CN109994392B - 连接方法及接合体 - Google Patents
连接方法及接合体 Download PDFInfo
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- CN109994392B CN109994392B CN201910412779.0A CN201910412779A CN109994392B CN 109994392 B CN109994392 B CN 109994392B CN 201910412779 A CN201910412779 A CN 201910412779A CN 109994392 B CN109994392 B CN 109994392B
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- ceramic substrate
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- anisotropic conductive
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- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/321—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
- H05K3/323—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives by applying an anisotropic conductive adhesive layer over an array of pads
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- H01L2224/294—Coating material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29438—Coating material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
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- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
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- H01L2224/294—Coating material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29438—Coating material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
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- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
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- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/75—Apparatus for connecting with bump connectors or layer connectors
- H01L2224/7525—Means for applying energy, e.g. heating means
- H01L2224/75252—Means for applying energy, e.g. heating means in the upper part of the bonding apparatus, e.g. in the bonding head
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- H01L2224/75—Apparatus for connecting with bump connectors or layer connectors
- H01L2224/7525—Means for applying energy, e.g. heating means
- H01L2224/753—Means for applying energy, e.g. heating means by means of pressure
- H01L2224/75301—Bonding head
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- H01L2224/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
- H01L2224/819—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector with the bump connector not providing any mechanical bonding
- H01L2224/81901—Pressing the bump connector against the bonding areas by means of another connector
- H01L2224/81903—Pressing the bump connector against the bonding areas by means of another connector by means of a layer connector
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- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8319—Arrangement of the layer connectors prior to mounting
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- H01L2224/832—Applying energy for connecting
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- H01L2224/83203—Thermocompression bonding, e.g. diffusion bonding, pressure joining, thermocompression welding or solid-state welding
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- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/8385—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
- H01L2224/83851—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester being an anisotropic conductive adhesive
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- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/1515—Shape
- H01L2924/15158—Shape the die mounting substrate being other than a cuboid
- H01L2924/15159—Side view
Landscapes
- Engineering & Computer Science (AREA)
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- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Wire Bonding (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
- Non-Insulated Conductors (AREA)
- Manufacturing Of Electrical Connectors (AREA)
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CN201910412779.0A CN109994392B (zh) | 2014-01-08 | 2015-01-06 | 连接方法及接合体 |
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JP2014001704A JP6425382B2 (ja) | 2014-01-08 | 2014-01-08 | 接続方法、及び接合体 |
CN201580003741.8A CN106063391B (zh) | 2014-01-08 | 2015-01-06 | 连接方法及接合体 |
PCT/JP2015/050140 WO2015105098A1 (ja) | 2014-01-08 | 2015-01-06 | 接続方法、及び接合体 |
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US20220181369A1 (en) | 2019-03-08 | 2022-06-09 | Dexerials Corporation | Method of manufacturing connection structure, connection structure, film structure, and method of manufacturing film structure |
JP2020198422A (ja) | 2019-03-08 | 2020-12-10 | デクセリアルズ株式会社 | 接続構造体の製造方法、及び接続構造体、並びにフィルム構造体、及びフィルム構造体の製造方法 |
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CN101542721A (zh) * | 2007-01-26 | 2009-09-23 | 日立化成工业株式会社 | 密封用膜及使用其的半导体装置 |
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JP2750473B2 (ja) * | 1990-10-02 | 1998-05-13 | イビデン株式会社 | 電子部品搭載用基板 |
JPH11186727A (ja) * | 1997-12-22 | 1999-07-09 | Kyocera Corp | 配線基板およびその製造方法 |
US7247381B1 (en) * | 1998-08-13 | 2007-07-24 | Hitachi Chemical Company, Ltd. | Adhesive for bonding circuit members, circuit board, and method of producing the same |
CN1310835A (zh) * | 1999-05-31 | 2001-08-29 | 西铁城钟表公司 | 电气连接结构和平面显示装置 |
JP4535411B2 (ja) | 2000-06-30 | 2010-09-01 | 日東電工株式会社 | アクリル系熱硬化型接着剤および接着シート類 |
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JP2002146325A (ja) | 2000-11-16 | 2002-05-22 | Hitachi Chem Co Ltd | 接着剤組成物とそれを用いた接着部材と半導体搭載用基板と半導体装置 |
JP2003238925A (ja) | 2002-02-19 | 2003-08-27 | Hitachi Chem Co Ltd | 接着剤組成物、接着フィルム |
JP4697600B2 (ja) * | 2006-06-01 | 2011-06-08 | Tdk株式会社 | 複合配線基板の製造方法 |
CN101724361B (zh) * | 2008-12-30 | 2011-12-07 | 四川虹欧显示器件有限公司 | 各向异性导电胶和导电膜以及电连接方法 |
JP5668636B2 (ja) * | 2010-08-24 | 2015-02-12 | 日立化成株式会社 | 回路接続構造体の製造方法 |
WO2012073739A1 (ja) * | 2010-11-29 | 2012-06-07 | シャープ株式会社 | 基板モジュール |
JP5643623B2 (ja) | 2010-12-02 | 2014-12-17 | デクセリアルズ株式会社 | 異方性導電材料及びその製造方法 |
JP5703061B2 (ja) * | 2011-02-23 | 2015-04-15 | 積水化学工業株式会社 | 接続構造体の製造方法 |
JP6099297B2 (ja) * | 2011-03-29 | 2017-03-22 | 株式会社アドマテックス | 無機粉体混合物及びフィラー含有組成物 |
CN103765865A (zh) * | 2011-08-19 | 2014-04-30 | 富士胶片株式会社 | 摄像元件模块及其制造方法 |
JP5678950B2 (ja) * | 2012-01-06 | 2015-03-04 | Tdk株式会社 | ガラスセラミックス焼結体及び配線基板 |
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CN101542721A (zh) * | 2007-01-26 | 2009-09-23 | 日立化成工业株式会社 | 密封用膜及使用其的半导体装置 |
CN101276661A (zh) * | 2007-03-27 | 2008-10-01 | 富士胶片株式会社 | 各向异性导电性部件及其制造方法 |
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TWI684393B (zh) | 2020-02-01 |
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WO2015105098A1 (ja) | 2015-07-16 |
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JP6425382B2 (ja) | 2018-11-21 |
TW201536142A (zh) | 2015-09-16 |
KR102275926B1 (ko) | 2021-07-12 |
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