CN105074046A - 氧化铌溅射靶、其制造方法及氧化铌膜 - Google Patents

氧化铌溅射靶、其制造方法及氧化铌膜 Download PDF

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Publication number
CN105074046A
CN105074046A CN201480010227.2A CN201480010227A CN105074046A CN 105074046 A CN105074046 A CN 105074046A CN 201480010227 A CN201480010227 A CN 201480010227A CN 105074046 A CN105074046 A CN 105074046A
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CN
China
Prior art keywords
niobium oxide
niobium
sputtering target
sputtering
niobium oxides
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201480010227.2A
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English (en)
Chinese (zh)
Inventor
梅本启太
张守斌
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Mitsubishi Materials Corp
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Mitsubishi Materials Corp
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Filing date
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Publication of CN105074046A publication Critical patent/CN105074046A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/495—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on vanadium, niobium, tantalum, molybdenum or tungsten oxides or solid solutions thereof with other oxides, e.g. vanadates, niobates, tantalates, molybdates or tungstates
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
    • C04B35/62605—Treating the starting powders individually or as mixtures
    • C04B35/62645—Thermal treatment of powders or mixtures thereof other than sintering
    • C04B35/6265—Thermal treatment of powders or mixtures thereof other than sintering involving reduction or oxidation
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/64—Burning or sintering processes
    • C04B35/645—Pressure sintering
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/64—Burning or sintering processes
    • C04B35/645—Pressure sintering
    • C04B35/6455—Hot isostatic pressing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
    • C04B2235/3251—Niobium oxides, niobates, tantalum oxides, tantalates, or oxide-forming salts thereof
    • C04B2235/3253—Substoichiometric niobium or tantalum oxides, e.g. NbO
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
    • C04B2235/658—Atmosphere during thermal treatment
    • C04B2235/6581—Total pressure below 1 atmosphere, e.g. vacuum

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Structural Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Powder Metallurgy (AREA)
CN201480010227.2A 2013-02-26 2014-02-20 氧化铌溅射靶、其制造方法及氧化铌膜 Pending CN105074046A (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2013035575 2013-02-26
JP2013-035575 2013-02-26
JP2014-023246 2014-02-10
JP2014023246A JP6403087B2 (ja) 2013-02-26 2014-02-10 酸化ニオブスパッタリングターゲット及びその製造方法
PCT/JP2014/054004 WO2014132872A1 (ja) 2013-02-26 2014-02-20 酸化ニオブスパッタリングターゲット、その製造方法及び酸化ニオブ膜

Publications (1)

Publication Number Publication Date
CN105074046A true CN105074046A (zh) 2015-11-18

Family

ID=51428143

Family Applications (1)

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CN201480010227.2A Pending CN105074046A (zh) 2013-02-26 2014-02-20 氧化铌溅射靶、其制造方法及氧化铌膜

Country Status (5)

Country Link
JP (1) JP6403087B2 (enExample)
KR (1) KR20150120996A (enExample)
CN (1) CN105074046A (enExample)
TW (1) TWI603938B (enExample)
WO (1) WO2014132872A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105506737A (zh) * 2015-12-28 2016-04-20 常州瞻驰光电科技有限公司 一种非化学计量比氧化铌多晶镀膜材料及其生长技术
CN110963529A (zh) * 2018-09-30 2020-04-07 中国科学院上海硅酸盐研究所 一种纯相的铌的低价态氧化物纳米粉体及其制备方法和应用

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6273376B2 (ja) * 2014-10-06 2018-01-31 Ｊｘ金属株式会社 ニオブ酸化物焼結体及び該焼結体からなるスパッタリングターゲット並びにニオブ酸化物焼結体の製造方法
JP6492877B2 (ja) * 2015-03-30 2019-04-03 東ソー株式会社 酸化物焼結体及びその製造方法
WO2020195121A1 (ja) 2019-03-26 2020-10-01 Ｊｘ金属株式会社 ニオブスパッタリングターゲット
CN110467462A (zh) * 2019-08-09 2019-11-19 宁夏中色新材料有限公司 一种高致密低电阻氧化铌旋转靶材及其制备方法

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* Cited by examiner, † Cited by third party
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JP2002338354A (ja) * 2001-05-18 2002-11-27 Kyocera Corp 酸化ニオブ焼結体とその製造方法及びこれを用いたスパッタリングターゲット
JP2004059965A (ja) * 2002-07-25 2004-02-26 Toshiba Corp スパッタリングターゲットおよびその製造方法
CN101851740A (zh) * 2009-04-02 2010-10-06 宜兴佰伦光电材料科技有限公司 用于磁控溅射镀膜的导电Nb2O5-x靶材及生产方法
CN101864555A (zh) * 2009-04-14 2010-10-20 上海高展金属材料有限公司 一种导电的氧化铌靶材、制备方法及其应用
KR20110052119A (ko) * 2009-11-12 2011-05-18 삼성코닝정밀소재 주식회사 다상 Ｎｂ0ｘ 스퍼터링 타겟 및 그 제조방법
CN102659405A (zh) * 2012-04-06 2012-09-12 西北稀有金属材料研究院 高密度氧化铌溅射靶材的制备方法

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JP2915177B2 (ja) * 1990-11-30 1999-07-05 株式会社日立製作所 スパッタリングターゲットの製造方法及びこの方法によって製造されたスパッタリングターゲット
JP2000113913A (ja) * 1998-10-02 2000-04-21 Sumitomo Osaka Cement Co Ltd 色素増感型太陽電池
JP2003098340A (ja) * 2001-09-21 2003-04-03 Asahi Glass Co Ltd 光学多層干渉膜とその製造方法および光学多層干渉膜を用いたフィルター
JP2003123853A (ja) * 2001-10-11 2003-04-25 Bridgestone Corp 有機色素増感型金属酸化物半導体電極及びその製造方法、並びにこの半導体電極を有する太陽電池
JP4670097B2 (ja) * 2005-04-27 2011-04-13 Ａｇｃセラミックス株式会社 ターゲットおよび該ターゲットによる高屈折率膜の製造方法
TWI385814B (zh) * 2009-05-25 2013-02-11 Ind Tech Res Inst 光電致變色元件及其製作方法
JP5249963B2 (ja) * 2010-02-01 2013-07-31 三井金属鉱業株式会社 セラミックス−金属複合材料からなるスパッタリングターゲット材およびスパッタリングターゲット
KR101967945B1 (ko) * 2010-04-26 2019-04-10 제이엑스금속주식회사 Ｓｂ-Ｔｅ기 합금 소결체 스퍼터링 타깃
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JP5630416B2 (ja) * 2011-03-23 2014-11-26 住友金属鉱山株式会社 Ｃｕ−Ｇａ合金スパッタリングターゲットの製造方法及びＣｕ−Ｇａ合金粉末の製造方法
JP5501306B2 (ja) * 2011-08-18 2014-05-21 出光興産株式会社 Ｉｎ−Ｇａ−Ｚｎ−Ｏ系スパッタリングターゲット
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JP2002338354A (ja) * 2001-05-18 2002-11-27 Kyocera Corp 酸化ニオブ焼結体とその製造方法及びこれを用いたスパッタリングターゲット
JP2004059965A (ja) * 2002-07-25 2004-02-26 Toshiba Corp スパッタリングターゲットおよびその製造方法
CN101851740A (zh) * 2009-04-02 2010-10-06 宜兴佰伦光电材料科技有限公司 用于磁控溅射镀膜的导电Nb2O5-x靶材及生产方法
CN101864555A (zh) * 2009-04-14 2010-10-20 上海高展金属材料有限公司 一种导电的氧化铌靶材、制备方法及其应用
KR20110052119A (ko) * 2009-11-12 2011-05-18 삼성코닝정밀소재 주식회사 다상 Ｎｂ0ｘ 스퍼터링 타겟 및 그 제조방법
CN102659405A (zh) * 2012-04-06 2012-09-12 西北稀有金属材料研究院 高密度氧化铌溅射靶材的制备方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105506737A (zh) * 2015-12-28 2016-04-20 常州瞻驰光电科技有限公司 一种非化学计量比氧化铌多晶镀膜材料及其生长技术
CN105506737B (zh) * 2015-12-28 2018-02-09 常州瞻驰光电科技有限公司 一种非化学计量比氧化铌多晶镀膜材料及其生长技术
CN110963529A (zh) * 2018-09-30 2020-04-07 中国科学院上海硅酸盐研究所 一种纯相的铌的低价态氧化物纳米粉体及其制备方法和应用
CN110963529B (zh) * 2018-09-30 2021-12-07 中国科学院上海硅酸盐研究所 一种纯相的铌的低价态氧化物纳米粉体及其制备方法和应用

Also Published As

Publication number Publication date
WO2014132872A1 (ja) 2014-09-04
JP2014194072A (ja) 2014-10-09
JP6403087B2 (ja) 2018-10-10
TW201439032A (zh) 2014-10-16
KR20150120996A (ko) 2015-10-28
TWI603938B (zh) 2017-11-01

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Application publication date: 20151118