CN105954982B - 物体处理装置、曝光装置及曝光方法、以及元件制造方法 - Google Patents

物体处理装置、曝光装置及曝光方法、以及元件制造方法 Download PDF

Info

Publication number
CN105954982B
CN105954982B CN201610282686.7A CN201610282686A CN105954982B CN 105954982 B CN105954982 B CN 105954982B CN 201610282686 A CN201610282686 A CN 201610282686A CN 105954982 B CN105954982 B CN 105954982B
Authority
CN
China
Prior art keywords
foregoing
substrate
processing apparatus
aforesaid
aforesaid object
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201610282686.7A
Other languages
English (en)
Chinese (zh)
Other versions
CN105954982A (zh
Inventor
青木保夫
滨田智秀
白数广
户口学
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of CN105954982A publication Critical patent/CN105954982A/zh
Application granted granted Critical
Publication of CN105954982B publication Critical patent/CN105954982B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063—Transporting devices for sheet glass
    • B65G49/064—Transporting devices for sheet glass in a horizontal position
    • B65G49/065—Transporting devices for sheet glass in a horizontal position supported partially or completely on fluid cushions, e.g. a gas cushion
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70816—Bearings
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/78—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using vacuum or suction, e.g. Bernoulli chucks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
    • B65G2249/04—Arrangements of vacuum systems or suction cups
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49998—Work holding

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201610282686.7A 2009-08-20 2010-08-17 物体处理装置、曝光装置及曝光方法、以及元件制造方法 Active CN105954982B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US23549909P 2009-08-20 2009-08-20
US61/235,499 2009-08-20
US12/855,283 US20110042874A1 (en) 2009-08-20 2010-08-12 Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method
US12/855,283 2010-08-12
CN201080036901.6A CN102483578B (zh) 2009-08-20 2010-08-17 物体处理装置、曝光装置及曝光方法、以及元件制造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN201080036901.6A Division CN102483578B (zh) 2009-08-20 2010-08-17 物体处理装置、曝光装置及曝光方法、以及元件制造方法

Publications (2)

Publication Number Publication Date
CN105954982A CN105954982A (zh) 2016-09-21
CN105954982B true CN105954982B (zh) 2018-06-01

Family

ID=43604681

Family Applications (4)

Application Number Title Priority Date Filing Date
CN201610282686.7A Active CN105954982B (zh) 2009-08-20 2010-08-17 物体处理装置、曝光装置及曝光方法、以及元件制造方法
CN201080036901.6A Active CN102483578B (zh) 2009-08-20 2010-08-17 物体处理装置、曝光装置及曝光方法、以及元件制造方法
CN201610282687.1A Active CN105954976B (zh) 2009-08-20 2010-08-17 物体处理装置、曝光装置及曝光方法、以及元件制造方法
CN201610282679.7A Active CN105957827B (zh) 2009-08-20 2010-08-17 物体处理装置、曝光装置及曝光方法、以及元件制造方法

Family Applications After (3)

Application Number Title Priority Date Filing Date
CN201080036901.6A Active CN102483578B (zh) 2009-08-20 2010-08-17 物体处理装置、曝光装置及曝光方法、以及元件制造方法
CN201610282687.1A Active CN105954976B (zh) 2009-08-20 2010-08-17 物体处理装置、曝光装置及曝光方法、以及元件制造方法
CN201610282679.7A Active CN105957827B (zh) 2009-08-20 2010-08-17 物体处理装置、曝光装置及曝光方法、以及元件制造方法

Country Status (6)

Country Link
US (1) US20110042874A1 (https=)
JP (5) JP5776923B2 (https=)
KR (3) KR102184248B1 (https=)
CN (4) CN105954982B (https=)
TW (4) TW202021037A (https=)
WO (1) WO2011021711A1 (https=)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102483580B (zh) * 2009-08-20 2015-04-01 株式会社尼康 物体处理装置、曝光装置及曝光方法、以及元件制造方法
US8699001B2 (en) * 2009-08-20 2014-04-15 Nikon Corporation Object moving apparatus, object processing apparatus, exposure apparatus, object inspecting apparatus and device manufacturing method
US8598538B2 (en) 2010-09-07 2013-12-03 Nikon Corporation Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
CN103782239B (zh) * 2011-08-30 2017-09-05 株式会社尼康 基板处理装置及基板处理方法、曝光方法及曝光装置、以及元件制造方法、及平板显示器的制造方法
JP5464186B2 (ja) * 2011-09-07 2014-04-09 信越化学工業株式会社 フォトマスクブランク、フォトマスク及びその製造方法
KR102000430B1 (ko) * 2012-04-03 2019-07-15 가부시키가이샤 니콘 패턴 형성 장치
JP5863149B2 (ja) * 2012-04-04 2016-02-16 株式会社ニコン 露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
NL2010679A (en) 2012-05-23 2013-11-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
TWI464795B (zh) * 2012-07-13 2014-12-11 Apone Technology Ltd 局部表面處理的遮罩方法
CN103572342B (zh) * 2012-07-23 2016-04-20 崇鼎科技有限公司 局部表面处理的屏蔽方法
DE102012219332B4 (de) * 2012-10-23 2014-11-13 Mdi Schott Advanced Processing Gmbh Vorrichtung und Verfahren zum Lagern und Fixieren einer Glasscheibe
EP3183091B8 (en) * 2014-08-19 2018-09-05 Lumileds Holding B.V. Sapphire collector for reducing mechanical damage during die level laser lift-off
JP6712411B2 (ja) * 2015-03-30 2020-06-24 株式会社ニコン 物体搬送装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、物体搬送方法、及び露光方法
HK1246870A1 (zh) * 2015-03-31 2018-09-14 株式会社尼康 曝光装置、平板显示器的制造方法、器件制造方法及曝光方法
KR102572643B1 (ko) * 2015-05-13 2023-08-31 루미리즈 홀딩 비.브이. 다이 레벨의 레이저 리프트-오프 중에 기계적 손상을 줄이기 위한 사파이어 수집기
WO2017057465A1 (ja) * 2015-09-30 2017-04-06 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法、並びに計測方法
US10520834B2 (en) 2015-09-30 2019-12-31 Nikon Corporation Movable body apparatus, exposure apparatus, manufacturing method of flat-panel display and device manufacturing method, and movement method of object
KR102676391B1 (ko) * 2015-09-30 2024-06-18 가부시키가이샤 니콘 노광 장치, 노광 방법, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법
CN108139679B (zh) * 2015-09-30 2021-06-22 株式会社尼康 曝光装置、平面显示器的制造方法、组件制造方法、及曝光方法
CN106814551B (zh) * 2015-11-30 2019-04-12 上海微电子装备（集团）股份有限公司 一种基板交接装置及交接方法
WO2018001709A1 (en) * 2016-07-01 2018-01-04 Asml Netherlands B.V. Stage system, lithographic apparatus, method for positioning and device manufacturing method
TWI784972B (zh) * 2016-09-30 2022-12-01 日商尼康股份有限公司 曝光裝置、平板顯示器的製造方法、元件製造方法以及曝光方法
US20200019071A1 (en) * 2016-09-30 2020-01-16 Nikon Corporation Carrier device, exposure apparatus, exposure method, manufacturing method of flat-panel display, device manufacturing method, and carrying method
JP6805018B2 (ja) * 2017-02-10 2020-12-23 東京エレクトロン株式会社 塗布装置、および塗布方法
KR20230110827A (ko) * 2017-03-31 2023-07-25 가부시키가이샤 니콘 노광 장치, 노광 방법, 플랫 패널 디스플레이의 제조방법, 및, 디바이스 제조 방법
JP6573131B2 (ja) * 2017-04-19 2019-09-11 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
JP6983578B2 (ja) * 2017-08-25 2021-12-17 株式会社日本製鋼所 レーザ照射装置、レーザ照射方法、及び半導体装置の製造方法
JP7114277B2 (ja) 2018-03-07 2022-08-08 キヤノン株式会社 パターン形成装置及び物品の製造方法
JP2019045875A (ja) * 2018-12-07 2019-03-22 株式会社ニコン 露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び露光方法
JP7285648B2 (ja) * 2019-01-31 2023-06-02 株式会社Ｓｃｒｅｅｎホールディングス 搬送装置、露光装置および搬送方法
JP7435613B2 (ja) * 2019-09-03 2024-02-21 株式会社ニコン 移動体装置及び加工システム
JP2021067925A (ja) * 2019-10-21 2021-04-30 キヤノン株式会社 支持装置、投影光学系、露光装置、支持装置の調整方法および物品製造方法
JP2021035682A (ja) * 2020-12-03 2021-03-04 東京エレクトロン株式会社 塗布装置、および塗布方法
CN112739028B (zh) * 2020-12-29 2025-02-07 中山新诺科技股份有限公司 一种用于双面数字化曝光的基材平整装置
JP7681437B2 (ja) * 2021-06-07 2025-05-22 株式会社ジャパンディスプレイ 表示装置の製造方法
CN113247627B (zh) * 2021-06-28 2021-11-12 新沂市铭达玻璃有限公司 一种基于玻璃输送的自动化装置
JP7756535B2 (ja) * 2021-10-06 2025-10-20 キヤノン株式会社 位置決め装置、リソグラフィ装置、および物品製造方法
CN114509923B (zh) * 2022-01-28 2023-11-24 复旦大学 一种深紫外物镜设计中的调焦调平装置及其应用
CN115236941B (zh) * 2022-02-25 2025-06-24 深圳市先地图像科技有限公司 一种在柔性感光胶片上激光成像的装置及方法
US12533818B2 (en) * 2022-04-11 2026-01-27 Asmpt Singapore Pte. Ltd. Pick-up chuck with gas bearing structure
US20230375945A1 (en) * 2022-05-19 2023-11-23 Taiwan Semiconductor Manufacturing Co., Ltd. Workpiece support

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1580875A (zh) * 2003-08-08 2005-02-16 光子动力学公司 传送和约束大型扁平柔性介质的高精度气浮轴承分轴台
CN101017331A (zh) * 2006-02-10 2007-08-15 优志旺电机株式会社 XYθ移动载台

Family Cites Families (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4642908B1 (https=) * 1968-09-19 1971-12-18
KR100300618B1 (ko) * 1992-12-25 2001-11-22 오노 시게오 노광방법,노광장치,및그장치를사용하는디바이스제조방법
JP3689949B2 (ja) * 1995-12-19 2005-08-31 株式会社ニコン 投影露光装置、及び該投影露光装置を用いたパターン形成方法
EP0866375A3 (en) * 1997-03-17 2000-05-24 Nikon Corporation Article positioning apparatus and exposing apparatus having the same
JP2000078830A (ja) * 1998-09-01 2000-03-14 Nikon Corp リニアモータ及びステージ装置並びに露光装置
JP2000243693A (ja) * 1999-02-23 2000-09-08 Nikon Corp ステージ装置及び露光装置
JP2001215718A (ja) * 1999-11-26 2001-08-10 Nikon Corp 露光装置及び露光方法
EP1160628B1 (en) * 2000-06-02 2007-07-18 ASML Netherlands B.V. Lithographic projection apparatus with a supporting assembly
TW527526B (en) * 2000-08-24 2003-04-11 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
TW529172B (en) * 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
US20030098965A1 (en) * 2001-11-29 2003-05-29 Mike Binnard System and method for supporting a device holder with separate components
US6888620B2 (en) * 2001-11-29 2005-05-03 Nikon Corporation System and method for holding a device with minimal deformation
TWI222423B (en) * 2001-12-27 2004-10-21 Orbotech Ltd System and methods for conveying and transporting levitated articles
TWI226303B (en) * 2002-04-18 2005-01-11 Olympus Corp Substrate carrying device
JP2004079630A (ja) * 2002-08-12 2004-03-11 Nikon Corp 支持装置とその製造方法およびステージ装置並びに露光装置
JP2004238133A (ja) * 2003-02-05 2004-08-26 Sharp Corp 薄板把持装置、薄板搬送装置および薄板検査装置
JP4373175B2 (ja) * 2003-10-17 2009-11-25 オリンパス株式会社 基板搬送装置
KR101195628B1 (ko) 2004-04-14 2012-10-30 코레플로우 사이언티픽 솔루션스 리미티드 편평한 물체의 대향면상에 광학 장치를 포커싱하는 방법
US20080013060A1 (en) * 2004-07-23 2008-01-17 Nikon Corporation Support Apparatus, Stage Apparatus, Exposure Apparatus, And Device Manufacturing Method
US7440081B2 (en) * 2004-11-05 2008-10-21 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and substrate table
US7864293B2 (en) * 2005-01-25 2011-01-04 Nikon Corporation Exposure apparatus, exposure method, and producing method of microdevice
JP2006265020A (ja) * 2005-03-23 2006-10-05 Nippon Sheet Glass Co Ltd ガラス板搬送支持装置
EP1865381A4 (en) * 2005-03-29 2010-03-03 Nikon Corp EXPOSURE DEVICE, METHOD FOR THE PRODUCTION OF AN EXPOSURE DEVICE AND METHOD FOR THE PRODUCTION OF A MICRO-BUILDING ELEMENT
KR100949502B1 (ko) * 2005-06-20 2010-03-24 엘지디스플레이 주식회사 액정표시장치 제조 공정용 기판 반송장치
JP4553376B2 (ja) * 2005-07-19 2010-09-29 東京エレクトロン株式会社 浮上式基板搬送処理装置及び浮上式基板搬送処理方法
US7543867B2 (en) * 2005-09-30 2009-06-09 Photon Dynamics, Inc. Vacuum gripping system for positioning large thin substrates on a support table
WO2007074798A1 (ja) * 2005-12-27 2007-07-05 Sharp Kabushiki Kaisha 基板処理装置への基板搬送方法
TWI605491B (zh) * 2006-01-19 2017-11-11 尼康股份有限公司 曝光裝置及曝光方法、以及元件製造方法
EP3327507B1 (en) * 2006-02-21 2019-04-03 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
KR101356270B1 (ko) * 2006-02-21 2014-01-28 가부시키가이샤 니콘 패턴 형성 장치, 마크 검출 장치, 노광 장치, 패턴 형성 방법, 노광 방법 및 디바이스 제조 방법
US20070236854A1 (en) * 2006-04-11 2007-10-11 Lee Martin E Anti-Gravity Device for Supporting Weight and Reducing Transmissibility
JP2008063020A (ja) * 2006-09-04 2008-03-21 Olympus Corp 基板搬送装置およびそれを用いた基板検査システム
KR20150036734A (ko) 2006-12-27 2015-04-07 가부시키가이샤 니콘 스테이지 장치, 노광 장치, 및 디바이스의 제조 방법
JP2008192678A (ja) * 2007-02-01 2008-08-21 Toppan Printing Co Ltd 基板処理装置
JP4652351B2 (ja) * 2007-02-02 2011-03-16 大日本印刷株式会社 基板支持装置、基板支持方法
KR101547784B1 (ko) * 2007-03-05 2015-08-26 가부시키가이샤 니콘 이동체 장치, 패턴 형성 장치 및 패턴 형성 방법, 디바이스 제조 방법, 이동체 장치의 제조 방법, 및 이동체 구동 방법
JP4743716B2 (ja) * 2007-03-06 2011-08-10 東京エレクトロン株式会社 基板処理装置
US7607647B2 (en) 2007-03-20 2009-10-27 Kla-Tencor Technologies Corporation Stabilizing a substrate using a vacuum preload air bearing chuck
JP5279207B2 (ja) * 2007-06-11 2013-09-04 Ｎｓｋテクノロジー株式会社 露光装置用基板搬送機構
JP2009085865A (ja) 2007-10-02 2009-04-23 Olympus Corp 基板検査装置
JP2009128830A (ja) 2007-11-27 2009-06-11 Sharp Corp 基板処理装置及び基板処理装置の制御方法
US8115906B2 (en) 2007-12-14 2012-02-14 Nikon Corporation Movable body system, pattern formation apparatus, exposure apparatus and measurement device, and device manufacturing method
JP2009147240A (ja) 2007-12-18 2009-07-02 Dainippon Printing Co Ltd 基板支持装置、基板支持方法、基板加工装置、基板加工方法、表示装置構成部材の製造方法
JP2009256029A (ja) * 2008-04-15 2009-11-05 Toray Eng Co Ltd 板状部材の搬送装置および板状部材の搬送方法
KR20100018950A (ko) 2008-08-08 2010-02-18 하명찬 타이어 가황기용 단열판
JP5254073B2 (ja) * 2008-08-21 2013-08-07 Ｎｓｋテクノロジー株式会社 スキャン露光装置およびスキャン露光装置の基板搬送方法
US8699001B2 (en) * 2009-08-20 2014-04-15 Nikon Corporation Object moving apparatus, object processing apparatus, exposure apparatus, object inspecting apparatus and device manufacturing method
JP2010132460A (ja) * 2010-01-13 2010-06-17 Toray Eng Co Ltd 板状部材の搬送装置および板状部材の搬送方法
US8598538B2 (en) * 2010-09-07 2013-12-03 Nikon Corporation Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
US20120064460A1 (en) * 2010-09-07 2012-03-15 Nikon Corporation Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
US20120064461A1 (en) * 2010-09-13 2012-03-15 Nikon Corporation Movable body apparatus, exposure apparatus, device manufacturing method, flat-panel display manufacturing method, and object exchange method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1580875A (zh) * 2003-08-08 2005-02-16 光子动力学公司 传送和约束大型扁平柔性介质的高精度气浮轴承分轴台
CN101017331A (zh) * 2006-02-10 2007-08-15 优志旺电机株式会社 XYθ移动载台

Also Published As

Publication number Publication date
CN105954976B (zh) 2019-11-26
JP5776923B2 (ja) 2015-09-09
KR20120053020A (ko) 2012-05-24
TWI686896B (zh) 2020-03-01
CN105954976A (zh) 2016-09-21
KR20190131146A (ko) 2019-11-25
TW202021037A (zh) 2020-06-01
TWI632640B (zh) 2018-08-11
WO2011021711A1 (en) 2011-02-24
CN105957827B (zh) 2019-11-26
CN105954982A (zh) 2016-09-21
US20110042874A1 (en) 2011-02-24
KR20180058854A (ko) 2018-06-01
KR102184248B1 (ko) 2020-11-30
JP6628154B2 (ja) 2020-01-08
TW201727819A (zh) 2017-08-01
JP2015232718A (ja) 2015-12-24
JP2011044713A (ja) 2011-03-03
JP2017142522A (ja) 2017-08-17
TWI582893B (zh) 2017-05-11
KR101862001B1 (ko) 2018-05-29
TW201126641A (en) 2011-08-01
CN102483578B (zh) 2016-05-25
CN102483578A (zh) 2012-05-30
JP2020043369A (ja) 2020-03-19
CN105957827A (zh) 2016-09-21
TW201839901A (zh) 2018-11-01
JP6508576B2 (ja) 2019-05-08
JP2017142523A (ja) 2017-08-17

Similar Documents

Publication Publication Date Title
CN105954982B (zh) 物体处理装置、曝光装置及曝光方法、以及元件制造方法
CN102483579B (zh) 物体移动装置、物体处理装置、曝光装置、物体检查装置及元件制造方法
CN102483580B (zh) 物体处理装置、曝光装置及曝光方法、以及元件制造方法
CN105372947B (zh) 移动体装置、物体处理装置、曝光装置、平板显示器的制造方法、及元件制造方法
JP6638774B2 (ja) 露光方法及び露光装置、並びにデバイス製造方法及びフラットパネルディスプレイの製造方法
TWI789689B (zh) 曝光裝置、平面顯示器之製造方法、及元件製造方法
HK1229531A1 (en) Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method
HK1229441A1 (en) Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method
HK1229440A1 (en) Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method
HK1166142B (en) Object moving apparatus, object processing apparatus, exposure apparatus, object inspecting apparatus and device manufacturing method
HK1166141A (en) Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method
HK1229441B (zh) 物体处理装置、曝光装置及曝光方法、以及元件制造方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
REG Reference to a national code

Ref country code: HK

Ref legal event code: DE

Ref document number: 1229441

Country of ref document: HK

GR01 Patent grant
GR01 Patent grant