000-03-16
CN1211287C (zh) 2005-07-20
EP1113992A1 (de) 2001-07-11
KR20010074957A (ko) 2001-08-09
CN1314871A (zh) 2001-09-26
ES2268881T3 (es) 2007-03-16
US6533966B1 (en) 2003-03-18
ATE330908T1 (de) 2006-07-15
PT1113992E (pt) 2006-09-29
EP1113992B1 (de) 2006-06-21
JP4488623B2 (ja) 2010-06-23
DE59913605D1 (de) 2006-08-03

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