CN115917651B - 电阻变化型非易失性存储装置及其写入方法 - Google Patents

电阻变化型非易失性存储装置及其写入方法

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Publication number
CN115917651B
CN115917651B CN202180043696.4A CN202180043696A CN115917651B CN 115917651 B CN115917651 B CN 115917651B CN 202180043696 A CN202180043696 A CN 202180043696A CN 115917651 B CN115917651 B CN 115917651B
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China
Prior art keywords
resistance
current
period
constant current
nonvolatile memory
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CN202180043696.4A
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Chinese (zh)
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CN115917651A (zh
Inventor
河合贤
片山幸治
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Nuvoton Technology Corp Japan
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Nuvoton Technology Corp Japan
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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0021Auxiliary circuits
    • G11C13/0069Writing or programming circuits or methods
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0007Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements comprising metal oxide memory material, e.g. perovskites
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0021Auxiliary circuits
    • G11C13/0023Address circuits or decoders
    • G11C13/0026Bit-line or column circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0021Auxiliary circuits
    • G11C13/003Cell access
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0009RRAM elements whose operation depends upon chemical change
    • G11C13/0011RRAM elements whose operation depends upon chemical change comprising conductive bridging RAM [CBRAM] or programming metallization cells [PMCs]
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0021Auxiliary circuits
    • G11C13/0069Writing or programming circuits or methods
    • G11C2013/0078Write using current through the cell
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0021Auxiliary circuits
    • G11C13/0069Writing or programming circuits or methods
    • G11C2013/0083Write to perform initialising, forming process, electro forming or conditioning
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C2213/00Indexing scheme relating to G11C13/00 for features not covered by this group
    • G11C2213/30Resistive cell, memory material aspects
    • G11C2213/32Material having simple binary metal oxide structure
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C2213/00Indexing scheme relating to G11C13/00 for features not covered by this group
    • G11C2213/70Resistive array aspects
    • G11C2213/72Array wherein the access device being a diode
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C2213/00Indexing scheme relating to G11C13/00 for features not covered by this group
    • G11C2213/70Resistive array aspects
    • G11C2213/79Array wherein the access device being a transistor

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Semiconductor Memories (AREA)
CN202180043696.4A 2020-07-09 2021-06-14 电阻变化型非易失性存储装置及其写入方法 Active CN115917651B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020-118177 2020-07-09
JP2020118177 2020-07-09
PCT/JP2021/022553 WO2022009618A1 (ja) 2020-07-09 2021-06-14 抵抗変化型不揮発性記憶装置およびその書き込み方法

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CN115917651A CN115917651A (zh) 2023-04-04
CN115917651B true CN115917651B (zh) 2025-10-17

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Country Link
US (1) US12190950B2 (https=)
JP (1) JP7708759B2 (https=)
CN (1) CN115917651B (https=)
WO (1) WO2022009618A1 (https=)

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JP4846813B2 (ja) * 2009-03-12 2011-12-28 株式会社東芝 不揮発性半導体記憶装置
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JP2011009344A (ja) * 2009-06-24 2011-01-13 Sharp Corp 不揮発性可変抵抗素子のフォーミング方法
CN102197434A (zh) 2009-10-15 2011-09-21 松下电器产业株式会社 电阻变化型非易失性存储装置
JP2011204785A (ja) * 2010-03-24 2011-10-13 Toshiba Corp 不揮発性記憶装置
JP5521850B2 (ja) 2010-07-21 2014-06-18 ソニー株式会社 抵抗変化型メモリデバイスおよびその駆動方法
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KR20120103913A (ko) * 2011-03-11 2012-09-20 삼성전자주식회사 가변 저항 소자, 상기 가변 저항 소자를 포함하는 반도체 장치 및 상기 반도체 장치의 동작 방법
CN103052990B (zh) * 2011-08-02 2015-01-07 松下电器产业株式会社 电阻变化型非易失性存储装置及其驱动方法
KR20130072842A (ko) * 2011-12-22 2013-07-02 에스케이하이닉스 주식회사 프로그램 펄스 발생 회로 및 이를 구비하는 비휘발성 메모리 장치
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CN105632543B (zh) * 2014-11-21 2018-03-30 松下知识产权经营株式会社 具有防篡改性的非易失性存储装置及集成电路卡
JP2016167326A (ja) * 2015-03-09 2016-09-15 ルネサスエレクトロニクス株式会社 半導体記憶装置
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Publication number Publication date
US20230081445A1 (en) 2023-03-16
JP7708759B2 (ja) 2025-07-15
CN115917651A (zh) 2023-04-04
WO2022009618A1 (ja) 2022-01-13
JPWO2022009618A1 (https=) 2022-01-13
US12190950B2 (en) 2025-01-07

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