JPWO2022009618A1 - - Google Patents

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Publication number
JPWO2022009618A1
JPWO2022009618A1 JP2022534981A JP2022534981A JPWO2022009618A1 JP WO2022009618 A1 JPWO2022009618 A1 JP WO2022009618A1 JP 2022534981 A JP2022534981 A JP 2022534981A JP 2022534981 A JP2022534981 A JP 2022534981A JP WO2022009618 A1 JPWO2022009618 A1 JP WO2022009618A1
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022534981A
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Japanese (ja)
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JP7708759B2 (ja
JPWO2022009618A5 (https=
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Publication of JPWO2022009618A1 publication Critical patent/JPWO2022009618A1/ja
Publication of JPWO2022009618A5 publication Critical patent/JPWO2022009618A5/ja
Application granted granted Critical
Publication of JP7708759B2 publication Critical patent/JP7708759B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0021Auxiliary circuits
    • G11C13/0069Writing or programming circuits or methods
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0007Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements comprising metal oxide memory material, e.g. perovskites
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0021Auxiliary circuits
    • G11C13/0023Address circuits or decoders
    • G11C13/0026Bit-line or column circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0009RRAM elements whose operation depends upon chemical change
    • G11C13/0011RRAM elements whose operation depends upon chemical change comprising conductive bridging RAM [CBRAM] or programming metallization cells [PMCs]
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0021Auxiliary circuits
    • G11C13/003Cell access
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0021Auxiliary circuits
    • G11C13/0069Writing or programming circuits or methods
    • G11C2013/0078Write using current through the cell
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0021Auxiliary circuits
    • G11C13/0069Writing or programming circuits or methods
    • G11C2013/0083Write to perform initialising, forming process, electro forming or conditioning
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C2213/00Indexing scheme relating to G11C13/00 for features not covered by this group
    • G11C2213/30Resistive cell, memory material aspects
    • G11C2213/32Material having simple binary metal oxide structure
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C2213/00Indexing scheme relating to G11C13/00 for features not covered by this group
    • G11C2213/70Resistive array aspects
    • G11C2213/72Array wherein the access device being a diode
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C2213/00Indexing scheme relating to G11C13/00 for features not covered by this group
    • G11C2213/70Resistive array aspects
    • G11C2213/79Array wherein the access device being a transistor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Semiconductor Memories (AREA)
JP2022534981A 2020-07-09 2021-06-14 抵抗変化型不揮発性記憶装置およびその書き込み方法 Active JP7708759B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020118177 2020-07-09
JP2020118177 2020-07-09
PCT/JP2021/022553 WO2022009618A1 (ja) 2020-07-09 2021-06-14 抵抗変化型不揮発性記憶装置およびその書き込み方法

Publications (3)

Publication Number Publication Date
JPWO2022009618A1 true JPWO2022009618A1 (https=) 2022-01-13
JPWO2022009618A5 JPWO2022009618A5 (https=) 2023-03-23
JP7708759B2 JP7708759B2 (ja) 2025-07-15

Family

ID=79552915

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022534981A Active JP7708759B2 (ja) 2020-07-09 2021-06-14 抵抗変化型不揮発性記憶装置およびその書き込み方法

Country Status (4)

Country Link
US (1) US12190950B2 (https=)
JP (1) JP7708759B2 (https=)
CN (1) CN115917651B (https=)
WO (1) WO2022009618A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11315634B1 (en) * 2020-10-20 2022-04-26 International Business Machines Corporation Device comprising tunable resistive elements
CN119054020A (zh) * 2022-04-19 2024-11-29 索尼半导体解决方案公司 存储装置、电子设备和存储装置控制方法

Citations (8)

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JP2008306157A (ja) * 2007-05-10 2008-12-18 Sharp Corp 可変抵抗素子とその製造方法及び不揮発性半導体記憶装置
JP2010211895A (ja) * 2009-03-12 2010-09-24 Toshiba Corp 不揮発性半導体記憶装置
JP2011009344A (ja) * 2009-06-24 2011-01-13 Sharp Corp 不揮発性可変抵抗素子のフォーミング方法
JP2012133836A (ja) * 2010-12-20 2012-07-12 Toshiba Corp 抵抗変化型メモリ
US20120230080A1 (en) * 2011-03-11 2012-09-13 Samsung Electronics Co., Ltd. Variable Resistance Device, Semiconductor Device Including The Variable Resistance Device, And Method Of Operating The Semiconductor Device
US20130163349A1 (en) * 2011-12-22 2013-06-27 SK Hynix Inc. Programming pulse generation circuit and non-volatile memory apparatus having the same
JP2016167326A (ja) * 2015-03-09 2016-09-15 ルネサスエレクトロニクス株式会社 半導体記憶装置
WO2019131025A1 (ja) * 2017-12-29 2019-07-04 パナソニック株式会社 抵抗変化型不揮発性記憶装置

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KR100699837B1 (ko) * 2005-04-04 2007-03-27 삼성전자주식회사 반도체 메모리 장치 및 반도체 메모리 장치의 프로그래밍방법
JP4628501B2 (ja) * 2009-03-25 2011-02-09 パナソニック株式会社 抵抗変化素子の駆動方法及び不揮発性記憶装置
US8508976B2 (en) * 2009-04-30 2013-08-13 Panasonic Corporation Nonvolatile memory element and nonvolatile memory device
CN102197434A (zh) 2009-10-15 2011-09-21 松下电器产业株式会社 电阻变化型非易失性存储装置
JP2011204785A (ja) * 2010-03-24 2011-10-13 Toshiba Corp 不揮発性記憶装置
JP5521850B2 (ja) 2010-07-21 2014-06-18 ソニー株式会社 抵抗変化型メモリデバイスおよびその駆動方法
JP5000026B2 (ja) * 2010-10-29 2012-08-15 パナソニック株式会社 不揮発性記憶装置
CN103052990B (zh) * 2011-08-02 2015-01-07 松下电器产业株式会社 电阻变化型非易失性存储装置及其驱动方法
WO2013157261A1 (ja) * 2012-04-20 2013-10-24 パナソニック株式会社 不揮発性記憶素子の駆動方法および不揮発性記憶装置
JP2014078302A (ja) * 2012-10-11 2014-05-01 Panasonic Corp クロスポイント型抵抗変化不揮発性記憶装置及びクロスポイント型抵抗変化不揮発性記憶装置の読み出し方法
US8981332B2 (en) * 2013-03-15 2015-03-17 Intermolecular, Inc. Nonvolatile resistive memory element with an oxygen-gettering layer
US9336881B2 (en) * 2014-06-16 2016-05-10 Panasonic Intellectual Property Management Co., Ltd. Variable resistance nonvolatile memory device including a variable resistance layer that changes reversibly between a low resistance state and a high resistance state according to an applied electrical signal
CN105632543B (zh) * 2014-11-21 2018-03-30 松下知识产权经营株式会社 具有防篡改性的非易失性存储装置及集成电路卡
US11139024B2 (en) * 2017-03-01 2021-10-05 Nanobridge Semiconductor, Inc. Semiconductor device
US10541011B1 (en) * 2017-08-01 2020-01-21 SK Hynix Inc. Electronic device
US10783941B1 (en) * 2019-05-28 2020-09-22 Intel Corporation Floating block select based programming time (tPROG)
US11610101B2 (en) * 2019-08-30 2023-03-21 International Business Machines Corporation Formation failure resilient neuromorphic device
CN112825259A (zh) * 2019-11-20 2021-05-21 三星电子株式会社 非易失性存储器及其操作方法
KR102802846B1 (ko) * 2019-12-23 2025-05-07 에스케이하이닉스 주식회사 저항성 메모리 장치 및 그의 동작 방법
JP2021150308A (ja) * 2020-03-16 2021-09-27 キオクシア株式会社 半導体記憶装置
US11145349B1 (en) * 2020-09-28 2021-10-12 Globalfoundries U.S. Inc. Physically unclonable function architecture including memory cells with parallel-connected access transistors and common write wordlines

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008306157A (ja) * 2007-05-10 2008-12-18 Sharp Corp 可変抵抗素子とその製造方法及び不揮発性半導体記憶装置
JP2010211895A (ja) * 2009-03-12 2010-09-24 Toshiba Corp 不揮発性半導体記憶装置
JP2011009344A (ja) * 2009-06-24 2011-01-13 Sharp Corp 不揮発性可変抵抗素子のフォーミング方法
JP2012133836A (ja) * 2010-12-20 2012-07-12 Toshiba Corp 抵抗変化型メモリ
US20120230080A1 (en) * 2011-03-11 2012-09-13 Samsung Electronics Co., Ltd. Variable Resistance Device, Semiconductor Device Including The Variable Resistance Device, And Method Of Operating The Semiconductor Device
US20130163349A1 (en) * 2011-12-22 2013-06-27 SK Hynix Inc. Programming pulse generation circuit and non-volatile memory apparatus having the same
JP2016167326A (ja) * 2015-03-09 2016-09-15 ルネサスエレクトロニクス株式会社 半導体記憶装置
WO2019131025A1 (ja) * 2017-12-29 2019-07-04 パナソニック株式会社 抵抗変化型不揮発性記憶装置

Also Published As

Publication number Publication date
US20230081445A1 (en) 2023-03-16
JP7708759B2 (ja) 2025-07-15
CN115917651A (zh) 2023-04-04
WO2022009618A1 (ja) 2022-01-13
CN115917651B (zh) 2025-10-17
US12190950B2 (en) 2025-01-07

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