CN1130575C - 具有抗反射膜的塑料光学器件以及用来使抗反射膜的厚度均一的机构 - Google Patents

具有抗反射膜的塑料光学器件以及用来使抗反射膜的厚度均一的机构 Download PDF

Info

Publication number
CN1130575C
CN1130575C CN98800651A CN98800651A CN1130575C CN 1130575 C CN1130575 C CN 1130575C CN 98800651 A CN98800651 A CN 98800651A CN 98800651 A CN98800651 A CN 98800651A CN 1130575 C CN1130575 C CN 1130575C
Authority
CN
China
Prior art keywords
film
reflective film
bed material
refraction
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN98800651A
Other languages
English (en)
Chinese (zh)
Other versions
CN1226970A (zh
Inventor
葭原雅章
嘉村齐
神谷肇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP14317597A external-priority patent/JP4345869B2/ja
Priority claimed from JP17309897A external-priority patent/JP4166845B2/ja
Priority claimed from JP17309697A external-priority patent/JP3975242B2/ja
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of CN1226970A publication Critical patent/CN1226970A/zh
Application granted granted Critical
Publication of CN1130575C publication Critical patent/CN1130575C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
CN98800651A 1997-05-16 1998-05-18 具有抗反射膜的塑料光学器件以及用来使抗反射膜的厚度均一的机构 Expired - Fee Related CN1130575C (zh)

Applications Claiming Priority (15)

Application Number Priority Date Filing Date Title
JP14318097 1997-05-16
JP143173/1997 1997-05-16
JP143175/97 1997-05-16
JP14317397 1997-05-16
JP143180/1997 1997-05-16
JP143175/1997 1997-05-16
JP143173/97 1997-05-16
JP14317597A JP4345869B2 (ja) 1997-05-16 1997-05-16 スパッタ成膜用の膜厚補正機構
JP143180/97 1997-05-16
JP17309897A JP4166845B2 (ja) 1997-05-16 1997-06-13 反射防止膜を有する眼鏡プラスチックレンズ
JP173098/97 1997-06-13
JP173096/97 1997-06-13
JP17309697A JP3975242B2 (ja) 1997-05-16 1997-06-13 反射防止膜を有するプラスチック光学部品
JP173096/1997 1997-06-13
JP173098/1997 1997-06-13

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CNB031206115A Division CN1239924C (zh) 1997-05-16 1998-05-18 有抗反射膜的塑料光学器件和使抗反射膜厚度均一的机构

Publications (2)

Publication Number Publication Date
CN1226970A CN1226970A (zh) 1999-08-25
CN1130575C true CN1130575C (zh) 2003-12-10

Family

ID=27527668

Family Applications (2)

Application Number Title Priority Date Filing Date
CN98800651A Expired - Fee Related CN1130575C (zh) 1997-05-16 1998-05-18 具有抗反射膜的塑料光学器件以及用来使抗反射膜的厚度均一的机构
CNB031206115A Expired - Fee Related CN1239924C (zh) 1997-05-16 1998-05-18 有抗反射膜的塑料光学器件和使抗反射膜厚度均一的机构

Family Applications After (1)

Application Number Title Priority Date Filing Date
CNB031206115A Expired - Fee Related CN1239924C (zh) 1997-05-16 1998-05-18 有抗反射膜的塑料光学器件和使抗反射膜厚度均一的机构

Country Status (6)

Country Link
US (1) US6250758B1 (ja)
EP (1) EP0928977A4 (ja)
KR (1) KR20000023795A (ja)
CN (2) CN1130575C (ja)
AU (1) AU741691C (ja)
WO (1) WO1998052074A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100445773C (zh) * 2004-12-03 2008-12-24 鸿富锦精密工业（深圳）有限公司 数码相机用透镜制造方法

Families Citing this family (76)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001074904A (ja) * 1999-09-02 2001-03-23 Canon Inc 二波長反射防止膜
EP1148037A1 (de) * 2000-04-19 2001-10-24 Blösch Holding AG Herstellungsverfahren für eine Entspiegelungsschicht auf Uhrengläsern
US6833058B1 (en) * 2000-10-24 2004-12-21 Honeywell International Inc. Titanium-based and zirconium-based mixed materials and sputtering targets
JP3953922B2 (ja) * 2001-10-18 2007-08-08 日東電工株式会社 反射防止フィルム、光学素子および表示装置
US7247345B2 (en) * 2002-03-25 2007-07-24 Ulvac, Inc. Optical film thickness controlling method and apparatus, dielectric multilayer film and manufacturing apparatus thereof
JP4034979B2 (ja) * 2002-03-25 2008-01-16 株式会社アルバック 光学膜厚制御方法及び光学膜厚制御装置並びに該光学膜厚制御方法を用いて作製した誘電体薄膜
TW593725B (en) * 2002-04-30 2004-06-21 Prodisc Technology Inc Coating device and method
WO2003095695A2 (en) * 2002-05-06 2003-11-20 Guardian Industries Corp. Sputter coating apparatus including ion beam source(s), and corresponding method
JP3840170B2 (ja) * 2002-10-11 2006-11-01 外男 林 金属蒸着加工レンズの製造方法
JP3824993B2 (ja) * 2002-12-25 2006-09-20 株式会社シンクロン 薄膜の製造方法およびスパッタリング装置
DE10308471B4 (de) * 2003-02-20 2005-03-24 Hensoldt Ag Beschichtungsanlage zum Beschichten von Substraten für optische Komponenten
CN1764852A (zh) * 2003-03-24 2006-04-26 皇家飞利浦电子股份有限公司 灯
US6972136B2 (en) * 2003-05-23 2005-12-06 Optima, Inc. Ultra low residual reflection, low stress lens coating and vacuum deposition method for making the same
US7075103B2 (en) * 2003-12-19 2006-07-11 General Electric Company Multilayer device and method of making
US7128414B2 (en) * 2003-12-24 2006-10-31 Essilor International Compagnie Cenerale D'optique Methods for coating lenses
JP4858975B2 (ja) 2004-10-01 2012-01-18 Ｈｏｙａ株式会社 硝子体手術用コンタクトレンズ
CN2763819Y (zh) * 2004-12-17 2006-03-08 鸿富锦精密工业（深圳）有限公司 复合透镜
WO2007053772A1 (en) * 2005-11-05 2007-05-10 3M Innovative Properties Company Optical films comprising high refractive index and antireflective coatings
US8845866B2 (en) * 2005-12-22 2014-09-30 General Electric Company Optoelectronic devices having electrode films and methods and system for manufacturing the same
FR2896045B1 (fr) 2006-01-12 2008-02-08 Essilor Int Collection de couples de lentilles ophtalmiques et lentilles ophtalmiques a couleur de reflet residuel d'intensite differente
CN101041889B (zh) * 2006-03-21 2010-05-12 鸿富锦精密工业（深圳）有限公司 镀膜方法
US20070285778A1 (en) * 2006-06-13 2007-12-13 Walker Christopher B Optical films comprising high refractive index and antireflective coatings
US20070285779A1 (en) * 2006-06-13 2007-12-13 Walker Christopher B Optical films comprising high refractive index and antireflective coatings
KR100813460B1 (ko) * 2006-07-14 2008-03-13 (주)해빛정보 다층박막 증착에 의한 광학소자 제조방법
KR100862782B1 (ko) * 2007-04-11 2008-10-13 이노베이션 앤드 인피니티 글로벌 코포레이션 저저항 기능이 부여된 투과 가능한 도전층을 최외층으로하는 항반사 도포층
KR100862781B1 (ko) * 2007-04-11 2008-10-13 이노베이션 앤드 인피니티 글로벌 코포레이션 투과 가능한 표면 도전층을 갖는 저저항 광감쇠 반사 방지도포층
JP5248516B2 (ja) * 2007-09-28 2013-07-31 株式会社ニコン・エシロール 光学部品、及び光学部品の製造方法
US8968830B2 (en) * 2007-12-06 2015-03-03 Oerlikon Trading Ag, Trubbach PVD—vacuum coating unit
TWI450996B (zh) * 2009-05-15 2014-09-01 Hon Hai Prec Ind Co Ltd 鍍膜原料收容裝置
JP2011000710A (ja) * 2009-06-16 2011-01-06 Nidek Co Ltd 加飾シート、加飾シート成形体、及び加飾シートの製造方法
CN101806927B (zh) * 2010-02-25 2013-09-11 海洋王照明科技股份有限公司 一种高反膜及其制备方法
JP2012093689A (ja) 2010-09-29 2012-05-17 Nikon-Essilor Co Ltd 光学部品およびその製造方法
FR2968091B1 (fr) * 2010-11-26 2013-03-22 Saint Gobain Substrat transparent comportant un revetement antireflet
FR2968774B1 (fr) * 2010-12-10 2013-02-08 Essilor Int Article d'optique comportant un revetement antireflet a faible reflexion dans le domaine ultraviolet et le domaine visible
EP2682808B1 (en) * 2011-02-28 2023-08-16 Hoya Corporation Optical lens
JP6113412B2 (ja) * 2011-02-28 2017-04-12 Hoya株式会社 光学レンズの製造方法
US9335443B2 (en) 2011-04-15 2016-05-10 Qspex Technologies, Inc. Anti-reflective lenses and methods for manufacturing the same
US9042019B2 (en) * 2011-04-15 2015-05-26 Qspex Technologies, Inc. Anti-reflective lenses and methods for manufacturing the same
JP5893271B2 (ja) * 2011-06-10 2016-03-23 オリンパス株式会社 反射防止膜、光学系、及び光学機器
CN102955218A (zh) * 2011-08-31 2013-03-06 鸿富锦精密工业（深圳）有限公司 镜头模组
CN103176225A (zh) * 2011-12-22 2013-06-26 凤凰光学(上海)有限公司 一种高强度减反膜系结构
JP5625127B2 (ja) * 2012-02-17 2014-11-12 株式会社ニコン・エシロール 眼鏡レンズ用光学部品、およびその製造方法
WO2014069250A1 (ja) * 2012-11-05 2014-05-08 株式会社ニコン・エシロール 光学部品、光学部品の製造方法、及びゴースト光の定量方法
US9366784B2 (en) 2013-05-07 2016-06-14 Corning Incorporated Low-color scratch-resistant articles with a multilayer optical film
US9703011B2 (en) 2013-05-07 2017-07-11 Corning Incorporated Scratch-resistant articles with a gradient layer
US9359261B2 (en) 2013-05-07 2016-06-07 Corning Incorporated Low-color scratch-resistant articles with a multilayer optical film
US9684097B2 (en) 2013-05-07 2017-06-20 Corning Incorporated Scratch-resistant articles with retained optical properties
US9110230B2 (en) 2013-05-07 2015-08-18 Corning Incorporated Scratch-resistant articles with retained optical properties
JP6253009B2 (ja) * 2013-08-28 2017-12-27 東海光学株式会社 光学製品及び眼鏡レンズ
ES2536827B1 (es) * 2013-11-27 2015-12-18 Indo Optical S.L. Lente oftálmica que comprende una base de material polimérico con un recubrimiento con una estructura multicapa interferencial antireflejante, antiiridiscente y con filtro IR
WO2015101584A1 (en) * 2013-12-31 2015-07-09 Essilor International (Compagnie Generale D'optique) Multi-layer assembly and method for controlling layer thicknesses
JP6451057B2 (ja) * 2014-02-04 2019-01-16 東海光学株式会社 可視域反射防止近赤外域透過抑制光学製品並びに眼鏡レンズ及び眼鏡
US9291746B2 (en) 2014-02-25 2016-03-22 iCoat Company, LLC Visible spectrum anti-reflective coatings with reduced reflections in ultraviolet and infrared spectral bands
US11267973B2 (en) 2014-05-12 2022-03-08 Corning Incorporated Durable anti-reflective articles
US9335444B2 (en) 2014-05-12 2016-05-10 Corning Incorporated Durable and scratch-resistant anti-reflective articles
US9790593B2 (en) 2014-08-01 2017-10-17 Corning Incorporated Scratch-resistant materials and articles including the same
KR102244847B1 (ko) * 2014-12-31 2021-04-28 엘지디스플레이 주식회사 초집광 도광필름 및 이를 이용한 평판 표시장치용 박막형 백 라이트 유닛
EP3296800B1 (en) * 2015-05-11 2020-05-06 Nikon-Essilor Co., Ltd. Spectacle lens
CN111733389A (zh) * 2015-06-16 2020-10-02 施耐德两合公司 用于镜片覆层的装置
TWI744249B (zh) 2015-09-14 2021-11-01 美商康寧公司 高光穿透與抗刮抗反射物件
US10191305B2 (en) 2015-12-30 2019-01-29 Signet Armorlite, Inc. Ophthalmic lens
EP3242150B1 (en) * 2016-05-04 2019-01-02 Essilor International Optical article comprising an antireflective coating with a high reflection in the near infrared region (nir)
FR3058424B1 (fr) 2016-11-10 2022-06-10 Bnl Eurolens Installation de depot par evaporation d'un revetement sur des articles
DE102016125273A1 (de) 2016-12-14 2018-06-14 Schneider Gmbh & Co. Kg Anlage, Verfahren und Träger zur Beschichtung von Brillengläsern
JP2019015764A (ja) * 2017-07-03 2019-01-31 東海光学株式会社 プラスチック光学製品並びにプラスチック眼鏡レンズ及び眼鏡
CN109613637B (zh) * 2017-09-30 2021-10-26 张家港康得新光电材料有限公司 装饰膜
CN114085038A (zh) 2018-08-17 2022-02-25 康宁股份有限公司 具有薄的耐久性减反射结构的无机氧化物制品
RU188584U1 (ru) * 2018-09-24 2019-04-17 федеральное государственное бюджетное образовательное учреждение высшего образования "Омский государственный университет им. Ф.М. Достоевского" Устройство для изготовления нанометровых прозрачных пленок
EP3722451A1 (de) 2019-04-09 2020-10-14 FRAUNHOFER-GESELLSCHAFT zur Förderung der angewandten Forschung e.V. Vorrichtung und verfahren zur beschichtung von substraten mit planaren oder geformten oberflächen mittels magnetron-sputtern
CN110735121B (zh) * 2019-11-21 2022-03-29 江苏北方湖光光电有限公司 一种基于磁控溅射的非常规折射率混合薄膜制备方法
KR102323720B1 (ko) * 2020-03-19 2021-11-09 (주)도 은 근적외선 차단용 반사 방지층을 갖는 안경렌즈
WO2021220513A1 (ja) * 2020-05-01 2021-11-04 株式会社ニコン・エシロール 光学部材
KR102243076B1 (ko) * 2020-10-07 2021-04-21 최준석 시력 보정 패턴이 적용된 렌즈 및 제조방법
CN112526663A (zh) * 2020-11-04 2021-03-19 浙江大学 一种基于原子层沉积的吸收膜及其制作方法
CN113314849A (zh) * 2021-04-20 2021-08-27 上海海事大学 一种超材料宽带吸波体周期单元及超材料宽带吸波体
CN113684461A (zh) * 2021-08-16 2021-11-23 上海济物光电技术有限公司 一种具有面形修正能力的sic反射镜表面改性工艺方法

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5666802A (en) 1979-11-05 1981-06-05 Seiko Epson Corp Antireflection film of optical parts made of synthetic resin
JPS56113101A (en) 1980-02-14 1981-09-05 Asahi Glass Co Ltd Plastic article on which reflection preventive layer has been formed
US4609267A (en) * 1980-12-22 1986-09-02 Seiko Epson Corporation Synthetic resin lens and antireflection coating
JPS57124301A (en) * 1981-01-27 1982-08-03 Asahi Glass Co Ltd Highly durable multilayered film containing silicon oxide film
JPS58107484A (ja) 1981-12-19 1983-06-27 Olympus Optical Co Ltd 薄膜形成装置における反転式蒸着装置
JPH0642003B2 (ja) 1983-09-20 1994-06-01 オリンパス光学工業株式会社 光学部品の反射防止膜とその形成方法
JPS6273202A (ja) * 1985-09-27 1987-04-03 Hamamatsu Photonics Kk 光学薄膜の製造方法
JPS63217302A (ja) 1987-03-06 1988-09-09 Nikon Corp 多層光学素子
US5605609A (en) * 1988-03-03 1997-02-25 Asahi Glass Company Ltd. Method for forming low refractive index film comprising silicon dioxide
JPH0258002A (ja) 1988-08-24 1990-02-27 Sony Corp 光学レンズ
JPH03102301A (ja) 1989-09-18 1991-04-26 Kuraray Co Ltd 反射防止膜の特性評価方法および設計方法
JP3259914B2 (ja) 1990-07-25 2002-02-25 佐野富士光機株式会社 干渉膜形成用網目フィルタの製造方法及び干渉膜形成装置
JPH04202773A (ja) 1990-11-30 1992-07-23 Iwasaki Electric Co Ltd 成膜方法及びこの方法に使用する補正体
JP2971586B2 (ja) 1990-12-21 1999-11-08 株式会社リコー 薄膜形成装置
JPH05188202A (ja) * 1992-01-10 1993-07-30 Canon Inc 多層光学薄膜
JP3254782B2 (ja) 1992-02-18 2002-02-12 株式会社日立製作所 両面スパッタ成膜方法及びその装置並びにスパッタ成膜システム
JP3412849B2 (ja) 1992-12-25 2003-06-03 キヤノン株式会社 薄膜蒸着装置
JP3768547B2 (ja) 1993-12-17 2006-04-19 キヤノン株式会社 両面成膜方法
JPH0875902A (ja) * 1994-09-07 1996-03-22 Canon Inc 多層反射防止膜
JP3102301B2 (ja) 1995-05-24 2000-10-23 株式会社日立製作所 半導体記憶装置
US5923471A (en) * 1996-11-26 1999-07-13 Deposition Sciences, Inc. Optical interference coating capable of withstanding severe temperature environments

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100445773C (zh) * 2004-12-03 2008-12-24 鸿富锦精密工业（深圳）有限公司 数码相机用透镜制造方法

Also Published As

Publication number Publication date
WO1998052074A1 (fr) 1998-11-19
CN1239924C (zh) 2006-02-01
EP0928977A1 (en) 1999-07-14
AU741691C (en) 2004-08-12
AU7238798A (en) 1998-12-08
KR20000023795A (ko) 2000-04-25
US6250758B1 (en) 2001-06-26
EP0928977A4 (en) 2000-01-05
CN1226970A (zh) 1999-08-25
AU741691B2 (en) 2001-12-06
CN1480744A (zh) 2004-03-10

Similar Documents

Publication Publication Date Title
CN1130575C (zh) 具有抗反射膜的塑料光学器件以及用来使抗反射膜的厚度均一的机构
KR101902669B1 (ko) 플라스틱 기판용 장식 코팅
CN103197361B (zh) 抗反射涂层及其制造方法
CN1075198C (zh) 一种滤光装置
US20080049431A1 (en) Light emitting device including anti-reflection layer(s)
CN1277128C (zh) 带有抗反射膜的光学元件的生产方法
CN108521766A (zh) 包含屏幕区的透明层状元件
CN1766679A (zh) 起偏器及其制造方法
JP3975242B2 (ja) 反射防止膜を有するプラスチック光学部品
CN1022580C (zh) 一种含有氮氧化钛膜的喷镀膜制品
JP4796264B2 (ja) 表面ミラーコーティングを備える光学エレメントおよびこのコーティングを形成する方法
CN1741972A (zh) 具有金红石结构的氧化钛－铝和/或氧化铝透明涂层
CN1226973A (zh) 将光学镜片底料设定于支座上的机构
CN112281125A (zh) 复合金属薄膜及其制备方法和应用
EP1889941B1 (en) Metal multi-layered film structure and method of manufacturing and use of the same
CN1755398A (zh) 有抗反射膜的塑料光学器件和使抗反射膜厚度均一的机构
CN1741970A (zh) 透明氧化锆－钽和/或氧化钽涂层
JP2010257714A (ja) 車両用灯具、車両用灯具のレンズ、および、その製造方法
TWI417565B (zh) 在一基質上之耐擦拭的反射器用的層系統和其製造方法
AU774079B2 (en) Plastic optical devices having antireflection film and mechanism for equalizing thickness of antireflection film
JP6928309B2 (ja) 反射鏡の製造方法
CN111338007A (zh) 一种防反射膜及其制备方法
JPH1130705A (ja) 反射防止膜を有する眼鏡プラスチックレンズ
CN107479122A (zh) 一种有色渐变减光镜及其制造方法
CN106048526A (zh) 氮化锌膜、触摸屏盖板及膜的制备方法、应用

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C56 Change in the name or address of the patentee

Owner name: HOYA CO., LTD.

Free format text: FORMER NAME OR ADDRESS: HOYA CORP.

CP01 Change in the name or title of a patent holder

Patentee after: HOYA Corporation

Patentee before: Hoya Corp.

CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20031210

Termination date: 20170518