WO1998052074A1 - Composant optique en plastique pourvu d'une pellicule empechant la reflexion et mecanisme servant a uniformiser l'epaisseur de cette pellicule - Google Patents

Composant optique en plastique pourvu d'une pellicule empechant la reflexion et mecanisme servant a uniformiser l'epaisseur de cette pellicule Download PDF

Info

Publication number
WO1998052074A1
WO1998052074A1 PCT/JP1998/002177 JP9802177W WO9852074A1 WO 1998052074 A1 WO1998052074 A1 WO 1998052074A1 JP 9802177 W JP9802177 W JP 9802177W WO 9852074 A1 WO9852074 A1 WO 9852074A1
Authority
WO
WIPO (PCT)
Prior art keywords
reflection prevention
prevention film
film thickness
film
optical component
Prior art date
Application number
PCT/JP1998/002177
Other languages
English (en)
French (fr)
Inventor
Masaaki Yoshihara
Hitoshi Kamura
Hajime Kamiya
Original Assignee
Hoya Kabushiki Kaisha
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP14317597A external-priority patent/JP4345869B2/ja
Priority claimed from JP17309697A external-priority patent/JP3975242B2/ja
Priority claimed from JP17309897A external-priority patent/JP4166845B2/ja
Application filed by Hoya Kabushiki Kaisha filed Critical Hoya Kabushiki Kaisha
Priority to EP98919637A priority Critical patent/EP0928977A4/en
Priority to US09/230,031 priority patent/US6250758B1/en
Priority to AU72387/98A priority patent/AU741691C/en
Publication of WO1998052074A1 publication Critical patent/WO1998052074A1/ja

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
PCT/JP1998/002177 1997-05-16 1998-05-18 Composant optique en plastique pourvu d'une pellicule empechant la reflexion et mecanisme servant a uniformiser l'epaisseur de cette pellicule WO1998052074A1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP98919637A EP0928977A4 (en) 1997-05-16 1998-05-18 PLASTIC OPTICAL COMPONENT WITH A REFLECTION-PREVENTING FILM AND MECHANISM FOR THE SAME-SHAPED FILM THICKNESS PRODUCTION OF THIS FILM
US09/230,031 US6250758B1 (en) 1997-05-16 1998-05-18 Plastic optical devices having antireflection film and mechanism for equalizing thickness of antireflection film
AU72387/98A AU741691C (en) 1997-05-16 1998-05-18 Plastic optical component having a reflection prevention film and mechanism for making reflection prevention film thickness uniform

Applications Claiming Priority (10)

Application Number Priority Date Filing Date Title
JP14317397 1997-05-16
JP9/143180 1997-05-16
JP9/143173 1997-05-16
JP9/143175 1997-05-16
JP14318097 1997-05-16
JP14317597A JP4345869B2 (ja) 1997-05-16 1997-05-16 スパッタ成膜用の膜厚補正機構
JP9/173098 1997-06-13
JP17309697A JP3975242B2 (ja) 1997-05-16 1997-06-13 反射防止膜を有するプラスチック光学部品
JP17309897A JP4166845B2 (ja) 1997-05-16 1997-06-13 反射防止膜を有する眼鏡プラスチックレンズ
JP9/173096 1997-06-13

Publications (1)

Publication Number Publication Date
WO1998052074A1 true WO1998052074A1 (fr) 1998-11-19

Family

ID=27527668

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP1998/002177 WO1998052074A1 (fr) 1997-05-16 1998-05-18 Composant optique en plastique pourvu d'une pellicule empechant la reflexion et mecanisme servant a uniformiser l'epaisseur de cette pellicule

Country Status (6)

Country Link
US (1) US6250758B1 (ja)
EP (1) EP0928977A4 (ja)
KR (1) KR20000023795A (ja)
CN (2) CN1130575C (ja)
AU (1) AU741691C (ja)
WO (1) WO1998052074A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007053772A1 (en) * 2005-11-05 2007-05-10 3M Innovative Properties Company Optical films comprising high refractive index and antireflective coatings

Families Citing this family (76)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001074904A (ja) * 1999-09-02 2001-03-23 Canon Inc 二波長反射防止膜
EP1148037A1 (de) * 2000-04-19 2001-10-24 Blösch Holding AG Herstellungsverfahren für eine Entspiegelungsschicht auf Uhrengläsern
US6833058B1 (en) 2000-10-24 2004-12-21 Honeywell International Inc. Titanium-based and zirconium-based mixed materials and sputtering targets
JP3953922B2 (ja) * 2001-10-18 2007-08-08 日東電工株式会社 反射防止フィルム、光学素子および表示装置
US7247345B2 (en) * 2002-03-25 2007-07-24 Ulvac, Inc. Optical film thickness controlling method and apparatus, dielectric multilayer film and manufacturing apparatus thereof
JP4034979B2 (ja) * 2002-03-25 2008-01-16 株式会社アルバック 光学膜厚制御方法及び光学膜厚制御装置並びに該光学膜厚制御方法を用いて作製した誘電体薄膜
TW593725B (en) * 2002-04-30 2004-06-21 Prodisc Technology Inc Coating device and method
US7198699B2 (en) * 2002-05-06 2007-04-03 Guardian Industries Corp. Sputter coating apparatus including ion beam source(s), and corresponding method
JP3840170B2 (ja) * 2002-10-11 2006-11-01 外男 林 金属蒸着加工レンズの製造方法
JP3824993B2 (ja) * 2002-12-25 2006-09-20 株式会社シンクロン 薄膜の製造方法およびスパッタリング装置
DE10308471B4 (de) * 2003-02-20 2005-03-24 Hensoldt Ag Beschichtungsanlage zum Beschichten von Substraten für optische Komponenten
EP1616206A2 (en) * 2003-03-24 2006-01-18 Philips Intellectual Property & Standards GmbH Lamp
US6972136B2 (en) 2003-05-23 2005-12-06 Optima, Inc. Ultra low residual reflection, low stress lens coating and vacuum deposition method for making the same
US7075103B2 (en) * 2003-12-19 2006-07-11 General Electric Company Multilayer device and method of making
US7128414B2 (en) * 2003-12-24 2006-10-31 Essilor International Compagnie Cenerale D'optique Methods for coating lenses
US8007105B2 (en) 2004-10-01 2011-08-30 Hoya Corporation Lens for intraocular observation and contact lens for vitreous surgery
CN100445773C (zh) * 2004-12-03 2008-12-24 鸿富锦精密工业（深圳）有限公司 数码相机用透镜制造方法
CN2763819Y (zh) * 2004-12-17 2006-03-08 鸿富锦精密工业（深圳）有限公司 复合透镜
US8845866B2 (en) * 2005-12-22 2014-09-30 General Electric Company Optoelectronic devices having electrode films and methods and system for manufacturing the same
FR2896045B1 (fr) * 2006-01-12 2008-02-08 Essilor Int Collection de couples de lentilles ophtalmiques et lentilles ophtalmiques a couleur de reflet residuel d'intensite differente
CN101041889B (zh) * 2006-03-21 2010-05-12 鸿富锦精密工业（深圳）有限公司 镀膜方法
US20070285778A1 (en) * 2006-06-13 2007-12-13 Walker Christopher B Optical films comprising high refractive index and antireflective coatings
US20070285779A1 (en) * 2006-06-13 2007-12-13 Walker Christopher B Optical films comprising high refractive index and antireflective coatings
KR100813460B1 (ko) * 2006-07-14 2008-03-13 (주)해빛정보 다층박막 증착에 의한 광학소자 제조방법
KR100862782B1 (ko) * 2007-04-11 2008-10-13 이노베이션 앤드 인피니티 글로벌 코포레이션 저저항 기능이 부여된 투과 가능한 도전층을 최외층으로하는 항반사 도포층
KR100862781B1 (ko) * 2007-04-11 2008-10-13 이노베이션 앤드 인피니티 글로벌 코포레이션 투과 가능한 표면 도전층을 갖는 저저항 광감쇠 반사 방지도포층
JP5248516B2 (ja) * 2007-09-28 2013-07-31 株式会社ニコン・エシロール 光学部品、及び光学部品の製造方法
US8968830B2 (en) * 2007-12-06 2015-03-03 Oerlikon Trading Ag, Trubbach PVD—vacuum coating unit
TWI450996B (zh) * 2009-05-15 2014-09-01 Hon Hai Prec Ind Co Ltd 鍍膜原料收容裝置
JP2011000710A (ja) * 2009-06-16 2011-01-06 Nidek Co Ltd 加飾シート、加飾シート成形体、及び加飾シートの製造方法
CN101806927B (zh) * 2010-02-25 2013-09-11 海洋王照明科技股份有限公司 一种高反膜及其制备方法
JP2012093689A (ja) 2010-09-29 2012-05-17 Nikon-Essilor Co Ltd 光学部品およびその製造方法
FR2968091B1 (fr) * 2010-11-26 2013-03-22 Saint Gobain Substrat transparent comportant un revetement antireflet
FR2968774B1 (fr) 2010-12-10 2013-02-08 Essilor Int Article d'optique comportant un revetement antireflet a faible reflexion dans le domaine ultraviolet et le domaine visible
WO2012118089A1 (ja) * 2011-02-28 2012-09-07 Hoya株式会社 光学レンズの製造方法
CN103502878B (zh) * 2011-02-28 2016-01-20 Hoya株式会社 光学透镜
US9335443B2 (en) 2011-04-15 2016-05-10 Qspex Technologies, Inc. Anti-reflective lenses and methods for manufacturing the same
US9042019B2 (en) 2011-04-15 2015-05-26 Qspex Technologies, Inc. Anti-reflective lenses and methods for manufacturing the same
JP5893271B2 (ja) * 2011-06-10 2016-03-23 オリンパス株式会社 反射防止膜、光学系、及び光学機器
CN102955218A (zh) * 2011-08-31 2013-03-06 鸿富锦精密工业（深圳）有限公司 镜头模组
CN103176225A (zh) * 2011-12-22 2013-06-26 凤凰光学(上海)有限公司 一种高强度减反膜系结构
CN104115037B (zh) * 2012-02-17 2016-03-02 株式会社尼康依视路 光学部件、眼镜透镜及其制造方法
CN104838305A (zh) * 2012-11-05 2015-08-12 株式会社尼康依视路 光学元件、光学元件的制造方法、及重影光的定量方法
US9110230B2 (en) 2013-05-07 2015-08-18 Corning Incorporated Scratch-resistant articles with retained optical properties
US9684097B2 (en) 2013-05-07 2017-06-20 Corning Incorporated Scratch-resistant articles with retained optical properties
US9359261B2 (en) 2013-05-07 2016-06-07 Corning Incorporated Low-color scratch-resistant articles with a multilayer optical film
US9703011B2 (en) 2013-05-07 2017-07-11 Corning Incorporated Scratch-resistant articles with a gradient layer
US9366784B2 (en) 2013-05-07 2016-06-14 Corning Incorporated Low-color scratch-resistant articles with a multilayer optical film
JP6253009B2 (ja) * 2013-08-28 2017-12-27 東海光学株式会社 光学製品及び眼鏡レンズ
ES2536827B1 (es) * 2013-11-27 2015-12-18 Indo Optical S.L. Lente oftálmica que comprende una base de material polimérico con un recubrimiento con una estructura multicapa interferencial antireflejante, antiiridiscente y con filtro IR
EP3090072B1 (en) * 2013-12-31 2019-02-20 Essilor International Multi-layer assembly and method of coating
JP6451057B2 (ja) * 2014-02-04 2019-01-16 東海光学株式会社 可視域反射防止近赤外域透過抑制光学製品並びに眼鏡レンズ及び眼鏡
US9291746B2 (en) 2014-02-25 2016-03-22 iCoat Company, LLC Visible spectrum anti-reflective coatings with reduced reflections in ultraviolet and infrared spectral bands
US11267973B2 (en) 2014-05-12 2022-03-08 Corning Incorporated Durable anti-reflective articles
US9335444B2 (en) 2014-05-12 2016-05-10 Corning Incorporated Durable and scratch-resistant anti-reflective articles
US9790593B2 (en) 2014-08-01 2017-10-17 Corning Incorporated Scratch-resistant materials and articles including the same
KR102244847B1 (ko) * 2014-12-31 2021-04-28 엘지디스플레이 주식회사 초집광 도광필름 및 이를 이용한 평판 표시장치용 박막형 백 라이트 유닛
WO2016181932A1 (ja) * 2015-05-11 2016-11-17 株式会社ニコン・エシロール 眼鏡レンズ
EP3868917A1 (de) * 2015-06-16 2021-08-25 Schneider GmbH & Co. KG Vorrichtung, verfahren und verwendung zur beschichtung von linsen
EP3300520B1 (en) 2015-09-14 2020-11-25 Corning Incorporated High light transmission and scratch-resistant anti-reflective articles
US10191305B2 (en) 2015-12-30 2019-01-29 Signet Armorlite, Inc. Ophthalmic lens
EP3242150B1 (en) * 2016-05-04 2019-01-02 Essilor International Optical article comprising an antireflective coating with a high reflection in the near infrared region (nir)
FR3058424B1 (fr) 2016-11-10 2022-06-10 Bnl Eurolens Installation de depot par evaporation d'un revetement sur des articles
DE102016125278A1 (de) 2016-12-14 2018-06-14 Schneider Gmbh & Co. Kg Vorrichtung, Verfahren und Verwendung zur Beschichtung von Linsen
JP2019015764A (ja) * 2017-07-03 2019-01-31 東海光学株式会社 プラスチック光学製品並びにプラスチック眼鏡レンズ及び眼鏡
CN109613637B (zh) * 2017-09-30 2021-10-26 张家港康得新光电材料有限公司 装饰膜
CN111094200B (zh) 2018-08-17 2022-01-07 康宁股份有限公司 具有薄的耐久性减反射结构的无机氧化物制品
RU188584U1 (ru) * 2018-09-24 2019-04-17 федеральное государственное бюджетное образовательное учреждение высшего образования "Омский государственный университет им. Ф.М. Достоевского" Устройство для изготовления нанометровых прозрачных пленок
EP3722451A1 (de) 2019-04-09 2020-10-14 FRAUNHOFER-GESELLSCHAFT zur Förderung der angewandten Forschung e.V. Vorrichtung und verfahren zur beschichtung von substraten mit planaren oder geformten oberflächen mittels magnetron-sputtern
CN110735121B (zh) * 2019-11-21 2022-03-29 江苏北方湖光光电有限公司 一种基于磁控溅射的非常规折射率混合薄膜制备方法
KR102323720B1 (ko) * 2020-03-19 2021-11-09 (주)도 은 근적외선 차단용 반사 방지층을 갖는 안경렌즈
EP4145186A4 (en) * 2020-05-01 2024-01-24 Nikon-Essilor Co., Ltd. OPTICAL ELEMENT
KR102243076B1 (ko) * 2020-10-07 2021-04-21 최준석 시력 보정 패턴이 적용된 렌즈 및 제조방법
CN112526663A (zh) * 2020-11-04 2021-03-19 浙江大学 一种基于原子层沉积的吸收膜及其制作方法
CN113314849A (zh) * 2021-04-20 2021-08-27 上海海事大学 一种超材料宽带吸波体周期单元及超材料宽带吸波体
CN113684461A (zh) * 2021-08-16 2021-11-23 上海济物光电技术有限公司 一种具有面形修正能力的sic反射镜表面改性工艺方法

Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5666802A (en) * 1979-11-05 1981-06-05 Seiko Epson Corp Antireflection film of optical parts made of synthetic resin
JPS56113101A (en) * 1980-02-14 1981-09-05 Asahi Glass Co Ltd Plastic article on which reflection preventive layer has been formed
JPS57124301A (en) * 1981-01-27 1982-08-03 Asahi Glass Co Ltd Highly durable multilayered film containing silicon oxide film
JPS58107484A (ja) * 1981-12-19 1983-06-27 Olympus Optical Co Ltd 薄膜形成装置における反転式蒸着装置
JPS6064301A (ja) * 1983-09-20 1985-04-12 Olympus Optical Co Ltd 光学部品の反射防止膜とその形成方法
JPS6273202A (ja) * 1985-09-27 1987-04-03 Hamamatsu Photonics Kk 光学薄膜の製造方法
JPS63217302A (ja) * 1987-03-06 1988-09-09 Nikon Corp 多層光学素子
JPH0258002A (ja) * 1988-08-24 1990-02-27 Sony Corp 光学レンズ
JPH03102301A (ja) * 1989-09-18 1991-04-26 Kuraray Co Ltd 反射防止膜の特性評価方法および設計方法
JPH0481802A (ja) * 1990-07-25 1992-03-16 Sano Fuji Koki Kk 干渉膜形成用網目フィルタの製造方法及び干渉膜形成装置
JPH04202773A (ja) * 1990-11-30 1992-07-23 Iwasaki Electric Co Ltd 成膜方法及びこの方法に使用する補正体
JPH04221061A (ja) * 1990-12-21 1992-08-11 Ricoh Co Ltd 薄膜形成装置
JPH05295538A (ja) * 1992-02-18 1993-11-09 Hitachi Ltd 両面スパッタ成膜方法及びその装置
JPH06192835A (ja) * 1992-12-25 1994-07-12 Canon Inc 薄膜蒸着装置
JPH07173620A (ja) * 1993-12-17 1995-07-11 Canon Inc 両面成膜方法およびその装置
JPH0875902A (ja) * 1994-09-07 1996-03-22 Canon Inc 多層反射防止膜

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4609267A (en) * 1980-12-22 1986-09-02 Seiko Epson Corporation Synthetic resin lens and antireflection coating
US5605609A (en) * 1988-03-03 1997-02-25 Asahi Glass Company Ltd. Method for forming low refractive index film comprising silicon dioxide
JPH05188202A (ja) * 1992-01-10 1993-07-30 Canon Inc 多層光学薄膜
JP3102301B2 (ja) 1995-05-24 2000-10-23 株式会社日立製作所 半導体記憶装置
US5923471A (en) * 1996-11-26 1999-07-13 Deposition Sciences, Inc. Optical interference coating capable of withstanding severe temperature environments

Patent Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5666802A (en) * 1979-11-05 1981-06-05 Seiko Epson Corp Antireflection film of optical parts made of synthetic resin
JPS56113101A (en) * 1980-02-14 1981-09-05 Asahi Glass Co Ltd Plastic article on which reflection preventive layer has been formed
JPS57124301A (en) * 1981-01-27 1982-08-03 Asahi Glass Co Ltd Highly durable multilayered film containing silicon oxide film
JPS58107484A (ja) * 1981-12-19 1983-06-27 Olympus Optical Co Ltd 薄膜形成装置における反転式蒸着装置
JPS6064301A (ja) * 1983-09-20 1985-04-12 Olympus Optical Co Ltd 光学部品の反射防止膜とその形成方法
JPS6273202A (ja) * 1985-09-27 1987-04-03 Hamamatsu Photonics Kk 光学薄膜の製造方法
JPS63217302A (ja) * 1987-03-06 1988-09-09 Nikon Corp 多層光学素子
JPH0258002A (ja) * 1988-08-24 1990-02-27 Sony Corp 光学レンズ
JPH03102301A (ja) * 1989-09-18 1991-04-26 Kuraray Co Ltd 反射防止膜の特性評価方法および設計方法
JPH0481802A (ja) * 1990-07-25 1992-03-16 Sano Fuji Koki Kk 干渉膜形成用網目フィルタの製造方法及び干渉膜形成装置
JPH04202773A (ja) * 1990-11-30 1992-07-23 Iwasaki Electric Co Ltd 成膜方法及びこの方法に使用する補正体
JPH04221061A (ja) * 1990-12-21 1992-08-11 Ricoh Co Ltd 薄膜形成装置
JPH05295538A (ja) * 1992-02-18 1993-11-09 Hitachi Ltd 両面スパッタ成膜方法及びその装置
JPH06192835A (ja) * 1992-12-25 1994-07-12 Canon Inc 薄膜蒸着装置
JPH07173620A (ja) * 1993-12-17 1995-07-11 Canon Inc 両面成膜方法およびその装置
JPH0875902A (ja) * 1994-09-07 1996-03-22 Canon Inc 多層反射防止膜

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP0928977A4 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007053772A1 (en) * 2005-11-05 2007-05-10 3M Innovative Properties Company Optical films comprising high refractive index and antireflective coatings

Also Published As

Publication number Publication date
AU7238798A (en) 1998-12-08
KR20000023795A (ko) 2000-04-25
CN1226970A (zh) 1999-08-25
CN1480744A (zh) 2004-03-10
AU741691B2 (en) 2001-12-06
CN1239924C (zh) 2006-02-01
EP0928977A1 (en) 1999-07-14
US6250758B1 (en) 2001-06-26
CN1130575C (zh) 2003-12-10
AU741691C (en) 2004-08-12
EP0928977A4 (en) 2000-01-05

Similar Documents

Publication Publication Date Title
WO1998052074A1 (fr) Composant optique en plastique pourvu d'une pellicule empechant la reflexion et mecanisme servant a uniformiser l'epaisseur de cette pellicule
US4729068A (en) Light diffusing device
WO2006039315A3 (en) Light redirecting films including optical elements
SG43196A1 (en) Multiple data surface optical medium and storage system
NO942976D0 (no) Transparente substrater med et antall tynne sjikt samt anvendelse derav for termisk og/eller solar beskyttelse
CA2070094A1 (en) Reflector
US7614773B2 (en) Light guide plate and liquid crystal display device having the same
CA2061602A1 (en) Process for producing plastic lens
EP1449641A4 (en) COATED COATED ARTICLES AND THESE USE OF COATED FUNCTIONAL ARTICLES COATED WITH COATING COATINGS
TW263613B (en) Uniform film thickness deposition of sputtered materials
EP0867874A3 (en) Optical recording medium having dual information surfaces
WO2002071104A3 (en) Image display generator for a head-up display
CA2017259A1 (en) Transparencies
EP0548968A3 (en) Optical recording element having durability enhancing layer
AU7666098A (en) Film or coating deposition on a substrate
EP1040914A4 (en) LAMINATE THIN SHEET WHICH CAN PREVENT THE BREAKING EFFECT OF A GLASS
EP0739001A3 (en) Deposition of insulating thin film by plurality of ion beams
EP0855702A3 (en) Optical disc
CA2254650A1 (en) Sputtering method and apparatus with optical monitoring
BR9906165A (pt) Sistema de camadas que refletem os raios térmicos para substratos transparentes, filme polimérico flexìvel, e, vidraça laminada
US5911861A (en) Coating station
CA2134140A1 (en) Multiple Data Surface Optical Data Storage System
EP0908532A3 (en) Ion beam sputtering system
AU1210788A (en) Substrates for supporting electrical tracks and/or components
KR20060129308A (ko) 광반사체용 기재 및 광반사체

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 98800651.0

Country of ref document: CN

AK Designated states

Kind code of ref document: A1

Designated state(s): AU CN KR US

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE

WWE Wipo information: entry into national phase

Ref document number: 1998919637

Country of ref document: EP

Ref document number: 1019997000279

Country of ref document: KR

WWE Wipo information: entry into national phase

Ref document number: 72387/98

Country of ref document: AU

WWE Wipo information: entry into national phase

Ref document number: 09230031

Country of ref document: US

121 Ep: the epo has been informed by wipo that ep was designated in this application
WWP Wipo information: published in national office

Ref document number: 1998919637

Country of ref document: EP

WWP Wipo information: published in national office

Ref document number: 1019997000279

Country of ref document: KR

WWG Wipo information: grant in national office

Ref document number: 72387/98

Country of ref document: AU

WWR Wipo information: refused in national office

Ref document number: 1019997000279

Country of ref document: KR