PT1113992E - Processo para o fabrico de suspensoes e de pos a base de oxido de indio-estanho e a sua utilizacao - Google Patents

Processo para o fabrico de suspensoes e de pos a base de oxido de indio-estanho e a sua utilizacao

Info

Publication number
PT1113992E
PT1113992E PT99944597T PT99944597T PT1113992E PT 1113992 E PT1113992 E PT 1113992E PT 99944597 T PT99944597 T PT 99944597T PT 99944597 T PT99944597 T PT 99944597T PT 1113992 E PT1113992 E PT 1113992E
Authority
PT
Portugal
Prior art keywords
tin oxide
suspensions
indo
bas
pos
Prior art date
Application number
PT99944597T
Other languages
English (en)
Inventor
Nonninger Ralph
Goebbert Christian
Helmut Schmidt
Drumm Robert
Stefan Sepeur
Original Assignee
Leibniz Inst Neue Materialien
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE1998140527 external-priority patent/DE19840527B4/de
Priority claimed from DE1998149048 external-priority patent/DE19849048A1/de
Application filed by Leibniz Inst Neue Materialien filed Critical Leibniz Inst Neue Materialien
Publication of PT1113992E publication Critical patent/PT1113992E/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G19/00—Compounds of tin
    • C01G19/02—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G19/00—Compounds of tin
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
    • Y10T428/256—Heavy metal or aluminum or compound thereof
PT99944597T 1998-09-06 1999-09-03 Processo para o fabrico de suspensoes e de pos a base de oxido de indio-estanho e a sua utilizacao PT1113992E (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE1998140527 DE19840527B4 (de) 1998-09-06 1998-09-06 Verfahren zur Herstellung von Suspensionen und Pulvern von Indium-Zinn-Oxid
DE1998149048 DE19849048A1 (de) 1998-10-23 1998-10-23 Verfahren zur Herstellung von Suspensionen und Pulvern von Indium-Zinn-Oxid und deren Verwendung

Publications (1)

Publication Number Publication Date
PT1113992E true PT1113992E (pt) 2006-09-29

Family

ID=26048642

Family Applications (1)

Application Number Title Priority Date Filing Date
PT99944597T PT1113992E (pt) 1998-09-06 1999-09-03 Processo para o fabrico de suspensoes e de pos a base de oxido de indio-estanho e a sua utilizacao

Country Status (10)

Country Link
US (1) US6533966B1 (pt)
EP (1) EP1113992B1 (pt)
JP (1) JP4488623B2 (pt)
KR (1) KR100737657B1 (pt)
CN (1) CN1211287C (pt)
AT (1) ATE330908T1 (pt)
DE (1) DE59913605D1 (pt)
ES (1) ES2268881T3 (pt)
PT (1) PT1113992E (pt)
WO (1) WO2000014017A1 (pt)

Families Citing this family (70)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6989608B2 (en) * 2004-04-01 2006-01-24 Atmel Corporation Method and apparatus to eliminate galvanic corrosion on copper doped aluminum bond pads on integrated circuits
DE19960091A1 (de) * 1999-12-14 2001-07-12 Bosch Gmbh Robert Keramikhaltiges Dispergat, Verfahren zu dessen Herstellung und Verwendung des Dispergates in Dickschichtpasten
DE10022037A1 (de) 2000-05-05 2001-11-08 Bayer Ag IR-absorbierende Zusammensetzungen
DE10129376A1 (de) * 2001-06-20 2003-01-09 Degussa Indium-Zinn-Oxide
WO2003004565A2 (de) * 2001-07-05 2003-01-16 Nanogate Technologies Gmbh Optisches bauelement
JP3722282B2 (ja) * 2001-08-21 2005-11-30 Ｔｄｋ株式会社 金属粒子含有組成物、導電ペースト及びその製造方法
GB0126284D0 (en) * 2001-11-01 2002-01-02 Oxonica Ltd Water soluble luminescent nanoparticles
DE10160356A1 (de) * 2001-12-08 2003-06-26 Nanogate Technologies Gmbh IR-Schutz
DE10205920A1 (de) * 2002-02-12 2003-08-21 Itn Nanovation Gmbh Nanoskaliger Rutil, sowie Verfahren zu dessen Herstellung
EP1517967B1 (de) * 2002-06-24 2008-12-17 Air Products and Chemicals, Inc. Beschichtungsmaterial
JP4170735B2 (ja) * 2002-11-13 2008-10-22 信越化学工業株式会社 ゼオライトゾルとその製造方法、多孔質膜形成用組成物、多孔質膜とその製造方法、層間絶縁膜及び半導体装置
DE10304849A1 (de) * 2003-02-06 2004-08-19 Institut für Neue Materialien gemeinnützige Gesellschaft mit beschränkter Haftung Chemomechanische Herstellung von Funktionskolloiden
JP4867130B2 (ja) * 2003-02-17 2012-02-01 三菱瓦斯化学株式会社 絶縁化超微粉末とその製造方法、およびそれを用いた高誘電率樹脂複合材料
DE10316472A1 (de) 2003-04-09 2004-10-28 Heidelberger Druckmaschinen Ag Verfahren zum Trocknen einer Druckfarbe auf einem Bedruckstoff in einer Druckmaschine und Druckmaschine
DE10329626A1 (de) * 2003-06-25 2005-01-20 Itn Nanovation Gmbh Mischmetalloxide und ihre Verwendung in CO2-Sensoren
KR100727760B1 (ko) * 2003-09-18 2007-06-13 주식회사 엘지화학 베타-디케톤을 분산제로 사용한 금속 산화물의 분산액 및이를 이용한 대전 방지용 도전성 코팅막
EP1685199A2 (en) * 2003-11-21 2006-08-02 The National University of Ireland, Galway Method for solubilizing metal oxides by surface treatment, surface treated metal oxide solutions and method for separating metal oxides
US20050153171A1 (en) * 2004-01-12 2005-07-14 Chris Beatty Mixed metal oxide layer and method of manufacture
GB0407114D0 (en) * 2004-03-30 2004-05-05 Colormatrix Europe Ltd Polymer additives and methods of use thereof
US7713896B2 (en) * 2004-04-14 2010-05-11 Robert Bosch Gmbh Method for producing ceramic green compacts for ceramic components
GB0411945D0 (en) * 2004-05-28 2004-06-30 Ici Plc Mixed metal oxides
GB0411949D0 (en) * 2004-05-28 2004-06-30 Ici Plc Mixed metal oxides
GB0411883D0 (en) * 2004-05-28 2004-06-30 Ici Plc Mixed metal oxides
JP2006024535A (ja) * 2004-07-09 2006-01-26 Seiko Epson Corp 有機薄膜素子の製造方法、電気光学装置の製造方法及び電子機器の製造方法
KR20060008046A (ko) * 2004-07-23 2006-01-26 한양대학교 산학협력단 나노크기의 금속분말 피드스톡 제조방법 및 이를 이용한소결체 제조방법
DE102004057707A1 (de) * 2004-11-30 2006-06-01 Degussa Ag Oberflächenmodifizierte Indium-Zinn-Oxide
CN1622283A (zh) * 2004-12-15 2005-06-01 贺平 复合氧化物半导体纳米材料的制备方法
CN100364897C (zh) * 2005-02-25 2008-01-30 昆明理工大学 一种纳米铟锡氧化物粉体的制备方法
JP4984204B2 (ja) * 2005-03-22 2012-07-25 Ｄｏｗａエレクトロニクス株式会社 酸化インジウム粉末およびその製造方法
US7790067B2 (en) * 2005-08-04 2010-09-07 3Gsolar Ltd. Method for production of nanoporous electrodes for photoelectrochemical applications
DE102005040157A1 (de) 2005-08-25 2007-03-01 Degussa Ag Paste aus nanoskaligem Pulver und Dispergiermittel
AU2011218713B2 (en) * 2005-11-15 2013-11-21 Pola Chemical Industries Inc. Organic inorganic composite powder, method of producing the same, and composition containing the powder
AU2006314025B2 (en) 2005-11-15 2011-06-02 Pola Chemical Industries Inc. Organic inorganic composite powder, method of producing the same and composition containing the powder
CN100427192C (zh) * 2006-04-04 2008-10-22 张文知 无添加剂的长期稳定的高固体分的透明导电纳米晶水分散液及其制备方法
CN101678345B (zh) 2007-04-18 2012-09-12 松下电器产业株式会社 氧化钛光催化剂及其制造方法
WO2008132823A1 (ja) * 2007-04-18 2008-11-06 Panasonic Corporation 光触媒性材料及びこれを用いた光触媒性部材と浄化装置
JP5589214B2 (ja) * 2007-10-01 2014-09-17 Ｄｏｗａエレクトロニクス株式会社 Ｉｔｏ粉体およびその製造方法、透明導電材用塗料、並びに透明導電膜
TW200918457A (en) * 2007-10-25 2009-05-01 Univ Nat Taiwan Mono-dispersive spherical indium oxide-based particles and the method for producing the same
US20080138600A1 (en) * 2007-10-26 2008-06-12 National University Of Ireland, Galway Soluble Metal Oxides and Metal Oxide Solutions
EP2116513B1 (de) * 2008-05-06 2017-07-05 Evonik Degussa GmbH Verfahren zur herstellung eines oberflächenmodifizierten agglomerates von indiumzinnoxid, das nach diesem verfahren erhältliche oberflächenmodifizierte agglomerat selbst, sowie eine beschichtungsmasse hiermit
GB2459917B (en) * 2008-05-12 2013-02-27 Sinito Shenzhen Optoelectrical Advanced Materials Company Ltd A process for the manufacture of a high density ITO sputtering target
EP2143689A1 (de) * 2008-07-07 2010-01-13 Evonik Degussa GmbH Indiumzinnoxid-Partikel enthaltende Dispersion
JP5472589B2 (ja) * 2008-07-10 2014-04-16 国立大学法人東北大学 Ｉｔｏ粒子の製造方法
US8163205B2 (en) * 2008-08-12 2012-04-24 The Boeing Company Durable transparent conductors on polymeric substrates
CN101372358B (zh) * 2008-10-21 2010-06-02 北京科技大学 常压气相沉积制备氧化锡纳米线的方法
DE102008058365A1 (de) 2008-11-20 2010-05-27 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Leitfähige Beschichtungen auf ITO-Basis
CN101704547B (zh) * 2008-12-09 2011-04-27 南昌航空大学 晶形可控的铟锡氧化物纳米粉体的制备方法
DE102009033417C5 (de) 2009-04-09 2022-10-06 Interpane Entwicklungs-Und Beratungsgesellschaft Mbh Verfahren und Anlage zur Herstellung eines beschichteten Gegenstands mittels Tempern
JP5726728B2 (ja) * 2009-05-12 2015-06-03 Ｄｏｗａエレクトロニクス株式会社 Ｉｔｏ粉体、ｉｔｏ塗料、並びに、ｉｔｏ塗料を用いて成膜される透明導電膜
DE102009022097B4 (de) * 2009-05-20 2011-09-01 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Zusammensetzung und Verfahren zur Herstellung von ITO-Pulvern oder ITO-Beschichtungen
JP5835860B2 (ja) * 2009-10-29 2015-12-24 三菱マテリアル電子化成株式会社 熱線遮蔽組成物とその製造方法
KR101336395B1 (ko) * 2010-05-31 2013-12-04 정의산업(주) 투명전극용 ｉｔｏ 페이스트 제조방법 및 이에 의해 제조된 투명전극용 ｉｔｏ 페이스트
GB2482544A (en) * 2010-08-06 2012-02-08 Advanced Tech Materials Making high density indium tin oxide sputtering targets
JP5754580B2 (ja) * 2010-10-26 2015-07-29 三菱マテリアル電子化成株式会社 インジウム錫酸化物粉末
CN102760509A (zh) * 2011-04-26 2012-10-31 张文知 Ito纳米晶水分散液及其制备方法
WO2013002919A1 (en) 2011-06-28 2013-01-03 3M Innovative Properties Company Tin dioxide nanopartcles and method for making the same
DE102011084269A1 (de) 2011-10-11 2013-04-11 Evonik Degussa Gmbh Verfahren zur Herstellung von Polymer-Nanopartikel-Compounds mittels einerNanopartikel-Dispersion
TWI443068B (zh) * 2011-11-10 2014-07-01 Ind Tech Res Inst 氧化銦錫的回收方法
CA2787584A1 (en) 2012-08-22 2014-02-22 Hy-Power Nano Inc. Method for continuous preparation of indium-tin coprecipitates and indium-tin-oxide nanopowders with substantially homogeneous indium/tin composition, controllable shape and particle size
JP5924214B2 (ja) * 2012-09-27 2016-05-25 三菱マテリアル株式会社 Ｉｔｏ粉末及びその製造方法
JP5954082B2 (ja) * 2012-09-27 2016-07-20 三菱マテリアル株式会社 Ｉｔｏ粉末及びその製造方法
JP5397794B1 (ja) 2013-06-04 2014-01-22 Ｒｏｃａ株式会社 酸化物結晶薄膜の製造方法
US10590000B1 (en) * 2013-08-16 2020-03-17 United States Of America As Represented By The Administrator Of National Aeronautics And Space Administration High temperature, flexible aerogel composite and method of making same
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CN107400394B (zh) * 2016-05-19 2019-10-15 福建坤彩材料科技股份有限公司 一种直接用于静电粉末喷涂的珠光颜料及其制备方法
CN106676579B (zh) * 2017-01-05 2018-10-23 京东方科技集团股份有限公司 处理氧化锡铟刻蚀废液的方法
CN109887962B (zh) * 2019-02-18 2021-09-24 京东方科技集团股份有限公司 有机发光显示基板及其制作方法、显示装置
CN110673235B (zh) * 2019-10-14 2021-08-17 宁波盈瑞聚合科技有限公司 多功能光学膜及其生产方法
JP6729779B1 (ja) * 2019-11-25 2020-07-22 東洋インキＳｃホールディングス株式会社 錫ドープ酸化インジウム粒子分散体、成形用組成物および成形体
CN115784297B (zh) * 2022-11-21 2024-03-29 西安近代化学研究所 一种纺锤形In2O3纳米材料的制备方法及应用

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2691918B1 (fr) * 1992-06-09 1994-07-22 Kodak Pathe Preparation de poudres conductrices d'oxydes metalliques.
JPH0649394A (ja) * 1992-07-29 1994-02-22 Sekisui Chem Co Ltd 帯電防止性溶剤型透明塗料の製造方法
US5518810A (en) * 1993-06-30 1996-05-21 Mitsubishi Materials Corporation Infrared ray cutoff material and infrared cutoff powder use for same
JPH0841441A (ja) * 1994-05-25 1996-02-13 Sumitomo Metal Mining Co Ltd 紫外線、近赤外線遮へい用インジウム−錫酸化物粉末とこれを用いた紫外線、近赤外線遮へいガラスおよびその製造方法
KR100434646B1 (ko) * 1995-11-08 2004-09-01 도소 가부시키가이샤 소결된ito콤팩트의제조공정

Also Published As

Publication number Publication date
CN1211287C (zh) 2005-07-20
EP1113992B1 (de) 2006-06-21
ATE330908T1 (de) 2006-07-15
JP4488623B2 (ja) 2010-06-23
KR20010074957A (ko) 2001-08-09
US6533966B1 (en) 2003-03-18
EP1113992A1 (de) 2001-07-11
CN1314871A (zh) 2001-09-26
JP2002524374A (ja) 2002-08-06
WO2000014017A1 (de) 2000-03-16
KR100737657B1 (ko) 2007-07-09
DE59913605D1 (de) 2006-08-03
ES2268881T3 (es) 2007-03-16

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